JP2010505670A - 熱可塑性ポリシロキサン−ウレアコポリマーを有するラミネート - Google Patents
熱可塑性ポリシロキサン−ウレアコポリマーを有するラミネート Download PDFInfo
- Publication number
- JP2010505670A JP2010505670A JP2009531821A JP2009531821A JP2010505670A JP 2010505670 A JP2010505670 A JP 2010505670A JP 2009531821 A JP2009531821 A JP 2009531821A JP 2009531821 A JP2009531821 A JP 2009531821A JP 2010505670 A JP2010505670 A JP 2010505670A
- Authority
- JP
- Japan
- Prior art keywords
- group
- layer
- laminate
- thermoplastic
- siloxane copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920001577 copolymer Polymers 0.000 title claims abstract description 76
- 229920001169 thermoplastic Polymers 0.000 title claims abstract description 68
- 239000004416 thermosoftening plastic Substances 0.000 title claims abstract description 68
- 239000004202 carbamide Substances 0.000 title description 2
- 239000011521 glass Substances 0.000 claims abstract description 45
- 239000000463 material Substances 0.000 claims abstract description 27
- 229920000620 organic polymer Polymers 0.000 claims abstract description 13
- 239000007769 metal material Substances 0.000 claims abstract description 8
- 229910052500 inorganic mineral Inorganic materials 0.000 claims abstract description 7
- 239000011707 mineral Substances 0.000 claims abstract description 7
- 229920001558 organosilicon polymer Polymers 0.000 claims abstract description 6
- 239000002023 wood Substances 0.000 claims abstract description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 29
- 238000004519 manufacturing process Methods 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 27
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- 230000008569 process Effects 0.000 claims description 13
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 8
- 239000000654 additive Substances 0.000 claims description 7
- 125000002947 alkylene group Chemical group 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 125000005843 halogen group Chemical group 0.000 claims description 6
- 125000003277 amino group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 claims 2
- 239000010410 layer Substances 0.000 description 152
- -1 polyethylene terephthalate Polymers 0.000 description 52
- VILAVOFMIJHSJA-UHFFFAOYSA-N dicarbon monoxide Chemical group [C]=C=O VILAVOFMIJHSJA-UHFFFAOYSA-N 0.000 description 25
- 239000005038 ethylene vinyl acetate Substances 0.000 description 14
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 13
- 239000002131 composite material Substances 0.000 description 13
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 13
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 13
- 229920002620 polyvinyl fluoride Polymers 0.000 description 13
- 229920000642 polymer Polymers 0.000 description 12
- 238000003475 lamination Methods 0.000 description 11
- 239000005020 polyethylene terephthalate Substances 0.000 description 11
- 229920000139 polyethylene terephthalate Polymers 0.000 description 11
- 229920001296 polysiloxane Polymers 0.000 description 11
- 239000012790 adhesive layer Substances 0.000 description 9
- 238000001816 cooling Methods 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 8
- 238000001125 extrusion Methods 0.000 description 8
- 150000002430 hydrocarbons Chemical group 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000005266 casting Methods 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000005336 safety glass Substances 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 5
- 238000006887 Ullmann reaction Methods 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000005340 laminated glass Substances 0.000 description 5
- 238000010030 laminating Methods 0.000 description 5
- 229920002635 polyurethane Polymers 0.000 description 5
- 239000004814 polyurethane Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 239000004433 Thermoplastic polyurethane Substances 0.000 description 4
- 239000002318 adhesion promoter Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000004132 cross linking Methods 0.000 description 4
- 239000005001 laminate film Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 4
- 150000002978 peroxides Chemical class 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229920006358 Fluon Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000032798 delamination Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005265 energy consumption Methods 0.000 description 3
