JP2011068930A - 金属表面処理用組成物及び金属表面処理方法 - Google Patents
金属表面処理用組成物及び金属表面処理方法 Download PDFInfo
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- JP2011068930A JP2011068930A JP2009219654A JP2009219654A JP2011068930A JP 2011068930 A JP2011068930 A JP 2011068930A JP 2009219654 A JP2009219654 A JP 2009219654A JP 2009219654 A JP2009219654 A JP 2009219654A JP 2011068930 A JP2011068930 A JP 2011068930A
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- Prior art keywords
- surface treatment
- metal surface
- composition
- zirconium
- metal
- Prior art date
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- 239000002184 metal Substances 0.000 title claims abstract description 53
- 239000000203 mixture Substances 0.000 title claims abstract description 43
- 238000004381 surface treatment Methods 0.000 title claims abstract description 41
- 238000000034 method Methods 0.000 title claims abstract description 23
- 238000011282 treatment Methods 0.000 claims abstract description 55
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims abstract description 25
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims abstract description 23
- 229910000077 silane Inorganic materials 0.000 claims abstract description 17
- 150000003755 zirconium compounds Chemical class 0.000 claims abstract description 10
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 9
- 238000006482 condensation reaction Methods 0.000 claims abstract description 9
- 150000003609 titanium compounds Chemical class 0.000 claims abstract description 9
- 239000007787 solid Substances 0.000 claims abstract description 8
- -1 titanium halides Chemical class 0.000 claims description 29
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 23
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
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- UJVRJBAUJYZFIX-UHFFFAOYSA-N nitric acid;oxozirconium Chemical compound [Zr]=O.O[N+]([O-])=O.O[N+]([O-])=O UJVRJBAUJYZFIX-UHFFFAOYSA-N 0.000 claims description 6
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
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- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 239000011575 calcium Substances 0.000 claims description 2
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 claims description 2
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- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 2
- 229910052709 silver Inorganic materials 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 229910052712 strontium Inorganic materials 0.000 claims description 2
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 claims description 2
- 229910052718 tin Inorganic materials 0.000 claims description 2
- XROWMBWRMNHXMF-UHFFFAOYSA-J titanium tetrafluoride Chemical compound [F-].[F-].[F-].[F-].[Ti+4] XROWMBWRMNHXMF-UHFFFAOYSA-J 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 229910052727 yttrium Inorganic materials 0.000 claims description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 2
- OMQSJNWFFJOIMO-UHFFFAOYSA-J zirconium tetrafluoride Chemical compound F[Zr](F)(F)F OMQSJNWFFJOIMO-UHFFFAOYSA-J 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims 1
