JP2010528463A5 - - Google Patents

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Publication number
JP2010528463A5
JP2010528463A5 JP2010508737A JP2010508737A JP2010528463A5 JP 2010528463 A5 JP2010528463 A5 JP 2010528463A5 JP 2010508737 A JP2010508737 A JP 2010508737A JP 2010508737 A JP2010508737 A JP 2010508737A JP 2010528463 A5 JP2010528463 A5 JP 2010528463A5
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JP
Japan
Prior art keywords
field
projection objective
stray light
light component
plane
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JP2010508737A
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English (en)
Japanese (ja)
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JP4968558B2 (ja
JP2010528463A (ja
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Priority claimed from PCT/EP2008/004084 external-priority patent/WO2008145296A1/en
Publication of JP2010528463A publication Critical patent/JP2010528463A/ja
Publication of JP2010528463A5 publication Critical patent/JP2010528463A5/ja
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JP2010508737A 2007-05-25 2008-05-21 マイクロリソグラフィのための投影対物器械、その投影対物器械を有するマイクロリソグラフィ投影露光装置、構成要素のためのマイクロリソグラフィ製造方法、並びにその方法を用いて製造される構成要素 Active JP4968558B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US94011707P 2007-05-25 2007-05-25
DE102007024685 2007-05-25
US60/940,117 2007-05-25
DE102007024685.6 2007-05-25
PCT/EP2008/004084 WO2008145296A1 (en) 2007-05-25 2008-05-21 Projection objective for microlithography, microlithography projection exposure apparatus with said projection objective, microlithographic manufacturing method for components, as well as a component manufactured with said method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011263850A Division JP5436523B2 (ja) 2007-05-25 2011-12-01 マイクロリソグラフィのための投影対物器械、その投影対物器械を有するマイクロリソグラフィ投影露光装置、構成要素のためのマイクロリソグラフィ製造方法、並びにその方法を用いて製造される構成要素

Publications (3)

Publication Number Publication Date
JP2010528463A JP2010528463A (ja) 2010-08-19
JP2010528463A5 true JP2010528463A5 (enExample) 2011-07-14
JP4968558B2 JP4968558B2 (ja) 2012-07-04

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ID=39877324

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2010508737A Active JP4968558B2 (ja) 2007-05-25 2008-05-21 マイクロリソグラフィのための投影対物器械、その投影対物器械を有するマイクロリソグラフィ投影露光装置、構成要素のためのマイクロリソグラフィ製造方法、並びにその方法を用いて製造される構成要素
JP2011263850A Expired - Fee Related JP5436523B2 (ja) 2007-05-25 2011-12-01 マイクロリソグラフィのための投影対物器械、その投影対物器械を有するマイクロリソグラフィ投影露光装置、構成要素のためのマイクロリソグラフィ製造方法、並びにその方法を用いて製造される構成要素

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2011263850A Expired - Fee Related JP5436523B2 (ja) 2007-05-25 2011-12-01 マイクロリソグラフィのための投影対物器械、その投影対物器械を有するマイクロリソグラフィ投影露光装置、構成要素のためのマイクロリソグラフィ製造方法、並びにその方法を用いて製造される構成要素

Country Status (8)

Country Link
US (2) US9063439B2 (enExample)
EP (1) EP2165241B1 (enExample)
JP (2) JP4968558B2 (enExample)
KR (1) KR101544224B1 (enExample)
CN (1) CN101689027B (enExample)
DE (1) DE102008001800A1 (enExample)
TW (1) TWI483081B (enExample)
WO (2) WO2008145295A1 (enExample)

