JP2009516930A - 半導体材料としてのナフタレン系テトラカルボン酸ジイミド - Google Patents
半導体材料としてのナフタレン系テトラカルボン酸ジイミド Download PDFInfo
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- JP2009516930A JP2009516930A JP2008542331A JP2008542331A JP2009516930A JP 2009516930 A JP2009516930 A JP 2009516930A JP 2008542331 A JP2008542331 A JP 2008542331A JP 2008542331 A JP2008542331 A JP 2008542331A JP 2009516930 A JP2009516930 A JP 2009516930A
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 102
- 239000000463 material Substances 0.000 title claims abstract description 72
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 229910000071 diazene Inorganic materials 0.000 title abstract description 10
- RAABOESOVLLHRU-UHFFFAOYSA-N diazene Chemical compound N=N RAABOESOVLLHRU-UHFFFAOYSA-N 0.000 title description 5
- 150000000000 tetracarboxylic acids Chemical class 0.000 title description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 56
- 239000010409 thin film Substances 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 25
- 238000004519 manufacturing process Methods 0.000 claims abstract description 21
- -1 tetracarboxylic acid diimide naphthalene compound Chemical class 0.000 claims abstract description 20
- 230000008021 deposition Effects 0.000 claims abstract description 14
- 238000000859 sublimation Methods 0.000 claims abstract description 7
- 230000008022 sublimation Effects 0.000 claims abstract description 7
- 125000001424 substituent group Chemical group 0.000 claims description 57
- 150000001875 compounds Chemical class 0.000 claims description 43
- 125000002723 alicyclic group Chemical group 0.000 claims description 34
- 239000010408 film Substances 0.000 claims description 33
- 125000000217 alkyl group Chemical group 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 20
- 230000005669 field effect Effects 0.000 claims description 18
- 150000002790 naphthalenes Chemical class 0.000 claims description 17
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 15
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 125000004122 cyclic group Chemical group 0.000 claims description 11
- 125000003545 alkoxy group Chemical group 0.000 claims description 9
- 229910052739 hydrogen Inorganic materials 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 8
- 150000003949 imides Chemical class 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 7
- 238000006467 substitution reaction Methods 0.000 claims description 7
- 125000000962 organic group Chemical group 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 239000001257 hydrogen Substances 0.000 claims description 5
- 239000011159 matrix material Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 229910052710 silicon Inorganic materials 0.000 claims description 5
- 239000010703 silicon Substances 0.000 claims description 5
- 229920001940 conductive polymer Polymers 0.000 claims description 4
- MRMRHDNOSZTUHA-UHFFFAOYSA-N 5,8-bis(cyclohexylcarbamoyl)naphthalene-1,4-dicarboxylic acid Chemical compound C=12C(C(=O)O)=CC=C(C(O)=O)C2=C(C(O)=NC2CCCCC2)C=CC=1C(O)=NC1CCCCC1 MRMRHDNOSZTUHA-UHFFFAOYSA-N 0.000 claims description 3
