JP2010181453A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2010181453A5 JP2010181453A5 JP2009022492A JP2009022492A JP2010181453A5 JP 2010181453 A5 JP2010181453 A5 JP 2010181453A5 JP 2009022492 A JP2009022492 A JP 2009022492A JP 2009022492 A JP2009022492 A JP 2009022492A JP 2010181453 A5 JP2010181453 A5 JP 2010181453A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- underlayer film
- formula
- resist underlayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000004432 carbon atom Chemical group C* 0.000 claims description 41
- 125000000962 organic group Chemical group 0.000 claims description 10
- 125000003545 alkoxy group Chemical group 0.000 claims description 8
- 125000000217 alkyl group Chemical group 0.000 claims description 8
- 125000004414 alkyl thio group Chemical group 0.000 claims description 8
- 238000001459 lithography Methods 0.000 claims description 7
- 125000002723 alicyclic group Chemical group 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 4
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 125000004653 anthracenylene group Chemical group 0.000 claims description 4
- 229910052799 carbon Inorganic materials 0.000 claims description 4
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 125000004957 naphthylene group Chemical group 0.000 claims description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 4
- 229920000642 polymer Polymers 0.000 claims description 4
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims description 3
- 125000005138 alkoxysulfonyl group Chemical group 0.000 claims description 3
- 125000005196 alkyl carbonyloxy group Chemical group 0.000 claims description 3
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000005278 alkyl sulfonyloxy group Chemical group 0.000 claims description 2
- 239000002904 solvent Substances 0.000 claims description 2
- 239000004065 semiconductor Substances 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 1
- 239000007795 chemical reaction product Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 125000000547 substituted alkyl group Chemical group 0.000 claims 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical group OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 claims 1
- 150000002430 hydrocarbons Chemical group 0.000 description 4
- -1 1,4-dimethylbutylene group Chemical group 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000006021 1-methyl-2-propenyl group Chemical group 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000004810 2-methylpropylene group Chemical group [H]C([H])([H])C([H])(C([H])([H])[*:2])C([H])([H])[*:1] 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical group C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 125000004705 ethylthio group Chemical group C(C)S* 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000003253 isopropoxy group Chemical group [H]C([H])([H])C([H])(O*)C([H])([H])[H] 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000003935 n-pentoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 125000004712 n-pentylthio group Chemical group C(CCCC)S* 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009022492A JP5333737B2 (ja) | 2009-02-03 | 2009-02-03 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009022492A JP5333737B2 (ja) | 2009-02-03 | 2009-02-03 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010181453A JP2010181453A (ja) | 2010-08-19 |
| JP2010181453A5 true JP2010181453A5 (OSRAM) | 2012-01-19 |
| JP5333737B2 JP5333737B2 (ja) | 2013-11-06 |
Family
ID=42763065
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009022492A Active JP5333737B2 (ja) | 2009-02-03 | 2009-02-03 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5333737B2 (OSRAM) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012124597A1 (ja) * | 2011-03-15 | 2012-09-20 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
| WO2013141015A1 (ja) * | 2012-03-23 | 2013-09-26 | 日産化学工業株式会社 | Ｅｕｖリソグラフィー用レジスト下層膜形成組成物 |
| KR101866209B1 (ko) | 2012-05-07 | 2018-06-11 | 닛산 가가쿠 고교 가부시키 가이샤 | 레지스트 하층막 형성조성물 |
| KR101937895B1 (ko) * | 2013-01-09 | 2019-01-11 | 닛산 가가쿠 가부시키가이샤 | 레지스트 하층막 형성 조성물 |
| CN105579909B (zh) * | 2013-09-27 | 2019-11-12 | 日产化学工业株式会社 | 抗蚀剂下层膜形成用组合物和使用其的抗蚀剂图案的形成方法 |
| CN108780279B (zh) * | 2016-03-10 | 2022-07-05 | 日产化学株式会社 | 包含具有基于碳原子间的不饱和键的光交联基的化合物的高低差基板被覆用组合物 |
| JP2021042312A (ja) | 2019-09-11 | 2021-03-18 | キオクシア株式会社 | 化合物、ポリマー、パターン形成材料、パターン形成方法および半導体装置の製造方法 |
| WO2023149327A1 (ja) * | 2022-02-02 | 2023-08-10 | 日産化学株式会社 | 保護膜形成用組成物 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10316894A (ja) * | 1997-05-20 | 1998-12-02 | Nippon Kayaku Co Ltd | 粉体塗料組成物 |
| US6846612B2 (en) * | 2002-02-01 | 2005-01-25 | Brewer Science Inc. | Organic anti-reflective coating compositions for advanced microlithography |
| JP2006182961A (ja) * | 2004-12-28 | 2006-07-13 | Stanley Electric Co Ltd | 熱硬化性透明樹脂組成物、該組成物を熱硬化してなる透光性硬化物、該硬化物で封止された発光ダイオード |
| KR101423056B1 (ko) * | 2006-06-19 | 2014-07-25 | 닛산 가가쿠 고교 가부시키 가이샤 | 수산기 함유 축합계 수지를 함유하는 레지스트 하층막 형성조성물 |
| JP5158381B2 (ja) * | 2007-07-11 | 2013-03-06 | 日産化学工業株式会社 | レジスト下層膜形成組成物及びそれを用いたレジストパターンの形成方法 |
-
2009
- 2009-02-03 JP JP2009022492A patent/JP5333737B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2010181453A5 (OSRAM) | ||
| JP2019163463A5 (OSRAM) | ||
| TWI507462B (zh) | 包含有含氮化合物之光阻 | |
| JP2009053657A5 (OSRAM) | ||
| JP2004117688A5 (OSRAM) | ||
| TW201202327A (en) | Photoacid generators and photoresists comprising same | |
| JP2009258722A5 (OSRAM) | ||
| JP2014085643A5 (OSRAM) | ||
| CN106030417A (zh) | 光增感化学放大型抗蚀剂材料及使用了其的图案形成方法、半导体器件、光刻用掩模、以及纳米压印用模板 | |
| JP2009258723A5 (OSRAM) | ||
| JP2009265642A5 (OSRAM) | ||
| JPWO2014155960A1 (ja) | 光塩基発生剤 | |
| WO2009028511A1 (ja) | リソグラフィー用レジスト下層膜形成組成物及び半導体装置の製造方法 | |
| JP2017533180A (ja) | オキシムスルホネート誘導体 | |
| JP2009115835A5 (OSRAM) | ||
| JPWO2022202098A5 (OSRAM) | ||
| TW201502721A (zh) | 微構造體用樹脂構造體之製造方法及微構造體之製造方法 | |
| JP2010285403A5 (OSRAM) | ||
| WO2006011442A1 (ja) | ポジ型レジスト組成物およびレジストパターン形成方法 | |
| JP2013080206A (ja) | 感光性樹脂組成物、パターン形成方法、カラーフィルタ、及び表示装置 | |
| JP2008546027A5 (OSRAM) | ||
| JP6628052B2 (ja) | レジスト下層膜の形成方法 | |
| JP2007529037A5 (OSRAM) | ||
| JP2006018249A5 (OSRAM) | ||
| JP2012113256A5 (OSRAM) |