JP2009266824A - 基板に材料を蒸着する方法 - Google Patents
基板に材料を蒸着する方法 Download PDFInfo
- Publication number
- JP2009266824A JP2009266824A JP2009138834A JP2009138834A JP2009266824A JP 2009266824 A JP2009266824 A JP 2009266824A JP 2009138834 A JP2009138834 A JP 2009138834A JP 2009138834 A JP2009138834 A JP 2009138834A JP 2009266824 A JP2009266824 A JP 2009266824A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- solvent component
- boiling point
- range
- cold
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 title claims abstract description 33
- 239000000758 substrate Substances 0.000 title claims abstract description 14
- 238000000151 deposition Methods 0.000 title claims description 14
- 239000002904 solvent Substances 0.000 claims abstract description 64
- 238000009835 boiling Methods 0.000 claims abstract description 23
- 239000000203 mixture Substances 0.000 claims abstract description 13
- 238000009472 formulation Methods 0.000 claims abstract description 11
- 229920006395 saturated elastomer Polymers 0.000 claims abstract description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 13
- 230000008021 deposition Effects 0.000 claims description 5
- XHLHPRDBBAGVEG-UHFFFAOYSA-N 1-tetralone Chemical compound C1=CC=C2C(=O)CCCC2=C1 XHLHPRDBBAGVEG-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 230000000694 effects Effects 0.000 claims description 3
- HHNHBFLGXIUXCM-GFCCVEGCSA-N cyclohexylbenzene Chemical compound [CH]1CCCC[C@@H]1C1=CC=CC=C1 HHNHBFLGXIUXCM-GFCCVEGCSA-N 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 238000013329 compounding Methods 0.000 abstract description 4
- 230000001747 exhibiting effect Effects 0.000 abstract 2
- 230000005855 radiation Effects 0.000 abstract 2
- 229920000642 polymer Polymers 0.000 description 26
- 239000000243 solution Substances 0.000 description 9
- 238000005259 measurement Methods 0.000 description 4
- 239000012046 mixed solvent Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 239000004642 Polyimide Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- GWHJZXXIDMPWGX-UHFFFAOYSA-N 1,2,4-trimethylbenzene Chemical compound CC1=CC=C(C)C(C)=C1 GWHJZXXIDMPWGX-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 230000005525 hole transport Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- FNQJDLTXOVEEFB-UHFFFAOYSA-N 1,2,3-benzothiadiazole Chemical group C1=CC=C2SN=NC2=C1 FNQJDLTXOVEEFB-UHFFFAOYSA-N 0.000 description 1
- LIWRTHVZRZXVFX-UHFFFAOYSA-N 1-phenyl-3-propan-2-ylbenzene Chemical group CC(C)C1=CC=CC(C=2C=CC=CC=2)=C1 LIWRTHVZRZXVFX-UHFFFAOYSA-N 0.000 description 1
- RXACYPFGPNTUNV-UHFFFAOYSA-N 9,9-dioctylfluorene Chemical group C1=CC=C2C(CCCCCCCC)(CCCCCCCC)C3=CC=CC=C3C2=C1 RXACYPFGPNTUNV-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229920000547 conjugated polymer Polymers 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
- H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/36—Inkjet printing inks based on non-aqueous solvents
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/151—Copolymers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/917—Electroluminescent
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Electroluminescent Light Sources (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Abstract