- 230000002411 adverse Effects 0.000 claims description 3
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 3
- 239000012777 electrically insulating material Substances 0.000 claims description 3
- 125000002950 monocyclic group Chemical group 0.000 claims description 3
- FVFFILYGNGPUQS-UHFFFAOYSA-N 5,8-bis(cyclopentylcarbamoyl)naphthalene-1,4-dicarboxylic acid Chemical compound C=12C(C(=O)O)=CC=C(C(O)=O)C2=C(C(=O)NC2CCCC2)C=CC=1C(=O)NC1CCCC1 FVFFILYGNGPUQS-UHFFFAOYSA-N 0.000 claims 1
- 125000005462 imide group Chemical group 0.000 claims 1
- 230000037230 mobility Effects 0.000 description 40
- 239000010410 layer Substances 0.000 description 35
- 238000012360 testing method Methods 0.000 description 15
- 230000006870 function Effects 0.000 description 10
- 239000011368 organic material Substances 0.000 description 9
- 230000000295 complement effect Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 229910021417 amorphous silicon Inorganic materials 0.000 description 7
- 239000010931 gold Substances 0.000 description 7
- WSNMPAVSZJSIMT-UHFFFAOYSA-N COc1c(C)c2COC(=O)c2c(O)c1CC(O)C1(C)CCC(=O)O1 Chemical compound COc1c(C)c2COC(=O)c2c(O)c1CC(O)C1(C)CCC(=O)O1 WSNMPAVSZJSIMT-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 238000004768 lowest unoccupied molecular orbital Methods 0.000 description 6
- DQXKOHDUMJLXKH-PHEQNACWSA-N (e)-n-[2-[2-[[(e)-oct-2-enoyl]amino]ethyldisulfanyl]ethyl]oct-2-enamide Chemical compound CCCCC\C=C\C(=O)NCCSSCCNC(=O)\C=C\CCCCC DQXKOHDUMJLXKH-PHEQNACWSA-N 0.000 description 5
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- WLLGXSLBOPFWQV-UHFFFAOYSA-N MGK 264 Chemical compound C1=CC2CC1C1C2C(=O)N(CC(CC)CCCC)C1=O WLLGXSLBOPFWQV-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 125000006575 electron-withdrawing group Chemical group 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 239000012212 insulator Substances 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- PYJJCSYBSYXGQQ-UHFFFAOYSA-N trichloro(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](Cl)(Cl)Cl PYJJCSYBSYXGQQ-UHFFFAOYSA-N 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 4
- 125000004429 atom Chemical group 0.000 description 4
- 125000004093 cyano group Chemical group *C#N 0.000 description 4
- 125000000753 cycloalkyl group Chemical group 0.000 description 4
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- YTVNOVQHSGMMOV-UHFFFAOYSA-N naphthalenetetracarboxylic dianhydride Chemical compound C1=CC(C(=O)OC2=O)=C3C2=CC=C2C(=O)OC(=O)C1=C32 YTVNOVQHSGMMOV-UHFFFAOYSA-N 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- GSOFREOFMHUMMZ-UHFFFAOYSA-N 3,4-dicarbamoylnaphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=N)C(C(=N)O)=C(C(O)=O)C(C(O)=O)=C21 GSOFREOFMHUMMZ-UHFFFAOYSA-N 0.000 description 3