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WO2015012982A1 (en) * 2013-07-22 2015-01-29 Johnson Kenneth C Scanned-spot-array duv lithography system
US9188874B1 (en) 2011-05-09 2015-11-17 Kenneth C. Johnson Spot-array imaging system for maskless lithography and parallel confocal microscopy
US9097983B2 (en) 2011-05-09 2015-08-04 Kenneth C. Johnson Scanned-spot-array EUV lithography system
US8994920B1 (en) 2010-05-07 2015-03-31 Kenneth C. Johnson Optical systems and methods for absorbance modulation
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
WO2009061196A1 (en) * 2007-11-08 2009-05-14 Asml Netherlands B.V. Lithographic projection apparatus and method of compensating perturbation factors
DE102008043324B4 (de) * 2008-10-30 2010-11-11 Carl Zeiss Smt Ag Optische Anordnung zur dreidimensionalen Strukturierung einer Materialschicht
EP2219077A1 (en) 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
US20110094123A1 (en) * 2009-10-28 2011-04-28 Richard Vaughn Fabric-covered fluid-filled therapeutic foot orthotic with thong-cut device systems
US8443308B2 (en) * 2011-05-02 2013-05-14 Synopsys Inc. EUV lithography flare calculation and compensation
DE102012112773B4 (de) * 2012-12-20 2020-04-30 Jenoptik Optical Systems Gmbh Verfahren zur Herstellung einer wellenfrontkorrigierten optischen Anordnung aus mindestens zwei optischen Elementen und Verwendung des Verfahrens
US9857570B1 (en) * 2014-07-24 2018-01-02 Hoyos Integrity Corporation Full flat mirror guiding reflections to aperture of panoramic optical device
CN104317168B (zh) * 2014-10-28 2016-03-02 中国科学院长春光学精密机械与物理研究所 极紫外光刻系统中与杂散光有关的镜面加工误差分析方法
US10098529B2 (en) * 2015-10-28 2018-10-16 Ricoh Company, Ltd. Optical design of a light field otoscope
US20170119237A1 (en) * 2015-10-28 2017-05-04 Ricoh Company, Ltd. Optical Design of a Light Field Otoscope
US10417533B2 (en) * 2016-08-09 2019-09-17 Cognex Corporation Selection of balanced-probe sites for 3-D alignment algorithms
CN106773555B (zh) * 2017-03-21 2019-03-26 上海华力微电子有限公司 补偿由光刻镜头散射光导致曝光误差的方法
CN112034605B (zh) * 2020-09-09 2025-01-24 苏州大学 一种折反式Golay3稀疏孔径光学系统
CN119270401A (zh) * 2023-07-07 2025-01-07 玉晶光电(厦门)有限公司 一种使杂散光多次反射的光学元件

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JP2001264626A (ja) 2000-03-15 2001-09-26 Canon Inc 回折光学素子を有する光学系
JP2002353094A (ja) 2001-05-22 2002-12-06 Nikon Corp 照明光学装置および露光装置
JP3679736B2 (ja) 2001-07-04 2005-08-03 キヤノン株式会社 露光装置、露光方法、デバイス製造方法、並びに、デバイス
JP2004004601A (ja) * 2002-04-04 2004-01-08 Sony Corp 光スイッチング素子、光スイッチング素子アレイ、及び画像表示装置
JP2003318095A (ja) * 2002-04-24 2003-11-07 Nikon Corp フレア計測方法及びフレア計測装置、露光方法及び露光装置、露光装置の調整方法
TWI249082B (en) 2002-08-23 2006-02-11 Nikon Corp Projection optical system and method for photolithography and exposure apparatus and method using same
US7348575B2 (en) 2003-05-06 2008-03-25 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
WO2005015313A1 (en) 2003-08-04 2005-02-17 Carl Zeiss Smt Ag Illumination mask for range-resolved detection of scattered light
JP2005134666A (ja) 2003-10-30 2005-05-26 Hoya Corp フォトマスク及び映像デバイスの製造方法
US7466489B2 (en) 2003-12-15 2008-12-16 Susanne Beder Projection objective having a high aperture and a planar end surface
KR101150037B1 (ko) 2004-01-14 2012-07-02 칼 짜이스 에스엠티 게엠베하 반사굴절식 투영 대물렌즈
JP2006120899A (ja) 2004-10-22 2006-05-11 Nikon Corp 投影光学系、投影光学系の調整方法、投影露光装置、投影露光方法、および投影露光装置の調整方法
EP1820050A1 (en) 2004-12-09 2007-08-22 Carl Zeiss SMT AG Transmitting optical element and objective for a microlithographic projection exposure apparatus
DE602004014002D1 (de) 2004-12-10 2008-07-03 Essilor Int Stempel zum Auftragen eines Motivs, Verfahren zur Stempelherstellung und Verfahren zur Herstellung eines Objekts anhand von diesem Stempel
US7125178B2 (en) 2004-12-22 2006-10-24 Eastman Kodak Company Photographic processing arrangement and a processing solution supply cartridge for the processing arrangement
JP2006222222A (ja) 2005-02-09 2006-08-24 Canon Inc 投影光学系及びそれを有する露光装置
KR101590743B1 (ko) 2005-06-02 2016-02-01 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 대물 렌즈
EP1913445B1 (de) 2005-08-10 2011-05-25 Carl Zeiss SMT GmbH Abbildungssystem, insbesondere projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
DE102008001800A1 (de) * 2007-05-25 2008-11-27 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie, Mikrolithographie-Projektionsbelichtungsanlage mit einem derartigen Projektionsobjektiv, mikrolithographisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement

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