TW200717046A - Optical system, in particular illumination system or projection lens of a microlithographic exposure system - Google Patents
Optical system, in particular illumination system or projection lens of a microlithographic exposure systemInfo
- Publication number
- TW200717046A TW200717046A TW095134115A TW95134115A TW200717046A TW 200717046 A TW200717046 A TW 200717046A TW 095134115 A TW095134115 A TW 095134115A TW 95134115 A TW95134115 A TW 95134115A TW 200717046 A TW200717046 A TW 200717046A
- Authority
- TW
- Taiwan
- Prior art keywords
- orientation
- optical system
- rotation
- projection lens
- optical
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71757605P | 2005-09-14 | 2005-09-14 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200717046A true TW200717046A (en) | 2007-05-01 |
Family
ID=37499493
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095134115A TW200717046A (en) | 2005-09-14 | 2006-09-14 | Optical system, in particular illumination system or projection lens of a microlithographic exposure system |
Country Status (7)
Country | Link |
---|---|
US (1) | US8031326B2 (zh) |
EP (2) | EP1924890A1 (zh) |
JP (1) | JP2009508170A (zh) |
KR (1) | KR20080043835A (zh) |
CN (2) | CN102207691B (zh) |
TW (1) | TW200717046A (zh) |
WO (1) | WO2007031544A1 (zh) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
US8107162B2 (en) | 2004-05-17 | 2012-01-31 | Carl Zeiss Smt Gmbh | Catadioptric projection objective with intermediate images |
DE102006038454A1 (de) | 2005-12-23 | 2007-07-05 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage |
WO2008104192A1 (en) | 2007-02-28 | 2008-09-04 | Carl Zeiss Smt Ag | Catadioptric projection objective with pupil correction |
WO2008110501A1 (de) * | 2007-03-13 | 2008-09-18 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage |
WO2008119794A1 (en) | 2007-04-03 | 2008-10-09 | Carl Zeiss Smt Ag | Optical system, in particular illumination device or projection objective of a microlithographic projection exposure apparatus |
DE102007019831B4 (de) | 2007-04-25 | 2012-03-01 | Carl Zeiss Smt Gmbh | Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage |
US20090091728A1 (en) * | 2007-09-28 | 2009-04-09 | Carl Zeiss Smt Ag | Compact High Aperture Folded Catadioptric Projection Objective |
DE102007055567A1 (de) | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optisches System |
DE102008043321A1 (de) | 2008-01-17 | 2009-07-23 | Carl Zeiss Smt Ag | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage |
DE102009011329A1 (de) | 2009-03-05 | 2010-09-09 | Carl Zeiss Smt Ag | Kompaktes katadioptrisches Projektionsobjektiv für die Immersionslithographie sowie Projektionsbelichtungsverfahren |
DE102013204453B4 (de) * | 2013-03-14 | 2019-11-21 | Carl Zeiss Smt Gmbh | Optisches System für eine mikrolithographische Projektionsbelichtungsanlage, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauelemente |
US8922753B2 (en) | 2013-03-14 | 2014-12-30 | Carl Zeiss Smt Gmbh | Optical system for a microlithographic projection exposure apparatus |
US9519093B2 (en) * | 2013-08-23 | 2016-12-13 | Kla-Tencor Corporation | Broadband and wide field angle compensator |
DE102015223982A1 (de) | 2015-12-02 | 2017-06-08 | Carl Zeiss Smt Gmbh | Optisches System einer mikrolithographischen Projektionsbelichtungsanlage oder einer Waferinspektionsanlage |
