JP2010534767A - 真空蒸着物質の多目的容器及びその製造方法 - Google Patents
真空蒸着物質の多目的容器及びその製造方法 Download PDFInfo
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- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title abstract description 39
- 238000004519 manufacturing process Methods 0.000 title description 4
- 229910052751 metal Inorganic materials 0.000 claims abstract description 63
- 239000002184 metal Substances 0.000 claims abstract description 63
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- 239000004917 carbon fiber Substances 0.000 claims abstract description 31
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 claims abstract description 27
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000000151 deposition Methods 0.000 claims abstract description 18
- 230000008021 deposition Effects 0.000 claims abstract description 17
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- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims abstract description 12
- 229910052750 molybdenum Inorganic materials 0.000 claims abstract description 12
- 239000011733 molybdenum Substances 0.000 claims abstract description 12
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052802 copper Inorganic materials 0.000 claims abstract description 11
- 239000010949 copper Substances 0.000 claims abstract description 11
- 229910052742 iron Inorganic materials 0.000 claims abstract description 11
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052721 tungsten Inorganic materials 0.000 claims abstract description 11
- 239000010937 tungsten Substances 0.000 claims abstract description 11
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 10
- 239000010936 titanium Substances 0.000 claims abstract description 10
- 238000007740 vapor deposition Methods 0.000 claims description 38
- 238000007738 vacuum evaporation Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 abstract description 33
- 238000010894 electron beam technology Methods 0.000 abstract description 18
- 239000007787 solid Substances 0.000 abstract description 18
- 239000000843 powder Substances 0.000 abstract description 17
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- 239000000428 dust Substances 0.000 description 3
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- 238000003860 storage Methods 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000005019 vapor deposition process Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000012994 photoredox catalyst Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
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- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 208000006930 Pseudomyxoma Peritonei Diseases 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- -1 magnesium fluoride Chemical compound 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000011236 particulate material Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
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- 238000012805 post-processing Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
(1)粉末及び粒子のような固体状、様々な粘性を有する液体状、及びスラリーのような半固体状のうちのいずれかの状態を有する有機及び/又は無機化合物から形成される蒸着物質が容器内に含浸又は充填される工程において、蒸着物質の損失を防止でき、様々な機能を有する各種の蒸着物質の真空蒸着効率を最大にすることができる。
(2)電子ビーム加熱方法と抵抗加熱方法の両方を、本発明の容器に対して適用することができる。
(3)本発明の容器は、金属材料で製造されるため、処理時、保管時、移送時に安定的を有し、且つ再使用ができる。
(4)本発明の多目的容器内に、液体状の有機系/無機系蒸着物質を含浸することができる。また、固体状の有機系/無機系蒸着物質及び半固体状の有機系/無機系蒸着物質を充填材と混合し、容器内に充填して使用することもできる。
炭素繊維粉末20及び炭素繊維フェルト30を容器10に充填し、その後、炭素繊維粉末20及び炭素繊維フェルト30を覆い囲むように、金属メッシュ40及び金属ワッシャー50を炭素繊維フェルト30上に配置して容器に溶接する。こうして、蒸着物質を含浸した真空蒸着用物質は、60mgの液状フッ素系化合物を含浸することによって製造される。
実施例1で製造された真空蒸着用物質を、真空蒸着装置の電子ビームポートに装入する。電子ビームの直径は、真空蒸着装置を使用して、5×10−5torrの真空度及び20mAの電子ビーム電流で、30mmに設定される。そして、真空蒸着物質をガラス、PMMA、PC及びPET基板上にコーティングする。
実施例1で製造された真空蒸着用物質を、真空蒸着装置のモリブデン発熱体のボートに装入する。5×10−5torrの真空度及び50mAの電流で、ガラス、PMMA、PC及びPET基板上にコーティングする。
20 炭素繊維(フェルト)充填材
30 炭素フェルト
40 保護用の金属メッシュ
50 金属ワッシャー
Claims (7)
- 上部縁がリング状に形成され、内部に蒸着物質を収容する金属容器と、
前記金属容器の内部に収容され、前記蒸着物質上に配置される金属ワッシャーを備え、
