JP2009528165A5 - - Google Patents

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Publication number
JP2009528165A5
JP2009528165A5 JP2008557485A JP2008557485A JP2009528165A5 JP 2009528165 A5 JP2009528165 A5 JP 2009528165A5 JP 2008557485 A JP2008557485 A JP 2008557485A JP 2008557485 A JP2008557485 A JP 2008557485A JP 2009528165 A5 JP2009528165 A5 JP 2009528165A5
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JP
Japan
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particles
channel
guest
catalytically active
conduit
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JP2008557485A
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JP2009528165A (ja
JP5455004B2 (ja
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Priority claimed from PCT/US2007/062970 external-priority patent/WO2007106664A2/en
Publication of JP2009528165A publication Critical patent/JP2009528165A/ja
Publication of JP2009528165A5 publication Critical patent/JP2009528165A5/ja
Application granted granted Critical
Publication of JP5455004B2 publication Critical patent/JP5455004B2/ja
Expired - Fee Related legal-status Critical Current
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Claims (4)

  1. a) 貫流チャンネルの少なくとも一部を画定する内側表面を有する流体導管、および
    b) 前記内側表面の少なくとも一部に提供され、かつ、金触媒を含む複数個の触媒活性粒子、を含み、前記粒子が前記導管の内側表面に電気力によって付着している、触媒系。
  2. 前記粒子表面がナノ細孔性を備える、請求項に記載の系。
  3. a) 貫流チャンネルの少なくとも一部を画定する内側表面を有する流体導管、および
    b) 前記内側表面の少なくとも一部に提供され、かつ、複数個のゲスト粒子および複数個のホスト粒子を含むゲスト/ホスト構造を有し、触媒が前記ゲスト粒子上に提供される複数個の触媒活性複合粒子、を備え、前記複合粒子が前記導管の内側表面に電気力によって付着している、触媒系。
  4. a) 金触媒を含む複数個の触媒活性粒子を提供する工程、
    b) 貫流チャンネルの少なくとも一部を画定する内側表面を有する流体導管を提供する工程、および
    c) 前記粒子が前記内側表面の少なくとも一部の上に電気力によって付着するようにする工程、を包含する、触媒系の製造方法。
JP2008557485A 2006-02-28 2007-02-28 触媒活性金を用いる低圧力降下の高活性触媒系 Expired - Fee Related JP5455004B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US77785906P 2006-02-28 2006-02-28
US60/777,859 2006-02-28
US77866306P 2006-03-02 2006-03-02
US60/778,663 2006-03-02
PCT/US2007/062970 WO2007106664A2 (en) 2006-02-28 2007-02-28 Low pressure drop, highly active catalyst systems using catalytically active gold

Publications (3)

Publication Number Publication Date
JP2009528165A JP2009528165A (ja) 2009-08-06
JP2009528165A5 true JP2009528165A5 (ja) 2010-04-15
JP5455004B2 JP5455004B2 (ja) 2014-03-26

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008557485A Expired - Fee Related JP5455004B2 (ja) 2006-02-28 2007-02-28 触媒活性金を用いる低圧力降下の高活性触媒系

Country Status (5)

Country Link
US (1) US7955570B2 (ja)
EP (1) EP1988994A2 (ja)
JP (1) JP5455004B2 (ja)
CN (1) CN101394929B (ja)
WO (1) WO2007106664A2 (ja)

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