JP2010503537A5 - - Google Patents

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Publication number
JP2010503537A5
JP2010503537A5 JP2009528407A JP2009528407A JP2010503537A5 JP 2010503537 A5 JP2010503537 A5 JP 2010503537A5 JP 2009528407 A JP2009528407 A JP 2009528407A JP 2009528407 A JP2009528407 A JP 2009528407A JP 2010503537 A5 JP2010503537 A5 JP 2010503537A5
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JP
Japan
Prior art keywords
beamlet
subfield
scanning
layer
beamlets
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2009528407A
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English (en)
Japanese (ja)
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JP2010503537A (ja
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Publication date
Priority claimed from US11/531,836 external-priority patent/US20080083886A1/en
Application filed filed Critical
Publication of JP2010503537A publication Critical patent/JP2010503537A/ja
Publication of JP2010503537A5 publication Critical patent/JP2010503537A5/ja
Withdrawn legal-status Critical Current

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JP2009528407A 2006-09-14 2007-09-10 多光子硬化性光反応性組成物を加工するのに好適な光学システム Withdrawn JP2010503537A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/531,836 US20080083886A1 (en) 2006-09-14 2006-09-14 Optical system suitable for processing multiphoton curable photoreactive compositions
PCT/US2007/077980 WO2008033750A1 (en) 2006-09-14 2007-09-10 Optical system suitable for processing multiphoton curable photoreactive compositions

Publications (2)

Publication Number Publication Date
JP2010503537A JP2010503537A (ja) 2010-02-04
JP2010503537A5 true JP2010503537A5 (enExample) 2010-10-28

Family

ID=39184118

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009528407A Withdrawn JP2010503537A (ja) 2006-09-14 2007-09-10 多光子硬化性光反応性組成物を加工するのに好適な光学システム

Country Status (5)

Country Link
US (1) US20080083886A1 (enExample)
EP (1) EP2069850A4 (enExample)
JP (1) JP2010503537A (enExample)
CN (1) CN101517454A (enExample)
WO (1) WO2008033750A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US8322874B2 (en) * 2007-09-06 2012-12-04 3M Innovative Properties Company Lightguides having light extraction structures providing regional control of light output
CN101795838B (zh) 2007-09-06 2014-02-12 3M创新有限公司 形成模具的方法以及使用所述模具形成制品的方法
CN101795961B (zh) * 2007-09-06 2013-05-01 3M创新有限公司 用于制备微结构化制品的工具
WO2009048808A1 (en) 2007-10-11 2009-04-16 3M Innovative Properties Company Chromatic confocal sensor
JP5524856B2 (ja) 2007-12-12 2014-06-18 スリーエム イノベイティブ プロパティズ カンパニー エッジ明瞭性が向上した構造の製造方法
JP5801558B2 (ja) 2008-02-26 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム
US10029331B2 (en) * 2009-09-14 2018-07-24 Preco, Inc. Multiple laser beam focusing head
JP5518612B2 (ja) * 2010-07-20 2014-06-11 株式会社ディスコ 光学装置およびこれを備えるレーザー加工装置
JP6057583B2 (ja) * 2012-07-20 2017-01-11 オリンパス株式会社 光走査装置および走査型検査装置
WO2017027453A1 (en) 2015-08-07 2017-02-16 Google Inc. Controlling a line of sight angle of an imaging platform
EP3130950A1 (de) 2015-08-10 2017-02-15 Multiphoton Optics Gmbh Strahlumlenkelement sowie optisches bauelement mit strahlumlenkelement
DE102016113978B4 (de) * 2016-07-28 2021-09-02 Lilas Gmbh Vorrichtung zum Ablenken einer Laserstrahlung oder zum Ablenken von Licht
WO2018112929A1 (zh) * 2016-12-23 2018-06-28 重庆海蓝川马光电科技有限公司 用于多功能望远镜的复合棱镜及其双目望远镜光学系统
EP3649499A1 (en) * 2017-07-07 2020-05-13 University of Rochester Optical design for a two-degree-of-freedom scanning system with a curved sample plane
DE102018200036B3 (de) * 2018-01-03 2019-01-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Optische Anordnung zur direkten Laserinterferenzstrukturierung
CN111427236A (zh) * 2019-01-09 2020-07-17 芯恩（青岛）集成电路有限公司 一种多光束光掩膜板曝光系统
DE102019128362B3 (de) * 2019-10-21 2021-02-18 Trumpf Laser- Und Systemtechnik Gmbh Segmentiertes Strahlformungselement und Laserbearbeitungsanlage
CN215953962U (zh) * 2021-09-03 2022-03-04 佛山市南海威宏模具制造有限公司 双眼式望远镜

