JP2010005595A - 複層塗膜 - Google Patents
複層塗膜 Download PDFInfo
- Publication number
- JP2010005595A JP2010005595A JP2008170932A JP2008170932A JP2010005595A JP 2010005595 A JP2010005595 A JP 2010005595A JP 2008170932 A JP2008170932 A JP 2008170932A JP 2008170932 A JP2008170932 A JP 2008170932A JP 2010005595 A JP2010005595 A JP 2010005595A
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- JP
- Japan
- Prior art keywords
- mass
- parts
- polymer emulsion
- group
- coating film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000000576 coating method Methods 0.000 title claims abstract description 140
- 239000011248 coating agent Substances 0.000 title claims abstract description 139
- 239000002245 particle Substances 0.000 claims abstract description 183
- 239000000839 emulsion Substances 0.000 claims abstract description 167
- 229920000642 polymer Polymers 0.000 claims abstract description 164
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims abstract description 153
- 239000000178 monomer Substances 0.000 claims abstract description 147
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 142
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 117
- 150000003377 silicon compounds Chemical class 0.000 claims abstract description 86
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 80
- 239000008199 coating composition Substances 0.000 claims abstract description 61
- 238000000034 method Methods 0.000 claims abstract description 51
- 239000008119 colloidal silica Substances 0.000 claims abstract description 29
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 27
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 27
- 230000001699 photocatalysis Effects 0.000 claims abstract description 21
- 230000000379 polymerizing effect Effects 0.000 claims abstract description 20
- 238000001035 drying Methods 0.000 claims abstract description 12
- 239000003995 emulsifying agent Substances 0.000 claims description 47
- 239000004611 light stabiliser Substances 0.000 claims description 19
- 239000006097 ultraviolet radiation absorber Substances 0.000 claims description 17
- 125000003368 amide group Chemical group 0.000 claims description 15
- 125000003142 tertiary amide group Chemical group 0.000 claims description 4
- 125000003156 secondary amide group Chemical group 0.000 claims description 3
- 239000000203 mixture Substances 0.000 abstract description 33
- 239000000463 material Substances 0.000 abstract description 18
- 150000007530 organic bases Chemical class 0.000 abstract description 5
- 230000003301 hydrolyzing effect Effects 0.000 abstract 2
- 239000010408 film Substances 0.000 description 109
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 83
- -1 silicon alkoxide Chemical class 0.000 description 83
- 239000010410 layer Substances 0.000 description 79
- 238000006243 chemical reaction Methods 0.000 description 71
- 230000015572 biosynthetic process Effects 0.000 description 50
- 238000003786 synthesis reaction Methods 0.000 description 50
- 239000007864 aqueous solution Substances 0.000 description 44
- 239000007787 solid Substances 0.000 description 43
- 238000006116 polymerization reaction Methods 0.000 description 42
- 125000004432 carbon atom Chemical group C* 0.000 description 34
- 238000011109 contamination Methods 0.000 description 31
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 27
