JP2011155291A5 - - Google Patents
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- JP2011155291A5 JP2011155291A5 JP2011081850A JP2011081850A JP2011155291A5 JP 2011155291 A5 JP2011155291 A5 JP 2011155291A5 JP 2011081850 A JP2011081850 A JP 2011081850A JP 2011081850 A JP2011081850 A JP 2011081850A JP 2011155291 A5 JP2011155291 A5 JP 2011155291A5
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- JP
- Japan
- Prior art keywords
- light receiving
- layer
- light
- gas
- monitoring device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000758 substrate Substances 0.000 claims description 90
- 238000009826 distribution Methods 0.000 claims description 83
- 239000012535 impurity Substances 0.000 claims description 70
- 238000012806 monitoring device Methods 0.000 claims description 57
- 238000012544 monitoring process Methods 0.000 claims description 43
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 39
- 239000004065 semiconductor Substances 0.000 claims description 38
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- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical group [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 120
- 229910052739 hydrogen Inorganic materials 0.000 description 45
- 239000001257 hydrogen Substances 0.000 description 45
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- 229930195733 hydrocarbon Natural products 0.000 description 6
- 150000002430 hydrocarbons Chemical class 0.000 description 6
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 6
- 230000007704 transition Effects 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 5
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- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 4
- 238000004458 analytical method Methods 0.000 description 4
- 229910002091 carbon monoxide Inorganic materials 0.000 description 4
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- 229910052732 germanium Inorganic materials 0.000 description 3
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000002441 reversible effect Effects 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 229910052725 zinc Inorganic materials 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
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- 238000004611 spectroscopical analysis Methods 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- YBNMDCCMCLUHBL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-pyren-1-ylbutanoate Chemical compound C=1C=C(C2=C34)C=CC3=CC=CC4=CC=C2C=1CCCC(=O)ON1C(=O)CCC1=O YBNMDCCMCLUHBL-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 238000004497 NIR spectroscopy Methods 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000003491 array Methods 0.000 description 1
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- 238000004364 calculation method Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 238000001307 laser spectroscopy Methods 0.000 description 1
- XCAUINMIESBTBL-UHFFFAOYSA-N lead(ii) sulfide Chemical compound [Pb]=S XCAUINMIESBTBL-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001473 noxious effect Effects 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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- 238000001179 sorption measurement Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000000927 vapour-phase epitaxy Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011081850A JP5402972B2 (ja) | 2011-04-01 | 2011-04-01 | 気体モニタリング装置、燃焼状態モニタリング装置、経年変化モニタリング装置、および不純物濃度モニタリング装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011081850A JP5402972B2 (ja) | 2011-04-01 | 2011-04-01 | 気体モニタリング装置、燃焼状態モニタリング装置、経年変化モニタリング装置、および不純物濃度モニタリング装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008331531A Division JP4743453B2 (ja) | 2008-12-25 | 2008-12-25 | 気体モニタリング装置、燃焼状態モニタリング装置、経年変化モニタリング装置、および不純物濃度モニタリング装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011155291A JP2011155291A (ja) | 2011-08-11 |
| JP2011155291A5 true JP2011155291A5 (https=) | 2012-02-09 |
| JP5402972B2 JP5402972B2 (ja) | 2014-01-29 |
Family
ID=44540991
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011081850A Expired - Fee Related JP5402972B2 (ja) | 2011-04-01 | 2011-04-01 | 気体モニタリング装置、燃焼状態モニタリング装置、経年変化モニタリング装置、および不純物濃度モニタリング装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5402972B2 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5748176B2 (ja) * | 2011-11-01 | 2015-07-15 | 住友電気工業株式会社 | 受光素子、エピタキシャルウエハおよびその製造方法 |
| JP2016200558A (ja) * | 2015-04-14 | 2016-12-01 | 横河電機株式会社 | ガス濃度分析装置 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0547692A (ja) * | 1991-08-20 | 1993-02-26 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPH05160426A (ja) * | 1991-12-06 | 1993-06-25 | Nec Corp | 半導体受光素子 |
| JPH07106621A (ja) * | 1993-09-30 | 1995-04-21 | Furukawa Electric Co Ltd:The | 半導体受光素子 |
| JP3781354B2 (ja) * | 2001-12-04 | 2006-05-31 | 慎司 岡崎 | ガスセンサ用の膜とその製造方法 |
| JP4010455B2 (ja) * | 2003-04-24 | 2007-11-21 | ホーチキ株式会社 | 散乱光式煙感知器 |
| JP2006012974A (ja) * | 2004-06-23 | 2006-01-12 | Fujitsu Ltd | 光検知装置 |
| JP2007201432A (ja) * | 2005-12-28 | 2007-08-09 | Sumitomo Electric Ind Ltd | 撮像装置、視界支援装置、暗視装置、航海支援装置および監視装置 |
| JP2007324572A (ja) * | 2006-05-02 | 2007-12-13 | Sumitomo Electric Ind Ltd | 受光素子アレイ、その製造方法、および光計測システム |
| JP2008205001A (ja) * | 2007-02-16 | 2008-09-04 | Sumitomo Electric Ind Ltd | 受光素子、センサおよび撮像装置 |
-
2011
- 2011-04-01 JP JP2011081850A patent/JP5402972B2/ja not_active Expired - Fee Related
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