JP2009545651A - 低屈折率組成物 - Google Patents

低屈折率組成物 Download PDF

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Publication number
JP2009545651A
JP2009545651A JP2009522886A JP2009522886A JP2009545651A JP 2009545651 A JP2009545651 A JP 2009545651A JP 2009522886 A JP2009522886 A JP 2009522886A JP 2009522886 A JP2009522886 A JP 2009522886A JP 2009545651 A JP2009545651 A JP 2009545651A
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JP
Japan
Prior art keywords
nanosilica particles
solid
coating
oxysilane
particles
Prior art date
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Pending
Application number
JP2009522886A
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English (en)
Japanese (ja)
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JP2009545651A5 (enExample
Inventor
コスタンティノス・コウルタキス
マーク・アール・マッキーヴァー
ポール・グレゴリー・ベキアリアン
シェクハル・スブラモネイ
マリア・ペトルーチ−サミジャ
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EIDP Inc
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EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2009545651A publication Critical patent/JP2009545651A/ja
Publication of JP2009545651A5 publication Critical patent/JP2009545651A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C08K7/26—Silicon- containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/111—Anti-reflection coatings using layers comprising organic materials
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J3/00—Processes of treating or compounding macromolecular substances
    • C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/0427—Coating with only one layer of a composition containing a polymer binder
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/043—Improving the adhesiveness of the coatings per se, e.g. forming primers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2427/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Derivatives of such polymers

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Paints Or Removers (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Laminated Bodies (AREA)
JP2009522886A 2006-08-04 2007-08-03 低屈折率組成物 Pending JP2009545651A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US83582606P 2006-08-04 2006-08-04
PCT/US2007/017361 WO2008019077A1 (en) 2006-08-04 2007-08-03 Low refractive index composition

Publications (2)

Publication Number Publication Date
JP2009545651A true JP2009545651A (ja) 2009-12-24
JP2009545651A5 JP2009545651A5 (enExample) 2010-09-16

Family

ID=38754481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009522886A Pending JP2009545651A (ja) 2006-08-04 2007-08-03 低屈折率組成物

Country Status (6)

Country Link
US (1) US20080032053A1 (enExample)
JP (1) JP2009545651A (enExample)
KR (1) KR20090046873A (enExample)
CN (1) CN101501130A (enExample)
TW (1) TW200833763A (enExample)
WO (1) WO2008019077A1 (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010217699A (ja) * 2009-03-18 2010-09-30 Konica Minolta Opto Inc 反射防止層用組成物、反射防止フィルム、偏光板、および画像表示装置
JP2012096400A (ja) * 2010-10-29 2012-05-24 Jgc Catalysts & Chemicals Ltd 透明被膜付基材および透明被膜形成用塗布液
JP2017199036A (ja) * 2017-08-10 2017-11-02 日立マクセル株式会社 反射防止膜及びそれを備えた光学部材
JP2018536886A (ja) * 2016-02-19 2018-12-13 エルジー・ケム・リミテッド 低屈折層形成用光硬化性コーティング組成物
JP2019144579A (ja) * 2015-11-04 2019-08-29 エルジー・ケム・リミテッド 反射防止フィルム及びその製造方法
US10627547B2 (en) 2016-03-09 2020-04-21 Lg Chem, Ltd. Anti-reflective film