- RHTASMVIGRWMCN-UHFFFAOYSA-N 5,8-bis(hexylcarbamoyl)naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(=O)NCCCCCC)=CC=C(C(=O)NCCCCCC)C2=C1C(O)=O RHTASMVIGRWMCN-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000009825 accumulation Methods 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 229910021419 crystalline silicon Inorganic materials 0.000 description 3
- 150000008056 dicarboxyimides Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 3
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229920002530 polyetherether ketone Polymers 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000002094 self assembled monolayer Substances 0.000 description 3
- 239000013545 self-assembled monolayer Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000002061 vacuum sublimation Methods 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 2
- JLTPSDHKZGWXTD-UHFFFAOYSA-N 2-[6-(dicyanomethylidene)naphthalen-2-ylidene]propanedinitrile Chemical compound N#CC(C#N)=C1C=CC2=CC(=C(C#N)C#N)C=CC2=C1 JLTPSDHKZGWXTD-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 229920002430 Fibre-reinforced plastic Polymers 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 229920000144 PEDOT:PSS Polymers 0.000 description 2
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000011149 active material Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000012300 argon atmosphere Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- BODUWJSFPLUDMP-UHFFFAOYSA-N benzo[lmn][3,8]phenanthroline-1,3,6,8(2h,7h)-tetrone Chemical compound C1=CC(C(=O)NC2=O)=C3C2=CC=C2C(=O)NC(=O)C1=C32 BODUWJSFPLUDMP-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 125000002837 carbocyclic group Chemical group 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000002800 charge carrier Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 239000013058 crude material Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000011151 fibre-reinforced plastic Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000000813 microcontact printing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- MZYHMUONCNKCHE-UHFFFAOYSA-N naphthalene-1,2,3,4-tetracarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=C(C(O)=O)C(C(O)=O)=C21 MZYHMUONCNKCHE-UHFFFAOYSA-N 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229920000767 polyaniline Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000002861 polymer material Substances 0.000 description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000007363 ring formation reaction Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 150000003573 thiols Chemical class 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- MTLMVEWEYZFYTH-UHFFFAOYSA-N 1,3,5-trichloro-2-phenylbenzene Chemical compound ClC1=CC(Cl)=CC(Cl)=C1C1=CC=CC=C1 MTLMVEWEYZFYTH-UHFFFAOYSA-N 0.000 description 1
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical class C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- 125000006017 1-propenyl group Chemical group 0.000 description 1