【解決手段】冷光放射装置電荷輸送体(4)が電極(1,2)及び電子冷光放射性材料(3)間を移動できるように2つの電極に挟まれた電子冷光放射性材料と溶媒とを含む、冷光放射装置の製造用処方であって、前記溶媒が130から300℃の範囲の沸点を有し、前記電子冷光放射性材料の溶解度が容量当り0.03から0.3重量%である第1の溶媒成分、及び100から200℃の範囲の沸点を有し、前記電子冷光放射性材料の溶解度が容積当り0.5重量%を超える第2の溶媒成分からなり、かつ、第1の溶媒と第2の溶媒の沸点の差が30から250℃の範囲であり、第1溶媒成分の配合割合が、第2溶媒成分の除去によって、第1溶媒成分中の材料の残留溶液が飽和又は過飽和状態になるように決められることを特徴とする前記処方。
【選択図】図1
Description
1,2−ジメチルベンゼン中の実施例1及び2と同じ0.5%w/vF8BT高分子の液滴が、インクジェット法により表面が改質されたポリイミド基板上に蒸着された。乾燥液滴のプロフィールのDektak測定法により測定された。測定結果は、図4に示されている。
2 カソード
3 冷光放射性高分子
4 正孔輸送層
Claims (8)
- 冷光放射装置電荷輸送体が電極及び電子冷光放射性材料間を移動できるように2つの電極に挟まれた電子冷光放射性材料と溶媒とを含む、冷光放射装置の製造用処方であって、
前記溶媒が130から300℃の範囲の沸点を有し、前記電子冷光放射性材料の溶解度が容量当り0.03から0.3重量%である第1の溶媒成分、及び100から200℃の範囲の沸点を有し、前記電子冷光放射性材料の溶解度が容積当り0.5重量%を超える第2の溶媒成分からなり、かつ、第1の溶媒と第2の溶媒の沸点の差が30から250℃の範囲であり、
第1溶媒成分の配合割合が、第2溶媒成分の除去によって、第1溶媒成分中の材料の残留溶液が飽和又は過飽和状態になるように決められることを特徴とする前記処方。 - 第1の溶媒と第2の溶媒の沸点の差が70から150℃の範囲である請求項1に記載の処方。
- 第2溶媒成分に対する冷光放射性材料の溶解度が容積当り1.5重量%を超えることを特徴とする請求項1又は2に記載の処方。
- 第1溶媒成分がα−テトラロンからなり,第2溶媒成分が1,2−ジメチルベンゼンからなる請求項1に記載の処方。
- 第1溶媒成分がシクロヘキシルベンゼンからなり,第2溶媒成分が1,2−ジメチルベンゼンからなる請求項1に記載の処方。
- 溶媒に前記電子冷光放射性材料を溶解し、前記溶媒をインクジェット技術によってノズルを通して基板に蒸着し、それぞれの蒸着滴を乾燥させることによって使用される請求項1ないし5のいずれかに記載の処方。
- 基板上に蒸発した一滴の材料の厚さの変化が最大厚さの30%以下となる請求項6に記載の処方。
- 環状の蒸着による影響を減少させるか又は避けるためのものである請求項1ないし7のいずれかに記載の処方。
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW090104585A TW527432B (en) | 2001-02-28 | 2001-02-27 | A method and composition for depositing a polymer layer in the production of a light-emissive device, a method of forming a polymer layer on a substrate, and the use of a composition in an ink-jet method of depositing a polymer layer |
TW090104585 | 2001-02-27 | ||
GB0104875.0 | 2001-02-28 | ||
GBGB0104875.0A GB0104875D0 (en) | 2001-02-28 | 2001-02-28 | A formulation for depositing a conjugated polymer layer |
GBGB0107740.3A GB0107740D0 (en) | 2001-03-28 | 2001-03-28 | Formulation and method for depositing a material on a substrate |
GB0107740.3 | 2001-03-28 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002568175A Division JP4347569B2 (ja) | 2001-02-27 | 2002-02-27 | 基板に材料を蒸着する方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009266824A true JP2009266824A (ja) | 2009-11-12 |
JP5175799B2 JP5175799B2 (ja) | 2013-04-03 |
Family
ID=34276789
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009138834A Expired - Fee Related JP5175799B2 (ja) | 2001-02-27 | 2009-06-10 | 基板に材料を蒸着する方法 |
Country Status (3)
Country | Link |
---|---|
US (2) | US20060082627A9 (ja) |
JP (1) | JP5175799B2 (ja) |
CN (1) | CN100377380C (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011042794A (ja) * | 1999-03-29 | 2011-03-03 | Seiko Epson Corp | 機能デバイスの製造方法 |
WO2012001744A1 (ja) * | 2010-07-01 | 2012-01-05 | パナソニック株式会社 | 有機発光素子用インク、有機発光素子の製造方法、有機表示パネル、有機表示装置、有機発光装置、インク、機能層の形成方法、および有機発光素子 |
JP2015050095A (ja) * | 2013-09-03 | 2015-03-16 | セイコーエプソン株式会社 | 機能層形成用インクの製造方法、有機el素子の製造方法 |
JP2015166457A (ja) * | 2015-03-13 | 2015-09-24 | セイコーエプソン株式会社 | 成膜用インク、成膜方法、液滴吐出装置、膜付きデバイスおよび電子機器 |
WO2016121498A1 (ja) * | 2015-01-26 | 2016-08-04 | 住友化学株式会社 | 組成物およびそれを用いた発光素子 |
JP2020508362A (ja) * | 2017-02-17 | 2020-03-19 | ナージン テクノロジー コーポレーション リミテッドNajing Technology Corporation Limited | インク組成物、光電デバイスおよび光電デバイスの機能層の製造方法 |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020025918A (ko) * | 2002-02-15 | 2002-04-04 | 박병주 | 습식 공정으로 제작된 유기 반도체 디바이스 및 유기전계발광 소자 |
JP2003332560A (ja) * | 2002-05-13 | 2003-11-21 | Semiconductor Energy Lab Co Ltd | 半導体装置及びマイクロプロセッサ |
JP4373063B2 (ja) | 2002-09-02 | 2009-11-25 | 株式会社半導体エネルギー研究所 | 電子回路装置 |
