JP2009536883A5 - - Google Patents

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Publication number
JP2009536883A5
JP2009536883A5 JP2009508082A JP2009508082A JP2009536883A5 JP 2009536883 A5 JP2009536883 A5 JP 2009536883A5 JP 2009508082 A JP2009508082 A JP 2009508082A JP 2009508082 A JP2009508082 A JP 2009508082A JP 2009536883 A5 JP2009536883 A5 JP 2009536883A5
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JP
Japan
Prior art keywords
relief
mask
microstructure
surface relief
zone
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JP2009508082A
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English (en)
Japanese (ja)
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JP2009536883A (ja
JP5570210B2 (ja
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Priority claimed from EP06113901A external-priority patent/EP1855127A1/en
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Publication of JP2009536883A publication Critical patent/JP2009536883A/ja
Publication of JP2009536883A5 publication Critical patent/JP2009536883A5/ja
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Publication of JP5570210B2 publication Critical patent/JP5570210B2/ja
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JP2009508082A 2006-05-12 2007-05-07 光学的に有効な表面レリーフ微細構造及びその製造方法 Active JP5570210B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06113901A EP1855127A1 (en) 2006-05-12 2006-05-12 Optically effective surface relief microstructures and method of making them
EP06113901.0 2006-05-12
PCT/CH2007/000227 WO2007131375A1 (en) 2006-05-12 2007-05-07 Optically effective surface relief microstructures and method of making them

Publications (3)

Publication Number Publication Date
JP2009536883A JP2009536883A (ja) 2009-10-22
JP2009536883A5 true JP2009536883A5 (enExample) 2010-06-17
JP5570210B2 JP5570210B2 (ja) 2014-08-13

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JP2009508082A Active JP5570210B2 (ja) 2006-05-12 2007-05-07 光学的に有効な表面レリーフ微細構造及びその製造方法

Country Status (9)

Country Link
US (2) US8840146B2 (enExample)
EP (4) EP1855127A1 (enExample)
JP (1) JP5570210B2 (enExample)
CN (2) CN102495525B (enExample)
BR (1) BRPI0711415B1 (enExample)
ES (1) ES2510515T3 (enExample)
RU (1) RU2428724C2 (enExample)
TW (1) TWI437276B (enExample)
WO (1) WO2007131375A1 (enExample)

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