- 125000001261 isocyanato group Chemical group *N=C=O 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920005862 polyol Polymers 0.000 description 3
- 150000003077 polyols Chemical class 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 229920002396 Polyurea Polymers 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000012963 UV stabilizer Substances 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000004049 embossing Methods 0.000 description 2
- 150000002118 epoxides Chemical class 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000005304 optical glass Substances 0.000 description 2
- 150000001451 organic peroxides Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000058 polyacrylate Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 229920000915 polyvinyl chloride Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 150000003254 radicals Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 238000007761 roller coating Methods 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000010345 tape casting Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000004383 yellowing Methods 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- FKTXDTWDCPTPHK-UHFFFAOYSA-N 1,1,1,2,3,3,3-heptafluoropropane Chemical group FC(F)(F)[C](F)C(F)(F)F FKTXDTWDCPTPHK-UHFFFAOYSA-N 0.000 description 1
- 125000004955 1,4-cyclohexylene group Chemical group [H]C1([H])C([H])([H])C([H])([*:1])C([H])([H])C([H])([H])C1([H])[*:2] 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical group CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000006411 1-propenylene group Chemical group [H]\C(*)=C(\[H])C([H])([H])[H] 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 description 1
- 125000004179 3-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C(Cl)=C1[H] 0.000 description 1
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 description 1
- NNTRMVRTACZZIO-UHFFFAOYSA-N 3-isocyanatopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCN=C=O NNTRMVRTACZZIO-UHFFFAOYSA-N 0.000 description 1
- XLBNHVVSCQAMHG-UHFFFAOYSA-N 3-isocyanatopropyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCCN=C=O XLBNHVVSCQAMHG-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- ZOTKGMAKADCEDH-UHFFFAOYSA-N 5-triethoxysilylpentane-1,3-diamine Chemical compound CCO[Si](OCC)(OCC)CCC(N)CCN ZOTKGMAKADCEDH-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004970 Chain extender Substances 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- 239000004831 Hot glue Substances 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- 229920001944 Plastisol Polymers 0.000 description 1
- 229920005372 Plexiglas® Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004614 Process Aid Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229920004482 WACKER® Polymers 0.000 description 1
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 1
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 239000002253 acid Chemical group 0.000 description 1
- 125000004018 acid anhydride group Chemical group 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004450 alkenylene group Chemical group 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- 125000004419 alkynylene group Chemical group 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 125000004653 anthracenylene group Chemical group 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 239000005385 borate glass Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 125000005569 butenylene group Chemical group 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000005725 cyclohexenylene group Chemical group 0.000 description 1
- 125000004979 cyclopentylene group Chemical group 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- GJEMZHNSJOJQPY-UHFFFAOYSA-N diethoxymethyl(3-isocyanatopropyl)silane Chemical compound CCOC(OCC)[SiH2]CCCN=C=O GJEMZHNSJOJQPY-UHFFFAOYSA-N 0.000 description 1
- FGKBDYJRENOVOQ-UHFFFAOYSA-N diethoxymethyl(isocyanatomethyl)silane Chemical compound CCOC(OCC)[SiH2]CN=C=O FGKBDYJRENOVOQ-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- 125000005678 ethenylene group Chemical group [H]C([*:1])=C([H])[*:2] 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000005677 ethinylene group Chemical group [*:2]C#C[*:1] 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- VSBXEXGFTRRACW-UHFFFAOYSA-N ethoxy-(3-isocyanatopropyl)-dimethylsilane Chemical compound CCO[Si](C)(C)CCCN=C=O VSBXEXGFTRRACW-UHFFFAOYSA-N 0.000 description 1
