JP2010503537A - 多光子硬化性光反応性組成物を加工するのに好適な光学システム - Google Patents

多光子硬化性光反応性組成物を加工するのに好適な光学システム Download PDF

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JP2010503537A
JP2010503537A JP2009528407A JP2009528407A JP2010503537A JP 2010503537 A JP2010503537 A JP 2010503537A JP 2009528407 A JP2009528407 A JP 2009528407A JP 2009528407 A JP2009528407 A JP 2009528407A JP 2010503537 A JP2010503537 A JP 2010503537A
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Prior art keywords
beamlets
beam splitter
beamlet
subfield
prism
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JP2009528407A
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English (en)
Japanese (ja)
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JP2010503537A5 (enExample
Inventor
ファクリス，ディーン
ジェイ． マーナン，アンドリュー
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of JP2010503537A publication Critical patent/JP2010503537A/ja
Publication of JP2010503537A5 publication Critical patent/JP2010503537A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/101—Scanning systems with both horizontal and vertical deflecting means, e.g. raster or XY scanners
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/105—Scanning systems with one or more pivoting mirrors or galvano-mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0955—Lenses
    • G02B27/0961—Lens arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/095—Refractive optical elements
    • G02B27/0972—Prisms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/1219—Polymerisation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
JP2009528407A 2006-09-14 2007-09-10 多光子硬化性光反応性組成物を加工するのに好適な光学システム Withdrawn JP2010503537A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/531,836 US20080083886A1 (en) 2006-09-14 2006-09-14 Optical system suitable for processing multiphoton curable photoreactive compositions
PCT/US2007/077980 WO2008033750A1 (en) 2006-09-14 2007-09-10 Optical system suitable for processing multiphoton curable photoreactive compositions

Publications (2)

Publication Number Publication Date
JP2010503537A true JP2010503537A (ja) 2010-02-04
JP2010503537A5 JP2010503537A5 (enExample) 2010-10-28

Family

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Family Applications (1)

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JP2009528407A Withdrawn JP2010503537A (ja) 2006-09-14 2007-09-10 多光子硬化性光反応性組成物を加工するのに好適な光学システム

Country Status (5)

Country Link
US (1) US20080083886A1 (enExample)
EP (1) EP2069850A4 (enExample)
JP (1) JP2010503537A (enExample)
CN (1) CN101517454A (enExample)
WO (1) WO2008033750A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014021366A (ja) * 2012-07-20 2014-02-03 Olympus Corp 光走査装置および走査型検査装置

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US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US8322874B2 (en) * 2007-09-06 2012-12-04 3M Innovative Properties Company Lightguides having light extraction structures providing regional control of light output
CN101795838B (zh) 2007-09-06 2014-02-12 3M创新有限公司 形成模具的方法以及使用所述模具形成制品的方法
CN101795961B (zh) * 2007-09-06 2013-05-01 3M创新有限公司 用于制备微结构化制品的工具
WO2009048808A1 (en) 2007-10-11 2009-04-16 3M Innovative Properties Company Chromatic confocal sensor
JP5524856B2 (ja) 2007-12-12 2014-06-18 スリーエム イノベイティブ プロパティズ カンパニー エッジ明瞭性が向上した構造の製造方法
JP5801558B2 (ja) 2008-02-26 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム
US10029331B2 (en) * 2009-09-14 2018-07-24 Preco, Inc. Multiple laser beam focusing head
JP5518612B2 (ja) * 2010-07-20 2014-06-11 株式会社ディスコ 光学装置およびこれを備えるレーザー加工装置
WO2017027453A1 (en) 2015-08-07 2017-02-16 Google Inc. Controlling a line of sight angle of an imaging platform
EP3130950A1 (de) 2015-08-10 2017-02-15 Multiphoton Optics Gmbh Strahlumlenkelement sowie optisches bauelement mit strahlumlenkelement
DE102016113978B4 (de) * 2016-07-28 2021-09-02 Lilas Gmbh Vorrichtung zum Ablenken einer Laserstrahlung oder zum Ablenken von Licht
WO2018112929A1 (zh) * 2016-12-23 2018-06-28 重庆海蓝川马光电科技有限公司 用于多功能望远镜的复合棱镜及其双目望远镜光学系统
EP3649499A1 (en) * 2017-07-07 2020-05-13 University of Rochester Optical design for a two-degree-of-freedom scanning system with a curved sample plane
DE102018200036B3 (de) * 2018-01-03 2019-01-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optische Anordnung zur direkten Laserinterferenzstrukturierung
CN111427236A (zh) * 2019-01-09 2020-07-17 芯恩（青岛）集成电路有限公司 一种多光束光掩膜板曝光系统
DE102019128362B3 (de) * 2019-10-21 2021-02-18 Trumpf Laser- Und Systemtechnik Gmbh Segmentiertes Strahlformungselement und Laserbearbeitungsanlage
CN215953962U (zh) * 2021-09-03 2022-03-04 佛山市南海威宏模具制造有限公司 双眼式望远镜

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014021366A (ja) * 2012-07-20 2014-02-03 Olympus Corp 光走査装置および走査型検査装置

Also Published As

Publication number Publication date
EP2069850A1 (en) 2009-06-17
CN101517454A (zh) 2009-08-26
US20080083886A1 (en) 2008-04-10
EP2069850A4 (en) 2010-07-28
WO2008033750A1 (en) 2008-03-20

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