JP2009516930A5 - - Google Patents
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- Publication number
- JP2009516930A5 JP2009516930A5 JP2008542331A JP2008542331A JP2009516930A5 JP 2009516930 A5 JP2009516930 A5 JP 2009516930A5 JP 2008542331 A JP2008542331 A JP 2008542331A JP 2008542331 A JP2008542331 A JP 2008542331A JP 2009516930 A5 JP2009516930 A5 JP 2009516930A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- semiconductor material
- organic
- compound
- alicyclic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000004065 semiconductor Substances 0.000 claims 12
- 125000001424 substituent group Chemical group 0.000 claims 9
- 229910052757 nitrogen Inorganic materials 0.000 claims 8
- 125000002723 alicyclic group Chemical group 0.000 claims 7
- 239000000463 material Substances 0.000 claims 7
- 239000010409 thin film Substances 0.000 claims 7
- 150000001875 compounds Chemical class 0.000 claims 4
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims 4
- -1 naphthalenetetracarboxylic acid diimide compound Chemical class 0.000 claims 3
- 210000004940 Nucleus Anatomy 0.000 claims 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims 2
- 239000010408 film Substances 0.000 claims 2
- 150000003949 imides Chemical class 0.000 claims 2
- 238000004519 manufacturing process Methods 0.000 claims 2
- 150000002790 naphthalenes Chemical class 0.000 claims 2
- 230000002411 adverse Effects 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 238000000151 deposition Methods 0.000 claims 1
- 230000005669 field effect Effects 0.000 claims 1
- 125000000962 organic group Chemical group 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
Claims (3)
- シアン化されていないナフタレン核、及び当該化合物中の各イミド窒素に直接的に結合された、それぞれ環炭素4〜10個の第1及び第2の脂環式系を有するN,N'-ジシクロアルキル置換型ナフタレンテトラカルボン酸ジイミド化合物を含む有機半導体材料から成る薄膜を、薄膜トランジスタ内に含む物品であって、
該脂環式系及び該ナフタレン核のそれぞれの上に独立して、任意選択的に1つ又は2つ以上の置換基が在り、
該化合物中の各脂環式系上の任意の置換基は、少なくとも1つの電子供与有機置換基を含む。 - 該有機半導体材料薄膜が、下記構造:
によって表されるN,N'-ジシクロアルキル置換型1,4,5,8-ナフタレンテトラカルボン酸ジイミド化合物を含む請求項1に記載の物品。 - 薄膜半導体デバイスの製作方法であって、必ずしも下記順序通りではなく、
(a) シアン化されていないナフタレン核、及び当該化合物中の各イミド窒素に直接的に結合された、それぞれ環炭素4〜10個の第1及び第2の脂環式系を有するN,N'-ジシクロアルキル置換型ナフタレンテトラカルボン酸ジイミド化合物を含む有機半導体材料から成る薄膜を基板上に堆積させる工程、
該脂環式系及び該ナフタレン核のそれぞれの上に独立して、任意選択的に1つ又は2つ以上の置換基が在り、存在する場合は、該任意選択の置換基は、nチャネル有機半導体材料から成る薄膜を、該有機半導体材料が0.01 cm 2 /Vsを上回る電界効果電子移動度を示すように、少なくとも1つの電子供与有機置換基を含む;
(b) 離隔されたソース電極とドレイン電極とを形成する工程、
該ソース電極とドレイン電極とは、nチャネル半導体膜によって分離され、そして該nチャネル半導体膜と電気的に接続される;及び
(c) 該有機半導体材料から離隔されたゲート電極を形成する工程
を含んで成る薄膜半導体デバイスの製作方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/285,238 US7422777B2 (en) | 2005-11-22 | 2005-11-22 | N,N′-dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors |
PCT/US2006/043200 WO2007061614A1 (en) | 2005-11-22 | 2006-11-07 | Naphthalene based tetracarboxylic diimides as semiconductor materials |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009516930A JP2009516930A (ja) | 2009-04-23 |
JP2009516930A5 true JP2009516930A5 (ja) | 2009-12-17 |
Family
ID=37733692
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008542331A Pending JP2009516930A (ja) | 2005-11-22 | 2006-11-07 | 半導体材料としてのナフタレン系テトラカルボン酸ジイミド |
Country Status (6)
Country | Link |
---|---|
US (1) | US7422777B2 (ja) |
EP (1) | EP1952453B1 (ja) |
JP (1) | JP2009516930A (ja) |
KR (1) | KR20080073303A (ja) |
TW (1) | TWI416721B (ja) |
WO (1) | WO2007061614A1 (ja) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2554302C (en) * | 2004-01-26 | 2013-03-26 | Northwestern University | Perylene n-type semiconductors and related devices |