- AJKPHZFSPCONIF-UHFFFAOYSA-N ethoxy-(isocyanatomethyl)-dimethylsilane Chemical compound CCO[Si](C)(C)CN=C=O AJKPHZFSPCONIF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010096 film blowing Methods 0.000 description 1
- 230000004992 fission Effects 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 239000012760 heat stabilizer Substances 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000011065 in-situ storage Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000009830 intercalation Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- QRFPECUQGPJPMV-UHFFFAOYSA-N isocyanatomethyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CN=C=O QRFPECUQGPJPMV-UHFFFAOYSA-N 0.000 description 1
- HENJUOQEQGBPSV-UHFFFAOYSA-N isocyanatomethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CN=C=O HENJUOQEQGBPSV-UHFFFAOYSA-N 0.000 description 1
- MZOWBBNCHOUJAP-UHFFFAOYSA-N isocyanatomethyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CN=C=O MZOWBBNCHOUJAP-UHFFFAOYSA-N 0.000 description 1
- BUZRAOJSFRKWPD-UHFFFAOYSA-N isocyanatosilane Chemical class [SiH3]N=C=O BUZRAOJSFRKWPD-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- ZPPSOOVFTBGHBI-UHFFFAOYSA-N lead(2+);oxido(oxo)borane Chemical compound [Pb+2].[O-]B=O.[O-]B=O ZPPSOOVFTBGHBI-UHFFFAOYSA-N 0.000 description 1
- 239000004611 light stabiliser Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 229910021424 microcrystalline silicon Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- WUFHQGLVNNOXMP-UHFFFAOYSA-N n-(triethoxysilylmethyl)cyclohexanamine Chemical compound CCO[Si](OCC)(OCC)CNC1CCCCC1 WUFHQGLVNNOXMP-UHFFFAOYSA-N 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 125000004957 naphthylene group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 125000005561 phenanthryl group Chemical group 0.000 description 1
- 125000005562 phenanthrylene group Chemical group 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004999 plastisol Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 150000003138 primary alcohols Chemical class 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000037452 priming Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 230000002829 reductive effect Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 150000003333 secondary alcohols Chemical class 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 125000001973 tert-pentyl group Chemical group [H]C([H])([H])C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 229920006352 transparent thermoplastic Polymers 0.000 description 1
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- BOTMPGMIDPRZGP-UHFFFAOYSA-N triethoxy(isocyanatomethyl)silane Chemical compound CCO[Si](OCC)(OCC)CN=C=O BOTMPGMIDPRZGP-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
- 125000006839 xylylene group Chemical group 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/10009—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets
- B32B17/10018—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets comprising only one glass sheet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/1055—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
- B32B17/10798—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer containing silicone
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B25/00—Layered products comprising a layer of natural or synthetic rubber
- B32B25/20—Layered products comprising a layer of natural or synthetic rubber comprising silicone rubber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/048—Encapsulation of modules
- H01L31/0481—Encapsulation of modules characterised by the composition of the encapsulation material
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/88—Passivation; Containers; Encapsulations
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02B—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO BUILDINGS, e.g. HOUSING, HOUSE APPLIANCES OR RELATED END-USER APPLICATIONS
- Y02B10/00—Integration of renewable energy sources in buildings
- Y02B10/10—Photovoltaic [PV]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