JP4094386B2 (ja) | 2002-09-02 | 2008-06-04 | 株式会社半導体エネルギー研究所 | 電子回路装置 |
JP4574118B2 (ja) * | 2003-02-12 | 2010-11-04 | 株式会社半導体エネルギー研究所 | 半導体装置及びその作製方法 |
US7011529B2 (en) * | 2004-03-01 | 2006-03-14 | Anritsu Company | Hermetic glass bead assembly having high frequency compensation |
JP2005259523A (ja) * | 2004-03-11 | 2005-09-22 | Idemitsu Kosan Co Ltd | 有機エレクトロルミネッセンス素子、その製造方法及び有機溶液 |
US20050255253A1 (en) * | 2004-05-13 | 2005-11-17 | White John M | Apparatus and methods for curing ink on a substrate using an electron beam |
US20060109296A1 (en) * | 2004-11-04 | 2006-05-25 | Bassam Shamoun | Methods and apparatus for inkjet printing color filters for displays |
US20070042113A1 (en) * | 2004-11-04 | 2007-02-22 | Applied Materials, Inc. | Methods and apparatus for inkjet printing color filters for displays using pattern data |
US7413272B2 (en) * | 2004-11-04 | 2008-08-19 | Applied Materials, Inc. | Methods and apparatus for precision control of print head assemblies |
US20060092218A1 (en) * | 2004-11-04 | 2006-05-04 | Applied Materials, Inc. | Methods and apparatus for inkjet printing |
US7556334B2 (en) * | 2004-11-04 | 2009-07-07 | Applied Materials, Inc. | Methods and apparatus for aligning print heads |
US20060093751A1 (en) * | 2004-11-04 | 2006-05-04 | Applied Materials, Inc. | System and methods for inkjet printing for flat panel displays |
US20060185587A1 (en) * | 2005-02-18 | 2006-08-24 | Applied Materials, Inc. | Methods and apparatus for reducing ink conglomerates during inkjet printing for flat panel display manufacturing |
US8053024B2 (en) * | 2005-04-27 | 2011-11-08 | Konica Minolta Holdings, Inc. | Method for manufacturing organic electroluminescent device |
JP4682701B2 (ja) * | 2005-05-27 | 2011-05-11 | 凸版印刷株式会社 | 有機el素子用インキおよび有機el素子の製造方法 |
KR20070014986A (ko) * | 2005-07-28 | 2007-02-01 | 어플라이드 머티어리얼스, 인코포레이티드 | 동시적인 잉크젯 프린팅 및 결함 검사를 위한 방법 및 장치 |
US20070070132A1 (en) * | 2005-09-27 | 2007-03-29 | Fan-Cheung Sze | Inkjet delivery module |
US20080018677A1 (en) * | 2005-09-29 | 2008-01-24 | White John M | Methods and apparatus for inkjet print head cleaning using an inflatable bladder |
US20070076040A1 (en) * | 2005-09-29 | 2007-04-05 | Applied Materials, Inc. | Methods and apparatus for inkjet nozzle calibration |
US20070070109A1 (en) * | 2005-09-29 | 2007-03-29 | White John M | Methods and systems for calibration of inkjet drop positioning |
US20070068560A1 (en) * | 2005-09-29 | 2007-03-29 | Quanyuan Shang | Methods and apparatus for inkjet print head cleaning |
US7611217B2 (en) * | 2005-09-29 | 2009-11-03 | Applied Materials, Inc. | Methods and systems for inkjet drop positioning |
JP2007298950A (ja) * | 2006-02-07 | 2007-11-15 | Applied Materials Inc | カラーフィルタのムラ不整を低減するための方法及び装置 |
US8589573B2 (en) * | 2006-03-08 | 2013-11-19 | Cisco Technology, Inc. | Technique for preventing routing loops by disseminating BGP attribute information in an OSPF-configured network |
US20070256709A1 (en) * | 2006-04-29 | 2007-11-08 | Quanyuan Shang | Methods and apparatus for operating an inkjet printing system |
US20070263026A1 (en) * | 2006-04-29 | 2007-11-15 | Quanyuan Shang | Methods and apparatus for maintaining inkjet print heads using parking structures |
US20070252863A1 (en) * | 2006-04-29 | 2007-11-01 | Lizhong Sun | Methods and apparatus for maintaining inkjet print heads using parking structures with spray mechanisms |