- 239000002253 acid Substances 0.000 description 23
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium peroxydisulfate Substances [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 23
- VAZSKTXWXKYQJF-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)OOS([O-])=O VAZSKTXWXKYQJF-UHFFFAOYSA-N 0.000 description 23
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 23
- 150000001875 compounds Chemical class 0.000 description 23
- 150000003863 ammonium salts Chemical class 0.000 description 22
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 21
- 238000003756 stirring Methods 0.000 description 21
- 239000006087 Silane Coupling Agent Substances 0.000 description 20
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 20
- 239000000126 substance Substances 0.000 description 20
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 19
- 238000007720 emulsion polymerization reaction Methods 0.000 description 19
- 150000003254 radicals Chemical class 0.000 description 19
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 18
- 159000000000 sodium salts Chemical class 0.000 description 18
- 238000012360 testing method Methods 0.000 description 18
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 17
- 239000006185 dispersion Substances 0.000 description 17
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 16
- 239000003795 chemical substances by application Substances 0.000 description 16
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 16
- 239000000047 product Substances 0.000 description 16
- 239000000243 solution Substances 0.000 description 16
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 15
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 15
- 230000014759 maintenance of location Effects 0.000 description 15
- 239000011259 mixed solution Substances 0.000 description 15
- 239000000377 silicon dioxide Substances 0.000 description 15
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 15
- 239000002685 polymerization catalyst Substances 0.000 description 14
- 239000008279 sol Substances 0.000 description 14
- 125000000542 sulfonic acid group Chemical group 0.000 description 14
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 13
- 230000002378 acidificating effect Effects 0.000 description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 13
- 239000011941 photocatalyst Substances 0.000 description 13
- 229910052710 silicon Inorganic materials 0.000 description 13
- 239000010703 silicon Substances 0.000 description 13
- 239000000344 soap Substances 0.000 description 13
- 230000000007 visual effect Effects 0.000 description 13
- 238000010992 reflux Methods 0.000 description 12
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 11
- 150000001412 amines Chemical class 0.000 description 11
- ZZUFCTLCJUWOSV-UHFFFAOYSA-N furosemide Chemical compound C1=C(Cl)C(S(=O)(=O)N)=CC(C(O)=O)=C1NCC1=CC=CO1 ZZUFCTLCJUWOSV-UHFFFAOYSA-N 0.000 description 11
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- IUVCFHHAEHNCFT-INIZCTEOSA-N 2-[(1s)-1-[4-amino-3-(3-fluoro-4-propan-2-yloxyphenyl)pyrazolo[3,4-d]pyrimidin-1-yl]ethyl]-6-fluoro-3-(3-fluorophenyl)chromen-4-one Chemical compound C1=C(F)C(OC(C)C)=CC=C1C(C1=C(N)N=CN=C11)=NN1[C@@H](C)C1=C(C=2C=C(F)C=CC=2)C(=O)C2=CC(F)=CC=C2O1 IUVCFHHAEHNCFT-INIZCTEOSA-N 0.000 description 10
- 239000006096 absorbing agent Substances 0.000 description 10
