JP2010533373A - 材料のレーザ加工を行うための装置および方法 - Google Patents
材料のレーザ加工を行うための装置および方法 Download PDFInfo
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- 238000012545 processing Methods 0.000 title claims abstract description 19
- 238000000034 method Methods 0.000 title claims description 12
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- 229910052761 rare earth metal Inorganic materials 0.000 claims description 12
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- 230000003321 amplification Effects 0.000 claims description 9
- 238000003199 nucleic acid amplification method Methods 0.000 claims description 9
- 229910052769 Ytterbium Inorganic materials 0.000 claims description 7
- 238000005253 cladding Methods 0.000 claims description 7
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 claims description 7
- 229910052691 Erbium Inorganic materials 0.000 claims description 4
- 229910052689 Holmium Inorganic materials 0.000 claims description 4
- 229910052779 Neodymium Inorganic materials 0.000 claims description 4
- 229910052775 Thulium Inorganic materials 0.000 claims description 4
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 claims description 4
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 claims description 4
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims description 4
- 239000013307 optical fiber Substances 0.000 description 13
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- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
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- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/094003—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre
- H01S3/094007—Cladding pumping, i.e. pump light propagating in a clad surrounding the active core
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10015—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by monitoring or controlling, e.g. attenuating, the input signal
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/1022—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping
- H01S3/1024—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation by controlling the optical pumping for pulse generation
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
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- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
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Abstract
Description
図1は、光放射線7によって材料8のレーザ加工を行うための本発明の装置を示すブロック図である。図1の装置は、シード・ポンプ2により励起されるシード・レーザ1と、増幅器ポンプ4により励起される増幅器3と、コントローラ5と、スキャナ6とを備えている。ここで、コントローラ5は、シード・ポンプ2、増幅器ポンプ4およびスキャナ6を互いに同期させながら制御し、これによって、シード・レーザ1により放射される光パルス10が、増幅器3を通して伝播され、スキャナ6によって材料8に向けられるようになる。図1の装置は、光放射線7が第1の電力の範囲61内にあるときに、コントローラ5が、増幅器3を光減衰器として動作させるべく増幅器ポンプ4を制御し、また一方で、出力電力が第2の電力の範囲62内にあるときに、コントローラ5が、増幅器3を光増幅器として動作させるべく増幅器ポンプ4を制御することを特徴としている。第1の電力の範囲61および第2の電力の範囲62は、後で図6を参照しながら説明する。これらの第1および第2の電力の範囲は、互いに重なり合ってよい。電力増幅器2は、好ましくは、希土類ドーパントがドーピングされた二重クラッド光ファイバ19を有している(図示されていない)。
この本発明の例において、装置は、2段の主発振器を有する電力増幅器であって、シード・レーザ1と、電力増幅器3とを具備している。ここで、シード・レーザ1と電力増幅器3との間での光電力の分配の比は、約1:2(1対2)である。ポンプ2、4は、レーザダイオードとして実現される。それゆえに、200Wのレーザシステムにおいて、シード・レーザ1は、全体の出力に対して約66Wの電力で貢献し、また一方で、電力増幅器3は、公称の定格電力を達成するために133Wの電力を付加するであろう。
Claims (19)
- 材料のレーザ加工を行うための装置において、シード・ポンプにより励起されるシード・レーザと、増幅器ポンプにより励起される増幅器と、コントローラと、スキャナとを備え、
前記コントローラは、前記シード・ポンプ、前記増幅器ポンプおよび前記スキャナを互いに同期させながら制御し、これによって、前記シード・レーザにより放射される光パルスが、増幅器を通して伝播され、前記スキャナによって材料に向けられるようになり、
前記装置は、光放射線が第1の電力の範囲内にあるときに、前記コントローラが、前記増幅器を光減衰器として動作させるべく前記増幅器ポンプを制御し、また一方で、出力電力が第2の電力の範囲内にあるときに、前記コントローラが、前記増幅器を光増幅器として動作させるべく前記増幅器ポンプを制御することを特徴とする、材料のレーザ加工を行うための装置。 - 前記スキャナが、機械的ユニットである請求項1記載の装置。
