JP2010528427A5 - - Google Patents

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Publication number
JP2010528427A5
JP2010528427A5 JP2010509465A JP2010509465A JP2010528427A5 JP 2010528427 A5 JP2010528427 A5 JP 2010528427A5 JP 2010509465 A JP2010509465 A JP 2010509465A JP 2010509465 A JP2010509465 A JP 2010509465A JP 2010528427 A5 JP2010528427 A5 JP 2010528427A5
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JP
Japan
Prior art keywords
layer
organic active
forming
active layer
surface energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010509465A
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English (en)
Japanese (ja)
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JP5457337B2 (ja
JP2010528427A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2008/063825 external-priority patent/WO2008144467A1/en
Publication of JP2010528427A publication Critical patent/JP2010528427A/ja
Publication of JP2010528427A5 publication Critical patent/JP2010528427A5/ja
Application granted granted Critical
Publication of JP5457337B2 publication Critical patent/JP5457337B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2010509465A 2007-05-18 2008-05-16 閉じ込め層の製造方法 Expired - Fee Related JP5457337B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US93879407P 2007-05-18 2007-05-18
US60/938,794 2007-05-18
PCT/US2008/063825 WO2008144467A1 (en) 2007-05-18 2008-05-16 Process for making contained layers

Publications (3)

Publication Number Publication Date
JP2010528427A JP2010528427A (ja) 2010-08-19
JP2010528427A5 true JP2010528427A5 (https=) 2011-06-30
JP5457337B2 JP5457337B2 (ja) 2014-04-02

Family

ID=39825546

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010509465A Expired - Fee Related JP5457337B2 (ja) 2007-05-18 2008-05-16 閉じ込め層の製造方法

Country Status (7)

Country Link
US (1) US20080286487A1 (https=)
EP (1) EP2147129A1 (https=)
JP (1) JP5457337B2 (https=)
KR (1) KR101516447B1 (https=)
CN (1) CN101688287B (https=)
TW (1) TW200901531A (https=)
WO (1) WO2008144467A1 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090142556A1 (en) * 2007-11-29 2009-06-04 E. I. Du Pont De Nemours And Company Process for forming an organic electronic device including an organic device layer
US8040048B2 (en) * 2007-12-12 2011-10-18 Lang Charles D Process for forming an organic electronic device including an organic device layer
EP2414481A4 (en) 2009-04-03 2013-02-20 Du Pont ELECTROACTIVE MATERIALS
US8592239B2 (en) * 2009-07-27 2013-11-26 E I Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same
WO2013096543A1 (en) * 2011-12-20 2013-06-27 E. I. Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same
KR20140033671A (ko) * 2012-09-10 2014-03-19 삼성디스플레이 주식회사 유기발광 표시장치 및 그 제조 방법
JP6371304B2 (ja) * 2012-12-13 2018-08-08 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 閉じ込め層およびそれを使って製造されるデバイスを製造するための方法および材料

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6303238B1 (en) * 1997-12-01 2001-10-16 The Trustees Of Princeton University OLEDs doped with phosphorescent compounds
KR20010085420A (ko) * 2000-02-23 2001-09-07 기타지마 요시토시 전계발광소자와 그 제조방법
TW472503B (en) * 2000-04-26 2002-01-11 Ritdisplay Corp Manufacture method of photosensitive polyimide pattern definition layer for organic light-emitting diodes display
US6670645B2 (en) * 2000-06-30 2003-12-30 E. I. Du Pont De Nemours And Company Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
KR100898304B1 (ko) * 2001-03-02 2009-05-19 더 트러스티즈 오브 프린스턴 유니버시티 이중 도우프층, 인광 유기 발광 디바이스
JP2003058077A (ja) * 2001-08-08 2003-02-28 Fuji Photo Film Co Ltd ミクロファブリケーション用基板、その製造方法および像状薄膜形成方法
JP2003123967A (ja) * 2001-10-10 2003-04-25 Matsushita Electric Ind Co Ltd 発光素子の製造方法
JP4231645B2 (ja) * 2001-12-12 2009-03-04 大日本印刷株式会社 パターン形成体の製造方法
JP2004047176A (ja) * 2002-07-09 2004-02-12 Sharp Corp 有機エレクトロルミネッセンス素子
KR100858802B1 (ko) * 2002-07-31 2008-09-17 삼성에스디아이 주식회사 전자 발광 소자의 제조방법
JP4165692B2 (ja) * 2002-08-05 2008-10-15 大日本印刷株式会社 エレクトロルミネッセント素子の製造方法
US7098060B2 (en) * 2002-09-06 2006-08-29 E.I. Du Pont De Nemours And Company Methods for producing full-color organic electroluminescent devices
CA2499364A1 (en) * 2002-09-24 2004-04-08 E. I. Du Pont De Nemours And Company Water dispersible polyanilines made with polymeric acid colloids for electronics applications
WO2004029128A2 (en) * 2002-09-24 2004-04-08 E.I. Du Pont De Nemours And Company Water dispersible polythiophenes made with polymeric acid colloids
US6982179B2 (en) * 2002-11-15 2006-01-03 University Display Corporation Structure and method of fabricating organic devices
JP2004355949A (ja) * 2003-05-29 2004-12-16 Tdk Corp 有機ｅｌ表示体の製造方法および有機ｅｌ製造装置
CN1574214A (zh) * 2003-06-03 2005-02-02 国际商业机器公司 用于制造电子器件的基于熔化的图案化工艺
EP1840990A1 (en) * 2004-12-28 2007-10-03 Idemitsu Kosan Company Limited Organic electroluminescent device
US20080309221A1 (en) * 2004-12-30 2008-12-18 E.I. Du Pont De Nemours And Company Containment Structure For an Electronic Device
KR20070103402A (ko) * 2004-12-30 2007-10-23 이 아이 듀폰 디 네모아 앤드 캄파니 격납 구조체 및 방법
JP5098641B2 (ja) * 2005-04-27 2012-12-12 コニカミノルタホールディングス株式会社 有機エレクトロルミネッセンス素子の製造方法
US20060275547A1 (en) * 2005-06-01 2006-12-07 Lee Chung J Vapor Phase Deposition System and Method
US20070020395A1 (en) * 2005-06-27 2007-01-25 Lang Charles D Process for making an electronic device
US8124172B2 (en) * 2006-03-02 2012-02-28 E.I. Du Pont De Nemours And Company Process for making contained layers and devices made with same
US20080087882A1 (en) * 2006-06-05 2008-04-17 Lecloux Daniel D Process for making contained layers and devices made with same
KR20100094475A (ko) * 2007-10-26 2010-08-26 이 아이 듀폰 디 네모아 앤드 캄파니 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자
US20090130296A1 (en) * 2007-11-15 2009-05-21 Universal Display Corporation Fabrication of Organic Electronic Devices by Ink-Jet Printing at Low Temperatures
TW201011114A (en) * 2008-05-19 2010-03-16 Du Pont Apparatus and method of vapor coating in an electronic device

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