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009073441A1 (en) * 2007-11-30 2009-06-11 E. I. Du Pont De Nemours And Company Low refractive index composition, abrasion resistant anti-reflective coating, and method for forming abrasion resistant anti-reflective coating
EP2105465A1 (en) * 2008-03-27 2009-09-30 Greene, Tweed Of Delaware, Inc. Inert Substrate-Bonded Perfluoroelastomer Components and Related Methods
US8273173B2 (en) * 2008-09-22 2012-09-25 Intevep, S.A. Nano-additive for hydrocarbon well cementing operations
CA2738636A1 (en) * 2008-09-26 2010-04-01 Exxonmobil Oil Corporation Films having low density and low haze
US8092905B2 (en) * 2008-10-10 2012-01-10 E.I Du Pont De Nemours And Company Compositions containing multifunctional nanoparticles
CN101941001B (zh) * 2009-07-03 2014-04-02 3M创新有限公司 亲水涂层、制品、涂料组合物和方法
KR101594183B1 (ko) * 2009-10-12 2016-02-26 동우 화인켐 주식회사 저굴절층 형성용 조성물, 이를 이용한 반사 방지 필름, 이를 포함하는 편광판 및 표시 장치
JP5433372B2 (ja) * 2009-10-20 2014-03-05 フクビ化学工業株式会社 反射防止強化ガラスの製造方法
CN102241899B (zh) * 2010-05-11 2014-05-14 3M创新有限公司 涂料组合物，改性基体表面的方法和制品
JP2013539072A (ja) * 2010-09-16 2013-10-17 エルジー・ケム・リミテッド 感光性樹脂組成物、ドライフィルムソルダーレジスト及び回路基板
CN102634277A (zh) * 2011-02-14 2012-08-15 住龙纳米技术材料(深圳)有限公司 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜
TW201400562A (zh) * 2012-04-05 2014-01-01 Daikin Ind Ltd 具有含氟矽烷系塗覆層之物品的製造方法
KR101440951B1 (ko) * 2012-07-12 2014-09-17 경희대학교 산학협력단 투명 루미네선스성 필름 구조체 및 그의 제조방법
CN103146343B (zh) * 2013-02-22 2015-12-02 华建耐尔特（北京）低碳科技有限公司 一种节能抗热辐射的空气包覆阻断粘接涂料及其制备方法、使用方法
CN103305116B (zh) * 2013-06-17 2015-09-30 武汉绿凯科技有限公司 一种光固化増透膜镀膜液及其制备方法与应用
JP2016087561A (ja) * 2014-11-06 2016-05-23 富士フイルム株式会社 水性塗布液、膜及びその製造方法、積層体、並びに太陽電池モジュール
CN104951133A (zh) * 2015-06-18 2015-09-30 无锡启晖光电科技有限公司 一种触摸屏增透防污膜
KR102294715B1 (ko) * 2016-01-13 2021-08-26 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
WO2017142291A1 (ko) * 2016-02-19 2017-08-24 주식회사 엘지화학 저굴절층 형성용 광경화성 코팅 조성물
WO2017155338A1 (ko) * 2016-03-09 2017-09-14 주식회사 엘지화학 반사 방지 필름
WO2017155335A1 (ko) * 2016-03-09 2017-09-14 주식회사 엘지화학 반사 방지 필름
KR101973195B1 (ko) 2016-03-11 2019-04-26 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
WO2017155358A1 (ko) * 2016-03-11 2017-09-14 주식회사 엘지화학 반사 방지 필름 및 이의 제조 방법
CN110632686B (zh) * 2016-07-14 2021-10-29 株式会社Lg化学 防反射膜
KR101991928B1 (ko) 2017-04-28 2019-06-21 주식회사 엘지화학 반사 방지 필름
KR102376545B1 (ko) * 2017-08-01 2022-03-21 삼성디스플레이 주식회사 플렉시블 디스플레이 윈도우
KR102594548B1 (ko) * 2019-01-02 2023-10-27 삼성디스플레이 주식회사 윈도우, 윈도우의 제조 방법 및 윈도우를 포함하는 표시 장치
US12234389B2 (en) 2019-10-03 2025-02-25 3M Innovative Properties Company Silicone elastomers by free radical mediated cure
CN112480516B (zh) * 2020-12-02 2023-06-16 上海朗亿功能材料有限公司 一种透明防雾树脂、塑料制品及其制备方法

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JP2005227472A (ja) * 2004-02-12 2005-08-25 Fuji Photo Film Co Ltd 偏光板、液晶表示素子、及びそれを用いた液晶表示装置
JP2005283872A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置
JP2006117924A (ja) * 2004-09-22 2006-05-11 Fuji Photo Film Co Ltd 硬化組成物、反射防止フィルム、その製造方法、偏光板、及び画像表示装置

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JP2005227472A (ja) * 2004-02-12 2005-08-25 Fuji Photo Film Co Ltd 偏光板、液晶表示素子、及びそれを用いた液晶表示装置
JP2005283872A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置
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Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010217699A (ja) * 2009-03-18 2010-09-30 Konica Minolta Opto Inc 反射防止層用組成物、反射防止フィルム、偏光板、および画像表示装置
JP2012096400A (ja) * 2010-10-29 2012-05-24 Jgc Catalysts & Chemicals Ltd 透明被膜付基材および透明被膜形成用塗布液
JP2019144579A (ja) * 2015-11-04 2019-08-29 エルジー・ケム・リミテッド 反射防止フィルム及びその製造方法
US10627548B2 (en) 2015-11-04 2020-04-21 Lg Chem, Ltd. Anti-reflective film and manufacturing method thereof
JP2021076849A (ja) * 2015-11-04 2021-05-20 エルジー・ケム・リミテッド 反射防止フィルム及びその製造方法
US11415726B2 (en) 2015-11-04 2022-08-16 Lg Chem, Ltd. Anti-reflective film and manufacturing method thereof
JP2018536886A (ja) * 2016-02-19 2018-12-13 エルジー・ケム・リミテッド 低屈折層形成用光硬化性コーティング組成物
US10627547B2 (en) 2016-03-09 2020-04-21 Lg Chem, Ltd. Anti-reflective film
US11262481B2 (en) 2016-03-09 2022-03-01 Lg Chem, Ltd. Anti-reflective film
US11275199B2 (en) 2016-03-09 2022-03-15 Lg Chem, Ltd. Anti-reflective film
JP2017199036A (ja) * 2017-08-10 2017-11-02 日立マクセル株式会社 反射防止膜及びそれを備えた光学部材

Also Published As

Publication number Publication date
US20080032053A1 (en) 2008-02-07
TW200833763A (en) 2008-08-16
WO2008019077A1 (en) 2008-02-14
CN101501130A (zh) 2009-08-05
KR20090046873A (ko) 2009-05-11

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