- Y10T428/31612—As silicone, silane or siloxane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Laminated Bodies (AREA)
Abstract
(A)無機ガラス及び/又は有機ガラスを有する少なくとも1つの層、
(B)熱可塑性シロキサンコポリマーを有する少なくとも1つの層
(C)少なくとも1つの感光層を有する少なくとも1つのユニット、及び場合により
(D)有機ポリマー、有機ケイ素ポリマー、金属材料、鉱物材料及び木材を有するグループから選択される少なくとも1つの更なる層を有するラミネートに関する。
Description
(A)無機ガラス及び/又は有機ガラスを有する少なくとも1つの層、
(B)熱可塑性シロキサンコポリマーを有する少なくとも1つの層
(C)少なくとも1つの感光層を有する少なくとも1つのユニット、及び場合により
(D)有機ポリマー、有機ケイ素ポリマー、金属材料、鉱物材料及び木材を有するグループから選択される少なくとも1つの更なる層
を有するラミネートである。
Rは、同じ又は異なっていてよく、かつ一価のSi−結合した、場合によりハロゲン原子により置換された炭化水素基であり、前記基は酸素原子により中断されていてもよい、
Xは、同じ又は異なっていてよく、かつ1〜20個の炭素原子を有するアルキレン基であり、その際、互いに隣り合わないメチレン単位は基−O−で置換されていてもよい、
Aは、同じ又は異なっていてよく、かつ酸素原子又はアミノ基−NR’−であり、
Zは、同じ又は異なっていてよく、かつ酸素原子又はアミノ基−NR’−であり、
R’は、同じ又は異なっていてよく、かつ水素原子又は1〜10個の炭素原子を有するアルキル基であり、
Yは、同じ又は異なっていてよく、かつ二価の、場合によりハロゲン原子で置換された1〜20個の炭素原子を有する炭化水素基であり、前記基は酸素原子により中断されていてもよい、
Dは、同じ又は異なっていてよく、かつ二価の、場合によりハロゲン原子又はC1〜C6−アルキルエステル基で置換された炭化水素基であり、その際、互いに隣り合わないメチレン単位は基−O−、−COO−、−OCO−又は−OCOO−で置換されていてもよい、
nは同じ又は異なっていてよく、かつ1〜4000の数である、
aは、少なくとも1の数であり、
bは、0又は1〜1000の数であり、かつ
cは、0又は1〜1000の数である]
の化合物であるのが有利である。
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−p−C6H4−CH2−p−C6H4−ならびに、a=40〜70であり、かつ
水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)35-45(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−p−C6H4−CH2−p−C6H4−ならびに、a=40〜70であり、かつ
水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2O)35-45(CH2)3−NH−CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−(CH2)6−ならびにa=25〜35であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)35-45(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−(CH2)6−ならびにa=25〜35であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2O)35-45(CH2)3−NH−CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−(CH2)6−ならびにa=50〜70であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)35-45(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−(CH2)6−ならびにa=50〜70であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2O)35-45(CH2)3−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−C(CH3)2−m−C6H4−C(CH3)2−ならびにa=25〜35であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)35-45(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−C(CH3)2−m−C6H4−C(CH3)2−ならびにa=25〜35であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2 O)35-45(CH2)3−NH−CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−C(CH3)2−m−C6H4−C(CH3)2−ならびにa=50〜70であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)35-45(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−C(CH3)2−m−C6H4−C(CH3)2−ならびにa=50〜70であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2 O)35-45(CH2)3−NH−CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−p−C6H10−CH2−p−C6H10−ならびにa=25〜35であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)35-45(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−p−C6H10−CH2−p−C6H10−ならびにa=25〜35であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2 O)35-45(CH2)3−NH −CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−p−C6H10−CH2−p−C6H10−ならびにa=50〜70であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)35-45(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、b=0、c=0、
Y=−p−C6H10−CH2−p−C6H10−ならびにa=50〜70であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2 O)35-45(CH2)3−NH−CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=140〜155、b=0、c=0、Y=−C(CH3)2−m−C6H4−C(CH3)2−ならびにa=50〜70であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)140-155(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=140〜155、b=0、c=0、Y=−C(CH3)2−m−C6H4−C(CH3)2−ならびにa=50〜70であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)140-155(CH2)3−NH−CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=140〜155、b=0、c=0、Y=−C(CH3)2−m−C6H4−C(CH3)2−ならびにa=20〜35であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)140-155(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=140〜155、b=0、c=0、Y=−C(CH3)2−m−C6H4−C(CH3)2−ならびにa=20〜35であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)140-155(CH2)3−NH−CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、Y=−C(CH2)6−、a=15〜25、b=15〜25ならびにc=0であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2)35-45(CH2)3−NH2がカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、Y=−(CH2)6−、a=15〜25、b=15〜25ならびにc=0であり、かつ水素原子が基Aに、かつ基−NH(CH2)3SiMe2(OSiMe2O)35-45(CH2)3−NH−CO−NH−Y−NCOがカルボニル炭素原子に末端を成すもの;
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、
Y=
R=CH3−、X=−(CH2)3−、A=−NH−、n=35〜45、
Y=