- 125000005011 alkyl ether group Chemical group 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 10
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 10
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 10
- 125000006353 oxyethylene group Chemical group 0.000 description 10
- 150000003839 salts Chemical class 0.000 description 10
- 239000000758 substrate Substances 0.000 description 10
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 10
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 9
- 239000002585 base Substances 0.000 description 9
- 239000007859 condensation product Substances 0.000 description 9
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 9
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 8
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 8
- 125000003118 aryl group Chemical group 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 8
- 125000001033 ether group Chemical group 0.000 description 8
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 description 8
- 239000003973 paint Substances 0.000 description 8
- 239000003381 stabilizer Substances 0.000 description 8
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 8
- WBIQQQGBSDOWNP-UHFFFAOYSA-N 2-dodecylbenzenesulfonic acid Chemical compound CCCCCCCCCCCCC1=CC=CC=C1S(O)(=O)=O WBIQQQGBSDOWNP-UHFFFAOYSA-N 0.000 description 7
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 7
- 150000007513 acids Chemical class 0.000 description 7
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 7
- 239000012964 benzotriazole Substances 0.000 description 7
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 7
- 229940060296 dodecylbenzenesulfonic acid Drugs 0.000 description 7
- 239000000706 filtrate Substances 0.000 description 7
- 229920001296 polysiloxane Polymers 0.000 description 7
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 6
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 6
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical group CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 6
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 6
- 239000003638 chemical reducing agent Substances 0.000 description 6
- 239000002131 composite material Substances 0.000 description 6
- 229910052739 hydrogen Inorganic materials 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 238000006011 modification reaction Methods 0.000 description 6
- 125000003396 thiol group Chemical group [H]S* 0.000 description 6
- UVRCNEIYXSRHNT-UHFFFAOYSA-N 3-ethylpent-2-enamide Chemical compound CCC(CC)=CC(N)=O UVRCNEIYXSRHNT-UHFFFAOYSA-N 0.000 description 5
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 5
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonium chloride Substances [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Natural products CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 229910021529 ammonia Inorganic materials 0.000 description 5
- 235000011114 ammonium hydroxide Nutrition 0.000 description 5
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 5
- 239000012965 benzophenone Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 238000000354 decomposition reaction Methods 0.000 description 5
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 5
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 5
- 239000002344 surface layer Substances 0.000 description 5
