JP2010210760A - 投影光学系、露光装置及びデバイス製造方法 - Google Patents

投影光学系、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP2010210760A
JP2010210760A JP2009054815A JP2009054815A JP2010210760A JP 2010210760 A JP2010210760 A JP 2010210760A JP 2009054815 A JP2009054815 A JP 2009054815A JP 2009054815 A JP2009054815 A JP 2009054815A JP 2010210760 A JP2010210760 A JP 2010210760A
Authority
JP
Japan
Prior art keywords
moving member
optical system
sio2
distortion
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009054815A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010210760A5 (enExample
Inventor
Yuhei Sumiyoshi
雄平 住吉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2009054815A priority Critical patent/JP2010210760A/ja
Priority to US12/720,080 priority patent/US8477286B2/en
Publication of JP2010210760A publication Critical patent/JP2010210760A/ja
Publication of JP2010210760A5 publication Critical patent/JP2010210760A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0068—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration having means for controlling the degree of correction, e.g. using phase modulators, movable elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2009054815A 2009-03-09 2009-03-09 投影光学系、露光装置及びデバイス製造方法 Pending JP2010210760A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009054815A JP2010210760A (ja) 2009-03-09 2009-03-09 投影光学系、露光装置及びデバイス製造方法
US12/720,080 US8477286B2 (en) 2009-03-09 2010-03-09 Projection optical system, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009054815A JP2010210760A (ja) 2009-03-09 2009-03-09 投影光学系、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2010210760A true JP2010210760A (ja) 2010-09-24
JP2010210760A5 JP2010210760A5 (enExample) 2012-04-26

Family

ID=42677977

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009054815A Pending JP2010210760A (ja) 2009-03-09 2009-03-09 投影光学系、露光装置及びデバイス製造方法

Country Status (2)

Country Link
US (1) US8477286B2 (enExample)
JP (1) JP2010210760A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5406437B2 (ja) * 2007-06-22 2014-02-05 キヤノン株式会社 露光装置及びデバイス製造方法
NL1036546A1 (nl) 2008-02-26 2009-08-27 Asml Netherlands Bv Lithographic method to apply a pattern to a substrate and Lithographic Apparatus.
JP5312058B2 (ja) * 2009-01-19 2013-10-09 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
DE102011080437A1 (de) * 2010-09-30 2012-04-05 Carl Zeiss Smt Gmbh Abbildendes optisches System für die Mikrolithographie
DE102017209440A1 (de) * 2017-06-02 2018-12-06 Carl Zeiss Smt Gmbh Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithografie

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10242048A (ja) * 1996-12-28 1998-09-11 Canon Inc 投影露光装置及びデバイスの製造方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0851304B1 (en) * 1996-12-28 2004-03-17 Canon Kabushiki Kaisha Projection exposure apparatus and device manufacturing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10242048A (ja) * 1996-12-28 1998-09-11 Canon Inc 投影露光装置及びデバイスの製造方法

Also Published As

Publication number Publication date
US20100225889A1 (en) 2010-09-09
US8477286B2 (en) 2013-07-02

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