JP2009540506A - 閉じ込め層の製造方法、およびそれを使用して製造されたデバイス - Google Patents
閉じ込め層の製造方法、およびそれを使用して製造されたデバイス Download PDFInfo
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- JP2009540506A JP2009540506A JP2009514349A JP2009514349A JP2009540506A JP 2009540506 A JP2009540506 A JP 2009540506A JP 2009514349 A JP2009514349 A JP 2009514349A JP 2009514349 A JP2009514349 A JP 2009514349A JP 2009540506 A JP2009540506 A JP 2009540506A
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- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920000553 poly(phenylenevinylene) Polymers 0.000 description 1
- 229920000548 poly(silane) polymer Polymers 0.000 description 1
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 1
- 229920001798 poly[2-(acrylamido)-2-methyl-1-propanesulfonic acid] polymer Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920002098 polyfluorene Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 150000004032 porphyrins Chemical class 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000027756 respiratory electron transport chain Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 1
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical compound FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 238000003631 wet chemical etching Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/17—Passive-matrix OLED displays
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US81093906P | 2006-06-05 | 2006-06-05 | |
| PCT/US2007/013286 WO2007145978A1 (en) | 2006-06-05 | 2007-06-05 | Process for making contained layers and devices made with same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009540506A true JP2009540506A (ja) | 2009-11-19 |
| JP2009540506A5 JP2009540506A5 (enExample) | 2011-09-29 |
Family
ID=38657382
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009514349A Pending JP2009540506A (ja) | 2006-06-05 | 2007-06-05 | 閉じ込め層の製造方法、およびそれを使用して製造されたデバイス |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20080087882A1 (enExample) |
| EP (1) | EP2025017A1 (enExample) |
| JP (1) | JP2009540506A (enExample) |
| TW (1) | TW200849686A (enExample) |
| WO (1) | WO2007145978A1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080286487A1 (en) * | 2007-05-18 | 2008-11-20 | Lang Charles D | Process for making contained layers |
| KR20100094475A (ko) | 2007-10-26 | 2010-08-26 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자 |
| US9525148B2 (en) | 2008-04-03 | 2016-12-20 | Qd Vision, Inc. | Device including quantum dots |
| KR101995371B1 (ko) | 2008-04-03 | 2019-07-02 | 삼성 리서치 아메리카 인코포레이티드 | 양자점들을 포함하는 발광 소자 |
| TW201104357A (en) * | 2009-07-27 | 2011-02-01 | Du Pont | Process and materials for making contained layers and devices made with same |
| KR101728575B1 (ko) | 2009-10-07 | 2017-04-19 | 큐디 비젼, 인크. | 양자점을 포함하는 소자 |
Citations (8)
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|---|---|---|---|---|
| JP2002148821A (ja) * | 2000-11-14 | 2002-05-22 | Shin Etsu Chem Co Ltd | レジスト表面処理剤組成物及びパターン形成方法 |
| WO2003011974A1 (en) * | 2001-07-26 | 2003-02-13 | Nissan Chemical Industries, Ltd. | Polyamic acid resin composition |
| JP2003045672A (ja) * | 2001-07-20 | 2003-02-14 | Osram Opto Semiconductors Gmbh | 有機発光デバイスのための構造定義材料 |
| JP2004071286A (ja) * | 2002-08-05 | 2004-03-04 | Dainippon Printing Co Ltd | エレクトロルミネッセント素子の製造方法 |