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 4
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 4
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 4
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical group C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- HETCEOQFVDFGSY-UHFFFAOYSA-N Isopropenyl acetate Chemical compound CC(=C)OC(C)=O HETCEOQFVDFGSY-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 4
- 239000002518 antifoaming agent Substances 0.000 description 4
- RSOILICUEWXSLA-UHFFFAOYSA-N bis(1,2,2,6,6-pentamethylpiperidin-4-yl) decanedioate Chemical compound C1C(C)(C)N(C)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(C)C(C)(C)C1 RSOILICUEWXSLA-UHFFFAOYSA-N 0.000 description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 4
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 4
- 239000001530 fumaric acid Substances 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 4
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 4
- 239000011976 maleic acid Substances 0.000 description 4
- 125000005641 methacryl group Chemical group 0.000 description 4
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 4
- 230000001443 photoexcitation Effects 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 229920001223 polyethylene glycol Polymers 0.000 description 4
- 238000010526 radical polymerization reaction Methods 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid group Chemical group C(CCC(=O)O)(=O)O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-L sulfate group Chemical group S(=O)(=O)([O-])[O-] QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- MCDBEBOBROAQSH-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl prop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C=C MCDBEBOBROAQSH-UHFFFAOYSA-N 0.000 description 3
- JMGZKPMMFXFSGK-UHFFFAOYSA-N 3-tri(propan-2-yloxy)silylpropyl prop-2-enoate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)CCCOC(=O)C=C JMGZKPMMFXFSGK-UHFFFAOYSA-N 0.000 description 3
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 3
- HGEKXQRHZRDGKO-UHFFFAOYSA-N 3-tripropoxysilylpropyl prop-2-enoate Chemical compound CCCO[Si](OCCC)(OCCC)CCCOC(=O)C=C HGEKXQRHZRDGKO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- OKIZCWYLBDKLSU-UHFFFAOYSA-M N,N,N-Trimethylmethanaminium chloride Chemical compound [Cl-].C[N+](C)(C)C OKIZCWYLBDKLSU-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- RMKZLFMHXZAGTM-UHFFFAOYSA-N [dimethoxy(propyl)silyl]oxymethyl prop-2-enoate Chemical compound CCC[Si](OC)(OC)OCOC(=O)C=C RMKZLFMHXZAGTM-UHFFFAOYSA-N 0.000 description 3
- 229920000180 alkyd Polymers 0.000 description 3
- 230000003373 anti-fouling effect Effects 0.000 description 3
- 239000004566 building material Substances 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 239000002781 deodorant agent Substances 0.000 description 3
- DGPFXVBYDAVXLX-UHFFFAOYSA-N dibutyl(diethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)CCCC DGPFXVBYDAVXLX-UHFFFAOYSA-N 0.000 description 3
- YPENMAABQGWRBR-UHFFFAOYSA-N dibutyl(dimethoxy)silane Chemical compound CCCC[Si](OC)(OC)CCCC YPENMAABQGWRBR-UHFFFAOYSA-N 0.000 description 3
- 235000014113 dietary fatty acids Nutrition 0.000 description 3
