JP2010043352A5 - - Google Patents

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Publication number
JP2010043352A5
JP2010043352A5 JP2009153960A JP2009153960A JP2010043352A5 JP 2010043352 A5 JP2010043352 A5 JP 2010043352A5 JP 2009153960 A JP2009153960 A JP 2009153960A JP 2009153960 A JP2009153960 A JP 2009153960A JP 2010043352 A5 JP2010043352 A5 JP 2010043352A5
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JP
Japan
Prior art keywords
plate
pair
vacuum vessel
closed space
plate members
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2009153960A
Other languages
English (en)
Japanese (ja)
Other versions
JP2010043352A (ja
JP5580004B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2009153960A priority Critical patent/JP5580004B2/ja
Priority claimed from JP2009153960A external-priority patent/JP5580004B2/ja
Priority to US12/499,926 priority patent/US8763833B2/en
Publication of JP2010043352A publication Critical patent/JP2010043352A/ja
Publication of JP2010043352A5 publication Critical patent/JP2010043352A5/ja
Application granted granted Critical
Publication of JP5580004B2 publication Critical patent/JP5580004B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2009153960A 2008-07-14 2009-06-29 真空容器、および真空処理装置 Active JP5580004B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2009153960A JP5580004B2 (ja) 2008-07-14 2009-06-29 真空容器、および真空処理装置
US12/499,926 US8763833B2 (en) 2008-07-14 2009-07-09 Vacuum vessel, vacuum processing apparatus comprising vacuum vessel, and vacuum vessel manufacturing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008182470 2008-07-14
JP2008182470 2008-07-14
JP2009153960A JP5580004B2 (ja) 2008-07-14 2009-06-29 真空容器、および真空処理装置

Publications (3)

Publication Number Publication Date
JP2010043352A JP2010043352A (ja) 2010-02-25
JP2010043352A5 true JP2010043352A5 (https=) 2012-08-30
JP5580004B2 JP5580004B2 (ja) 2014-08-27

Family

ID=41504165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009153960A Active JP5580004B2 (ja) 2008-07-14 2009-06-29 真空容器、および真空処理装置

Country Status (2)

Country Link
US (1) US8763833B2 (https=)
JP (1) JP5580004B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012141105A (ja) * 2011-01-05 2012-07-26 Shimadzu Corp 真空チャンバ
US20140250658A1 (en) * 2013-03-05 2014-09-11 Applied Materials, Inc. Vacuum chambers and components for semiconductor substrate processing and methods of fabrication

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1307584A (en) * 1919-06-24 Pheyes
US1909136A (en) * 1929-07-24 1933-05-16 Thomas & Betts Corp Conduit box
US2488710A (en) * 1946-09-23 1949-11-22 Allegheny Ludlum Steel Enclosing shield for electrical applications
US4102557A (en) * 1977-03-01 1978-07-25 Pace Incorporated Collapsible container
JPS5881268A (ja) 1981-11-06 1983-05-16 Japanese National Railways<Jnr> 真空槽
EP0452778B1 (en) * 1990-04-20 1995-03-15 Applied Materials, Inc. Pressure vacuum vessel and method of manufacture
JPH05103972A (ja) 1990-11-28 1993-04-27 Plasma Syst:Kk 真空容器
JPH04236777A (ja) * 1991-01-17 1992-08-25 Kobe Steel Ltd 半導体製造装置用真空チャンバの箱体
JPH05263936A (ja) * 1992-03-17 1993-10-12 Kobe Steel Ltd 高真空チャンバの壁板の製造方法
JP3206962B2 (ja) 1992-05-27 2001-09-10 日本発条株式会社 真空容器
JPH0629100A (ja) 1992-07-07 1994-02-04 Mitsubishi Electric Corp 加速器用真空容器
JPH0864542A (ja) 1994-08-25 1996-03-08 Plasma Syst:Kk 半導体処理装置用真空チャンバーおよびその製造方法
JPH09209150A (ja) 1996-02-06 1997-08-12 Tokyo Electron Ltd 真空チャンバ及びその製造方法
US6349843B1 (en) * 1999-04-01 2002-02-26 The Vollrath Company Llc Pan removal ramp
JP2005163964A (ja) * 2003-12-04 2005-06-23 Toyo Sekkei Kogyo Kk 半導体製造装置用開閉装置
US7267229B2 (en) * 2004-11-12 2007-09-11 Cheng Shun Chen Foldable container device
JP4926530B2 (ja) * 2006-04-27 2012-05-09 東京エレクトロン株式会社 シール部材、減圧容器、減圧処理装置、減圧容器のシール機構、および減圧容器の製造方法
US20090294281A1 (en) 2006-07-07 2009-12-03 Canon Anelva Corporation Plasma film forming apparatus and film manufacturing method
JP2008021487A (ja) 2006-07-12 2008-01-31 Mitsubishi Electric Corp 真空容器及びその製造方法
JP4660570B2 (ja) 2008-04-15 2011-03-30 キヤノンアネルバ株式会社 真空成膜装置及び成膜方法
JP2009299184A (ja) 2008-05-12 2009-12-24 Canon Anelva Corp 磁場発生装置、磁場発生方法、スパッタ装置及びデバイスの製造方法

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