本発明によるラミネートは、場合により更なる層(D)を有してもよく、これは有利には金属材料、鉱物材料、有機ポリマー及び有機ケイ素ポリマー、例えば、ポリビニルブチラール、ポリウレタン、ポリウレア、ポリ塩化ビニル、エポキシド、ポリエステル、(メタ)−アクリレート、ポリエチレン、ポリ酢酸ビニル、ポリプロピレン、PVC、ポリスチレン、ポリカーボネート、フッ化有機炭化水素ポリマー、シリコーン、シリコーン樹脂ポリマー、変性シリコーンポリマー、ホットメルト接着剤、コーティング、充填材料及びプラスチゾル、ならびにそれらの混合物、コポリマー及びラミネートから成るグループから選択され、その際、層(D)の材料は層(A)、(B)、(C)のものとは異なっている。
工程1で、熱可塑性シロキサンコポリマーから成る層(B)ならびに場合により更なる添加剤を有利には0.1〜3mmの厚さを有するフィルムの形で製造し、
工程2で、工程1にて得られたフィルム層(B)を、積層すべき層(A)と層(C)の間ならびに場合により(C)と(D)の間に設置し、かつ
工程3で、有利には使用される熱可塑性シロキサンコポリマーの軟化温度を10〜50℃上回る温度、かつ有利には周囲雰囲気の圧力(すなわち約1000hPa)と20000hPaの間である圧力で、個々の層を結合してラミネートにする
ことに特徴付けられる。
a)フィルムB1の製造
Wacker Chemie AGより商標名GENIOMER(R)140で得られるような、92質量%のシロキサン含有量、約120000g/molの質量平均分子量Mw及び約125℃の軟化点を有するウレア基含有熱可塑性シロキサンコポリマーから、"チルロール"法によりフィルムを製造した。このために、顆粒状に得られる原料を螺旋型押出機により、下流のローラー装置の冷却ローラー("チルロール")上に直接押し出した。その際に以下の機械配置を使用した:
10個の加熱ゾーンを有する1−螺旋型押出機による押出し:
ゾーン1(入り口):70℃
ゾーン2と3: 170℃
ゾーン4〜7: 195℃
ゾーン8と9: 170℃
ゾーン10(噴射口)170℃
押出機の回転数:30rpm
押出速度:50kg/h
可変ワイドスリットノズル、垂直ノズル配置、幅約60cm;
冷却ローラー("チルロール")の温度:15℃
排出速度:約3.5m/分。
フィルムB1の製造と同様に、a)で記載したように同時押出しにより、ウレア基含有熱可塑性シロキサンコポリマーを有するPE−フィルムラミネートを製造した。
10個の加熱ゾーンを有する1−螺旋型押出機によるGENIOMER(R)−押出し:
ゾーン1(入り口):70℃
ゾーン2と3: 170℃
ゾーン4〜7: 195℃
ゾーン8と9: 170℃
ゾーン10(噴射口)170℃
押出機の回転数:30rpm
押出速度:50kg/h
可変ワイドスリットノズル、垂直ノズル配置、幅約60cm;
冷却ローラー("チルロール")の温度:15℃
排出速度:約3.5m/分。
ゾーン1(入り口):70℃
ゾーン2と3: 190℃
ゾーン4〜7: 195℃
ゾーン8と9: 180℃
ゾーン10(噴射口)175℃
押出機の回転数:30rpm
押出速度:8kg/h
可変ワイドスリットノズル、垂直ノズル配置、幅約60cm;
冷却ローラー("チルロール")の温度:15℃
排出速度:約3.5m/分。
太陽電池+鉄不含ガラス:95%
太陽電池+熱可塑性シロキサンコポリマー層B1+鉄不含ガラス:94%。
例1と同様に、例1で挙げた層に加えて、もう1つの更なるガラス層と熱可塑性シロキサンコポリマーB1から成る層を有するラミネートを製造した。これはすなわち以下の形の構造を有した:
鉄不含ガラス/熱可塑性シロキサンコポリマー層B1/太陽電池/熱可塑性シロキサンコポリマー層B1/鉄不含ガラス。
例1と同様に、例えば、Isovolta AG社から商標名Icosolar(R)-2442で入手されるような10cm×10cmの寸法と0.35cmの厚さを有するPVF/PET/PVF−コラミネートフィルムを更に使用しながら、以下の形の構造を有するラミネートを製造した:
PVF/PET/PVF−コラミネートフィルム層/熱可塑性シロキサンコポリマー層B1/太陽電池/熱可塑性シロキサンコポリマー層B1/鉄不含ガラス。
例1に倣って、ローラーラミネーターを用い、かつそれぞれ12個の太陽電池(多結晶性シリコン、寸法10×10cm)、1b)で製造された熱可塑性シロキサンコポリマーフィルムB2、片側をコロナ処理したPE/PTFE−コポリマーフィルム(例えば、旭硝子株式会社(日本)より商標名Fluon(R) ETFEで入手されるようなもの)ならびに更にPVF/PET/PVF−コラミネートフィルム(例えば、Isovolte AG社から商標名Icosolar(R)-2442で入手されるようなもの)から成る、隣り合って平行に存在する3つ組みの市販の太陽電池ストリングを使用しながら、次の形の構造:Fluon(R) ETFE/熱可塑性シロキサンコポリマー層B2’/太陽電池ストリング/熱可塑性シロキサンコポリマー層B2’/PVF/PET/PVF−コラミネートフィルムを有するラミネートを製造した。この場合に、PE/PTFE−コポリマーフィルムのコロナ処理した側が、熱可塑性シロキサンコポリマー層の側に来るように置いた。更に、ローラーラミネーターへの入口の前に、1b)で記載したGENIOMER(R)−同時押出しフィルムB2のLDPE−部分をフィルムローラーから繰り出される際に、ガイドローラーにより取り除いた(B2’)。積層ロールの温度は、160℃であり、ローラーは1.2mmのスリット幅を有し、かつローラーラミネーターの供給速度は0.15m/分であり、その結果50cmの幅と約130cmの長さを有する本発明によるラミネートを約9分で製造することができた。
Claims (9)
- 次のもの:
(A)無機及び/又は有機ガラスを有する少なくとも1つの層、
(B)熱可塑性シロキサンコポリマーを有する少なくとも1つの層、
(C)少なくとも1つの感光層を有する少なくとも1つのユニット、及び場合により
(D)有機ポリマー、有機ケイ素ポリマー、金属材料、鉱物材料及び木材を有するグループから選択される少なくとも1つの更なる層
を有するラミネート。 - 層(B)の熱可塑性シロキサンコポリマーは、一般式
Rは、同じ又は異なっていてよく、かつ一価のSi−結合した、場合によりハロゲン原子により置換された炭化水素基であり、前記基は酸素原子により中断されていてもよい、
Xは、同じ又は異なっていてよく、かつ1〜20個の炭素原子を有するアルキレン基であり、その際、互いに隣り合わないメチレン単位は基−O−で置換されていてもよい、
Aは、同じ又は異なっていてよく、かつ酸素原子又はアミノ基−NR’−であり、
Zは、同じ又は異なっていてよく、かつ酸素原子又はアミノ基−NR’−であり、
R’は、同じ又は異なっていてよく、かつ水素原子又は1〜10個の炭素原子を有するアルキル基であり、
Yは、同じ又は異なっていてよく、かつ二価の、場合によりハロゲン原子で置換された1〜20個の炭素原子を有する炭化水素基であり、前記基は酸素原子により中断されていてもよい、
Dは、同じ又は異なっていてよく、かつ二価の、場合によりハロゲン原子又はC1〜C6−アルキルエステル基で置換された炭化水素基であり、その際、互いに隣り合わないメチレン単位は基−O−、−COO−、−OCO−又は−OCOO−で置換されていてもよい、
nは同じ又は異なっていてよく、かつ1〜4000の数である、
aは、少なくとも1の数であり、
bは、0又は1〜1000の数であり、かつ
cは、0又は1〜1000の数である]
の化合物である、請求項1に記載のラミネート。 - 層(B)の熱可塑性シロキサンコポリマーは、周囲雰囲気の圧力、すなわち900〜1100hPaの間で少なくとも40℃の軟化点を有する、請求項1又は2に記載のラミネート。
- 層(B)の熱可塑性シロキサンコポリマーは、周囲雰囲気の圧力、すなわち900〜1100hPaの間で100〜180℃の軟化点を有する、請求項1から3までのいずれか1項に記載のラミネート。
- 熱可塑性コポリマーの弾性率は、室温にて100%伸び率で、3N/mm2までの値である、請求項1から4までのいずれか1項に記載のラミネート。
- 層(D)は、金属材料、鉱物材料、有機ポリマー及び有機ケイ素ポリマーならびにそれらの混合物、コポリマー及びラミネートから成るグループから選択される、請求項1から5までのいずれか1項に記載のラミネート。
- 少なくとも1つの層(D)を有する、請求項1から6までのいずれか1項に記載のラミネート。
- 工程1で、熱可塑性シロキサンコポリマーから成る層(B)ならびに場合により更なる添加剤をフィルムの形で製造し、
工程2で、工程1にて得られたフィルム層(B)を、積層すべき層(A)と層(C)の間ならびに場合により(C)と(D)の間に設置し、かつ
工程3で、個々の層を結合してラミネートにする
ことに特徴付けられる、請求項1から7までのいずれか1項に記載のラミネートを製造する方法。 - 工程3は、使用される熱可塑性シロキサンコポリマーの軟化温度を10〜50℃上回る温度で、かつ周囲雰囲気の圧力、すなわち約1000hPaと20000hPaの間である圧力で実施される、請求項8に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102006048216A DE102006048216A1 (de) | 2006-10-11 | 2006-10-11 | Laminate mit thermoplastischen Polysiloxan-Harnstoff-Copolymeren |
DE102006048216.6 | 2006-10-11 | ||