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- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 abstract description 8
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- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- HLJCWGPUCQTHFY-UHFFFAOYSA-H disodium;hexafluorotitanium(2-) Chemical compound [F-].[F-].[Na+].[Na+].F[Ti](F)(F)F HLJCWGPUCQTHFY-UHFFFAOYSA-H 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000008397 galvanized steel Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910000398 iron phosphate Inorganic materials 0.000 description 1
- WBJZTOZJJYAKHQ-UHFFFAOYSA-K iron(3+) phosphate Chemical compound [Fe+3].[O-]P([O-])([O-])=O WBJZTOZJJYAKHQ-UHFFFAOYSA-K 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- UWTJALAXUKLZON-UHFFFAOYSA-I lithium titanium(4+) pentafluoride Chemical compound [Li+].[F-].[F-].[F-].[F-].[F-].[Ti+4] UWTJALAXUKLZON-UHFFFAOYSA-I 0.000 description 1
- QLKUHEGYKZOAEP-UHFFFAOYSA-I lithium;zirconium(4+);pentafluoride Chemical compound [Li+].[F-].[F-].[F-].[F-].[F-].[Zr+4] QLKUHEGYKZOAEP-UHFFFAOYSA-I 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920001228 polyisocyanate Polymers 0.000 description 1
- 239000005056 polyisocyanate Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- SQTLECAKIMBJGK-UHFFFAOYSA-I potassium;titanium(4+);pentafluoride Chemical compound [F-].[F-].[F-].[F-].[F-].[K+].[Ti+4] SQTLECAKIMBJGK-UHFFFAOYSA-I 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
- FOQJQXVUMYLJSU-UHFFFAOYSA-N triethoxy(1-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)[Si](OCC)(OCC)OCC FOQJQXVUMYLJSU-UHFFFAOYSA-N 0.000 description 1
- PGVSPORIGRCPMG-UHFFFAOYSA-N triethoxy(1-triethoxysilylhexyl)silane Chemical compound CCCCCC([Si](OCC)(OCC)OCC)[Si](OCC)(OCC)OCC PGVSPORIGRCPMG-UHFFFAOYSA-N 0.000 description 1
- IZRJPHXTEXTLHY-UHFFFAOYSA-N triethoxy(2-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CC[Si](OCC)(OCC)OCC IZRJPHXTEXTLHY-UHFFFAOYSA-N 0.000 description 1
- OSAJVUUALHWJEM-UHFFFAOYSA-N triethoxy(8-triethoxysilyloctyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCCCCC[Si](OCC)(OCC)OCC OSAJVUUALHWJEM-UHFFFAOYSA-N 0.000 description 1
- XWPXMMSMCXBBGE-UHFFFAOYSA-N triethoxy(9-triethoxysilylnonyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCCCCCC[Si](OCC)(OCC)OCC XWPXMMSMCXBBGE-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JBYXACURRYATNJ-UHFFFAOYSA-N trimethoxy(1-trimethoxysilylhexyl)silane Chemical compound CCCCCC([Si](OC)(OC)OC)[Si](OC)(OC)OC JBYXACURRYATNJ-UHFFFAOYSA-N 0.000 description 1
- MBIWXZXQMMLFAB-UHFFFAOYSA-N trimethoxy(9-trimethoxysilylnonyl)silane Chemical compound CO[Si](OC)(OC)CCCCCCCCC[Si](OC)(OC)OC MBIWXZXQMMLFAB-UHFFFAOYSA-N 0.000 description 1
- DJYGUVIGOGFJOF-UHFFFAOYSA-N trimethoxy(trimethoxysilylmethyl)silane Chemical compound CO[Si](OC)(OC)C[Si](OC)(OC)OC DJYGUVIGOGFJOF-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C22/00—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C22/05—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions
- C23C22/06—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6
