JP2010513050A5 - - Google Patents
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- Publication number
- JP2010513050A5 JP2010513050A5 JP2009543104A JP2009543104A JP2010513050A5 JP 2010513050 A5 JP2010513050 A5 JP 2010513050A5 JP 2009543104 A JP2009543104 A JP 2009543104A JP 2009543104 A JP2009543104 A JP 2009543104A JP 2010513050 A5 JP2010513050 A5 JP 2010513050A5
- Authority
- JP
- Japan
- Prior art keywords
- abrasive article
- particles
- abrasive
- fixed
- inorganic filler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims 31
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 claims 15
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 claims 15
- 239000011256 inorganic filler Substances 0.000 claims 14
- 229910003475 inorganic filler Inorganic materials 0.000 claims 14
- 239000011159 matrix material Substances 0.000 claims 14
- 239000002131 composite material Substances 0.000 claims 8
- 229920005596 polymer binder Polymers 0.000 claims 7
- 239000002491 polymer binding agent Substances 0.000 claims 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 6
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 3
- 239000000377 silicon dioxide Substances 0.000 claims 3
- 229910052580 B4C Inorganic materials 0.000 claims 2
- 229910052582 BN Inorganic materials 0.000 claims 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims 2
- 229910052581 Si3N4 Inorganic materials 0.000 claims 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims 2
- 239000010432 diamond Substances 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 2
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 150000004756 silanes Chemical class 0.000 claims 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims 1
- 239000012756 surface treatment agent Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US87172006P | 2006-12-22 | 2006-12-22 | |
| US11/671,037 US7497885B2 (en) | 2006-12-22 | 2007-02-05 | Abrasive articles with nanoparticulate fillers and method for making and using them |
| PCT/US2007/087598 WO2008079743A1 (en) | 2006-12-22 | 2007-12-14 | Abrasive articles with nanoparticulate fillers and method for making and using them |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010513050A JP2010513050A (ja) | 2010-04-30 |
| JP2010513050A5 true JP2010513050A5 (enExample) | 2011-01-27 |
Family
ID=39540892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009543104A Pending JP2010513050A (ja) | 2006-12-22 | 2007-12-14 | ナノ微粒子充填剤を有する研磨物品並びにそれを作製及び使用する方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7497885B2 (enExample) |
| EP (1) | EP2118226A4 (enExample) |
| JP (1) | JP2010513050A (enExample) |
| KR (1) | KR20090091302A (enExample) |
| TW (1) | TW200902233A (enExample) |
| WO (1) | WO2008079743A1 (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7591865B2 (en) * | 2005-01-28 | 2009-09-22 | Saint-Gobain Abrasives, Inc. | Method of forming structured abrasive article |
| US8287611B2 (en) * | 2005-01-28 | 2012-10-16 | Saint-Gobain Abrasives, Inc. | Abrasive articles and methods for making same |
| US8435098B2 (en) * | 2006-01-27 | 2013-05-07 | Saint-Gobain Abrasives, Inc. | Abrasive article with cured backsize layer |
| US8083820B2 (en) * | 2006-12-22 | 2011-12-27 | 3M Innovative Properties Company | Structured fixed abrasive articles including surface treated nano-ceria filler, and method for making and using the same |
| EP2327088B1 (en) * | 2008-08-28 | 2019-01-09 | 3M Innovative Properties Company | Structured abrasive article, method of making the same, and use in wafer planarization |
| KR101836539B1 (ko) * | 2010-02-24 | 2018-03-08 | 바스프 에스이 | 연마 물품, 이의 제조 방법 및 이의 사용 방법 |
| JP2013526777A (ja) | 2010-05-11 | 2013-06-24 | スリーエム イノベイティブ プロパティズ カンパニー | 化学機械平坦化用の界面活性剤を含む固定研磨パッド |
