JP2011037670A5 - - Google Patents
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- Publication number
- JP2011037670A5 JP2011037670A5 JP2009187302A JP2009187302A JP2011037670A5 JP 2011037670 A5 JP2011037670 A5 JP 2011037670A5 JP 2009187302 A JP2009187302 A JP 2009187302A JP 2009187302 A JP2009187302 A JP 2009187302A JP 2011037670 A5 JP2011037670 A5 JP 2011037670A5
- Authority
- JP
- Japan
- Prior art keywords
- phch
- reaction formula
- phchrcl
- scheme
- iron rust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 229910052742 iron Inorganic materials 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009187302A JP5368909B2 (ja) | 2009-08-12 | 2009-08-12 | クロロシラン類の精製方法 |
| CN201080035441.5A CN102471076B (zh) | 2009-08-12 | 2010-07-07 | 氯硅烷类的提纯方法 |
| EP10808063.1A EP2465819B1 (en) | 2009-08-12 | 2010-07-07 | Method for purifying chlorosilanes |
| PCT/JP2010/004441 WO2011018875A1 (ja) | 2009-08-12 | 2010-07-07 | クロロシラン類の精製方法 |
| US13/386,926 US9193597B2 (en) | 2009-08-12 | 2010-07-07 | Method for purifying chlorosilanes |
| AU2010283420A AU2010283420B2 (en) | 2009-08-12 | 2010-07-07 | Method for purifying chlorosilanes |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009187302A JP5368909B2 (ja) | 2009-08-12 | 2009-08-12 | クロロシラン類の精製方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2011037670A JP2011037670A (ja) | 2011-02-24 |
| JP2011037670A5 true JP2011037670A5 (enExample) | 2012-02-02 |
| JP5368909B2 JP5368909B2 (ja) | 2013-12-18 |
Family
ID=43586060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009187302A Active JP5368909B2 (ja) | 2009-08-12 | 2009-08-12 | クロロシラン類の精製方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9193597B2 (enExample) |
| EP (1) | EP2465819B1 (enExample) |
| JP (1) | JP5368909B2 (enExample) |
| CN (1) | CN102471076B (enExample) |
| AU (1) | AU2010283420B2 (enExample) |
| WO (1) | WO2011018875A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5507498B2 (ja) * | 2011-06-21 | 2014-05-28 | 信越化学工業株式会社 | クロロシラン類の精製方法 |
| WO2013059686A1 (en) * | 2011-10-20 | 2013-04-25 | Rec Silicon Inc | Fouling reduction in hydrochlorosilane production |
| JP5914240B2 (ja) * | 2012-08-07 | 2016-05-11 | 株式会社トクヤマ | 多結晶シリコンの製造方法 |
| US10584035B2 (en) * | 2017-02-24 | 2020-03-10 | Shin-Etsu Chemical Co., Ltd. | Purification system of trichlorosilane and silicon crystal |
| DE102017125221A1 (de) * | 2017-10-27 | 2019-05-02 | Nexwafe Gmbh | Verfahren und Vorrichtung zur Entfernung von Verunreinigungen aus Chlorsilanen |
| US20250198050A1 (en) | 2022-01-18 | 2025-06-19 | Tokuyama Corporation | Reaction Furnace for Producing Polycrystalline Silicon Rod, Gas Supply Nozzle, Production Method of Polycrystalline Silicon Rod, and Polycrystalline Silicon Rod |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3126248A (en) | 1964-03-24 | Process for producing purified | ||
| NL235008A (enExample) * | 1958-01-11 | |||
| US4374110A (en) | 1981-06-15 | 1983-02-15 | Motorola, Inc. | Purification of silicon source materials |
| JP2005067979A (ja) * | 2003-08-27 | 2005-03-17 | Tokuyama Corp | クロロシラン類の精製方法 |
| ITRM20040570A1 (it) | 2004-11-19 | 2005-02-19 | Memc Electronic Materials | Procedimento e impianto di purificazione di triclorosilano e di tetracloruro di silicio. |
| CN100413872C (zh) | 2005-10-31 | 2008-08-27 | 杭州师范学院 | 一种化学提纯甲基苯基二氯硅烷的方法 |
| JP4714198B2 (ja) * | 2007-09-05 | 2011-06-29 | 信越化学工業株式会社 | クロロシラン類の精製方法 |
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2009
- 2009-08-12 JP JP2009187302A patent/JP5368909B2/ja active Active
-
2010
- 2010-07-07 WO PCT/JP2010/004441 patent/WO2011018875A1/ja not_active Ceased
- 2010-07-07 US US13/386,926 patent/US9193597B2/en not_active Expired - Fee Related
- 2010-07-07 CN CN201080035441.5A patent/CN102471076B/zh not_active Expired - Fee Related
- 2010-07-07 AU AU2010283420A patent/AU2010283420B2/en not_active Ceased
- 2010-07-07 EP EP10808063.1A patent/EP2465819B1/en not_active Not-in-force