| JP2004531598A (ja) * | 2001-03-09 | 2004-10-14 | スリーエム イノベイティブ プロパティズ カンパニー | パーフルオロアルキル部分を含む撥水撥油性付与エステルオリゴマー |
| JP2005062356A (ja) * | 2003-08-08 | 2005-03-10 | Seiko Epson Corp | パターンの形成方法及び配線パターンの形成方法、電気光学装置及び電子機器 |
| WO2005031889A2 (en) * | 2003-09-24 | 2005-04-07 | E.I. Dupont De Nemours And Company | Method for the application of active materials onto active surfaces and devices made with such methods |
| JP2005166645A (ja) * | 2003-11-14 | 2005-06-23 | Asahi Glass Co Ltd | 画像表示素子の隔壁の形成方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09203803A (ja) * | 1996-01-25 | 1997-08-05 | Asahi Glass Co Ltd | カラーフィルタの製造方法及びそれを用いた液晶表示素子 |
| US6303238B1 (en) * | 1997-12-01 | 2001-10-16 | The Trustees Of Princeton University | OLEDs doped with phosphorescent compounds |
| AU2015901A (en) * | 1999-12-21 | 2001-07-03 | Plastic Logic Limited | Inkjet-fabricated integrated circuits |
| US6670645B2 (en) * | 2000-06-30 | 2003-12-30 | E. I. Du Pont De Nemours And Company | Electroluminescent iridium compounds with fluorinated phenylpyridines, phenylpyrimidines, and phenylquinolines and devices made with such compounds |
| US7098060B2 (en) * | 2002-09-06 | 2006-08-29 | E.I. Du Pont De Nemours And Company | Methods for producing full-color organic electroluminescent devices |
| CN1681869B (zh) * | 2002-09-24 | 2010-05-26 | E.I.内穆尔杜邦公司 | 用于电子器件用聚合物酸胶体制成的可水分散的聚苯胺 |
| WO2004029128A2 (en) * | 2002-09-24 | 2004-04-08 | E.I. Du Pont De Nemours And Company | Water dispersible polythiophenes made with polymeric acid colloids |
| US6992326B1 (en) * | 2004-08-03 | 2006-01-31 | Dupont Displays, Inc. | Electronic device and process for forming same |
-
2007
- 2007-06-05 WO PCT/US2007/013286 patent/WO2007145978A1/en not_active Ceased
- 2007-06-05 US US11/758,269 patent/US20080087882A1/en not_active Abandoned
- 2007-06-05 EP EP07795782A patent/EP2025017A1/en not_active Withdrawn
- 2007-06-05 JP JP2009514349A patent/JP2009540506A/ja active Pending
- 2007-06-06 TW TW096120415A patent/TW200849686A/zh unknown
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002148821A (ja) * | 2000-11-14 | 2002-05-22 | Shin Etsu Chem Co Ltd | レジスト表面処理剤組成物及びパターン形成方法 |
| JP2004531598A (ja) * | 2001-03-09 | 2004-10-14 | スリーエム イノベイティブ プロパティズ カンパニー | パーフルオロアルキル部分を含む撥水撥油性付与エステルオリゴマー |
| JP2003045672A (ja) * | 2001-07-20 | 2003-02-14 | Osram Opto Semiconductors Gmbh | 有機発光デバイスのための構造定義材料 |
| WO2003011974A1 (en) * | 2001-07-26 | 2003-02-13 | Nissan Chemical Industries, Ltd. | Polyamic acid resin composition |
| JP2004071286A (ja) * | 2002-08-05 | 2004-03-04 | Dainippon Printing Co Ltd | エレクトロルミネッセント素子の製造方法 |
| JP2005062356A (ja) * | 2003-08-08 | 2005-03-10 | Seiko Epson Corp | パターンの形成方法及び配線パターンの形成方法、電気光学装置及び電子機器 |
| WO2005031889A2 (en) * | 2003-09-24 | 2005-04-07 | E.I. Dupont De Nemours And Company | Method for the application of active materials onto active surfaces and devices made with such methods |
| JP2005166645A (ja) * | 2003-11-14 | 2005-06-23 | Asahi Glass Co Ltd | 画像表示素子の隔壁の形成方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200849686A (en) | 2008-12-16 |
| US20080087882A1 (en) | 2008-04-17 |
| WO2007145978A1 (en) | 2007-12-21 |
| EP2025017A1 (en) | 2009-02-18 |
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