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- DCBNMBIOGUANTC-UHFFFAOYSA-N [5-[(5-benzoyl-4-hydroxy-2-methoxyphenyl)methyl]-2-hydroxy-4-methoxyphenyl]-phenylmethanone Chemical compound COC1=CC(O)=C(C(=O)C=2C=CC=CC=2)C=C1CC(C(=CC=1O)OC)=CC=1C(=O)C1=CC=CC=C1 DCBNMBIOGUANTC-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 125000005211 alkyl trimethyl ammonium group Chemical group 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
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- 230000003078 antioxidant effect Effects 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
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- YWDBZVIHZORXHG-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-1-yl) decanedioate Chemical compound CC1(C)CCCC(C)(C)N1OC(=O)CCCCCCCCC(=O)ON1C(C)(C)CCCC1(C)C YWDBZVIHZORXHG-UHFFFAOYSA-N 0.000 description 1
- GOJOVSYIGHASEI-UHFFFAOYSA-N bis(2,2,6,6-tetramethylpiperidin-4-yl) butanedioate Chemical compound C1C(C)(C)NC(C)(C)CC1OC(=O)CCC(=O)OC1CC(C)(C)NC(C)(C)C1 GOJOVSYIGHASEI-UHFFFAOYSA-N 0.000 description 1
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- 239000013078 crystal Substances 0.000 description 1
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- 238000004033 diameter control Methods 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
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- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 1
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- 239000007789 gas Substances 0.000 description 1
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- VRINOTYEGADLMW-UHFFFAOYSA-N heptyl(trimethoxy)silane Chemical compound CCCCCCC[Si](OC)(OC)OC VRINOTYEGADLMW-UHFFFAOYSA-N 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
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- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
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- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- UJRDRFZCRQNLJM-UHFFFAOYSA-N methyl 3-[3-(benzotriazol-2-yl)-5-tert-butyl-4-hydroxyphenyl]propanoate Chemical compound CC(C)(C)C1=CC(CCC(=O)OC)=CC(N2N=C3C=CC=CC3=N2)=C1O UJRDRFZCRQNLJM-UHFFFAOYSA-N 0.000 description 1
- 230000000877 morphologic effect Effects 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- WFKDPJRCBCBQNT-UHFFFAOYSA-N n,2-dimethylprop-2-enamide Chemical compound CNC(=O)C(C)=C WFKDPJRCBCBQNT-UHFFFAOYSA-N 0.000 description 1
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- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
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- ZIWDVJPPVMGJGR-UHFFFAOYSA-N n-ethyl-2-methylprop-2-enamide Chemical compound CCNC(=O)C(C)=C ZIWDVJPPVMGJGR-UHFFFAOYSA-N 0.000 description 1
- YLVYQHNZVBDPES-UHFFFAOYSA-N n-ethyl-n,2-dimethylprop-2-enamide Chemical compound CCN(C)C(=O)C(C)=C YLVYQHNZVBDPES-UHFFFAOYSA-N 0.000 description 1
- ZOTWHNWBICCBPC-UHFFFAOYSA-N n-ethyl-n-methylprop-2-enamide Chemical compound CCN(C)C(=O)C=C ZOTWHNWBICCBPC-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- COYVWKMZTCAFHO-UHFFFAOYSA-N n-methyl-n-propan-2-ylprop-2-enamide Chemical compound CC(C)N(C)C(=O)C=C COYVWKMZTCAFHO-UHFFFAOYSA-N 0.000 description 1
- RGNKVBUBMHKKJP-UHFFFAOYSA-N n-methyl-n-propylprop-2-enamide Chemical compound CCCN(C)C(=O)C=C RGNKVBUBMHKKJP-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
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- 230000001590 oxidative effect Effects 0.000 description 1