PCT/EP2007/060693 WO2008043749A1 (de) | 2006-10-11 | 2007-10-09 | Laminate mit thermoplastischen polysiloxan-harnstoff-copolymeren |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010505670A true JP2010505670A (ja) | 2010-02-25 |
JP5080582B2 JP5080582B2 (ja) | 2012-11-21 |
Family
ID=38996565
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009531821A Expired - Fee Related JP5080582B2 (ja) | 2006-10-11 | 2007-10-09 | 熱可塑性ポリシロキサン−ウレアコポリマーを有するラミネート |
Country Status (14)
Country | Link |
---|---|
US (1) | US8076002B2 (ja) |
EP (1) | EP2104611B1 (ja) |
JP (1) | JP5080582B2 (ja) |
KR (1) | KR101196763B1 (ja) |
CN (1) | CN101541532B (ja) |
AT (1) | ATE467506T1 (ja) |
AU (1) | AU2007306357B2 (ja) |
BR (1) | BRPI0719198B1 (ja) |
DE (2) | DE102006048216A1 (ja) |
ES (1) | ES2343981T3 (ja) |
IL (1) | IL197669A (ja) |
MX (1) | MX2009003880A (ja) |
WO (1) | WO2008043749A1 (ja) |
ZA (1) | ZA200901871B (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013110391A (ja) * | 2011-10-28 | 2013-06-06 | Shin Etsu Chem Co Ltd | ウエハ加工体、ウエハ加工用部材、ウエハ加工用仮接着材、及び薄型ウエハの製造方法 |
JP2015523920A (ja) * | 2012-05-16 | 2015-08-20 | ノヴォポリマーズ エヌフェーNovopolymers N.V. | ポリマーシート |
US9299875B2 (en) | 2013-08-30 | 2016-03-29 | Shin-Etsu Chemical Co., Ltd. | Manufacture of solar cell module |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007000553A1 (de) * | 2007-10-22 | 2009-04-23 | Wacker Chemie Ag | Fluorpolymer-Silicon-Verbunde und Verfahren zur Herstellung |
DE102008027000A1 (de) * | 2008-06-05 | 2009-12-17 | Institut für Kunststofftechnologie und -recycling eV | Photovoltaikmodul mit wärmeableitender Rückseitenverkapselung, bestehend aus einem gelierten modifizierten Polymer-Plastisol mit feinteiligen dispergierten Thermoplasten / Elasten oder verfestigtem Harz oder weiteren geeigneten Polymeren und Verfahren zur Aufbringung der Beschichtung |
DE102008037821A1 (de) * | 2008-08-14 | 2010-02-25 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Herstellung von mechanisch vorgespannten Solarzellenverbunden sowie mechanisch vorgespanntes Solarzellenmodul |
DE102009002408A1 (de) | 2009-04-15 | 2010-10-21 | Wacker Chemie Ag | Zusammensetzung auf der Basis von Siloxancopolymeren |
US8188363B2 (en) | 2009-08-07 | 2012-05-29 | Sunpower Corporation | Module level solutions to solar cell polarization |
US20110048505A1 (en) * | 2009-08-27 | 2011-03-03 | Gabriela Bunea | Module Level Solution to Solar Cell Polarization Using an Encapsulant with Opened UV Transmission Curve |
CN101719523B (zh) * | 2009-11-18 | 2012-06-27 | 常熟阿特斯阳光电力科技有限公司 | 汽车用太阳能电池板 |
CN102686393B (zh) * | 2009-12-17 | 2015-06-17 | 陶氏环球技术有限责任公司 | 复合层压材料及其用途 |
DE102009059105A1 (de) * | 2009-12-18 | 2011-06-22 | Schott Ag, 55122 | Rückseitenfolie für Solarmodule |
US8377738B2 (en) | 2010-07-01 | 2013-02-19 | Sunpower Corporation | Fabrication of solar cells with counter doping prevention |
KR101287186B1 (ko) * | 2011-05-13 | 2013-07-23 | (주)태인케미컬 | 투명 점착 시트 및 그를 이용한 디스플레이패널 조립체 분리방법 |
NL2008837C2 (en) * | 2012-05-16 | 2013-11-20 | Novopolymers N V | Solar panel. |
ITVI20120189A1 (it) * | 2012-07-30 | 2014-01-31 | Fortom Chimica S R L | Metodo per il recupero di materiali da pannelli solari al silicio a fine vita e uso di prodotti ottenuti mediante il suddetto metodo |
US9812590B2 (en) | 2012-10-25 | 2017-11-07 | Sunpower Corporation | Bifacial solar cell module with backside reflector |
DE102012219571A1 (de) * | 2012-10-25 | 2014-04-30 | Solarworld Innovations Gmbh | Photovoltaikmodul mit einer Markierung |
EP2735378A1 (en) * | 2012-11-23 | 2014-05-28 | 3S Swiss Solar Systems AG | Method for making a solar module with encapsulant and system therefor |
US9035172B2 (en) | 2012-11-26 | 2015-05-19 | Sunpower Corporation | Crack resistant solar cell modules |
WO2014100656A1 (en) * | 2012-12-21 | 2014-06-26 | Dow Corning Corporation | Hot-melt type curable silicone composition for compression molding or laminating |
EP2936581B1 (en) | 2012-12-21 | 2018-11-21 | Dow Silicones Corporation | Layered polymer structures and methods |
US8796061B2 (en) | 2012-12-21 | 2014-08-05 | Sunpower Corporation | Module assembly for thin solar cells |
US20160230042A1 (en) * | 2013-03-04 | 2016-08-11 | The Government Of The United States Of America, As Represented By The Secretary Of The Navy | Silane end capped substituted urea resins and coatings thereof |
US9685571B2 (en) | 2013-08-14 | 2017-06-20 | Sunpower Corporation | Solar cell module with high electric susceptibility layer |
