JP2009540506A - 閉じ込め層の製造方法、およびそれを使用して製造されたデバイス - Google Patents

閉じ込め層の製造方法、およびそれを使用して製造されたデバイス Download PDF

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Publication number
JP2009540506A
JP2009540506A JP2009514349A JP2009514349A JP2009540506A JP 2009540506 A JP2009540506 A JP 2009540506A JP 2009514349 A JP2009514349 A JP 2009514349A JP 2009514349 A JP2009514349 A JP 2009514349A JP 2009540506 A JP2009540506 A JP 2009540506A
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JP
Japan
Prior art keywords
layer
intermediate layer
fluorinated
forming
surface energy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009514349A
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English (en)
Japanese (ja)
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JP2009540506A5 (enExample
Inventor
ディヴィッド レクルークス ダニエル
モーリス スミス エリック
エー．ヨハンソン ゲーリー
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2009540506A publication Critical patent/JP2009540506A/ja
Publication of JP2009540506A5 publication Critical patent/JP2009540506A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/17—Passive-matrix OLED displays

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
JP2009514349A 2006-06-05 2007-06-05 閉じ込め層の製造方法、およびそれを使用して製造されたデバイス Pending JP2009540506A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US81093906P 2006-06-05 2006-06-05
PCT/US2007/013286 WO2007145978A1 (en) 2006-06-05 2007-06-05 Process for making contained layers and devices made with same

Publications (2)

Publication Number Publication Date
JP2009540506A true JP2009540506A (ja) 2009-11-19
JP2009540506A5 JP2009540506A5 (enExample) 2011-09-29

Family

ID=38657382

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009514349A Pending JP2009540506A (ja) 2006-06-05 2007-06-05 閉じ込め層の製造方法、およびそれを使用して製造されたデバイス

Country Status (5)

Country Link
US (1) US20080087882A1 (enExample)
EP (1) EP2025017A1 (enExample)
JP (1) JP2009540506A (enExample)
TW (1) TW200849686A (enExample)
WO (1) WO2007145978A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080286487A1 (en) * 2007-05-18 2008-11-20 Lang Charles D Process for making contained layers
KR20100094475A (ko) * 2007-10-26 2010-08-26 이 아이 듀폰 디 네모아 앤드 캄파니 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자
US9525148B2 (en) 2008-04-03 2016-12-20 Qd Vision, Inc. Device including quantum dots
KR101995370B1 (ko) 2008-04-03 2019-07-02 삼성 리서치 아메리카 인코포레이티드 양자점들을 포함하는 발광 소자
EP2459379A4 (en) 2009-07-27 2015-05-06 Du Pont METHOD AND MATERIALS FOR PRODUCING RESTRICTED LAYERS AND DEVICES MADE THEREFOR
KR101728575B1 (ko) 2009-10-07 2017-04-19 큐디 비젼, 인크. 양자점을 포함하는 소자

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002148821A (ja) * 2000-11-14 2002-05-22 Shin Etsu Chem Co Ltd レジスト表面処理剤組成物及びパターン形成方法
WO2003011974A1 (en) * 2001-07-26 2003-02-13 Nissan Chemical Industries, Ltd. Polyamic acid resin composition
JP2003045672A (ja) * 2001-07-20 2003-02-14 Osram Opto Semiconductors Gmbh 有機発光デバイスのための構造定義材料
JP2004071286A (ja) * 2002-08-05 2004-03-04 Dainippon Printing Co Ltd エレクトロルミネッセント素子の製造方法
JP2004531598A (ja) * 2001-03-09 2004-10-14 スリーエム イノベイティブ プロパティズ カンパニー パーフルオロアルキル部分を含む撥水撥油性付与エステルオリゴマー
JP2005062356A (ja) * 2003-08-08 2005-03-10 Seiko Epson Corp パターンの形成方法及び配線パターンの形成方法、電気光学装置及び電子機器
WO2005031889A2 (en) * 2003-09-24 2005-04-07 E.I. Dupont De Nemours And Company Method for the application of active materials onto active surfaces and devices made with such methods
JP2005166645A (ja) * 2003-11-14 2005-06-23 Asahi Glass Co Ltd 画像表示素子の隔壁の形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09203803A (ja) * 1996-01-25 1997-08-05 Asahi Glass Co Ltd カラーフィルタの製造方法及びそれを用いた液晶表示素子
US6303238B1 (en) * 1997-12-01 2001-10-16 The Trustees Of Princeton University OLEDs doped with phosphorescent compounds
CA2394886C (en) * 1999-12-21 2012-07-17 Plastic Logic Limited Inkjet-fabricated integrated circuits
US6670645B2 (en) * 2000-06-30 2003-12-30 E. I. Du Pont De Nemours And Company Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds
US7098060B2 (en) * 2002-09-06 2006-08-29 E.I. Du Pont De Nemours And Company Methods for producing full-color organic electroluminescent devices
US7431866B2 (en) * 2002-09-24 2008-10-07 E. I. Du Pont De Nemours And Company Water dispersible polythiophenes made with polymeric acid colloids
CN1681869B (zh) * 2002-09-24 2010-05-26 E.I.内穆尔杜邦公司 用于电子器件用聚合物酸胶体制成的可水分散的聚苯胺
US6992326B1 (en) * 2004-08-03 2006-01-31 Dupont Displays, Inc. Electronic device and process for forming same

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002148821A (ja) * 2000-11-14 2002-05-22 Shin Etsu Chem Co Ltd レジスト表面処理剤組成物及びパターン形成方法
JP2004531598A (ja) * 2001-03-09 2004-10-14 スリーエム イノベイティブ プロパティズ カンパニー パーフルオロアルキル部分を含む撥水撥油性付与エステルオリゴマー
JP2003045672A (ja) * 2001-07-20 2003-02-14 Osram Opto Semiconductors Gmbh 有機発光デバイスのための構造定義材料
WO2003011974A1 (en) * 2001-07-26 2003-02-13 Nissan Chemical Industries, Ltd. Polyamic acid resin composition
JP2004071286A (ja) * 2002-08-05 2004-03-04 Dainippon Printing Co Ltd エレクトロルミネッセント素子の製造方法
JP2005062356A (ja) * 2003-08-08 2005-03-10 Seiko Epson Corp パターンの形成方法及び配線パターンの形成方法、電気光学装置及び電子機器
WO2005031889A2 (en) * 2003-09-24 2005-04-07 E.I. Dupont De Nemours And Company Method for the application of active materials onto active surfaces and devices made with such methods
JP2005166645A (ja) * 2003-11-14 2005-06-23 Asahi Glass Co Ltd 画像表示素子の隔壁の形成方法

Also Published As

Publication number Publication date
US20080087882A1 (en) 2008-04-17
TW200849686A (en) 2008-12-16
WO2007145978A1 (en) 2007-12-21
EP2025017A1 (en) 2009-02-18

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