JP2009524238A - プロービング・システムにおいて位置決めを改良するための方法と装置 - Google Patents

プロービング・システムにおいて位置決めを改良するための方法と装置 Download PDF

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JP2009524238A
JP2009524238A JP2008551252A JP2008551252A JP2009524238A JP 2009524238 A JP2009524238 A JP 2009524238A JP 2008551252 A JP2008551252 A JP 2008551252A JP 2008551252 A JP2008551252 A JP 2008551252A JP 2009524238 A JP2009524238 A JP 2009524238A
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Prior art keywords
sensor
component
coupled
contact
force
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Pending
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JP2008551252A
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Japanese (ja)
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JP2009524238A5 (https=
Inventor
ナヤック，ウダイ
チャン，ショーラン
アスメロン，ジョージ
ジェダ，マックス
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エレクトログラス・インコーポレーテッド
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Publication of JP2009524238A publication Critical patent/JP2009524238A/ja
Publication of JP2009524238A5 publication Critical patent/JP2009524238A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02—General constructional details
    • G01R1/06—Measuring leads; Measuring probes
    • G01R1/067—Measuring probes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28—Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851—Testing of integrated circuits [IC]
    • G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2891—Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26—Testing of individual semiconductor devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Measuring Leads Or Probes (AREA)
  • Tests Of Electronic Circuits (AREA)
JP2008551252A 2006-01-18 2006-10-30 プロービング・システムにおいて位置決めを改良するための方法と装置 Pending JP2009524238A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/335,367 US7368929B2 (en) 2006-01-18 2006-01-18 Methods and apparatuses for improved positioning in a probing system
PCT/US2006/042478 WO2007084206A1 (en) 2006-01-18 2006-10-30 Methods and apparatuses for improved positioning in a probing system

Publications (2)

Publication Number Publication Date
JP2009524238A true JP2009524238A (ja) 2009-06-25
JP2009524238A5 JP2009524238A5 (https=) 2009-12-24

Family

ID=38016442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008551252A Pending JP2009524238A (ja) 2006-01-18 2006-10-30 プロービング・システムにおいて位置決めを改良するための方法と装置

Country Status (6)

Country Link
US (2) US7368929B2 (https=)
JP (1) JP2009524238A (https=)
KR (1) KR101347767B1 (https=)
CN (1) CN101297206A (https=)
TW (1) TWI418819B (https=)
WO (1) WO2007084206A1 (https=)

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DE202008013982U1 (de) * 2008-10-20 2009-01-08 Rosenberger Hochfrequenztechnik Gmbh & Co. Kg Messsystem zum Bestimmen von Streuparametern
US9207276B2 (en) * 2009-01-17 2015-12-08 Disco Corporation Method and apparatus for testing a semiconductor wafer
JP4886800B2 (ja) * 2009-02-26 2012-02-29 インターナショナル・ビジネス・マシーンズ・コーポレーション プローブカード、プローブカードの製造方法、プローバ装置
US8269514B2 (en) * 2009-08-25 2012-09-18 Formfactor, Inc. Method and apparatus for multilayer support substrate
WO2011062312A1 (ko) * 2009-11-23 2011-05-26 주식회사 쎄믹스 터치패드를 이용한 웨이퍼 프로버
US8519729B2 (en) 2010-02-10 2013-08-27 Sunpower Corporation Chucks for supporting solar cell in hot spot testing
JP5529605B2 (ja) * 2010-03-26 2014-06-25 東京エレクトロン株式会社 ウエハチャックの傾き補正方法及びプローブ装置
DE102011102791A1 (de) * 2011-05-27 2012-11-29 Feinmetall Gmbh Federkontaktstiftanordnung
US8963567B2 (en) 2011-10-31 2015-02-24 International Business Machines Corporation Pressure sensing and control for semiconductor wafer probing
US8875979B2 (en) * 2012-05-04 2014-11-04 Asm Technology Singapore Pte. Ltd. Apparatus and method for determining an alignment of a bondhead of a die bonder relative to a workchuck
JP2014109531A (ja) * 2012-12-04 2014-06-12 Toshiba Corp 半導体検査装置および半導体検査方法
KR101415984B1 (ko) * 2013-05-16 2014-07-09 (주)에이젯 반도체 소자 테스트용 핸들러장치의 디바이스 컨택 제어방법
JP6280459B2 (ja) * 2014-06-27 2018-02-14 株式会社ディスコ テープ拡張装置
WO2016014906A1 (en) * 2014-07-24 2016-01-28 Nucleus Scientific, Inc. A measurement instrument for testing charge storage devices
US10481177B2 (en) * 2014-11-26 2019-11-19 Tokyo Seimitsu Co. Ltd. Wafer inspection method
CN104391139A (zh) * 2014-12-08 2015-03-04 大族激光科技产业集团股份有限公司 一种测试探针压力监控的方法及装置
US10363646B2 (en) * 2016-05-05 2019-07-30 Caterpillar Inc. Manufacturing fixture system and associated process having a rest pad force sensor with closed loop feedback
TWI676031B (zh) * 2018-09-06 2019-11-01 致茂電子股份有限公司 滑移式電子元件測試裝置
US12188978B2 (en) * 2019-02-21 2025-01-07 Vuereal Inc. Probe structure for micro device inspection
TWI777740B (zh) * 2021-08-23 2022-09-11 鴻勁精密股份有限公司 校正裝置、校正方法及其應用之作業機
CN118837711B (zh) * 2024-06-17 2025-06-27 赛诺威盛科技(北京)股份有限公司 一种用于ct探测器ad转换板的检测方法、装置及系统