- C23C22/34—Chemical surface treatment of metallic material by reaction of the surface with a reactive liquid, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using aqueous solutions using aqueous acidic solutions with pH less than 6 containing fluorides or complex fluorides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
Abstract
【解決手段】(A)チタン化合物及び/又はジルコニウム化合物、並びに(B)アミノシラン(b1)及び多シリル官能シラン(b2)の縮合反応物を含有することを特徴とする金属表面処理用組成物。チタン化合物及び/又はジルコニウム化合物(A)の含有量が金属元素換算で5〜10,000ppmであり、アミノシラン(b1)及び多シリル官能シラン(b2)の縮合反応物(B)の含有量が固形分濃度で1〜5,000ppmである。
【選択図】なし
Description
上記において、R1、R2、R3およびR4は、独立に、水素原子、または炭素数1〜30の1価の有機基を示す。1価の有機基としては、アルキル基、アルケニル基、シクロアルキル基、アリール基等の炭化水素基;水酸基、エポキシ基、アミノ基等の官能基を有する炭化水素基などが挙げられ、特にメチル基、エチル基等の低級アルキル基が好ましい。
製造例1
還流冷却器、温度計、窒素導入管、攪拌機を取り付けた1Lの丸底フラスコに、イソプロパノール200g、脱イオン水200gを仕込み、攪拌を開始した。気相に窒素を吹き込み、攪拌しながら3−アミノプロピルトリメトキシシラン90g、ビス(トリエトキシシリル)エタン10gを一度に投入した。常温で1時間攪拌した後、60℃で6時間反応させた後、留分を除去し、プロピレングリコールモノメチルエーテルに交換しながら沸点が120℃になるまで昇温した。60℃まで冷却した後、減圧蒸留にて濃縮し、生成物(P1)の不揮発分40%溶液120gを得た。得られた生成物(P1)の不揮発分40%溶液は、無色透明の粘調な液体であった。
製造例1において、原料組成を表1に示す通りとする以外は製造例1と同様に行って各生成物(P1)〜(P8)及び(R1)〜(R4)を得た。
金属表面処理用組成物の作成
上記で作成した(P1)〜(P8)及び(R1)〜(R4)に、ジルコンフッ化水素酸及びチタンフッ化水素酸、各金属の硝酸塩等を用いて、表2に示す組成を有する金属表面処理用組成物を調整した。表2において、各金属成分の濃度は金属元素換算で示し、それ以外の成分の濃度は固形分濃度を示す。
市販の冷間圧延鋼板(SPCC−SD、日本テストパネル社製、70mm×150mm×0.8mm)、亜鉛系めっき鋼板(GA鋼板、日本テストパネル社製、70mm×150mm×0.8mm)、5000系アルミニウム(日本テストパネル社製、70mm×150mm×0.8mm)又は6000系アルミニウム(日本テストパネル社製、70mm×150mm×0.8mm)を基材として、下記に示す工程及び表3の条件で化成処理を行なった。
(注1)有機樹脂:「PAA25」、商品名、日東紡株式会社製、ポリアリルアミン樹脂水溶液
(注2)界面活性剤:「ニューコール1100」、商品名、日本乳化剤株式会社製、ノニオン系界面活性剤
(注3)シリカ:「スノーテックスO」、商品名、日産化学工業株式会社製、水分散性(コロイダル)シリカ
市販のリン酸亜鉛系化成処理鋼板(基材:SPCC−SD、日本テストパネル社製)に、「アクカベークRIZE」(水性ポリエステルウレタン系焼付型塗料)を乾燥膜厚で30μmとなるようにエアスプレー塗装を行い、150℃で30分間加熱して焼き付けて、試験塗板を作成した。得られた試験塗板を下記評価試験に供した。結果を表4に示す。
比較例5において、市販のリン酸亜鉛系化成処理鋼板(基材:GA鋼板、日本テストパネル社製)を用いる以外は比較例5と同様にして試験塗板を作成した。得られた試験塗板を下記評価試験に供した。結果を表4に示す。
比較例5において、市販のクロメート系化成処理板(基材:5000系アルミニウム、日本テストパネル社製)を用いる以外は比較例5と同様にして試験塗板を作成した。得られた試験塗板を下記評価試験に供した。結果を表4に示す。
(*1)耐食性:各試験塗板に、素地に達するよう塗膜にナイフでクロスカット傷を入れ、これを塩水噴霧腐食試験(SST:JIS Z−2371に準ずる。塩水温度35℃)に240時間供し、その後ナイフ傷部に接着テープによる貼着・剥離を行い、塗膜の剥離幅を測定した。評価基準は以下のとおりである。
○:剥離幅3mm以内
△:剥離幅3mmを超えて5mm以内
×:剥離幅5mmを超える
○:剥れマス5個以内
△:剥れマス6〜10個
×:剥れマス11個以上
Claims (11)
- (A)チタン化合物及び/又はジルコニウム化合物、並びに(B)アミノシラン(b1)及び多シリル官能シラン(b2)の縮合反応物を含有することを特徴とする金属表面処理用組成物。
- チタン化合物及び/又はジルコニウム化合物(A)の含有量が金属元素換算で5〜10,000ppmであり、アミノシラン(b1)及び多シリル官能シラン(b2)の縮合反応物(B)の含有量が固形分濃度で1〜5,000ppmである請求項1に記載の金属表面処理用組成物。
- チタン化合物及び/又はジルコニウム化合物(A)が、チタンのハロゲン化物及びその塩、ジルコニウムのハロゲン化物及びその塩、炭酸ジルコニウム及びその塩並びに硝酸ジルコニルから選ばれる少なくとも1種の化合物を含むものである請求項1又は2に記載の金属表面処理用組成物。
- チタン化合物及び/又はジルコニウム化合物(A)が、ジルコニウムフッ化塩、チタンフッ化塩、炭酸ジルコニウム及びその塩並びに硝酸ジルコニルから選ばれる少なくとも1種の化合物を含むものである請求項1ないし3のいずれか1項に記載の金属表面処理用組成物。
- アミノシラン(b1)及び多シリル官能シラン(b2)の使用比が、モル比で50/50〜99/1である請求項1ないし5のいずれか1項に記載の金属表面処理用組成物。
- マグネシウム、亜鉛、カルシウム、アルミニウム、ガリウム、インジウム、銅、鉄、マンガン、ニッケル、コバルト、セリウム、ストロンチウム、希土類元素、スズ、ビスマス、イットリウム、バナジウム、バリウム、クロム、モリブデン、タングステン及び銀よりなる群から選ばれる少なくとも1種の金属元素をさらに含有する請求項1ないし6のいずれか1項に記載の金属表面処理用組成物。
- 硝酸、硫酸、リン酸、ホスホン酸、次亜リン酸及びこれらの塩類よりなる群から選ばれる少なくとも1種をさらに含有する請求項1ないし7のいずれか1項に記載の金属表面処理用組成物。
- 水溶性又は水分散性有機樹脂をさらに含有する請求項1ないし8のいずれか1項に記載の金属表面処理用組成物。
- 界面活性剤をさらに含有する請求項1ないし9のいずれか1項に記載の金属表面処理用組成物。
- 金属材料の表面を処理する金属表面処理方法であって、請求項1ないし10のいずれか1項に記載の金属表面処理用組成物を含む金属表面処理液を前記金属材料に接触させる処理液接触工程と、前記処理液接触工程を経た金属材料を水洗する水洗工程と、を含む金属表面処理方法。
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