| DE102010042040A1 (de) | 2010-10-06 | 2012-04-12 | Siltronic Ag | Verfahren zum Schleifen einer Halbleiterscheibe |
| JP2012182314A (ja) * | 2011-03-01 | 2012-09-20 | Jsr Corp | 組成物および化学機械研磨パッド、ならびに化学機械研磨方法 |
| JP2013092748A (ja) | 2011-10-26 | 2013-05-16 | Cabot Corp | 複合体粒子を含むトナー添加剤 |
| US9353313B2 (en) | 2012-08-09 | 2016-05-31 | Auburn University | Microdevices and methods of manufacture |
| WO2015095154A1 (en) | 2013-12-20 | 2015-06-25 | Cabot Corporation | Metal oxide-polymer composite particles for chemical mechanical planarization |
| US9873180B2 (en) | 2014-10-17 | 2018-01-23 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
| US9776361B2 (en) | 2014-10-17 | 2017-10-03 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
| US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
| US11745302B2 (en) | 2014-10-17 | 2023-09-05 | Applied Materials, Inc. | Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process |
| US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
| KR20240015167A (ko) | 2014-10-17 | 2024-02-02 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 ｃｍｐ 패드 구성 |
| US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
| US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
| CN113103145B (zh) | 2015-10-30 | 2023-04-11 | 应用材料公司 | 形成具有期望ζ电位的抛光制品的设备与方法 |
| US10593574B2 (en) | 2015-11-06 | 2020-03-17 | Applied Materials, Inc. | Techniques for combining CMP process tracking data with 3D printed CMP consumables |
| US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
| KR20240015161A (ko) | 2016-01-19 | 2024-02-02 | 어플라이드 머티어리얼스, 인코포레이티드 | 다공성 화학적 기계적 연마 패드들 |
| US11471999B2 (en) | 2017-07-26 | 2022-10-18 | Applied Materials, Inc. | Integrated abrasive polishing pads and manufacturing methods |
| US11072050B2 (en) | 2017-08-04 | 2021-07-27 | Applied Materials, Inc. | Polishing pad with window and manufacturing methods thereof |
| WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
| KR20210042171A (ko) | 2018-09-04 | 2021-04-16 | 어플라이드 머티어리얼스, 인코포레이티드 | 진보한 폴리싱 패드들을 위한 제형들 |
| US11813712B2 (en) | 2019-12-20 | 2023-11-14 | Applied Materials, Inc. | Polishing pads having selectively arranged porosity |
| US11806829B2 (en) | 2020-06-19 | 2023-11-07 | Applied Materials, Inc. | Advanced polishing pads and related polishing pad manufacturing methods |
| KR102410612B1 (ko) * | 2020-08-24 | 2022-06-20 | 에스케이씨솔믹스 주식회사 | 연마패드 및 이를 이용한 반도체 소자의 제조방법 |
| US11878389B2 (en) | 2021-02-10 | 2024-01-23 | Applied Materials, Inc. | Structures formed using an additive manufacturing process for regenerating surface texture in situ |
| US12138737B2 (en) * | 2021-03-31 | 2024-11-12 | Rohm and Haas Electronic Materials Holdings, Inc. | CMP polishing pad with enhanced rate |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4314827A (en) | 1979-06-29 | 1982-02-09 | Minnesota Mining And Manufacturing Company | Non-fused aluminum oxide-based abrasive mineral |
| US4623364A (en) | 1984-03-23 | 1986-11-18 | Norton Company | Abrasive material and method for preparing the same |
| CA1254238A (en) | 1985-04-30 | 1989-05-16 | Alvin P. Gerk | Process for durable sol-gel produced alumina-based ceramics, abrasive grain and abrasive products |
| US4623384A (en) * | 1985-06-03 | 1986-11-18 | Stauffer Chemical Co. | Benzylacrylaryl amide herbicidal compounds and methods of use |
| US4770671A (en) | 1985-12-30 | 1988-09-13 | Minnesota Mining And Manufacturing Company | Abrasive grits formed of ceramic containing oxides of aluminum and yttrium, method of making and using the same and products made therewith |
| US4881951A (en) | 1987-05-27 | 1989-11-21 | Minnesota Mining And Manufacturing Co. | Abrasive grits formed of ceramic containing oxides of aluminum and rare earth metal, method of making and products made therewith |
