JP2010000500A - フレキシブルキャリア上に堆積された金属膜から彫刻欠陥を除去する方法 - Google Patents
フレキシブルキャリア上に堆積された金属膜から彫刻欠陥を除去する方法 Download PDFInfo
- Publication number
- JP2010000500A JP2010000500A JP2009128145A JP2009128145A JP2010000500A JP 2010000500 A JP2010000500 A JP 2010000500A JP 2009128145 A JP2009128145 A JP 2009128145A JP 2009128145 A JP2009128145 A JP 2009128145A JP 2010000500 A JP2010000500 A JP 2010000500A
- Authority
- JP
- Japan
- Prior art keywords
- metal film
- flexible carrier
- engraving
- liquid
- psi
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/07—Electric details
- H05K2201/0753—Insulation
- H05K2201/0761—Insulation resistance, e.g. of the surface of the PCB between the conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0346—Deburring, rounding, bevelling or smoothing conductor edges
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/027—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed by irradiation, e.g. by photons, alpha or beta particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T83/00—Cutting
- Y10T83/04—Processes
- Y10T83/0591—Cutting by direct application of fluent pressure to work
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Drying Of Semiconductors (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- ing And Chemical Polishing (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
【解決手段】本発明は、フレキシブルキャリア上に堆積された金属膜からマスク投影レーザーアブレーション彫刻欠陥を除去する方法に関する。本発明によると、前記方法は、約1500PSIから約3000PSIの間で加圧された液体を前記欠陥上に噴霧することを含む。
【選択図】なし
Description
Claims (9)
- フレキシブルキャリア上に堆積された金属膜からマスク投影レーザーアブレーション彫刻欠陥を除去する方法であって、約1500PSIから約3000PSIの間で加圧された液体を前記欠陥に噴霧することを含む方法。
- 前記液体が前記金属膜に対して30°以上の角度で噴霧されることを特徴とする、請求項1に記載の方法。
- 前記液体が前記金属膜に対して実質的に垂直に噴霧されることを特徴とする、請求項2に記載の方法。
- 噴霧される前記液体が脱イオン水であることを特徴とする、請求項1に記載の方法。
- 前記脱イオン水が使用される前に再イオン化されることを特徴とする、請求項4に記載の方法。
- 前記液体が、前記金属膜に対して回転及び往復運動して噴霧されることを特徴とする、請求項1に記載の方法。
- 前記金属膜が蒸着によって前記フレキシブルキャリア上に堆積された場合に、前記液体の圧力が約1800PSI未満であることを特徴とする、請求項1に記載の方法。
- 前記フレキシブルキャリアがプラスチック材料から成ることを特徴とする請求項1に記載の方法。
- 前記フレキシブルキャリアがPEN(ポリエチレンナフタレート)、PET(ポリエチレンテレフタレート)及びポリイミドを含む群から選択される材料から成ることを特徴とする、請求項8に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0854142 | 2008-06-23 | ||
FR0854142A FR2932899B1 (fr) | 2008-06-23 | 2008-06-23 | Procede d'elimination de defaut de gravure d'une couche metallique deposee sur un support souple. |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010000500A true JP2010000500A (ja) | 2010-01-07 |
JP5711875B2 JP5711875B2 (ja) | 2015-05-07 |
Family
ID=40297678
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009128145A Expired - Fee Related JP5711875B2 (ja) | 2008-06-23 | 2009-05-27 | フレキシブル基板上に堆積された金属膜から彫刻欠陥を除去する方法 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090314145A1 (ja) |
EP (1) | EP2139305B1 (ja) |
JP (1) | JP5711875B2 (ja) |
FR (1) | FR2932899B1 (ja) |
Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02139199A (ja) * | 1988-11-15 | 1990-05-29 | Nec Corp | バリ取り方法 |
JPH0496238A (ja) * | 1990-08-03 | 1992-03-27 | Mitsui Petrochem Ind Ltd | 半導体装置の製造方法 |
JP2003037351A (ja) * | 2001-07-24 | 2003-02-07 | Kinzoku Kagaku Kogyo Kk | プリント配線板の穴壁洗浄方法及び装置 |
JP2003318519A (ja) * | 2002-04-24 | 2003-11-07 | Ube Ind Ltd | フレキシブル両面基板およびビアめっきの前処理方法 |
JP2004037866A (ja) * | 2002-07-03 | 2004-02-05 | Asahi Kasei Corp | 印刷版の製造方法 |
JP2005101304A (ja) * | 2003-09-25 | 2005-04-14 | Kyocera Corp | 配線基板の製造方法 |
JP2005268797A (ja) * | 2004-03-17 | 2005-09-29 | Samsung Electronics Co Ltd | テープ配線基板の製造方法 |
JP2005294323A (ja) * | 2004-03-31 | 2005-10-20 | Ngk Spark Plug Co Ltd | 配線基板の製造方法 |
JP2007013049A (ja) * | 2005-07-04 | 2007-01-18 | Sharp Corp | フレキシブル回路およびこれを利用した電子装置 |
JP2007073768A (ja) * | 2005-09-07 | 2007-03-22 | Shin Etsu Handotai Co Ltd | 貼り合わせsoiウェーハの製造方法 |
