JP5817215B2 - 光増幅装置およびレーザ加工装置 - Google Patents
光増幅装置およびレーザ加工装置 Download PDFInfo
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- JP5817215B2 JP5817215B2 JP2011118041A JP2011118041A JP5817215B2 JP 5817215 B2 JP5817215 B2 JP 5817215B2 JP 2011118041 A JP2011118041 A JP 2011118041A JP 2011118041 A JP2011118041 A JP 2011118041A JP 5817215 B2 JP5817215 B2 JP 5817215B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06754—Fibre amplifiers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1301—Stabilisation of laser output parameters, e.g. frequency or amplitude in optical amplifiers
- H01S3/13013—Stabilisation of laser output parameters, e.g. frequency or amplitude in optical amplifiers by controlling the optical pumping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/1306—Stabilisation of the amplitude
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/06—Construction or shape of active medium
- H01S3/063—Waveguide lasers, i.e. whereby the dimensions of the waveguide are of the order of the light wavelength
- H01S3/067—Fibre lasers
- H01S3/06754—Fibre amplifiers
- H01S3/06758—Tandem amplifiers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/091—Processes or apparatus for excitation, e.g. pumping using optical pumping
- H01S3/094—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light
- H01S3/094003—Processes or apparatus for excitation, e.g. pumping using optical pumping by coherent light the pumped medium being a fibre
- H01S3/094007—Cladding pumping, i.e. pump light propagating in a clad surrounding the active core
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10007—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers
- H01S3/10015—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating in optical amplifiers by monitoring or controlling, e.g. attenuating, the input signal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/16—Solid materials
- H01S3/1601—Solid materials characterised by an active (lasing) ion
- H01S3/1603—Solid materials characterised by an active (lasing) ion rare earth
- H01S3/1618—Solid materials characterised by an active (lasing) ion rare earth ytterbium
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
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- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Lasers (AREA)
Description
図1は、本発明の実施の形態1に係るレーザ加工装置の構成例を示した図である。図1を参照して、レーザ加工装置100は、光増幅装置と、その光増幅装置からのレーザ光を走査するためのレーザビーム走査機構14とを含む。光増幅装置は、光増幅ファイバ1と、シードLD2と、励起LD3と、アイソレータ4,6と、コンバイナ5と、エンドキャップ12と、ドライバ21,22と、受光素子15と、波高値検出器16と、シャッタ19と、制御装置20と、入力部25とを備える。
図12は、実施の形態2に係るレーザ加工装置の構成図である。図12を参照して、レーザ加工装置101は、2段のファイバ増幅器により構成された光増幅器を備える。この点において実施の形態2に係るレーザ加工装置は実施の形態1に係るレーザ加工装置と異なる。図1および図12を参照して、レーザ加工装置101は、カプラ7と、光増幅ファイバ8と、励起LD9A,9Bと、コンバイナ10と、アイソレータ11と、受光素子17と、波高値検出器18と、ドライバ23とをさらに備える点においてレーザ加工装置100と異なる。
Claims (6)
- シード光を励起光によって増幅する光増幅ファイバと、
発光期間に前記シード光をパルス状に複数回発生させるシード光源と、
前記発光期間の直前の非発光期間に第1のレベルのパワーを有する前記励起光を発生させ、前記発光期間に前記第1のレベルより高い第2のレベルのパワーを有する前記励起光を発生させる励起光源と、
前記光増幅ファイバから出力された出力光パルスのピークパワーを検出するための検出器と、
前記発光期間の間に発生した最初の出力光パルスのピークパワーが、前記発光期間の間に発生した最終の出力光パルスのピークパワーを上回る場合、前記非発光期間における前記励起光のパワーを低下させ、前記最初の出力光パルスのピークパワーが前記最終の出力光パルスのピークパワーを下回る場合、前記非発光期間における前記励起光のパワーを上昇させる制御部とを備える、光増幅装置。 - 前記制御部は、前記光増幅装置の起動時に、前記出力光パルスの予め定められた条件ごとに、前記非発光期間における前記励起光のパワーを制御して、前記最初の出力光パルスと前記最終の出力光パルスとの間でパワーを同じにするための前記励起光のパワーに関するデータを取得し、
前記光増幅装置は、
前記データを前記出力光パルスの前記予め定められた条件と関連付けて記憶する記憶部をさらに備える、請求項1に記載の光増幅装置。 - 前記光増幅装置の運転時に、前記制御部は、前記記憶部に記憶されたデータに基づいて、前記非発光期間における前記励起光のパワーを設定する、請求項2に記載の光増幅装置。
- 前記励起光源は、半導体レーザであり、
前記データは、前記半導体レーザのバイアス電流のデータであり、
前記出力光パルスの条件が変更された場合、前記制御部は、変更前の条件に対応する前記バイアス電流のデータの変動を、変更後の条件に対応する前記バイアス電流のデータに反映させる、請求項3に記載の光増幅装置。 - 前記出力光パルスを前記光増幅装置の外部に出力することを防ぐためのシャッタをさらに備え、
