JP2010517255A - 表面を洗浄する方法 - Google Patents
表面を洗浄する方法 Download PDFInfo
- Publication number
- JP2010517255A JP2010517255A JP2009545888A JP2009545888A JP2010517255A JP 2010517255 A JP2010517255 A JP 2010517255A JP 2009545888 A JP2009545888 A JP 2009545888A JP 2009545888 A JP2009545888 A JP 2009545888A JP 2010517255 A JP2010517255 A JP 2010517255A
- Authority
- JP
- Japan
- Prior art keywords
- spray
- seconds
- cleaning
- free
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004140 cleaning Methods 0.000 claims abstract description 48
- 239000007921 spray Substances 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 36
- 239000007788 liquid Substances 0.000 claims abstract description 26
- 238000005406 washing Methods 0.000 claims description 21
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 7
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 claims description 4
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 239000003960 organic solvent Substances 0.000 claims description 2
- 239000007800 oxidant agent Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 description 14
- 239000002245 particle Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 229960005419 nitrogen Drugs 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001412 amines Chemical group 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/024—Cleaning by means of spray elements moving over the surface to be cleaned
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
Abstract
【選択図】 なし
Description
回転速度で噴霧する。窒素流速90sl/分(sl=標準リットル1013hPa、25℃)、DI−水流速70ml/分。噴霧中に、噴霧ノズルはウエファーを越えて中心から端部まで10mm/秒(0.01m/秒)の速度でゆっくり走査する。
段階Aに関してはSC1(過酸化水素およびアンモニアの水溶液)が使用される。或いは、コリン(または他の第四級アミン類)の水溶液を使用することもできる。
Claims (14)
- −液体が分配ノズルを通して表面上に連続的液体流状で分配されるようにして表面を自由流洗浄で処理し、
−液体が噴霧ノズルを通して表面に対して小滴の形態で向けられるようにして表面を噴霧洗浄で処理する
段階を含んでなる板状物品の表面を洗浄する方法であって、表面が自由流洗浄段階前に噴霧洗浄段階でそして自由流洗浄段階後に噴霧洗浄段階で処理される方法。 - 自由流洗浄段階およびその後の噴霧洗浄段階の系列を少なくとも2回行う請求項1に記載の方法。
- 自由流洗浄段階および/または噴霧洗浄段階の少なくとも1つがアルカリ性洗浄液体を使用する請求項1に記載の方法。
- アルカリ性洗浄液体がオゾン、過酸化水素、並びにオゾンおよび過酸化水素の混合物の群から選択される酸化剤を含んでなる請求項3に記載の方法。
- 洗浄液体がアンモニアを含んでなる請求項4に記載の方法。
- 噴霧洗浄段階の少なくとも1つが水、有機溶媒アルカリ性組成物、および酸性組成物を含んでなる群から選択される洗浄液体を使用する請求項1に記載の方法。
- 自由流洗浄段階および噴霧洗浄段階が5秒より長くなく臨機に重複する請求項1に記載の方法。
- 少なくとも1つの洗浄段階中に板状物品が回転される請求項1に記載の方法。
- 噴霧洗浄段階が無空気噴霧ノズル、内部混合のある二相ノズルまたは外部混合のある二相ノズルの群から選択される噴霧ノズルを使用する請求項1に記載の方法。
- 噴霧洗浄段階が外部混合のある二相ノズルを使用する請求項9に記載の方法。
- 噴霧ノズルのオリフィスが0.1cm〜10cm、好ましくは0.3cm〜5cm、の範囲にある板状物品の表面までの距離dのところに置かれる請求項9に記載の方法。
- 噴霧洗浄段階の少なくとも2つが各々5秒〜45秒、好ましくは8秒〜30秒、にわたり行われる請求項1に記載の方法。
- 自由流洗浄段階の少なくとも2つが各々5秒〜45秒、好ましくは8秒〜30秒、にわたり行われる請求項2に記載の方法。
- 噴霧ノズルが板状物品を越えて横方向に走査する請求項9に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
ATA105/2007 | 2007-01-22 | ||
AT1052007 | 2007-01-22 | ||
PCT/EP2008/050180 WO2008090019A1 (en) | 2007-01-22 | 2008-01-09 | Method for cleaning a surface |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010517255A true JP2010517255A (ja) | 2010-05-20 |
JP5017375B2 JP5017375B2 (ja) | 2012-09-05 |
Family
ID=39242422
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009545888A Expired - Fee Related JP5017375B2 (ja) | 2007-01-22 | 2008-01-09 | 表面を洗浄する方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8932408B2 (ja) |
EP (1) | EP2106303B1 (ja) |
JP (1) | JP5017375B2 (ja) |
KR (1) | KR101456914B1 (ja) |
CN (1) | CN101583439B (ja) |
TW (1) | TWI457993B (ja) |
WO (1) | WO2008090019A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012054451A (ja) * | 2010-09-02 | 2012-03-15 | Shin Etsu Chem Co Ltd | 貼り合わせ基板の製造方法および半導体基板洗浄液 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20100154826A1 (en) * | 2008-12-19 | 2010-06-24 | Tokyo Electron Limited | System and Method For Rinse Optimization |