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1549077A (en) * 1977-08-09 1979-08-01 Redifon Flight Simulation Ltd Scanning systems
US4796038A (en) 1985-07-24 1989-01-03 Ateq Corporation Laser pattern generation apparatus
FR2665959B1 (fr) * 1990-08-16 1994-01-14 Oreal Appareil destine a permettre d'evaluer la brillance d'une surface, en particulier de la peau.
JPH0735994A (ja) * 1993-07-22 1995-02-07 Asahi Optical Co Ltd レーザ描画装置
US5548444A (en) * 1994-07-06 1996-08-20 Hughes Danbury Optical Systems, Inc. Optical beam homogenizing apparatus and method
JP4106478B2 (ja) * 1998-03-06 2008-06-25 株式会社オーク製作所 多ビーム走査型露光装置
EP1031868B1 (de) * 1999-02-26 2003-05-14 Dr. Johannes Heidenhain GmbH Kompensierter Parallel-Strahlteiler mit zwei Platten sowie Interferometer
US6767685B2 (en) * 1999-12-03 2004-07-27 Fuji Photo Film Co., Ltd. Plate-making method, plate-making apparatus used in such plate-making method, and image recording material
US6606197B2 (en) * 2000-03-28 2003-08-12 Corning Incorporated Dual grating filtering system
KR100810546B1 (ko) 2000-06-15 2008-03-18 쓰리엠 이노베이티브 프로퍼티즈 캄파니 삼차원 광학 소자의 가공 방법
US6611379B2 (en) * 2001-01-25 2003-08-26 Brookhaven Science Associates Llc Beam splitter and method for generating equal optical path length beams
KR100481106B1 (ko) * 2001-05-21 2005-04-07 가부시키가이샤 히타치세이사쿠쇼 투사기
US6561648B2 (en) * 2001-05-23 2003-05-13 David E. Thomas System and method for reconstruction of aberrated wavefronts
US20040012872A1 (en) 2001-06-14 2004-01-22 Fleming Patrick R Multiphoton absorption method using patterned light
US7298415B2 (en) * 2001-07-13 2007-11-20 Xenogen Corporation Structured light imaging apparatus
US6909556B2 (en) * 2002-01-14 2005-06-21 Lightmaster Systems, Inc. Design of prism assemblies and kernel configurations for use in projection systems
US6781763B1 (en) * 2002-04-01 2004-08-24 The United States Of America As Represented By The Secretary Of The Air Force Image analysis through polarization modulation and combination
US7359045B2 (en) * 2002-05-06 2008-04-15 Applied Materials, Israel, Ltd. High speed laser scanning inspection system
EP1554634B1 (en) * 2002-10-25 2011-12-21 Mapper Lithography Ip B.V. Lithography system
US7307787B2 (en) * 2002-12-20 2007-12-11 Fuji Xerox Co., Ltd. Beam splitting prism, method of manufacturing beam splitting prism, and all-optical switching device
US6909735B2 (en) * 2003-04-10 2005-06-21 Hitachi Via Mechanics, Ltd. System and method for generating and controlling multiple independently steerable laser beam for material processing
US7057720B2 (en) * 2003-06-24 2006-06-06 Corning Incorporated Optical interrogation system and method for using same
US7421973B2 (en) * 2003-11-06 2008-09-09 Axcelis Technologies, Inc. System and method for performing SIMOX implants using an ion shower
ATE439612T1 (de) * 2003-12-05 2009-08-15 3M Innovative Properties Co Prozess zur herstellung von photonischen kristallen
EP1710609A1 (en) * 2005-04-08 2006-10-11 Deutsches Krebsforschungszentrum Stiftung des öffentlichen Rechts Optical scanning device and method of deriving same
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system

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