JP2010001543A5 - - Google Patents

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Publication number
JP2010001543A5
JP2010001543A5 JP2008162725A JP2008162725A JP2010001543A5 JP 2010001543 A5 JP2010001543 A5 JP 2010001543A5 JP 2008162725 A JP2008162725 A JP 2008162725A JP 2008162725 A JP2008162725 A JP 2008162725A JP 2010001543 A5 JP2010001543 A5 JP 2010001543A5
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JP
Japan
Prior art keywords
resin
copper film
copper
layer
resin layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008162725A
Other languages
English (en)
Japanese (ja)
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JP2010001543A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008162725A priority Critical patent/JP2010001543A/ja
Priority claimed from JP2008162725A external-priority patent/JP2010001543A/ja
Publication of JP2010001543A publication Critical patent/JP2010001543A/ja
Publication of JP2010001543A5 publication Critical patent/JP2010001543A5/ja
Pending legal-status Critical Current

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JP2008162725A 2008-06-23 2008-06-23 銅膜形成方法及び配線基板 Pending JP2010001543A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008162725A JP2010001543A (ja) 2008-06-23 2008-06-23 銅膜形成方法及び配線基板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008162725A JP2010001543A (ja) 2008-06-23 2008-06-23 銅膜形成方法及び配線基板

Publications (2)

Publication Number Publication Date
JP2010001543A JP2010001543A (ja) 2010-01-07
JP2010001543A5 true JP2010001543A5 (enExample) 2011-05-12

Family

ID=41583485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008162725A Pending JP2010001543A (ja) 2008-06-23 2008-06-23 銅膜形成方法及び配線基板

Country Status (1)

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JP (1) JP2010001543A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5721254B2 (ja) * 2010-09-17 2015-05-20 国立大学法人大阪大学 誘電体基材表面の触媒フリー金属化方法及び金属膜付き誘電体基材
US20180315680A1 (en) * 2015-11-11 2018-11-01 Nhk Spring Co., Ltd. Laminate and method of manufacturing laminate
CN109479375B (zh) * 2016-12-02 2022-05-06 株式会社爱发科 布线基板的加工方法
KR101842447B1 (ko) * 2017-04-06 2018-05-14 주식회사 피엔에스테크놀로지 저온경화형 폴리이미드 전구체 조성물
EP4276880B1 (fr) * 2022-05-10 2025-02-19 Rubattel et Weyermann S.A. Procédé de modification de l état de surface d'une pièce par bombardement ionique

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006057059A (ja) * 2004-08-23 2006-03-02 Fuji Photo Film Co Ltd 表面導電性材料の製造方法
JP2007150221A (ja) * 2005-10-27 2007-06-14 Fujitsu Ltd 多層回路基板およびその製造方法
JP4825578B2 (ja) * 2006-05-15 2011-11-30 新光電気工業株式会社 無電解めっき方法

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