JP2010010398A - 真空処理装置 - Google Patents
真空処理装置 Download PDFInfo
- Publication number
- JP2010010398A JP2010010398A JP2008168053A JP2008168053A JP2010010398A JP 2010010398 A JP2010010398 A JP 2010010398A JP 2008168053 A JP2008168053 A JP 2008168053A JP 2008168053 A JP2008168053 A JP 2008168053A JP 2010010398 A JP2010010398 A JP 2010010398A
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- vacuum
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- vacuum processing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/6719—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the processing chambers, e.g. modular processing chambers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Drying Of Semiconductors (AREA)
Abstract
設置面積あたりの生産性が高い半導体製造装置を提供する。
【解決手段】
内部が減圧される処理室を有する複数の真空処理容器と、これら真空処理容器が周囲に連結されて配置され減圧された内部を処理対称の試料が搬送される真空搬送容器と、この真空搬送容器の前方側に連結されその前面側に前記試料が収納されたカセットが載せられる複数のカセット台が配置されて大気圧下の内部で前記試料が搬送される大気搬送容器と、kの大気搬送容器内の左右の一端部に配置され前記試料の位置を調節する位置合わせ機と、この位置合わせ機の下方で床面との間に配置され前記複数の真空処理用機に供給される流体の供給を調節する調節器とを備えた。
【選択図】図1(a)
Description
101 大気側ブロック
102 真空側ブロック
103a,103b,103c,104 処理ユニット
105 搬送ユニット
108 筐体
109 カセット台
111 位置合わせ部
113,113′ ロック室
201 基準位置
202 予備ポート
300 冷却媒体供給ユニット
301 冷却水IN側配管
302 冷却水OUT側配管
303 コネクタ部
304 冷却水供給・排出管路
305 開口
Claims (4)
- 内部が減圧される処理室を有する複数の真空処理容器と、これら真空処理容器が周囲に連結されて配置され減圧された内部を処理対称の試料が搬送される真空搬送容器と、この真空搬送容器の前方側に連結されその前面側に前記試料が収納されたカセットが載せられる複数のカセット台が配置されて大気圧下の内部で前記試料が搬送される大気搬送容器と、この大気搬送容器内の左右の一端部に配置され前記試料の位置を調節する位置合わせ機と、この位置合わせ機の下方で床面との間に配置され前記複数の真空処理用機に供給される流体の供給を調節する調節器とを備えた真空処理装置。
- 請求項1記載の真空処理装置であって、前記流体は前記複数の真空処理容器またはその内部の試料台の冷却用液体である真空処理装置。
- 請求項1又は2の記載の真空処理装置であって、前記搬送容器は上方から見て多角形の平面形を有しその複数の辺に前記真空処理容器が連結され、前記大気搬送容器が前記真空搬送容器の前記一端側に偏らせて配置され、前記一端側の端部に前記位置合わせ機及びその下方の前記調節器を備えた真空処理装置。
- 請求項3に記載の真空処理装置であって、前記大気搬送容器内の空間に配置されその前方側の前記カセット台の配置に沿って駆動される試料搬送用のロボットを備えた真空処理装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008168053A JP5097627B2 (ja) | 2008-06-27 | 2008-06-27 | 真空処理装置 |
KR1020080080620A KR101092510B1 (ko) | 2008-06-27 | 2008-08-18 | 진공처리장치 |
US12/203,168 US8100620B2 (en) | 2008-06-27 | 2008-09-03 | Vacuum processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008168053A JP5097627B2 (ja) | 2008-06-27 | 2008-06-27 | 真空処理装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2010010398A true JP2010010398A (ja) | 2010-01-14 |
JP2010010398A5 JP2010010398A5 (ja) | 2011-09-08 |
JP5097627B2 JP5097627B2 (ja) | 2012-12-12 |
Family
ID=41447675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008168053A Active JP5097627B2 (ja) | 2008-06-27 | 2008-06-27 | 真空処理装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US8100620B2 (ja) |
JP (1) | JP5097627B2 (ja) |
KR (1) | KR101092510B1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013531364A (ja) * | 2010-04-30 | 2013-08-01 | アプライド マテリアルズ インコーポレイテッド | 共通のリソースを有するプロセスチャンバ及びその使用方法 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2491981A2 (en) | 2003-11-27 | 2012-08-29 | Shiseido Company Limited | Parakeratosis inhibitor and external composition for skin |
KR102497795B1 (ko) * | 2016-07-04 | 2023-02-09 | 세메스 주식회사 | 기판 처리 장치 |
US11107713B2 (en) * | 2019-05-29 | 2021-08-31 | Taiwan Semiconductor Manufacturing Company Ltd. | Conveying system and method for operating the same |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004006665A (ja) * | 2002-02-20 | 2004-01-08 | Tokyo Electron Ltd | 真空処理装置 |
JP2005101598A (ja) * | 2003-09-04 | 2005-04-14 | Hitachi High-Technologies Corp | 真空処理装置 |
JP2005252201A (ja) * | 2004-03-08 | 2005-09-15 | Hitachi High-Technologies Corp | 真空処理装置 |
JP2008053325A (ja) * | 2006-08-23 | 2008-03-06 | Tokyo Electron Ltd | 基板搬送装置及び基板搬送方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4852516A (en) * | 1986-05-19 | 1989-08-01 | Machine Technology, Inc. | Modular processing apparatus for processing semiconductor wafers |
US6312525B1 (en) * | 1997-07-11 | 2001-11-06 | Applied Materials, Inc. | Modular architecture for semiconductor wafer fabrication equipment |
TW442891B (en) * | 1998-11-17 | 2001-06-23 | Tokyo Electron Ltd | Vacuum processing system |
US7032614B2 (en) * | 2000-11-03 | 2006-04-25 | Applied Materials, Inc. | Facilities connection box for pre-facilitation of wafer fabrication equipment |
SG115630A1 (en) * | 2003-03-11 | 2005-10-28 | Asml Netherlands Bv | Temperature conditioned load lock, lithographic apparatus comprising such a load lock and method of manufacturing a substrate with such a load lock |
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2008
- 2008-06-27 JP JP2008168053A patent/JP5097627B2/ja active Active
- 2008-08-18 KR KR1020080080620A patent/KR101092510B1/ko active IP Right Grant
- 2008-09-03 US US12/203,168 patent/US8100620B2/en active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004006665A (ja) * | 2002-02-20 | 2004-01-08 | Tokyo Electron Ltd | 真空処理装置 |
JP2005101598A (ja) * | 2003-09-04 | 2005-04-14 | Hitachi High-Technologies Corp | 真空処理装置 |
JP2005252201A (ja) * | 2004-03-08 | 2005-09-15 | Hitachi High-Technologies Corp | 真空処理装置 |
JP2008053325A (ja) * | 2006-08-23 | 2008-03-06 | Tokyo Electron Ltd | 基板搬送装置及び基板搬送方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013531364A (ja) * | 2010-04-30 | 2013-08-01 | アプライド マテリアルズ インコーポレイテッド | 共通のリソースを有するプロセスチャンバ及びその使用方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101092510B1 (ko) | 2011-12-13 |
US20090324367A1 (en) | 2009-12-31 |
JP5097627B2 (ja) | 2012-12-12 |
US8100620B2 (en) | 2012-01-24 |
KR20100002018A (ko) | 2010-01-06 |
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