- ZYZYQCACSQDPSB-UHFFFAOYSA-N 12,15-dioxatricyclo[8.6.0.02,7]hexadeca-1(10),2,4,6,8-pentaene-11,16-dione Chemical compound O=C1OCCOC(=O)C2=C1C=CC1=CC=CC=C21 ZYZYQCACSQDPSB-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- MGGVALXERJRIRO-UHFFFAOYSA-N 4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-2-[2-oxo-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethyl]-1H-pyrazol-5-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)O MGGVALXERJRIRO-UHFFFAOYSA-N 0.000 description 1
- 125000001318 4-trifluoromethylbenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])*)C(F)(F)F 0.000 description 1
- DWLWGAWWEOVHEU-UHFFFAOYSA-N 5,8-bis(octylcarbamoyl)naphthalene-1,4-dicarboxylic acid Chemical compound C1=CC(C(O)=O)=C2C(C(O)=NCCCCCCCC)=CC=C(C(O)=NCCCCCCCC)C2=C1C(O)=O DWLWGAWWEOVHEU-UHFFFAOYSA-N 0.000 description 1
- RJCHVBHJXJDUNL-UHFFFAOYSA-N 5,8-dicarbamoylnaphthalene-1,4-dicarboxylic acid Chemical class C1=CC(C(O)=O)=C2C(C(=N)O)=CC=C(C(O)=N)C2=C1C(O)=O RJCHVBHJXJDUNL-UHFFFAOYSA-N 0.000 description 1
- NAZODJSYHDYJGP-UHFFFAOYSA-N 7,18-bis[2,6-di(propan-2-yl)phenyl]-7,18-diazaheptacyclo[14.6.2.22,5.03,12.04,9.013,23.020,24]hexacosa-1(23),2,4,9,11,13,15,20(24),21,25-decaene-6,8,17,19-tetrone Chemical class CC(C)C1=CC=CC(C(C)C)=C1N(C(=O)C=1C2=C3C4=CC=1)C(=O)C2=CC=C3C(C=C1)=C2C4=CC=C3C(=O)N(C=4C(=CC=CC=4C(C)C)C(C)C)C(=O)C1=C23 NAZODJSYHDYJGP-UHFFFAOYSA-N 0.000 description 1
- PONZBUKBFVIXOD-UHFFFAOYSA-N 9,10-dicarbamoylperylene-3,4-dicarboxylic acid Chemical compound C=12C3=CC=C(C(O)=O)C2=C(C(O)=O)C=CC=1C1=CC=C(C(O)=N)C2=C1C3=CC=C2C(=N)O PONZBUKBFVIXOD-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 241000252506 Characiformes Species 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000005083 Zinc sulfide Substances 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- ZOIORXHNWRGPMV-UHFFFAOYSA-N acetic acid;zinc Chemical compound [Zn].CC(O)=O.CC(O)=O ZOIORXHNWRGPMV-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003710 aryl alkyl group Chemical group 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- 229910021523 barium zirconate Inorganic materials 0.000 description 1
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000002619 bicyclic group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- RBTKNAXYKSUFRK-UHFFFAOYSA-N heliogen blue Chemical class [Cu].[N-]1C2=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=NC([N-]1)=C(C=CC=C3)C3=C1N=C([N-]1)C3=CC=CC=C3C1=N2 RBTKNAXYKSUFRK-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BNRNAKTVFSZAFA-UHFFFAOYSA-N hydrindane Chemical compound C1CCCC2CCCC21 BNRNAKTVFSZAFA-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- JVJQPDTXIALXOG-UHFFFAOYSA-N nitryl fluoride Chemical compound [O-][N+](F)=O JVJQPDTXIALXOG-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- KJOLVZJFMDVPGB-UHFFFAOYSA-N perylenediimide Chemical compound C=12C3=CC=C(C(NC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)NC(=O)C4=CC=C3C1=C42 KJOLVZJFMDVPGB-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920000636 poly(norbornene) polymer Polymers 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OGEZSLXPCKHGKO-UHFFFAOYSA-N ptcdi-ph Chemical compound O=C1C(C2=C34)=CC=C3C(C=35)=CC=C(C(N(C=6C=CC=CC=6)C6=O)=O)C5=C6C=CC=3C4=CC=C2C(=O)N1C1=CC=CC=C1 OGEZSLXPCKHGKO-UHFFFAOYSA-N 0.000 description 1