JP2008004880A (ja) * | 2006-06-26 | 2008-01-10 | Mitsubishi Electric Corp | 半導体装置の製造方法及び半導体装置の製造装置 |
JP2008501531A (ja) * | 2004-06-11 | 2008-01-24 | エキシテック リミテッド | アブレーション方法及び装置 |
JP2008073768A (ja) * | 2006-08-25 | 2008-04-03 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
Family Cites Families (12)
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US4017571A (en) * | 1971-04-05 | 1977-04-12 | Chemotronics International, Inc. | Method of producing three dimensional skeletal structures |
DE3315223A1 (de) * | 1983-04-27 | 1984-10-31 | Driam Metallprodukt Gmbh & Co Kg, 7991 Eriskirch | Beschichtungsvorrichtung und dieser zugeordnete reinigungsvorrichtung |
US4673443A (en) * | 1985-03-18 | 1987-06-16 | Motorola, Inc. | Continuous ionizer for semiconductor manufacturing processes |
EP0445728B1 (en) * | 1990-03-07 | 1994-06-08 | Hitachi, Ltd. | Apparatus and method for cleaning solid surface |
US5364474A (en) * | 1993-07-23 | 1994-11-15 | Williford Jr John F | Method for removing particulate matter |
US5575705A (en) * | 1993-08-12 | 1996-11-19 | Church & Dwight Co., Inc. | Slurry blasting process |
US5593339A (en) * | 1993-08-12 | 1997-01-14 | Church & Dwight Co., Inc. | Slurry cleaning process |
US5384990A (en) * | 1993-08-12 | 1995-01-31 | Church & Dwight Co., Inc. | Water blasting process |
US6062084A (en) * | 1999-01-29 | 2000-05-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for detecting wafer edge defects and method of using |
US6612319B1 (en) * | 2000-08-08 | 2003-09-02 | Advanced Micro Devices, Inc, | Low defect EBR nozzle |
EP1321625B1 (en) * | 2001-12-21 | 2004-09-22 | Siemens Aktiengesellschaft | Method for removing a metallic layer |
US20070085989A1 (en) * | 2005-06-21 | 2007-04-19 | Nikon Corporation | Exposure apparatus and exposure method, maintenance method, and device manufacturing method |
-
2008
- 2008-06-23 FR FR0854142A patent/FR2932899B1/fr not_active Expired - Fee Related
-
2009
- 2009-05-21 US US12/470,135 patent/US20090314145A1/en not_active Abandoned
- 2009-05-26 EP EP09305478.1A patent/EP2139305B1/fr not_active Not-in-force
- 2009-05-27 JP JP2009128145A patent/JP5711875B2/ja not_active Expired - Fee Related
Patent Citations (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02139199A (ja) * | 1988-11-15 | 1990-05-29 | Nec Corp | バリ取り方法 |
JPH0496238A (ja) * | 1990-08-03 | 1992-03-27 | Mitsui Petrochem Ind Ltd | 半導体装置の製造方法 |
JP2003037351A (ja) * | 2001-07-24 | 2003-02-07 | Kinzoku Kagaku Kogyo Kk | プリント配線板の穴壁洗浄方法及び装置 |
JP2003318519A (ja) * | 2002-04-24 | 2003-11-07 | Ube Ind Ltd | フレキシブル両面基板およびビアめっきの前処理方法 |
JP2004037866A (ja) * | 2002-07-03 | 2004-02-05 | Asahi Kasei Corp | 印刷版の製造方法 |
JP2005101304A (ja) * | 2003-09-25 | 2005-04-14 | Kyocera Corp | 配線基板の製造方法 |
JP2005268797A (ja) * | 2004-03-17 | 2005-09-29 | Samsung Electronics Co Ltd | テープ配線基板の製造方法 |
JP2005294323A (ja) * | 2004-03-31 | 2005-10-20 | Ngk Spark Plug Co Ltd | 配線基板の製造方法 |
JP2008501531A (ja) * | 2004-06-11 | 2008-01-24 | エキシテック リミテッド | アブレーション方法及び装置 |
JP2007013049A (ja) * | 2005-07-04 | 2007-01-18 | Sharp Corp | フレキシブル回路およびこれを利用した電子装置 |
JP2007073768A (ja) * | 2005-09-07 | 2007-03-22 | Shin Etsu Handotai Co Ltd | 貼り合わせsoiウェーハの製造方法 |
JP2008004880A (ja) * | 2006-06-26 | 2008-01-10 | Mitsubishi Electric Corp | 半導体装置の製造方法及び半導体装置の製造装置 |
JP2008073768A (ja) * | 2006-08-25 | 2008-04-03 | Semiconductor Energy Lab Co Ltd | 半導体装置の作製方法 |
Also Published As
Publication number | Publication date |
---|---|
FR2932899B1 (fr) | 2010-07-30 |
US20090314145A1 (en) | 2009-12-24 |
EP2139305B1 (fr) | 2013-09-04 |
JP5711875B2 (ja) | 2015-05-07 |
EP2139305A1 (fr) | 2009-12-30 |
FR2932899A1 (fr) | 2009-12-25 |
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