US7569693B2 (en) * | 2006-06-12 | 2009-08-04 | Northwestern University | Naphthalene-based semiconductor materials and methods of preparing and use thereof |
EP2089398A2 (en) * | 2006-10-25 | 2009-08-19 | Polyera Corporation | Organic semiconductor materials and methods of preparing and use thereof |
EP2086974B1 (en) | 2006-11-17 | 2013-07-24 | Polyera Corporation | Diimide-based semiconductor materials and methods of preparing and using the same |
US7892454B2 (en) * | 2006-11-17 | 2011-02-22 | Polyera Corporation | Acene-based organic semiconductor materials and methods of preparing and using the same |
US7804087B2 (en) * | 2006-12-07 | 2010-09-28 | Eastman Kodak Company | Configurationally controlled N,N'-Dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors |
KR20090117730A (ko) * | 2007-01-08 | 2009-11-12 | 폴리에라 코퍼레이션 | 아렌-비스(디카르복스이미드)-기재 반도체 물질, 및 이를 제조하기 위한 관련된 중간체의 제조 방법 |
WO2008091670A2 (en) * | 2007-01-24 | 2008-07-31 | Polyera Corporation | Organic semiconductor materials and precursors thereof |
US7858970B2 (en) * | 2007-06-29 | 2010-12-28 | Eastman Kodak Company | Heterocycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as N-type semiconductor materials for thin film transistors |
WO2009089283A2 (en) * | 2008-01-07 | 2009-07-16 | The Johns Hopkins University | Low-voltage, n-channel hybrid transistors |
KR20160029863A (ko) * | 2008-02-05 | 2016-03-15 | 바스프 에스이 | 페릴렌 반도체 및 이의 제조 방법 및 용도 |
EP2240530B1 (en) * | 2008-02-05 | 2015-05-20 | Basf Se | Perylene-imide semiconductor polymers |
US7649199B2 (en) * | 2008-04-11 | 2010-01-19 | Eastman Kodak Company | N-type semiconductor materials in thin film transistors and electronic devices |
KR101694877B1 (ko) * | 2009-10-16 | 2017-01-11 | 삼성전자주식회사 | 그라핀 소자 및 그 제조 방법 |
US8212243B2 (en) * | 2010-01-22 | 2012-07-03 | Eastman Kodak Company | Organic semiconducting compositions and N-type semiconductor devices |
US8309394B2 (en) * | 2010-01-22 | 2012-11-13 | Eastman Kodak Company | Method of making N-type semiconductor devices |
US20110269966A1 (en) * | 2010-04-30 | 2011-11-03 | Deepak Shukla | Semiconducting articles |
US8314265B2 (en) | 2010-04-30 | 2012-11-20 | Eastman Kodak Company | Aromatic amic acids or amic esters and compositions |
US8530270B2 (en) | 2010-04-30 | 2013-09-10 | Eastman Kodak Company | Methods of preparing semiconductive compositions and devices |
US8411489B2 (en) | 2010-04-30 | 2013-04-02 | Eastman Kodak Company | Semiconducting devices and methods of preparing |
US8450726B2 (en) | 2010-05-27 | 2013-05-28 | Eastman Kodak Company | Articles containing coatings of amic acid salts |
US8431433B2 (en) | 2010-05-27 | 2013-04-30 | Eastman Kodak Company | Methods of providing semiconductor layers from amic acid salts |
US8404892B2 (en) | 2010-05-27 | 2013-03-26 | Eastman Kodak Company | Aromatic amic acid salts and compositions |
DE102011013897A1 (de) * | 2011-03-11 | 2012-09-13 | Technische Universität Dresden | Organische Solarzelle |
US8692238B2 (en) | 2012-04-25 | 2014-04-08 | Eastman Kodak Company | Semiconductor devices and methods of preparation |
US8779415B2 (en) | 2012-11-08 | 2014-07-15 | Eastman Kodak Company | Devices containing organic polymeric multi-metallic composites |
KR101490104B1 (ko) * | 2013-06-12 | 2015-03-25 | 경상대학교산학협력단 | 나프탈렌 다이이미드 유도체 화합물 및 제조방법과 이를 포함하는 유기전자소자 |
EP3155623B1 (en) | 2014-06-11 | 2019-05-08 | Eastman Kodak Company | Devices having dielectric layers with thiosulfate-containing polymers |