前記金属ワッシャーが、前記金属容器の上部縁から下げられ、前記蒸着物質を押し付けた状態で前記金属容器に固定されることを特徴とする真空蒸着用容器。 - 内部に蒸着物質を収容する金属容器と、
前記金属容器の内部に収容され、前記蒸着物質上に配置される金属ワッシャーを備え、
前記金属ワッシャーが、前記蒸着物質を押し付けた状態で前記金属容器に溶接されることを特徴とする真空蒸着用容器。 - 前記蒸着物質と前記金属ワッシャーの間に配置され、前記蒸着物質の前記金属容器からの離脱を防止する金属メッシュをさらに備えたことを特徴とする請求項1又は2に記載の真空蒸着用容器。
- 前記金属容器、前記金属ワッシャー及び前記金属メッシュは、ステンレススチール、鉄、銅、モリブデン、タングステン又はチタンからなることを特徴とする請求項1又は2に記載の真空蒸着用容器。
- 前記蒸着物質と前記金属ワッシャーの間に配置され、前記蒸着物質の前記金属容器からの離脱を防止する炭素繊維フェルトをさらに備えたことを特徴とする請求項1又は2に記載の真空蒸着用容器。
- 前記金属容器は、円筒形状又は四角筒形状であることを特徴とする請求項1又は2に記載の真空蒸着用容器。
- 前記金属ワッシャーは、中央に孔を有していることを特徴とする請求項1又は2に記載の真空蒸着用容器。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070075000A KR101025005B1 (ko) | 2007-07-26 | 2007-07-26 | 진공증착용 증착물질의 다목적 담체 및 그 제조방법 |
KR10-2007-0075000 | 2007-07-26 | ||
PCT/KR2008/004352 WO2009014398A2 (en) | 2007-07-26 | 2008-07-25 | Multipurpose carrier of vacuum vapor deposition material and method thereof |
Publications (2)
Publication Number | Publication Date |
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JP2010534767A true JP2010534767A (ja) | 2010-11-11 |
JP5188575B2 JP5188575B2 (ja) | 2013-04-24 |
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Application Number | Title | Priority Date | Filing Date |
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JP2010518125A Active JP5188575B2 (ja) | 2007-07-26 | 2008-07-25 | 真空蒸着物質の多目的容器及びその製造方法 |
Country Status (5)
Country | Link |
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JP (1) | JP5188575B2 (ja) |
KR (1) | KR101025005B1 (ja) |
CN (1) | CN101765676B (ja) |
HK (1) | HK1145093A1 (ja) |
WO (1) | WO2009014398A2 (ja) |
Cited By (1)
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JP2016011460A (ja) * | 2014-06-02 | 2016-01-21 | キヤノンオプトロン株式会社 | 蒸発源とそれを用いた蒸着方法 |
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US9972128B2 (en) | 2012-07-20 | 2018-05-15 | The University Of British Columbia | Methods and systems for generating polycubes and all-hexahedral meshes of an object |
KR20140013471A (ko) | 2012-07-24 | 2014-02-05 | 주식회사 쎄코 | 진공증착용 발열조립체 및 이를 구비하는 진공증착장치 |
KR101355208B1 (ko) * | 2012-08-02 | 2014-01-27 | 주식회사 유라마 | 진공증착용 유기물질 담체 용기 |
KR101480726B1 (ko) * | 2012-12-21 | 2015-01-09 | 주식회사 선익시스템 | 진공 증착기 |
US9922458B2 (en) | 2013-11-04 | 2018-03-20 | The University Of British Columbia | Methods and systems for generating polycube segmentations from input meshes of objects |
KR101404047B1 (ko) | 2013-11-29 | 2014-06-10 | (주)파인켐텍 | 진공증착용 증착물질의 담체 |
KR200480271Y1 (ko) | 2014-11-26 | 2016-05-18 | (주)파인켐텍 | 진공증착용 담체 |
US10941482B2 (en) | 2014-12-19 | 2021-03-09 | Tata Steel Nederland Technology B.V. | Filter device to remove particles from a vapour stream |
US10210657B2 (en) | 2015-07-24 | 2019-02-19 | The University Of British Columbia | Methods and systems for hex-mesh optimization via edge-cone rectification |
KR20170116398A (ko) * | 2016-04-11 | 2017-10-19 | 주식회사 쎄코 | 증착용 담체 |
CN114134464A (zh) * | 2021-10-26 | 2022-03-04 | 惠州市华阳光学技术有限公司 | 一种结构色颜料及其制备方法 |
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KR100528892B1 (ko) * | 2003-08-22 | 2005-11-15 | 신도현 | 진공환경에서 사용하는 발수 및 발유처리용 담체 |
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JP2001183503A (ja) * | 1999-12-24 | 2001-07-06 | Toray Ind Inc | 光学物品の製造方法 |
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JP2001335920A (ja) * | 2000-05-26 | 2001-12-07 | Toray Ind Inc | 蒸着源、光学物品およびそれらの製造方法 |
JP2003264079A (ja) * | 2002-03-11 | 2003-09-19 | Sanyo Electric Co Ltd | 蒸着装置用蒸着源、これを用いた蒸着装置及び有機el素子の製造方法 |
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JP2016011460A (ja) * | 2014-06-02 | 2016-01-21 | キヤノンオプトロン株式会社 | 蒸発源とそれを用いた蒸着方法 |
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CN101765676B (zh) | 2012-04-11 |
HK1145093A1 (en) | 2011-04-01 |
CN101765676A (zh) | 2010-06-30 |
KR101025005B1 (ko) | 2011-03-24 |
JP5188575B2 (ja) | 2013-04-24 |
KR20090011432A (ko) | 2009-02-02 |
WO2009014398A2 (en) | 2009-01-29 |
WO2009014398A3 (en) | 2009-04-02 |
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