Citations (4)

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JP2000260852A (ja) * 1999-03-11 2000-09-22 Tokyo Electron Ltd 検査ステージ及び検査装置
JP2001228212A (ja) * 2000-02-15 2001-08-24 Tokyo Electron Ltd 針荷重測定方法、針荷重設定方法及び検査装置
JP2001358204A (ja) * 2000-06-15 2001-12-26 Tokyo Electron Ltd 検査ステージ
JP2002075827A (ja) * 2000-08-29 2002-03-15 Nikon Corp Ｘ線投影露光装置およびｘ線投影露光方法および半導体デバイス

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US5197076A (en) * 1991-11-15 1993-03-23 Davis James G Temperature stabilizable laser apparatus
US5517128A (en) * 1993-01-05 1996-05-14 Sentech Instruments Gmbh Method and arrangement for charge carrier profiling in semiconductor structure by means of AFM scanning
US6140828A (en) 1997-05-08 2000-10-31 Tokyo Electron Limited Prober and probe method
US6111421A (en) * 1997-10-20 2000-08-29 Tokyo Electron Limited Probe method and apparatus for inspecting an object
JP3407192B2 (ja) * 1998-12-31 2003-05-19 株式会社ダイトー テストハンドの制御方法及び計測制御システム
US6690284B2 (en) 1998-12-31 2004-02-10 Daito Corporation Method of controlling IC handler and control system using the same
JP2001110857A (ja) 1999-10-06 2001-04-20 Tokyo Electron Ltd プローブ方法及びプローブ装置
CA2476389A1 (en) * 2002-03-22 2003-10-09 Electro Scientific Industries, Inc. Test probe alignment apparatus
US7049577B2 (en) 2002-09-30 2006-05-23 Teradyne, Inc. Semiconductor handler interface auto alignment
JP2004152916A (ja) 2002-10-29 2004-05-27 Nec Corp 半導体デバイス検査装置及び検査方法
KR20050084304A (ko) * 2002-12-16 2005-08-26 코닌클리케 필립스 일렉트로닉스 엔.브이. 높은 위치 정밀도로 물체를 처리하는 장치
JP2005072143A (ja) 2003-08-21 2005-03-17 Tokyo Seimitsu Co Ltd プローブ装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000260852A (ja) * 1999-03-11 2000-09-22 Tokyo Electron Ltd 検査ステージ及び検査装置
JP2001228212A (ja) * 2000-02-15 2001-08-24 Tokyo Electron Ltd 針荷重測定方法、針荷重設定方法及び検査装置
JP2001358204A (ja) * 2000-06-15 2001-12-26 Tokyo Electron Ltd 検査ステージ
JP2002075827A (ja) * 2000-08-29 2002-03-15 Nikon Corp Ｘ線投影露光装置およびｘ線投影露光方法および半導体デバイス

Also Published As

Publication number Publication date
TWI418819B (zh) 2013-12-11
US7368929B2 (en) 2008-05-06
US20080150565A1 (en) 2008-06-26
KR20080093408A (ko) 2008-10-21
US7852097B2 (en) 2010-12-14
TW200736633A (en) 2007-10-01
CN101297206A (zh) 2008-10-29
WO2007084206A1 (en) 2007-07-26
US20070164762A1 (en) 2007-07-19
KR101347767B1 (ko) 2014-01-10

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