- 前記スキャナが、検流計および反射器を有する請求項1または2記載の装置。
- 前記コントローラが、コンピュータのコントローラである請求項1から3のいずれか一項に記載の装置。
- 前記コントローラは、電気的駆動電力が前記第1の電力の範囲内にあるときに、前記電気的駆動電力の前記増幅器ポンプへの供給を停止させるためのスイッチを有する請求項1から4のいずれか一項に記載の装置。
- 前記シード・レーザが、クラッディング励起のファイバレーザを有する請求項1から5のいずれか一項に記載の装置。
- 前記クラッディング励起のファイバレーザが、希土類ドーパントを含む請求項1から6のいずれか一項に記載の装置。
- 前記希土類ドーパントが、イッテルビウムを含む請求項7記載の装置。
- 前記希土類ドーパントが、エルビウム、ツリウム、ホルミウムまたはネオジムを含む請求項7または8記載の装置。
- 前記増幅器が、クラッディング励起のファイバ増幅器を有する請求項1から9のいずれか一項に記載の装置。
- 前記クラッディング励起のファイバ増幅器が、希土類ドーパントを含む請求項1から10のいずれか一項に記載の装置。
- 前記希土類ドーパントが、イッテルビウムを含む請求項11記載の装置。
- 前記希土類ドーパントが、エルビウム、ツリウム、ホルミウムまたはネオジムを含む請求項11または12記載の装置。
- 前記装置が、さらに、少なくとも1つの付加的な増幅段を備える請求項1から13のいずれか一項に記載の装置。
- 前記装置が、さらに、吸収体を備える請求項1から14のいずれか一項に記載の装置。
- 前記装置が、さらに、可飽和吸収体を備える請求項1から15のいずれか一項に記載の装置。
- 前記可飽和吸収体が、遅延を発生させ、前記装置が、さらに、前記遅延を補償するための可変遅延部を備える請求項16記載の装置。
- 材料のレーザ加工を行うための方法であって、
本発明の装置を提供するステップと、
レーザ放射線を前記材料に当てるステップとを有することを特徴とする、材料のレーザ加工を行うための方法。 - 前記材料が、印刷ローラーである請求項18に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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GBGB0713265.7A GB0713265D0 (en) | 2007-07-09 | 2007-07-09 | Apparatus and method for laser processing a material |
PCT/GB2008/002357 WO2009007721A2 (en) | 2007-07-09 | 2008-07-09 | Apparatus and method for laser processing a material |
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JP2010533373A5 JP2010533373A5 (ja) | 2011-07-21 |
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US (1) | US20100177797A1 (ja) |
EP (1) | EP2165394B1 (ja) |
JP (1) | JP2010533373A (ja) |
KR (1) | KR101480932B1 (ja) |
CN (1) | CN101689747B (ja) |
AT (1) | ATE483265T1 (ja) |
CA (1) | CA2693496C (ja) |
DE (1) | DE602008002842D1 (ja) |
DK (1) | DK2165394T3 (ja) |
GB (1) | GB0713265D0 (ja) |
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GB2445771A (en) * | 2007-01-19 | 2008-07-23 | Gsi Group Ltd | A diode pumped CW laser |
JP5371838B2 (ja) * | 2010-03-10 | 2013-12-18 | 株式会社フジクラ | ファイバレーザ装置 |
EP2586108B1 (en) * | 2010-06-28 | 2015-01-21 | Megaopto Co., Ltd. | Laser apparatus |
DE102010044128A1 (de) * | 2010-11-18 | 2012-05-24 | Bundesdruckerei Gmbh | Laservorrichtung und Verfahren zur Bearbeitung von Gegenständen mit einem in der Pulsenergie steuerbaren Laser |
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JP5817215B2 (ja) * | 2011-05-26 | 2015-11-18 | オムロン株式会社 | 光増幅装置およびレーザ加工装置 |
RU2498468C1 (ru) * | 2012-04-20 | 2013-11-10 | Общество С Ограниченной Ответственностью "Научно-Техническое Объединение "Ирэ-Полюс" | Способ дифференциального контроля инверсии населенности лазерной среды и устройство его реализующее (варианты) |
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WO2017009945A1 (ja) * | 2015-07-14 | 2017-01-19 | ギガフォトン株式会社 | エキシマレーザ装置 |
JPWO2017009945A1 (ja) * | 2015-07-14 | 2018-04-26 | ギガフォトン株式会社 | エキシマレーザ装置 |
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Also Published As
Publication number | Publication date |
---|---|
CA2693496A1 (en) | 2009-01-15 |
GB0713265D0 (en) | 2007-08-15 |
KR20100041803A (ko) | 2010-04-22 |
CN101689747B (zh) | 2011-07-27 |
KR101480932B1 (ko) | 2015-01-12 |
WO2009007721A3 (en) | 2009-07-30 |
DK2165394T3 (da) | 2011-01-03 |
US20100177797A1 (en) | 2010-07-15 |
CA2693496C (en) | 2016-02-09 |
DE602008002842D1 (de) | 2010-11-11 |
ATE483265T1 (de) | 2010-10-15 |
WO2009007721A2 (en) | 2009-01-15 |
EP2165394B1 (en) | 2010-09-29 |
EP2165394A2 (en) | 2010-03-24 |
CN101689747A (zh) | 2010-03-31 |
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