- DXGLGDHPHMLXJC-UHFFFAOYSA-N oxybenzone Chemical compound OC1=CC(OC)=CC=C1C(=O)C1=CC=CC=C1 DXGLGDHPHMLXJC-UHFFFAOYSA-N 0.000 description 1
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- FZYCEURIEDTWNS-UHFFFAOYSA-N prop-1-en-2-ylbenzene Chemical compound CC(=C)C1=CC=CC=C1.CC(=C)C1=CC=CC=C1 FZYCEURIEDTWNS-UHFFFAOYSA-N 0.000 description 1
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- BBFCIBZLAVOLCF-UHFFFAOYSA-N pyridin-1-ium;bromide Chemical compound Br.C1=CC=NC=C1 BBFCIBZLAVOLCF-UHFFFAOYSA-N 0.000 description 1
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- 229920002050 silicone resin Polymers 0.000 description 1
- 229910001388 sodium aluminate Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
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- 229910052715 tantalum Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
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- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
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- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 description 1
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 1
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- BJDLPDPRMYAOCM-UHFFFAOYSA-N triethoxy(propan-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)C BJDLPDPRMYAOCM-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- NMEPHPOFYLLFTK-UHFFFAOYSA-N trimethoxy(octyl)silane Chemical compound CCCCCCCC[Si](OC)(OC)OC NMEPHPOFYLLFTK-UHFFFAOYSA-N 0.000 description 1
- HILHCDFHSDUYNX-UHFFFAOYSA-N trimethoxy(pentyl)silane Chemical compound CCCCC[Si](OC)(OC)OC HILHCDFHSDUYNX-UHFFFAOYSA-N 0.000 description 1
- LGROXJWYRXANBB-UHFFFAOYSA-N trimethoxy(propan-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)C LGROXJWYRXANBB-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
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Abstract
【解決手段】下塗り層11と、下塗り層11上に設けられた上塗り層12とを備える複層塗膜1。下塗り層11は、ビニル単量体及び加水分解性珪素化合物をそれぞれ重合させる工程を含む方法によって得られる重合体エマルジョン粒子(A)を含有する下塗り用コーティング組成物(I)の塗膜を乾燥して形成される膜である。上塗り層12は、光触媒活性を有する金属酸化物粒子(B)と、ビニル単量体及び加水分解性珪素化合物をそれぞれ重合させる工程を含む方法によって得られる重合体エマルジョン粒子(C)と、コロイダルシリカ(D)と、を含有する上塗り用コーティング組成物(II)の塗膜を乾燥して形成される膜である。
【選択図】図1
Description
SiWxRy (1)
SiWxRy (1)
(式中、Wは炭素数1〜20のアルコキシ基、水酸基、炭素数1〜20のアセトキシ基、ハロゲン原子、水素原子、炭素数1〜20のオキシム基、エノキシ基、アミノキシ基、アミド基から選ばれた少なくとも1種の基を表す。Rは、直鎖状または分岐状の炭素数が1〜30個のアルキル基、炭素数5〜20のシクロアルキル基、および炭素数1〜20のアルキル基若しくは炭素数1〜20のアルコキシ基若しくはハロゲン原子で置換されていてもよい炭素数6〜20のアリール基から選ばれる少なくとも1種の炭化水素基を表す。xは1以上4以下の整数であり、yは0以上3以下の整数である。また、x+y=4である。)Wとして少なくとも1個のアルコキシ基を有する珪素アルコキシドが好ましい。
1.数平均粒子径
固形分含有量が1〜20質量%となるよう適宜溶媒を加えて試料を希釈し、湿式粒度分析計(日機装製マイクロトラックUPA−9230)を用いて測定した。
塗膜の表面にイオン交換水の滴を乗せ、20℃で1分間放置した後、協和界面科学製CA−X150型接触角計を用いて接触角を測定した。塗膜表面に対する水の接触角が小さいほど、塗膜表面の親水性が高い。
基材上に複層塗膜が形成された試験板を、スガ試験器製サンシャインウェザーメーターを使用してブラックパネル温度63℃、降雨18分/2時間の環境下に暴露する暴露試験を行った。暴露前及び曝露1000時間後の塗膜の光沢を測定し、光沢保持率を求めた。また、暴露1000時間後の塗膜表面の水の接触角を上記「2.」の方法で測定した。なお、外観については目視で評価した。
基材上に複層塗膜が形成された試験板を一般道路(トラック通行量500〜1000台/日程度)に面したフェンスに3ケ月間張りつけた後、汚染の度合いを目視にて評価した。
下塗り用の重合体エマルジョン100質量部に対して、エチレングリコールモノブチルエーテル4質量部、エチレングリコールモノ2−エチルヘキシルエーテル4質量部を配合して、下塗り用コーティング組成物(I)を得た。得られたコーティング組成物(I)をワイヤーコーターNo.50を用いて基材としての硫酸アルマイト板に塗布し、室温で14日間乾燥させて、下塗り層を形成させた。
重合体エマルジョン粒子(A)の合成
撹拌機、還流冷却器、滴下槽および温度計を取り付けた反応容器にイオン交換水290質量部、エチレン性不飽和単量体と共重合可能な二重結合を分子中に持つスルホコハク酸ジエステルアンモニウム塩(製品名:ラテムルS−180A、花王(株)製)の20質量%水溶液10質量部を投入し、反応容器中の温度を80℃に上げた。次いで、過硫酸アンモニウムの2質量%水溶液を10質量部添加し、その5分後に、メタクリル酸メチル25質量部、メタクリル酸シクロヘキシル50質量部、アクリル酸ブチル15質量部、メタクリル酸5質量部、メタクリル酸2−ヒドロキシエチル10質量部、ラテムルS−180Aの20質量%水溶液5質量部、過硫酸アンモニウムの2質量%水溶液15質量部及びイオン交換水48質量部からなる乳化混合液を滴下槽より40分かけて流入させた。流入中は反応容器の温度を80℃に保った。さらに、流入が終了してからも反応容器の温度を80℃にして30分保った。