DE102013017378A1 (de) | 2013-10-21 | 2015-04-23 | Wacker Chemie Ag | Laminate mit thermoplastischen Siloxan-Copolymeren |
AR100231A1 (es) * | 2014-04-29 | 2016-09-21 | Procter & Gamble | Composiciones para el cuidado de las telas que comprenden polímeros de poliuretano, poliurea y/o poliuretanourea |
MX2017009473A (es) | 2015-01-20 | 2017-11-02 | Basf Coatings Gmbh | Proceso para la produccion de laminados flexibles organicos-inorganicos. |
CN105949773A (zh) * | 2016-05-05 | 2016-09-21 | 成都硅宝科技股份有限公司 | 一种有机硅热塑性薄膜及其制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05125084A (ja) * | 1991-03-06 | 1993-05-21 | Ciba Geigy Ag | 向上された接着性と耐候性とを有するガラスコーテイング |
JPH09132716A (ja) * | 1995-11-10 | 1997-05-20 | Toshiba Silicone Co Ltd | 太陽電池モジュール用保護シート用組成物および太陽電池モジュール用保護シート |
JP2001094135A (ja) * | 1999-09-21 | 2001-04-06 | Canon Inc | 太陽電池モジュール |
JP2005002340A (ja) * | 2003-06-12 | 2005-01-06 | Wacker Chemie Gmbh | オルガノポリシロキサン/ポリ尿素/ポリウレタン−ブロック共重合体の製造法およびその使用 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4057439A (en) | 1976-08-25 | 1977-11-08 | Solarex Corporation | Solar panel |
US4395527A (en) * | 1978-05-17 | 1983-07-26 | M & T Chemicals Inc. | Siloxane-containing polymers |
FR2426337A1 (fr) | 1978-05-19 | 1979-12-14 | Comp Generale Electricite | Panneau de cellules solaires et son procede de fabrication |
US5340403A (en) * | 1986-10-20 | 1994-08-23 | Zeneca Limited | Process for the production of xylose |
US6340403B1 (en) | 1994-04-20 | 2002-01-22 | The Regents Of The University Of California | Solar cell module lamination process |
US5474620A (en) * | 1994-05-16 | 1995-12-12 | United Solar Systems Corporation | Cut resistant laminate for the light incident surface of a photovoltaic module |
DE19919742A1 (de) | 1999-04-30 | 2000-11-02 | Fraunhofer Ges Forschung | Verfahren zum Beschichten von Substraten aus dotiertem Silizium mit einer Antireflexschicht für Solarzellen mittels einer in einer Vakuumkammer betriebenen Zerstäubungskathode mit einem Magnetsystem |
DE19963866A1 (de) | 1999-12-30 | 2001-08-16 | Schott Auer Gmbh | Gegenstand mit einem Glassubstrat und mit einer optisch aktiven Beschichtung |
DE10051724A1 (de) | 2000-10-18 | 2002-05-02 | Flabeg Gmbh & Co Kg | Thermisch vorgespanntes Glas mit einer abriebfesten, porösen SiO¶2¶-Antireflexschicht |
DE10137855A1 (de) * | 2001-08-02 | 2003-02-27 | Consortium Elektrochem Ind | Organopolysiloxan/Polyharnstoff/ Polyurethan-Blockcopolymere |
AU2002301252B2 (en) | 2001-10-12 | 2007-12-20 | Bayer Aktiengesellschaft | Photovoltaic modules with a thermoplastic hot-melt adhesive layer and a process for their production |
DE20220444U1 (de) * | 2001-10-12 | 2003-09-04 | Bayer Ag, 51373 Leverkusen | Photovoltaik-Module mit einer thermoplastischen Schmelzklebeschicht |
FR2836912B1 (fr) | 2002-03-06 | 2004-11-26 | Saint Gobain | Susbstrat transparent a revetement antireflets avec proprietes de resistance a l'abrasion |
US7511298B2 (en) * | 2002-10-10 | 2009-03-31 | Kansai Paint Co., Ltd. | Method for forming semiconductor film and use of semiconductor film |
DE10250564B4 (de) | 2002-10-30 | 2009-09-17 | Schott Ag | Verfahren zur Beschichtung einer Oberfläche, Erzeugnis und Verwendung des Erzeugnisses |
DE10342401B4 (de) | 2003-09-13 | 2014-10-30 | Schott Ag | Verbundmaterialien mit einer Morphologie-beeinflussenden Schicht, Verfahren zu deren Herstellung sowie Verwendung des Verbundmaterials |
DE10352423B3 (de) | 2003-11-10 | 2005-01-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Verminderung der Reflexion an Halbleiteroberflächen |
DE102004053708A1 (de) | 2004-11-03 | 2006-05-04 | Schott Ag | Verfahren zur Herstellung eines Erzeugnisses mit Antibeschlag-Beschichtung, sowie verfahrensgemäß herstellbares Erzeugnis |
US20080276983A1 (en) * | 2005-11-04 | 2008-11-13 | Robert Andrew Drake | Encapsulation of Photovoltaic Cells |
-
2006
- 2006-10-11 DE DE102006048216A patent/DE102006048216A1/de not_active Withdrawn
-
2007
- 2007-10-09 DE DE502007003802T patent/DE502007003802D1/de active Active
- 2007-10-09 KR KR1020097006440A patent/KR101196763B1/ko active IP Right Grant
- 2007-10-09 CN CN2007800379139A patent/CN101541532B/zh not_active Expired - Fee Related
- 2007-10-09 AU AU2007306357A patent/AU2007306357B2/en not_active Ceased
- 2007-10-09 JP JP2009531821A patent/JP5080582B2/ja not_active Expired - Fee Related