- 238000000728 pulse radiolysis time-resolved microwave conductivity Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000012216 screening Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003335 steric effect Effects 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 125000005346 substituted cycloalkyl group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000002207 thermal evaporation Methods 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000004246 zinc acetate Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
本発明において使用されるN,N'-ジシクロアルキル置換型ナフタレン-1,4,5,8-ビス(ジカルボキシミド)化合物を、Rademacher, A.他、Chem. Ber. 1982 115, 2927に記載されている一般的な方法に従って、ナフタレンテトラカルボン酸二無水物を過剰のシクロアルキルアミンで環化することによって、従来通りに調製する。例えば、本発明において使用されるN,N'-ジシクロヘキシル-1,4,5,8-ナフタレンテトラカルボン酸ジイミド(化合物I-3)を、ナフタレンテトラカルボン酸二無水物を過剰のシクロアルキルアミンで環化することによって、従来通りに調製した。従って、Aldrich Chemical Companyから入手可能なナフタレンテトラカルボン酸二無水物、3〜4当量過剰のアミン、例えばやはりAldrichから入手可能なシクロアルキルアミン、触媒量の酢酸亜鉛、及び二無水物分子1グラム当たり10〜15 mlのキノリンの混合物を、温度約220℃で4〜5時間にわたって加熱した。混合物を室温まで冷やしておき、そして沈澱した固形物を捕集し、濾過し、そしてアセトンで、続いてそれぞれ200 mlの沸騰0.1 M水性Na2CO3、沸騰水、及び高温トルエンで洗浄し、これを、生成物が事実上溶解されることになる温度未満で維持する。次いで、10-5〜10-6 torrで一連の昇華を施すことにより、固形物を精製する。(上述のように、ナフタレンテトラカルボン酸二無水物を過剰のアミンで環化することによって、他の化合物が好都合に調製される。)次いで、10-5〜10-6 torrで一連の昇華を施すことにより、粗材料を精製した。
本発明の種々の材料の電気特性を試験するために、トップ・コンタクト・ジオメトリーを使用して、電界効果トランジスタを典型的な形式で形成した。使用される基板は、トランジスタのゲートとしても役立つ、重度にドープされたシリコン・ウェハーである。ゲート誘電体は、厚さ185 nmの熱成長させられたSiO2層である。ゲート誘電体の表面を処理することにより電気特性を改善できることが、p型及びn型トランジスタの両方に関して、以前に示されている。本明細書中に記載された試験のほとんどの場合、酸化物表面は、薄い(<10 nm)スピン塗布ポリマー層、又はオクタデシルトリクロロシラン(OTS)の自己組織化単分子層(SAM)で処理された。典型的には、未処理酸化物試料が比較のための試験に含まれた。
製作されたデバイスの電気的特徴付けを、Hewlett Packard HP 4145b(登録商標)パラメータ分析器で実施した。空気中のデバイスの安定性を意図的に試験することを除けば、プローブ測定ステーションは、全ての測定に対して正のアルゴン環境内で保持した。白色光に対する感受性を検査する場合を除いては、測定を硫黄光下で実施した。デバイスを試験前に空気に曝露した。
下記例は、単純なN,N'-ジヘキシル-1,4,5,8-ナフタレンテトラカルボン酸ジイミドと比較して、N,N'-ジシクロヘキシル置換型1,4,5,8-ナフタレン系テトラカルボン酸ジイミドを含む本発明のデバイスが、高い移動度及びオン/オフ比を有する、改善されたnチャネル半導体膜を提供することを実証する。飽和領域内で計算された移動度は、0.07〜2.5 cm2/Vsであり、オン/オフ比は104〜105であった。改善された性能に加えて、デバイスはまた、優れた再現性を示す。
この例は、N,N'-ジヘキシル-1,4,5,8-ナフタレンテトラカルボン酸ジイミドC-1から形成されたn型TFTデバイスを実証する。
この例は、本発明によるN,N'-ジシクロヘキシル-1,4,5,8-ナフタレンテトラカルボン酸ジイミド(化合物I-3)を使用したn型TFTデバイスの改善された性能を実証する。
28 基板
30 ドレイン電極
44 ゲート電極
56 ゲート誘電体
70 半導体
Claims (30)
- シアン化されていないナフタレン核、及び当該化合物中の各イミド窒素に直接的に結合された、それぞれ環炭素4〜10個の第1及び第2の脂環式系を有するN,N'-ジシクロアルキル置換型ナフタレンテトラカルボン酸ジイミド化合物を含む有機半導体材料から成る薄膜を、薄膜トランジスタ内に含む物品であって、
該脂環式系及び該ナフタレン核のそれぞれの上に独立して、任意選択的に1つ又は2つ以上の置換基が在り、
該化合物中の各脂環式系上の任意の置換基は、少なくとも1つの電子供与有機置換基を含む。 - 前記構造内の第1及び第2の脂環式系の両方が、少なくとも1つの電子供与基で置換されている請求項1に記載の物品。
- 該第1及び第2の脂環式系のうちの一方又は両方が、CH3、線状又は分枝状C2〜C4アルキル、アルケニル、アルコキシ、又は炭素原子数1〜4の他の電子供与有機基から選択された少なくとも1つの電子供与基によって置換されている請求項3に記載の物品。
- 該薄膜トランジスタが、誘電層、ゲート電極、ソース電極、及びドレイン電極を含む電界効果トランジスタであり、そして該誘電層、該ゲート電極、該有機半導体材料薄膜、該ソース電極、及び該ドレイン電極が、該ゲート電極と該有機半導体材料薄膜との両方が該誘電層と接触しており、そして該ソース電極と該ドレイン電極との両方が該有機半導体材料薄膜と接触している限り、任意の順序を成している請求項1に記載の物品。
- 該有機半導体材料薄膜が、0.01 cm2/Vsを上回る電子移動度を示すことができる請求項1に記載の物品。
- 該脂環式系が単環又は二環式脂環式炭化水素環である請求項1に記載の物品。
- 該ナフタレン核上の該Y置換基が、アルキル基、アルケニル基、及びアルコキシ基から成る群から選択される請求項1に記載の物品。
- 該脂環式系が、置換型又は無置換型シクロヘキシル又はシクロペンチル環である請求項1に記載の物品。
- 該有機半導体材料薄膜が、下記構造:
によって表されるN,N'-ジシクロアルキル置換型1,4,5,8-ナフタレンテトラカルボン酸ジイミド化合物を含む請求項1に記載の物品。 - R1〜R10基の全てが水素である請求項10に記載の物品。
- 該化合物中の第1脂環式系及び第2脂環式系の両方が、アルキル基である少なくとも1つの電子供与基を含む請求項10に記載の物品。
- 該構造内の該脂環式系の両方が、それぞれ独立して無置換型であるか又は少なくとも1つの電子供与基で置換された、環内炭素原子数5〜6の両単環式脂環式系である請求項10に記載の物品。
- 該化合物中の該第1及び第2の脂環式系環のうちの一方又は両方が、アルキル基である少なくとも1つの電子供与基によって置換されたシクロヘキシル環である請求項10に記載の物品。
- 前記構造内で、R1、R2、R3、R4、R5、R6、R7、R8、R9、及びR10が、それぞれ独立して、H、CH3、線状又は分枝状C2〜C4アルキル、アルケニル、アルコキシ、又は炭素原子数1〜4の他の電子供与有機基から選択される請求項10に記載の物品。
- 前記構造内で、R1、R2、R3、R4、及びR5のうちの少なくとも2つがHであり、そしてR6、R7、R8、R9、及びR10のうちの少なくとも2つがHである請求項10に記載の物品。
- 前記構造内で、R1、R2、R3、R4、及びR5のうちの少なくとも3つがHであり、そしてR6、R7、R8、R9、及びR10のうちの少なくとも3つがHである請求項16に記載の物品。
- 前記構造内で、R1、R3、R4、R5、R6、R8、R9、及びR10の全てがHであり、且つR2及びR7のうちの少なくとも一方がアルキル基であるか;又は、R2、R3、R4、R5、R7、R8、R9、及びR10の全てがHであり、且つR1及びR6のうちの少なくとも一方がCH3である請求項10に記載の物品。
- 該2つのシクロヘキシル環のそれぞれの環上に、独立して選択された厳密に1つの電子供与有機置換基があり、そして該置換基は同一性及び/又は位置において異なっているか、又は、該置換基が同一性及び位置において同じである場合、該置換基が、該イミド窒素に対して該シクロヘキシル環上のパラ位置でなくオルト又はメタ位置にある請求項14に記載の物品。
- 該電子供与基及び/又はY基は独立して、アルキル、アルケニル、及びアルコキシ基から選択される請求項10に記載の物品。
- 該薄膜トランジスタのソース/ドレイン電流のオン/オフ比は、少なくとも104である請求項1に記載の物品。
- 該ゲート電極が、該有機半導体材料薄膜を通る該ソース電極と該ドレイン電極との間の電流を、該ゲート電極に印加される電圧によって制御するように適合されている請求項5に記載の物品。
- 該誘電層が、無機又は有機の電気絶縁材料を含む請求項5に記載の物品。
- 該薄膜トランジスタがさらに、任意選択的に可撓性である非関与支持体を含む請求項1に記載の物品。
- 該ソース電極、ドレイン電極、及びゲート電極がそれぞれ独立して、ドープ型シリコン、金属、及び導電性ポリマーから選択された材料を含む請求項5に記載の物品。
- 請求項1に記載の複数の薄膜トランジスタを含む、集積回路、アクティブ・マトリックス・ディスプレイ、及び太陽電池から成る群から選択される電子デバイス。
- 該複数の薄膜トランジスタは、任意選択的に可撓性である非関与支持体上にある請求項26に記載の電子デバイス。
- 薄膜半導体デバイスの製作方法であって、必ずしも下記順序通りではなく、
(a) シアン化されていないナフタレン核、及び当該化合物中の各イミド窒素に直接的に結合された、それぞれ環炭素4〜10個の第1及び第2の脂環式系を有するN,N'-ジシクロアルキル置換型ナフタレンテトラカルボン酸ジイミド化合物を含む有機半導体材料から成る薄膜を基板上に堆積させる工程、
該脂環式系及び該ナフタレン核のそれぞれの上に独立して、任意選択的に1つ又は2つ以上の置換基が在り、存在する場合は、該任意選択の置換基は、nチャネル有機半導体材料から成る薄膜を、該有機半導体材料が0.01 cm2/Vsを上回る電界効果電子移動度を示すように、少なくとも1つの電子供与有機置換基を含む;
(b) 離隔されたソース電極とドレイン電極とを形成する工程、
該ソース電極とドレイン電極とは、nチャネル半導体膜によって分離され、そして該nチャネル半導体膜と電気的に接続される;及び
(c) 該有機半導体材料から離隔されたゲート電極を形成する工程
を含んで成る薄膜半導体デバイスの製作方法。 - 前記化合物が、昇華によって該基板上に堆積され、そして該基板が、堆積中に100℃以下の温度を有する請求項28に記載の方法。
- 該化合物が、N,N'-ジシクロヘキシル-ナフタレン-1,4,5,8テトラカルボン酸ジイミド、又はN,N'-ジシクロペンチル-ナフタレン-1,4,5,8テトラカルボン酸ジイミドである請求項28に記載の方法。
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US11/285,238 US7422777B2 (en) | 2005-11-22 | 2005-11-22 | N,N′-dicycloalkyl-substituted naphthalene-based tetracarboxylic diimide compounds as n-type semiconductor materials for thin film transistors |
PCT/US2006/043200 WO2007061614A1 (en) | 2005-11-22 | 2006-11-07 | Naphthalene based tetracarboxylic diimides as semiconductor materials |
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EP (1) | EP1952453B1 (ja) |
JP (1) | JP2009516930A (ja) |
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WO2007061614A1 (en) | 2007-05-31 |
US20070116895A1 (en) | 2007-05-24 |
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