JP2021082619A (ja) * | 2018-03-16 | 2021-05-27 | 国立大学法人大阪大学 | n型有機半導体材料及びそれを含有する有機半導体膜並びに有機薄膜トランジスタ |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
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DE2636421A1 (de) | 1976-08-13 | 1978-02-16 | Basf Ag | Elektrisch leitfaehige perylenderivate |
DE2951349A1 (de) | 1979-12-20 | 1981-07-02 | Bayer Ag, 5090 Leverkusen | Naphthalintetracarbonsaeurediimide als elektrische halbleiter und photoleiter |
US4578334A (en) | 1984-11-23 | 1986-03-25 | Eastman Kodak Company | Multi-active photoconductive insulating elements and method for their manufacture |
DE3526249A1 (de) | 1985-07-23 | 1987-01-29 | Hoechst Ag | Elektrophotographisches aufzeichnungsmaterial |
US4719163A (en) | 1986-06-19 | 1988-01-12 | Eastman Kodak Company | Multi-active photoconductive insulating elements exhibiting far red sensitivity |
US5468583A (en) | 1994-12-28 | 1995-11-21 | Eastman Kodak Company | Cyclic bis-dicarboximide electron transport compounds for electrophotography |
US6387727B1 (en) * | 1999-03-29 | 2002-05-14 | Agere Systems Guardian Corp. | Device comprising n-channel semiconductor material |
JP3369515B2 (ja) * | 1999-07-28 | 2003-01-20 | 京セラミタ株式会社 | フタロシアニン結晶及びその製造方法と、これを含有した電子写真感光体 |
DE20021356U1 (de) | 2000-12-18 | 2001-02-22 | Basf Ag | Polyvinylchlorid mit kernhydrierten Phthalat-Weichmachern |
US20020192397A1 (en) | 2001-02-20 | 2002-12-19 | Fuji Photo Film Co., Ltd. | Polarizing plate protection film |
US6844033B2 (en) | 2001-03-01 | 2005-01-18 | Konica Corporation | Cellulose ester film, its manufacturing method, polarizing plate, and liquid crystal display |
JP4792677B2 (ja) | 2001-04-25 | 2011-10-12 | コニカミノルタホールディングス株式会社 | セルロースエステルフィルム |
WO2003062314A1 (en) | 2002-01-16 | 2003-07-31 | Eastman Chemical Company | Novel carbohydrate esters and polyol esters as plasticizers for polymers, compositions and articles including such plasticizers and methods of using the same |
JP2004014982A (ja) * | 2002-06-11 | 2004-01-15 | Konica Minolta Holdings Inc | 半導体回路および画像表示装置 |
KR100513700B1 (ko) * | 2003-07-04 | 2005-09-09 | 삼성전자주식회사 | 나프탈렌테트라카르복시디이미드 유도체 및 이를 포함하는전자사진감광체 |
JP2005208617A (ja) * | 2003-12-26 | 2005-08-04 | Canon Inc | 電子写真感光体、電子写真感光体の製造方法、プロセスカートリッジおよび電子写真装置 |
CA2554302C (en) | 2004-01-26 | 2013-03-26 | Northwestern University | Perylene n-type semiconductors and related devices |
US7838871B2 (en) * | 2004-03-24 | 2010-11-23 | Samsung Mobile Display Co., Ltd. | Organic field-effect transistor, flat panel display device including the same, and a method of manufacturing the organic field-effect transistor |
US7579619B2 (en) * | 2005-04-20 | 2009-08-25 | Eastman Kodak Company | N,N′-di(arylalkyl)-substituted naphthalene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors |
US7629605B2 (en) * | 2005-10-31 | 2009-12-08 | Eastman Kodak Company | N-type semiconductor materials for thin film transistors |
-
2005
- 2005-11-22 US US11/285,238 patent/US7422777B2/en active Active
-
2006
- 2006-11-07 WO PCT/US2006/043200 patent/WO2007061614A1/en active Application Filing
- 2006-11-07 KR KR1020087012156A patent/KR20080073303A/ko not_active Application Discontinuation
- 2006-11-07 JP JP2008542331A patent/JP2009516930A/ja active Pending
- 2006-11-07 EP EP06836979.2A patent/EP1952453B1/en not_active Expired - Fee Related
- 2006-11-21 TW TW95142933A patent/TWI416721B/zh not_active IP Right Cessation
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