| CH675250A5 (enExample) * | 1988-06-17 | 1990-09-14 | Lonza Ag | |
| US5014468A (en) | 1989-05-05 | 1991-05-14 | Norton Company | Patterned coated abrasive for fine surface finishing |
| US5152917B1 (en) | 1991-02-06 | 1998-01-13 | Minnesota Mining & Mfg | Structured abrasive article |
| US5736371A (en) * | 1991-06-04 | 1998-04-07 | A Et S Biovecteurs | Biodegradable particulate vector for transporting molecules having biological activity |
| US6258137B1 (en) | 1992-02-05 | 2001-07-10 | Saint-Gobain Industrial Ceramics, Inc. | CMP products |
| DE69419764T2 (de) | 1993-09-13 | 1999-12-23 | Minnesota Mining And Mfg. Co., St. Paul | Schleifartikel, verfahren zur herstellung desselben, verfahren zur verwendung desselben zum endbearbeiten, und herstellungswerkzeug |
| US5391210A (en) | 1993-12-16 | 1995-02-21 | Minnesota Mining And Manufacturing Company | Abrasive article |
| KR970701118A (ko) | 1994-02-22 | 1997-03-17 | 로저 로이 템트 | 연마 물품, 이의 제조 방법 및 이를 표면 마무리용으로서 사용하는 방법(abrasive article, a method of making same, and a method of using same for finishing) |
| US5958794A (en) | 1995-09-22 | 1999-09-28 | Minnesota Mining And Manufacturing Company | Method of modifying an exposed surface of a semiconductor wafer |
| US5692950A (en) | 1996-08-08 | 1997-12-02 | Minnesota Mining And Manufacturing Company | Abrasive construction for semiconductor wafer modification |
| US5876268A (en) * | 1997-01-03 | 1999-03-02 | Minnesota Mining And Manufacturing Company | Method and article for the production of optical quality surfaces on glass |
| US6194317B1 (en) | 1998-04-30 | 2001-02-27 | 3M Innovative Properties Company | Method of planarizing the upper surface of a semiconductor wafer |
| US5942015A (en) | 1997-09-16 | 1999-08-24 | 3M Innovative Properties Company | Abrasive slurries and abrasive articles comprising multiple abrasive particle grades |
| TW512170B (en) | 1998-07-24 | 2002-12-01 | Ibm | Aqueous slurry composition and method for polishing a surface using the same |
| US6287353B1 (en) * | 1999-09-28 | 2001-09-11 | 3M Innovative Properties Company | Abrasive grain, abrasive articles, and methods of making and using the same |
| WO2002020218A2 (en) * | 2000-09-08 | 2002-03-14 | 3M Innovative Properties Company | Abrasive sheet, method of manufacturing the same and method to abrade a fiber optic connector |
| US6551366B1 (en) | 2000-11-10 | 2003-04-22 | 3M Innovative Properties Company | Spray drying methods of making agglomerate abrasive grains and abrasive articles |
| US6645624B2 (en) | 2000-11-10 | 2003-11-11 | 3M Innovative Properties Company | Composite abrasive particles and method of manufacture |
| US6755721B2 (en) | 2002-02-22 | 2004-06-29 | Saint-Gobain Ceramics And Plastics, Inc. | Chemical mechanical polishing of nickel phosphorous alloys |
| US6802878B1 (en) * | 2003-04-17 | 2004-10-12 | 3M Innovative Properties Company | Abrasive particles, abrasive articles, and methods of making and using the same |
| CN1789365A (zh) * | 2004-12-16 | 2006-06-21 | 鸿富锦精密工业（深圳）有限公司 | 抛光磨料及其制造方法 |
| US7591865B2 (en) * | 2005-01-28 | 2009-09-22 | Saint-Gobain Abrasives, Inc. | Method of forming structured abrasive article |
| MX2007012843A (es) * | 2005-04-14 | 2007-11-15 | Saint Gobain Abrasives Inc | Metodo para la formacion de un articulo abrasivo estructurado. |
-
2007
- 2007-02-05 US US11/671,037 patent/US7497885B2/en not_active Expired - Fee Related
- 2007-12-14 WO PCT/US2007/087598 patent/WO2008079743A1/en not_active Ceased
- 2007-12-14 KR KR1020097012691A patent/KR20090091302A/ko not_active Ceased
- 2007-12-14 JP JP2009543104A patent/JP2010513050A/ja active Pending
- 2007-12-14 EP EP07865705.3A patent/EP2118226A4/en not_active Withdrawn
- 2007-12-21 TW TW096149593A patent/TW200902233A/zh unknown
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