前記制御部は、前記シャッタを閉じた状態で、前記光増幅装置の起動時における前記データを取得する、請求項2に記載の光増幅装置。 - 請求項1〜5のいずれか1項に記載の光増幅装置を備える、レーザ加工装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011118041A JP5817215B2 (ja) | 2011-05-26 | 2011-05-26 | 光増幅装置およびレーザ加工装置 |
US13/468,357 US8804230B2 (en) | 2011-05-26 | 2012-05-10 | Light amplifier and laser processing device |
CN201210146881.9A CN102801088B (zh) | 2011-05-26 | 2012-05-11 | 光放大装置及激光加工装置 |
EP12168487.2A EP2528172B1 (en) | 2011-05-26 | 2012-05-18 | Light amplifier and laser processing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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JP2011118041A JP5817215B2 (ja) | 2011-05-26 | 2011-05-26 | 光増幅装置およびレーザ加工装置 |
Publications (2)
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JP2012248615A JP2012248615A (ja) | 2012-12-13 |
JP5817215B2 true JP5817215B2 (ja) | 2015-11-18 |
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US (1) | US8804230B2 (ja) |
EP (1) | EP2528172B1 (ja) |
JP (1) | JP5817215B2 (ja) |
CN (1) | CN102801088B (ja) |
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JP2016115740A (ja) | 2014-12-12 | 2016-06-23 | オムロン株式会社 | 光増幅装置およびレーザ加工装置 |
WO2017081858A1 (en) * | 2015-11-12 | 2017-05-18 | Ricoh Company, Ltd. | Laser beam generation apparatus, laser machining device, and laser machining method |
WO2017090497A1 (en) * | 2015-11-24 | 2017-06-01 | Ricoh Company, Ltd. | Laser beam generation apparatus, laser machining device, and laser machining method |
JP2017103448A (ja) | 2015-11-24 | 2017-06-08 | 株式会社リコー | レーザー光発生装置、レーザー加工機、被加工物の生産方法 |
WO2017149712A1 (ja) * | 2016-03-02 | 2017-09-08 | ギガフォトン株式会社 | レーザ装置及び極端紫外光生成システム |
JP6551271B2 (ja) | 2016-03-15 | 2019-07-31 | オムロン株式会社 | 光増幅装置およびレーザ加工装置 |
DE102017110185A1 (de) * | 2017-05-11 | 2018-11-15 | Trumpf Laser Gmbh | Verfahren zum Pumpen eines Verstärkermediums zur Erzeugung von Laserpulsen mit gleicher Pulsenergie sowie zugehöriges Lasersystem |
US10333269B2 (en) * | 2017-09-27 | 2019-06-25 | Apple Inc. | Controlling output power of a laser amplifier with variable pulse rate |
KR102012846B1 (ko) * | 2018-01-17 | 2019-08-21 | 국방과학연구소 | 광 출력 장치 및 그 방법. |
CN108233159B (zh) * | 2018-02-09 | 2019-07-30 | 无锡源清瑞光激光科技有限公司 | 基于弛豫效应的脉冲光纤激光器 |
CN113491043B (zh) * | 2019-04-02 | 2023-04-14 | 上海禾赛科技有限公司 | 用于激光雷达的激光系统 |
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JP3411852B2 (ja) | 1999-05-31 | 2003-06-03 | サンクス株式会社 | レーザマーキング装置 |
KR100545294B1 (ko) | 2002-05-10 | 2006-01-24 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치, 디바이스 제조방법, 성능측정방법,캘리브레이션 방법 및 컴퓨터 프로그램 |
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JP5546119B2 (ja) | 2008-11-14 | 2014-07-09 | 株式会社アマダミヤチ | ファイバレーザ加工装置及びファイバレーザ加工方法 |
JP5338334B2 (ja) | 2009-01-21 | 2013-11-13 | オムロン株式会社 | レーザ光源装置およびレーザ加工装置 |
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JP5251902B2 (ja) | 2010-03-02 | 2013-07-31 | オムロン株式会社 | レーザ加工装置 |
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- 2011-05-26 JP JP2011118041A patent/JP5817215B2/ja active Active
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2012
- 2012-05-10 US US13/468,357 patent/US8804230B2/en active Active
- 2012-05-11 CN CN201210146881.9A patent/CN102801088B/zh active Active
- 2012-05-18 EP EP12168487.2A patent/EP2528172B1/en active Active
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Publication number | Publication date |
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EP2528172B1 (en) | 2017-08-16 |
CN102801088B (zh) | 2016-08-17 |
CN102801088A (zh) | 2012-11-28 |
US8804230B2 (en) | 2014-08-12 |
JP2012248615A (ja) | 2012-12-13 |
US20120300288A1 (en) | 2012-11-29 |
EP2528172A3 (en) | 2014-02-12 |
EP2528172A2 (en) | 2012-11-28 |
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