- 2007-10-09 BR BRPI0719198-7A patent/BRPI0719198B1/pt not_active IP Right Cessation
- 2007-10-09 EP EP07821062A patent/EP2104611B1/de not_active Not-in-force
- 2007-10-09 US US12/444,481 patent/US8076002B2/en not_active Expired - Fee Related
- 2007-10-09 AT AT07821062T patent/ATE467506T1/de active
- 2007-10-09 MX MX2009003880A patent/MX2009003880A/es active IP Right Grant
- 2007-10-09 WO PCT/EP2007/060693 patent/WO2008043749A1/de active Application Filing
- 2007-10-09 ES ES07821062T patent/ES2343981T3/es active Active
-
2009
- 2009-03-17 ZA ZA200901871A patent/ZA200901871B/xx unknown
- 2009-03-18 IL IL197669A patent/IL197669A/en active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05125084A (ja) * | 1991-03-06 | 1993-05-21 | Ciba Geigy Ag | 向上された接着性と耐候性とを有するガラスコーテイング |
JPH09132716A (ja) * | 1995-11-10 | 1997-05-20 | Toshiba Silicone Co Ltd | 太陽電池モジュール用保護シート用組成物および太陽電池モジュール用保護シート |
JP2001094135A (ja) * | 1999-09-21 | 2001-04-06 | Canon Inc | 太陽電池モジュール |
JP2005002340A (ja) * | 2003-06-12 | 2005-01-06 | Wacker Chemie Gmbh | オルガノポリシロキサン/ポリ尿素/ポリウレタン−ブロック共重合体の製造法およびその使用 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013110391A (ja) * | 2011-10-28 | 2013-06-06 | Shin Etsu Chem Co Ltd | ウエハ加工体、ウエハ加工用部材、ウエハ加工用仮接着材、及び薄型ウエハの製造方法 |
JP2015523920A (ja) * | 2012-05-16 | 2015-08-20 | ノヴォポリマーズ エヌフェーNovopolymers N.V. | ポリマーシート |
US9299875B2 (en) | 2013-08-30 | 2016-03-29 | Shin-Etsu Chemical Co., Ltd. | Manufacture of solar cell module |
Also Published As
Publication number | Publication date |
---|---|
CN101541532A (zh) | 2009-09-23 |
IL197669A (en) | 2013-07-31 |
MX2009003880A (es) | 2009-04-23 |
BRPI0719198B1 (pt) | 2018-07-10 |
BRPI0719198A2 (pt) | 2014-06-03 |
WO2008043749A1 (de) | 2008-04-17 |
AU2007306357B2 (en) | 2010-08-19 |
ZA200901871B (en) | 2010-03-31 |
EP2104611A1 (de) | 2009-09-30 |
KR20090045408A (ko) | 2009-05-07 |
DE102006048216A1 (de) | 2008-04-17 |
IL197669A0 (en) | 2009-12-24 |
US20100047589A1 (en) | 2010-02-25 |
EP2104611B1 (de) | 2010-05-12 |
DE502007003802D1 (en) | 2010-06-24 |
US8076002B2 (en) | 2011-12-13 |
KR101196763B1 (ko) | 2012-11-05 |
CN101541532B (zh) | 2013-05-22 |
ATE467506T1 (de) | 2010-05-15 |
ES2343981T3 (es) | 2010-08-13 |
JP5080582B2 (ja) | 2012-11-21 |
AU2007306357A1 (en) | 2008-04-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5080582B2 (ja) | 熱可塑性ポリシロキサン−ウレアコポリマーを有するラミネート | |
KR101614981B1 (ko) | 광전지 모듈 | |
EP2890560B1 (en) | Strengthened thin glass-polymer laminates | |
KR102203834B1 (ko) | 가요성 유리중합체 라미네이트를 형상 유지하여 형성하는 방법 | |
JP5545388B2 (ja) | 太陽電池モジュール表面保護用透明積層フィルム及び太陽電池モジュール | |
KR102232841B1 (ko) | 플렉서블 유리 기판의 2축 벤딩 및/또는 트위스팅을 감소시키기 위한 방법 및 구조물 | |
EP2512801B1 (en) | Composite laminates and uses thereof | |
JP2008533715A (ja) | 太陽電池素子封止材 | |
WO2012029499A1 (ja) | 1,4-シクロヘキシレンジメチレンテレフタレートと1,4-シクロヘキシレンジメチレンイソフタレートとの共重合体フィルム、太陽電池モジュール用保護シート、及び、太陽電池モジュール | |
KR101644809B1 (ko) | 태양전지용 실리콘 봉지재 조성물 및 태양전지 모듈 | |
CN103715297A (zh) | 制造太阳能电池组件的方法 | |
EP3221143A1 (en) | Glass-polymer laminates and processes for forming the same | |
JP2006522728A (ja) | ポリシロキサン−尿素コポリマーを有する合わせガラス | |
KR101064584B1 (ko) | 광전지용 시트 | |
CN115521717A (zh) | 异质结电池用反应性共挤胶膜及其制备方法、组件 | |
JP7254226B6 (ja) | 合わせガラス中間膜または太陽電池封止材用樹脂組成物、合わせガラス中間膜、合わせガラス、太陽電池封止材および太陽電池モジュール | |
CN111403516A (zh) | 太阳能电池组件及太阳能电池组件的制备方法 | |
KR20120086997A (ko) | 광전지 모듈 | |
Baum et al. | Photovoltaic encapsulation materials | |
JP2013036036A (ja) | 熱可塑性ポリウレタン、その製造方法およびそれにより製造された光起電モジュール |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20101228 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20110902 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111202 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20111209 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20111227 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20120110 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20120201 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20120208 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120301 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120801 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120830 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150907 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5080582 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |