JP2011114339A5 - - Google Patents

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Publication number
JP2011114339A5
JP2011114339A5 JP2010182795A JP2010182795A JP2011114339A5 JP 2011114339 A5 JP2011114339 A5 JP 2011114339A5 JP 2010182795 A JP2010182795 A JP 2010182795A JP 2010182795 A JP2010182795 A JP 2010182795A JP 2011114339 A5 JP2011114339 A5 JP 2011114339A5
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JP
Japan
Prior art keywords
substrate
heating
storage container
heat insulating
shutter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010182795A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011114339A (ja
JP5727171B2 (ja
Filing date
Publication date
Priority claimed from KR1020090115557A external-priority patent/KR101671873B1/ko
Application filed filed Critical
Publication of JP2011114339A publication Critical patent/JP2011114339A/ja
Publication of JP2011114339A5 publication Critical patent/JP2011114339A5/ja
Application granted granted Critical
Publication of JP5727171B2 publication Critical patent/JP5727171B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010182795A 2009-11-27 2010-08-18 ガス排気方法及びガス排気を行う基板加熱装置 Active JP5727171B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2009-0115557 2009-11-27
KR1020090115557A KR101671873B1 (ko) 2009-11-27 2009-11-27 가스 배기 방법 및 이를 수행하기 위한 기판 가열 장치

Publications (3)

Publication Number Publication Date
JP2011114339A JP2011114339A (ja) 2011-06-09
JP2011114339A5 true JP2011114339A5 (enExample) 2013-09-19
JP5727171B2 JP5727171B2 (ja) 2015-06-03

Family

ID=44236402

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010182795A Active JP5727171B2 (ja) 2009-11-27 2010-08-18 ガス排気方法及びガス排気を行う基板加熱装置

Country Status (2)

Country Link
JP (1) JP5727171B2 (enExample)
KR (1) KR101671873B1 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014054511A1 (ja) * 2012-10-03 2014-04-10 シャープ株式会社 基板焼成装置
KR102315008B1 (ko) * 2014-11-24 2021-10-20 엘지디스플레이 주식회사 디스플레이패널 제조용 열처리장치 및 열처리장치용 셔터장치
KR102528927B1 (ko) * 2021-05-07 2023-05-03 피코앤테라(주) 웨이퍼 수납용기
KR20250087813A (ko) 2023-12-08 2025-06-17 주식회사 대지메카트로닉스 워킹빔타입 pcb 건조 장치 및 방법
KR20250087815A (ko) 2023-12-08 2025-06-17 주식회사 대지메카트로닉스 수직타입 원적외선 pcb 건조 장치 및 방법

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59149020A (ja) * 1983-02-16 1984-08-25 Hitachi Ltd 縦型反応炉
JP2564288B2 (ja) * 1987-01-23 1996-12-18 株式会社日立製作所 ベ−ク装置
JPH03209714A (ja) * 1990-01-11 1991-09-12 Mitsubishi Electric Corp レジスト塗布装置
JPH0684781A (ja) * 1992-09-03 1994-03-25 Fujitsu Ltd 半導体製造装置
JP3247976B2 (ja) * 1993-09-06 2002-01-21 東京エレクトロン株式会社 熱処理装置
JP3555734B2 (ja) * 1998-03-24 2004-08-18 大日本スクリーン製造株式会社 基板加熱処理装置
JP4564624B2 (ja) * 2000-04-28 2010-10-20 小糸工業株式会社 陶芸用電気炉
JP3855127B2 (ja) * 2003-02-20 2006-12-06 光洋サーモシステム株式会社 熱処理装置
JP2005019593A (ja) * 2003-06-25 2005-01-20 Matsushita Electric Ind Co Ltd 熱処理方法および装置
JP2005061645A (ja) * 2003-08-12 2005-03-10 Clean Technology Kk 基板加熱乾燥装置に設ける換気構造
JP4255789B2 (ja) * 2003-09-08 2009-04-15 メタウォーター株式会社 誘導加熱式乾留炉
JP4833005B2 (ja) * 2006-09-11 2011-12-07 大日本スクリーン製造株式会社 基板処理装置および基板処理方法

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