WO2013086217A1 (en) | 2011-12-06 | 2013-06-13 | Masco Corporation Of Indiana | Ozone distribution in a faucet |
WO2017011506A1 (en) | 2015-07-13 | 2017-01-19 | Delta Faucet Company | Electrode for an ozone generator |
CA2946465C (en) | 2015-11-12 | 2022-03-29 | Delta Faucet Company | Ozone generator for a faucet |
WO2017112795A1 (en) | 2015-12-21 | 2017-06-29 | Delta Faucet Company | Fluid delivery system including a disinfectant device |
CN106856161B (zh) * | 2016-12-14 | 2019-12-13 | 北京七星华创电子股份有限公司 | 一种采用二相流雾化清洗晶圆表面污染物的方法 |
JP6811675B2 (ja) * | 2017-04-28 | 2021-01-13 | 株式会社Screenホールディングス | 基板処理方法および基板処理装置 |
CN109261619A (zh) * | 2018-10-15 | 2019-01-25 | 郑州旭飞光电科技有限公司 | 液晶基板玻璃表面黑点污渍的清洗方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08274052A (ja) * | 1995-03-30 | 1996-10-18 | Hitachi Ltd | 板状物の洗浄方法および装置 |
JP2004200246A (ja) * | 2002-12-16 | 2004-07-15 | Shimada Phys & Chem Ind Co Ltd | 基板洗浄方法及び装置 |
JP2004298514A (ja) * | 2003-03-31 | 2004-10-28 | Toto Ltd | 食器類洗浄装置 |
JP2004335838A (ja) * | 2003-05-09 | 2004-11-25 | Shin Etsu Handotai Co Ltd | 洗浄装置、洗浄システム及び洗浄方法 |
JP2007180497A (ja) * | 2005-12-02 | 2007-07-12 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3277404B2 (ja) * | 1993-03-31 | 2002-04-22 | ソニー株式会社 | 基板洗浄方法及び基板洗浄装置 |
JPH0969509A (ja) * | 1995-09-01 | 1997-03-11 | Matsushita Electron Corp | 半導体ウェーハの洗浄・エッチング・乾燥装置及びその使用方法 |
US6951221B2 (en) * | 2000-09-22 | 2005-10-04 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus |
JP3892792B2 (ja) * | 2001-11-02 | 2007-03-14 | 大日本スクリーン製造株式会社 | 基板処理装置および基板洗浄装置 |
US10179351B2 (en) * | 2005-02-07 | 2019-01-15 | Planar Semiconductor, Inc. | Method and apparatus for cleaning flat objects with pulsed liquid jet |
TWI324797B (en) * | 2005-04-05 | 2010-05-11 | Lam Res Corp | Method for removing particles from a surface |
-
2008
- 2008-01-09 US US12/523,759 patent/US8932408B2/en active Active
- 2008-01-09 TW TW097100802A patent/TWI457993B/zh active
- 2008-01-09 JP JP2009545888A patent/JP5017375B2/ja not_active Expired - Fee Related
- 2008-01-09 WO PCT/EP2008/050180 patent/WO2008090019A1/en active Application Filing
- 2008-01-09 EP EP08701344A patent/EP2106303B1/en not_active Not-in-force
- 2008-01-09 CN CN2008800027064A patent/CN101583439B/zh not_active Expired - Fee Related
- 2008-01-09 KR KR1020097017235A patent/KR101456914B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08274052A (ja) * | 1995-03-30 | 1996-10-18 | Hitachi Ltd | 板状物の洗浄方法および装置 |
JP2004200246A (ja) * | 2002-12-16 | 2004-07-15 | Shimada Phys & Chem Ind Co Ltd | 基板洗浄方法及び装置 |
JP2004298514A (ja) * | 2003-03-31 | 2004-10-28 | Toto Ltd | 食器類洗浄装置 |
JP2004335838A (ja) * | 2003-05-09 | 2004-11-25 | Shin Etsu Handotai Co Ltd | 洗浄装置、洗浄システム及び洗浄方法 |
JP2007180497A (ja) * | 2005-12-02 | 2007-07-12 | Dainippon Screen Mfg Co Ltd | 基板処理方法および基板処理装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012054451A (ja) * | 2010-09-02 | 2012-03-15 | Shin Etsu Chem Co Ltd | 貼り合わせ基板の製造方法および半導体基板洗浄液 |
Also Published As
Publication number | Publication date |
---|---|
WO2008090019A1 (en) | 2008-07-31 |
TW200837816A (en) | 2008-09-16 |
US20100012157A1 (en) | 2010-01-21 |
JP5017375B2 (ja) | 2012-09-05 |
KR101456914B1 (ko) | 2014-10-31 |
EP2106303A1 (en) | 2009-10-07 |
CN101583439A (zh) | 2009-11-18 |
KR20090113296A (ko) | 2009-10-29 |
EP2106303B1 (en) | 2012-10-10 |
TWI457993B (zh) | 2014-10-21 |
CN101583439B (zh) | 2013-03-13 |
US8932408B2 (en) | 2015-01-13 |
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