JP2009508170A - マイクロリソグラフィ露光システムの光学システム - Google Patents

マイクロリソグラフィ露光システムの光学システム Download PDF

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Publication number
JP2009508170A
JP2009508170A JP2008530521A JP2008530521A JP2009508170A JP 2009508170 A JP2009508170 A JP 2009508170A JP 2008530521 A JP2008530521 A JP 2008530521A JP 2008530521 A JP2008530521 A JP 2008530521A JP 2009508170 A JP2009508170 A JP 2009508170A
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JP
Japan
Prior art keywords
optical system
optical
axis
birefringent
group
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Pending
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JP2008530521A
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English (en)
Japanese (ja)
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JP2009508170A5 (enExample
Inventor
トッツェク，ミヒャエル
ベダー，スーザン
クラウス，ヴィルフリート
フェルトマン，ヘイコ
クラーマー，ダニエル
ドドック，オーレリアン
Original Assignee
カール・ツァイス・エスエムティー・アーゲー
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Application filed by カール・ツァイス・エスエムティー・アーゲー filed Critical カール・ツァイス・エスエムティー・アーゲー
Publication of JP2009508170A publication Critical patent/JP2009508170A/ja
Publication of JP2009508170A5 publication Critical patent/JP2009508170A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
JP2008530521A 2005-09-14 2006-09-13 マイクロリソグラフィ露光システムの光学システム Pending JP2009508170A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71757605P 2005-09-14 2005-09-14
PCT/EP2006/066332 WO2007031544A1 (en) 2005-09-14 2006-09-13 Optical system of a microlithographic exposure system

Publications (2)

Publication Number Publication Date
JP2009508170A true JP2009508170A (ja) 2009-02-26
JP2009508170A5 JP2009508170A5 (enExample) 2009-11-05

Family

ID=37499493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008530521A Pending JP2009508170A (ja) 2005-09-14 2006-09-13 マイクロリソグラフィ露光システムの光学システム

Country Status (7)

Country Link
US (1) US8031326B2 (enExample)
EP (2) EP2085824A1 (enExample)
JP (1) JP2009508170A (enExample)
KR (1) KR20080043835A (enExample)
CN (2) CN101263432B (enExample)
TW (1) TW200717046A (enExample)
WO (1) WO2007031544A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011508409A (ja) * 2007-11-20 2011-03-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系
JP2014179619A (ja) * 2013-03-14 2014-09-25 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影露光装置のための光学系
JP2024014793A (ja) * 2022-07-20 2024-02-01 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ装置用の光学素子を製造する方法

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* Cited by examiner, † Cited by third party
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US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
DE102006038454A1 (de) 2005-12-23 2007-07-05 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
WO2008104192A1 (en) 2007-02-28 2008-09-04 Carl Zeiss Smt Ag Catadioptric projection objective with pupil correction
WO2008110501A1 (de) * 2007-03-13 2008-09-18 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
KR101450362B1 (ko) 2007-04-03 2014-10-14 칼 짜이스 에스엠티 게엠베하 광학계, 특히 마이크로리소그래픽 투영 노광장치의 조명 장치 또는 투영 대물렌즈
DE102007019831B4 (de) 2007-04-25 2012-03-01 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
US20090091728A1 (en) * 2007-09-28 2009-04-09 Carl Zeiss Smt Ag Compact High Aperture Folded Catadioptric Projection Objective
DE102008043321A1 (de) 2008-01-17 2009-07-23 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102009011329A1 (de) 2009-03-05 2010-09-09 Carl Zeiss Smt Ag Kompaktes katadioptrisches Projektionsobjektiv für die Immersionslithographie sowie Projektionsbelichtungsverfahren
US8922753B2 (en) 2013-03-14 2014-12-30 Carl Zeiss Smt Gmbh Optical system for a microlithographic projection exposure apparatus
WO2015027200A1 (en) * 2013-08-23 2015-02-26 Kla-Tencor Corporation Broadband and wide field angle compensator
DE102015223982A1 (de) 2015-12-02 2017-06-08 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage oder einer Waferinspektionsanlage
CN111830616B (zh) * 2019-04-16 2021-11-09 致晶科技（北京）有限公司 利用晶体制成的消色差相位延迟器和制作方法
DE102023119826A1 (de) * 2023-07-26 2025-01-30 TRUMPF Lasersystems for Semiconductor Manufacturing SE Depolarisations-Kompensator und optisches System