撹拌機、還流冷却器、滴下槽および温度計を取り付けた反応容器にイオン交換水290質量部、ラテムルS−180Aの20質量%水溶液質量10部を投入し、反応容器中の温度を80℃に上げた。次いで、過硫酸アンモニウムの2質量%水溶液を10質量部添加し、その5分後に、メタクリル酸メチル25質量部、メタクリル酸シクロヘキシル50質量部、アクリル酸ブチル15質量部、メタクリル酸5質量部、メタクリル酸2−ヒドロキシエチル10質量部、ラテムルS−180Aの20質量%水溶液5質量部、過硫酸アンモニウムの2質量%水溶液15質量部、及びイオン交換水48質量部からなる乳化混合液を、滴下槽より40分かけて流入させた。流入中は反応容器の温度を80℃に保った。さらに、流入が終了してからも反応容器の温度を80℃にして30分保った。
撹拌機、還流冷却器、滴下槽および温度計を取り付けた反応容器にイオン交換水290質量部、ラテムルS−180Aの20質量%水溶液10質量部を投入し、反応容器中の温度を80℃に上げた。次いで、過硫酸アンモニウムの2質量%水溶液を10質量部添加し、その5分後に、メタクリル酸メチル25質量部、メタクリル酸シクロヘキシル50質量部、アクリル酸ブチル15質量部、メタクリル酸5質量部、メタクリル酸2−ヒドロキシエチル10質量部、ラテムルS−180Aの20質量%水溶液5質量部、過硫酸アンモニウムの2質量%水溶液15質量部、及び美イオン交換水48質量部からなる乳化混合液を、滴下槽より40分かけて流入させた。流入中は反応容器の温度を80℃に保った。さらに、流入が終了してからも反応容器の温度を80℃にして30分保った。
撹拌機、還流冷却器、滴下槽および温度計を取り付けた反応容器にイオン交換水290質量部、ラテムルS−180Aの20質量%水溶液10質量部を投入し、反応容器中の温度を80℃に上げた。次いで、過硫酸アンモニウムの2質量%水溶液を10質量部添加し、その5分後に、メタクリル酸メチル25質量部、メタクリル酸シクロヘキシル50質量部、アクリル酸ブチル15質量部、メタクリル酸5質量部、メタクリル酸2−ヒドロキシエチル10質量部、ラテムルS−180Aの20質量%水溶液5質量部、過硫酸アンモニウムの2質量%水溶液15質量部、及びイオン交換水48質量部からなる乳化混合液を、滴下槽より40分かけて流入させた。流入中は反応容器の温度を80℃に保った。さらに、流入が終了してから反応容器の温度を80℃にして30分保った。
撹拌機、還流冷却器、滴下槽および温度計を取り付けた反応容器にイオン交換水290質量部、ラテムルS−180Aの20質量%水溶液10質量部を投入し、反応容器中の温度を80℃に上げた。次いで、過硫酸アンモニウムの2質量%水溶液を10質量部添加し、その5分後に、メタクリル酸メチル25質量部、メタクリル酸シクロヘキシル50質量部、アクリル酸ブチル15質量部、メタクリル酸5質量部、メタクリル酸2−ヒドロキシエチル10質量部、ラテムルS−180Aの20質量%水溶液5質量部、過硫酸アンモニウムの2質量%水溶液15質量部、及びイオン交換水48質量部からなる乳化混合液を、滴下槽より40分かけて流入させた。流入中は反応容器の温度を80℃に保った。さらに、流入が終了してから反応容器の温度を80℃にして30分保った。
(合成例C1)
還流冷却器、滴下槽、温度計および撹拌装置を有する反応器に、イオン交換水1600質量部、ドデシルベンゼンスルホン酸2質量部を投入した後、撹拌下で温度を80℃に加温した。そこに、アクリル酸ブチル86質量部、フェニルトリメトキシシラン133質量部及び3−メタクリロキシプロピルトリメトキシシラン1.3質量部の混合液と、ジエチルアクリルアミド137質量部、アクリル酸3質量部、反応性乳化剤(商品名「アデカリアソープSR−1025」、旭電化(株)製、25質量%水溶液)13質量部、過硫酸アンモニウムの2質量%水溶液40質量部及びイオン交換水1200質量部の混合液とを、反応容器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに反応容器中の温度が80℃の状態で約2時間撹拌を続行した。その後、反応液を室温まで冷却し、100メッシュの金網で濾過した。濾液をイオン交換水で固形分濃度10.0質量%に調整して、数平均粒子径100nmの重合体エマルジョン粒子C1を含有する重合体エマルジョンを得た。
還流冷却器、滴下槽、温度計および撹拌装置を有する反応器に、イオン交換水1000質量部、ドデシルベンゼンスルホン酸2質量部を投入した後、撹拌下で温度を80℃に加温した。そこに、アクリル酸ブチル86質量部、フェニルトリメトキシシラン133質量部及び3−メタクリロキシプロピルトリメトキシシラン1.3質量部の混合液と、ジエチルアクリルアミド25質量部、アクリル酸3質量部、アデカリアソープSR−1025の25質量%水溶液13質量部、過硫酸アンモニウムの2質量%水溶液40質量部及びイオン交換水800質量部の混合液とを、反応容器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに反応容器中の温度が80℃の状態で約2時間撹拌を続行した。その後、反応液を室温まで冷却し、100メッシュの金網で濾過した。濾液をイオン交換水で固形分濃度10.0質量%に調整して、数平均粒子径105nmの重合体エマルジョン粒子C2を含有する重合体エマルジョンを得た。
還流冷却器、滴下槽、温度計および撹拌装置を有する反応器に、イオン交換水1600質量部、ドデシルベンゼンスルホン酸2質量部を投入した後、撹拌下で温度を80℃に加温した。そこに、アクリル酸ブチル86質量部、メタクリル酸2−ヒドロキシエチル2質量部、フェニルトリメトキシシラン133質量部及び3−メタクリロキシプロピルトリメトキシシラン1.3質量部の混合液と、N−イソプロピルアクリルアミド137質量部、アクリル酸2質量部、アデカリアソープSR−1025の25質量%水溶液13質量部、過硫酸アンモニウムの2質量%水溶液40質量部及びイオン交換水1200質量部の混合液とを、反応容器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに反応容器中の温度が80℃の状態で約2時間撹拌を続行した。その後、反応液を室温まで冷却し、100メッシュの金網で濾過した。濾液をイオン交換水で固形分濃度10.0質量%に調整して、数平均粒子径110nmの重合体エマルジョン粒子C3を含有する重合体エマルジョンを得た。
還流冷却器、滴下槽、温度計および撹拌装置を有する反応器に、イオン交換水1600質量部、ドデシルベンゼンスルホン酸2質量部を投入した後、撹拌下で温度を80℃に加温した。そこに、アクリル酸ブチル86質量部及びフェニルトリメトキシシラン133質量部の混合液と、ジエチルアクリルアミド137質量部、アクリル酸3質量部、アデカリアソープSR−1025の25質量%水溶液13質量部、過硫酸アンモニウムの2質量%水溶液40質量部及びイオン交換水1200質量部の混合液とを、反応容器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに反応容器中の温度が80℃の状態で約2時間撹拌を続行した。その後、反応液を室温まで冷却し、100メッシュの金網で濾過した。濾液をイオン交換水で固形分濃度10.0質量%に調整して、数平均粒子径122nmの重合体エマルジョン粒子C4を含有する重合体エマルジョンを得た。