CN111830616B (zh) * | 2019-04-16 | 2021-11-09 | 致晶科技(北京)有限公司 | 利用晶体制成的消色差相位延迟器和制作方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3014811B2 (ja) * | 1991-08-08 | 2000-02-28 | 富士通株式会社 | 偏光子及び該偏光子を備えた変調器 |
DE19535392A1 (de) | 1995-09-23 | 1997-03-27 | Zeiss Carl Fa | Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit |
US6829041B2 (en) * | 1997-07-29 | 2004-12-07 | Canon Kabushiki Kaisha | Projection optical system and projection exposure apparatus having the same |
DE19807120A1 (de) | 1998-02-20 | 1999-08-26 | Zeiss Carl Fa | Optisches System mit Polarisationskompensator |
US6630117B2 (en) * | 1999-06-04 | 2003-10-07 | Corning Incorporated | Making a dispersion managing crystal |
EP1371119A4 (en) * | 2001-03-02 | 2006-10-11 | Corning Inc | UV EXCIMER LASER WITH HIGH REPLACEMENT RATE |
WO2002093209A2 (de) | 2001-05-15 | 2002-11-21 | Carl Zeiss | Objektiv mit fluorid-kristall-linsen |
DE10133841A1 (de) * | 2001-07-18 | 2003-02-06 | Zeiss Carl | Objektiv mit Kristall-Linsen |
US7453641B2 (en) | 2001-10-30 | 2008-11-18 | Asml Netherlands B.V. | Structures and methods for reducing aberration in optical systems |
US6970232B2 (en) * | 2001-10-30 | 2005-11-29 | Asml Netherlands B.V. | Structures and methods for reducing aberration in integrated circuit fabrication systems |
JP4350341B2 (ja) * | 2002-03-26 | 2009-10-21 | キヤノン株式会社 | 光学系及び露光装置 |
US6950243B2 (en) * | 2002-04-19 | 2005-09-27 | Lockheed Martin Corporation | Refractive multispectral objective lens system and methods of selecting optical materials therefor |
US7154669B2 (en) * | 2002-08-05 | 2006-12-26 | Asml Holding N.V. | Method and system for correction of intrinsic birefringence in UV microlithography |
CN1739007B (zh) * | 2002-12-20 | 2013-06-19 | 海因兹仪器公司 | 测定透明样品的平面外双折射的方法和装置 |
DE10328938A1 (de) | 2003-06-27 | 2005-01-20 | Carl Zeiss Smt Ag | Korrektureinrichtung zur Kompensation von Störungen der Polarisationsverteilung sowie Projektionsobjektiv für die Mikrolithografie |
TW201834020A (zh) | 2003-10-28 | 2018-09-16 | 日商尼康股份有限公司 | 照明光學裝置、曝光裝置、曝光方法以及元件製造方法 |
DE10355725A1 (de) | 2003-11-28 | 2005-06-30 | Carl Zeiss Smt Ag | Optisches System sowie Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauteile |
JP5102492B2 (ja) | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結晶素子を有するマイクロリソグラフィー投影用対物レンズ |
US7301707B2 (en) | 2004-09-03 | 2007-11-27 | Carl Zeiss Smt Ag | Projection optical system and method |
-
2006
- 2006-09-13 KR KR1020087006172A patent/KR20080043835A/ko not_active Application Discontinuation
- 2006-09-13 WO PCT/EP2006/066332 patent/WO2007031544A1/en active Application Filing
- 2006-09-13 JP JP2008530521A patent/JP2009508170A/ja active Pending
- 2006-09-13 CN CN201110147181.7A patent/CN102207691B/zh not_active Expired - Fee Related
- 2006-09-13 EP EP06793489A patent/EP1924890A1/en not_active Withdrawn
- 2006-09-13 EP EP09160251A patent/EP2085824A1/en not_active Withdrawn
- 2006-09-13 CN CN2006800339207A patent/CN101263432B/zh active Active
- 2006-09-14 TW TW095134115A patent/TW200717046A/zh unknown
-
2008
- 2008-03-05 US US12/042,621 patent/US8031326B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN101263432B (zh) | 2011-07-27 |
US8031326B2 (en) | 2011-10-04 |
CN102207691A (zh) | 2011-10-05 |
US20080204877A1 (en) | 2008-08-28 |
KR20080043835A (ko) | 2008-05-19 |
EP2085824A1 (en) | 2009-08-05 |
CN101263432A (zh) | 2008-09-10 |
CN102207691B (zh) | 2015-02-25 |
EP1924890A1 (en) | 2008-05-28 |
JP2009508170A (ja) | 2009-02-26 |
WO2007031544A1 (en) | 2007-03-22 |
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