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JP2003279854A (ja) * 2002-03-26 2003-10-02 Canon Inc 投影光学系、露光装置、デバイス製造方法及びデバイス
JP2004535603A (ja) * 2001-07-18 2004-11-25 カール・ツアイス・エスエムテイ・アーゲー 結晶レンズを備えた対物レンズにおける複屈折の補正
WO2005001527A1 (de) * 2003-06-27 2005-01-06 Carl Zeiss Smt Ag Korrektureinrichtung zur kompensation von störungen der polarisationsverteilung sowie projektionsobjektiv für die mikrolithographie

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JP3014811B2 (ja) * 1991-08-08 2000-02-28 富士通株式会社 偏光子及び該偏光子を備えた変調器
DE19535392A1 (de) 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
US6829041B2 (en) * 1997-07-29 2004-12-07 Canon Kabushiki Kaisha Projection optical system and projection exposure apparatus having the same
DE19807120A1 (de) 1998-02-20 1999-08-26 Zeiss Carl Fa Optisches System mit Polarisationskompensator
US6630117B2 (en) * 1999-06-04 2003-10-07 Corning Incorporated Making a dispersion managing crystal
JP3857236B2 (ja) * 2001-03-02 2006-12-13 コーニング インコーポレイテッド 高繰返しレートｕｖエキシマーレーザ
JP2004526331A (ja) 2001-05-15 2004-08-26 カール・ツアイス・エスエムテイ・アーゲー フッ化物結晶レンズを含む対物レンズ
US7453641B2 (en) 2001-10-30 2008-11-18 Asml Netherlands B.V. Structures and methods for reducing aberration in optical systems
US6970232B2 (en) * 2001-10-30 2005-11-29 Asml Netherlands B.V. Structures and methods for reducing aberration in integrated circuit fabrication systems
US6950243B2 (en) * 2002-04-19 2005-09-27 Lockheed Martin Corporation Refractive multispectral objective lens system and methods of selecting optical materials therefor
US7154669B2 (en) * 2002-08-05 2006-12-26 Asml Holding N.V. Method and system for correction of intrinsic birefringence in UV microlithography
AU2003299695A1 (en) * 2002-12-20 2004-07-22 Hinds Instruments, Inc Out-of-plane birefringence measurement
TWI609409B (zh) 2003-10-28 2017-12-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
DE10355725A1 (de) 2003-11-28 2005-06-30 Carl Zeiss Smt Ag Optisches System sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauteile
WO2005059645A2 (en) 2003-12-19 2005-06-30 Carl Zeiss Smt Ag Microlithography projection objective with crystal elements
US7301707B2 (en) 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method

Patent Citations (3)

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JP2004535603A (ja) * 2001-07-18 2004-11-25 カール・ツアイス・エスエムテイ・アーゲー 結晶レンズを備えた対物レンズにおける複屈折の補正
JP2003279854A (ja) * 2002-03-26 2003-10-02 Canon Inc 投影光学系、露光装置、デバイス製造方法及びデバイス
WO2005001527A1 (de) * 2003-06-27 2005-01-06 Carl Zeiss Smt Ag Korrektureinrichtung zur kompensation von störungen der polarisationsverteilung sowie projektionsobjektiv für die mikrolithographie

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011508409A (ja) * 2007-11-20 2011-03-10 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系
US8379188B2 (en) 2007-11-20 2013-02-19 Carl Zeiss Smt Gmbh Optical system
JP2014179619A (ja) * 2013-03-14 2014-09-25 Carl Zeiss Smt Gmbh マイクロリソグラフィ投影露光装置のための光学系
JP2024014793A (ja) * 2022-07-20 2024-02-01 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ装置用の光学素子を製造する方法
JP7738034B2 (ja) 2022-07-20 2025-09-11 カール・ツァイス・エスエムティー・ゲーエムベーハー リソグラフィ装置用の光学素子を製造する方法

Also Published As

Publication number Publication date
TW200717046A (en) 2007-05-01
CN102207691B (zh) 2015-02-25
WO2007031544A1 (en) 2007-03-22
US20080204877A1 (en) 2008-08-28
KR20080043835A (ko) 2008-05-19
US8031326B2 (en) 2011-10-04
EP2085824A1 (en) 2009-08-05
CN101263432A (zh) 2008-09-10
CN101263432B (zh) 2011-07-27
CN102207691A (zh) 2011-10-05
EP1924890A1 (en) 2008-05-28

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