還流冷却器、滴下槽、温度計および撹拌装置を有する反応器に、イオン交換水1600質量部、ドデシルベンゼンスルホン酸4質量部を投入した後、撹拌下で温度を80℃に加温した。そこに、ジメチルジメトキシシラン185質量部及びフェニルトリメトキシシラン117質量部の混合液を反応容器中の温度を80℃に保った状態で約2時間かけて滴下し、その後、反応容器中の温度が80℃の状態で約1時間撹拌を続行した。次にアクリル酸ブチル86質量部、フェニルトリメトキシシラン133質量部及び3−メタクリロキシプロピルトリメトキシシラン1.3質量部の混合液と、ジエチルアクリルアミド137質量部、アクリル酸3質量部、アデカリアソープSR−1025の25質量%水溶液13質量部、過硫酸アンモニウムの2質量%水溶液40質量部及びイオン交換水1900質量部の混合液とを、反応容器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに反応容器中の温度が80℃の状態で約2時間撹拌を続行した後、反応液を室温まで冷却し、100メッシュの金網で濾過した。濾液をイオン交換水で固形分濃度10.0質量%に調整し、数平均粒子径130nmの重合体エマルジョン粒子C5を含有する重合体エマルジョンを得た。
還流冷却器、滴下槽、温度計および撹拌装置を有する反応器に、イオン交換水1000質量部、ドデシルベンゼンスルホン酸2質量部を投入した後、撹拌下で温度を80℃に加温した。そこに、アクリル酸ブチル86質量部、ジエチルアクリルアミド137質量部、アクリル酸3質量部、アデカリアソープSR−1025の25質量%水溶液13質量部、過硫酸アンモニウムの2質量%水溶液40質量部及びイオン交換水500質量部の混合液を、反応容器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに反応容器中の温度が80℃の状態で約2時間撹拌を続行した後、反応液を室温まで冷却し、100メッシュの金網で濾過した。濾液をイオン交換水で固形濃度10.0質量%に調整し、数平均粒子径85nmの重合体エマルジョン粒子C6を含有する重合体エマルジョンを得た。
還流冷却器、滴下槽、温度計および撹拌装置を有する反応器に、イオン交換水1600質量部、ドデシルベンゼンスルホン酸2質量部を投入した後、撹拌下で温度を80℃に加温した。そこに、アクリル酸ブチル86質量部、フェニルトリメトキシシラン133質量部、3−メタクリロキシプロピルトリメトキシシラン1.3質量部、メタクリル酸メチル137質量部、アクリル酸3質量部、アデカリアソープSR−1025の25質量%水溶液13質量部、過硫酸アンモニウムの2質量%水溶液40質量部及びイオン交換水1200質量部の混合液を、反応容器中の温度を80℃に保った状態で約2時間かけて同時に滴下した。さらに反応容器中の温度が80℃の状態で約2時間撹拌を続行した後、反応液を室温まで冷却し、100メッシュの金網で濾過した。濾液をイオン交換水で固形濃度10.0質量%に調整し、数平均粒子径107nmの重合体エマルジョン粒子C7を含有する重合体エマルジョンを得た。
合成例C1で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカ(商品名「スノーテックスO」、日産化学工業(株)製、固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾル(商品名「MPT−422」、石原産業(株)製、固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C5で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C1で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C5で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C1で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C1で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C2で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C3で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C4で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)3.75質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C7で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C1で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C6で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部、及び数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
合成例C1で得た重合体エマルジョン40質量部に数平均粒子径12nmの水分散コロイダルシリカのスノーテックスO(固形分20質量%)16質量部を配合し、攪拌して、上塗りコーティング組成物を得た。
合成例C1で得た重合体エマルジョン40質量部に数平均粒子径10nmのシリカ被覆酸化チタンヒドロゾルMPT−422(固形分20質量%)2.5質量部を混合し、攪拌して、上塗りコーティング組成物を得た。
Claims (5)
- 下塗り層と、該下塗り層上に設けられた上塗り層と、を備え、
前記下塗り層が、水及び乳化剤の存在下でビニル単量体及び加水分解性珪素化合物をそれぞれ重合させる工程を含む方法によって得られる重合体エマルジョン粒子(A)を含有する下塗り用コーティング組成物(I)の塗膜を乾燥して形成される膜であり、
前記上塗り層が、光触媒活性を有する金属酸化物粒子(B)と、水及び乳化剤の存在下でビニル単量体及び加水分解性珪素化合物をそれぞれ重合させる工程を含む方法によって得られる重合体エマルジョン粒子(C)と、コロイダルシリカ(D)と、を含有する上塗り用コーティング組成物(II)の塗膜を乾燥して形成される膜である、
複層塗膜。 - 前記重合体エマルジョン粒子(A)が、水及び乳化剤の存在下でビニル単量体及び加水分解性珪素化合物をビニル単量体/加水分解性珪素化合物=95/5〜50/50の質量比でそれぞれ重合させる工程を含む方法によって得られる、請求項1に記載の複層塗膜。
- 前記下塗り用コーティング組成物(I)が、紫外線吸収剤及び/又は光安定剤を更に含有する、請求項1又は2記載の複層塗膜。
- 前記重合体エマルジョン粒子(C)がコア/シェル構造を有する、請求項1〜3のいずれか一項に記載の複層塗膜。
- 前記重合体エマルジョン粒子(C)が、水及び乳化剤の存在下で、2級アミド基及び/又は3級アミド基を有するアミド基含有ビニル単量体を含むビニル単量体及び加水分解性珪素化合物をそれぞれ重合させる工程を含む方法によって得られ、
前記アミド基含有ビニル単量体と前記重合体エマルジョン粒子(C)との質量比が、前記アミド基含有ビニル単量体/前記重合体エマルジョン粒子(C)=10/90〜70/30である、請求項1〜4のいずれか一項に記載の複層塗膜。
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