US20080024532A1 (en) * | 2006-07-26 | 2008-01-31 | Si-Kyoung Kim | Methods and apparatus for inkjet printing system maintenance |
US20080022885A1 (en) * | 2006-07-27 | 2008-01-31 | Applied Materials, Inc. | Inks for display device manufacturing and methods of manufacturing and using the same |
WO2008013902A2 (en) * | 2006-07-28 | 2008-01-31 | Applied Materials, Inc. | Methods and apparatus for improved manufacturing of color filters |
US20080030562A1 (en) * | 2006-08-02 | 2008-02-07 | Applied Materials, Inc. | Methods and apparatus for improved ink for inkjet printing |
US7803420B2 (en) * | 2006-12-01 | 2010-09-28 | Applied Materials, Inc. | Methods and apparatus for inkjetting spacers in a flat panel display |
US20080204501A1 (en) * | 2006-12-01 | 2008-08-28 | Shinichi Kurita | Inkjet print head pressure regulator |
US7857413B2 (en) | 2007-03-01 | 2010-12-28 | Applied Materials, Inc. | Systems and methods for controlling and testing jetting stability in inkjet print heads |
US7637587B2 (en) * | 2007-08-29 | 2009-12-29 | Applied Materials, Inc. | System and method for reliability testing and troubleshooting inkjet printers |
US8174000B2 (en) * | 2009-02-11 | 2012-05-08 | Universal Display Corporation | Liquid compositions for inkjet printing of organic layers or other uses |
TWI576408B (zh) * | 2010-08-24 | 2017-04-01 | 精工愛普生股份有限公司 | 成膜用墨水、成膜方法、液滴噴出裝置、發光元件之製造方法、發光元件、發光裝置及電子機器 |
JP5938669B2 (ja) * | 2011-09-28 | 2016-06-22 | 株式会社Joled | 有機発光素子の製造方法、有機発光素子、有機表示装置、有機発光装置、機能層の形成方法、機能性部材、表示装置および発光装置 |
KR101900960B1 (ko) * | 2011-09-28 | 2018-09-20 | 가부시키가이샤 제이올레드 | 유기 발광 소자용 잉크, 및 당해 잉크의 제조 방법 |
JP6015073B2 (ja) * | 2012-04-02 | 2016-10-26 | セイコーエプソン株式会社 | 機能層形成用インク、発光素子の製造方法 |
KR102145424B1 (ko) * | 2013-11-11 | 2020-08-18 | 엘지디스플레이 주식회사 | 표시장치 제조용 잉크 및 이를 이용한 표시장치의 제조방법 |
JP6578629B2 (ja) * | 2014-03-24 | 2019-09-25 | セイコーエプソン株式会社 | 機能層形成用インク、発光素子の製造方法 |
CN110073507B (zh) * | 2017-03-21 | 2023-07-04 | 日本化药株式会社 | 有机半导体组合物、有机薄膜及有机薄膜晶体管 |
CN107880650B (zh) * | 2017-11-22 | 2021-02-19 | 华南理工大学 | 一种混合溶剂的喷墨打印墨水及其制备方法 |
CN109166893B (zh) * | 2018-08-31 | 2020-08-04 | 深圳市华星光电半导体显示技术有限公司 | 顶发光型有机发光二极管显示装置及其封装方法 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63264684A (ja) * | 1986-12-05 | 1988-11-01 | Dainippon Ink & Chem Inc | インク組成物 |
JPH1154272A (ja) * | 1997-07-31 | 1999-02-26 | Seiko Epson Corp | 発光ディスプレイの製造方法 |
WO2000059267A1 (fr) * | 1999-03-29 | 2000-10-05 | Seiko Epson Corporation | Composition, procede de preparation d'un film, et element fonctionnel et son procede de preparation |
JP2001052861A (ja) * | 1999-08-06 | 2001-02-23 | Sharp Corp | 有機ledディスプレイの有機層形成用塗液及び有機ledディスプレイの製造法 |
JP2003527955A (ja) * | 2000-03-23 | 2003-09-24 | セイコーエプソン株式会社 | 可溶性材料の堆積 |
JP4347569B2 (ja) * | 2001-02-27 | 2009-10-21 | ケンブリッジ ディスプレイ テクノロジー リミテッド | 基板に材料を蒸着する方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1341513A (ja) * | 1971-06-30 | 1973-12-25 | ||
US5091004A (en) * | 1987-09-22 | 1992-02-25 | Dainippon Ink And Chemicals, Inc. | Ink composition |
ATE228545T1 (de) | 1994-05-06 | 2002-12-15 | Bayer Ag | Leitfähige beschichtungen |
JP3899566B2 (ja) | 1996-11-25 | 2007-03-28 | セイコーエプソン株式会社 | 有機el表示装置の製造方法 |
US6309763B1 (en) | 1997-05-21 | 2001-10-30 | The Dow Chemical Company | Fluorene-containing polymers and electroluminescent devices therefrom |
GB9718516D0 (en) * | 1997-09-01 | 1997-11-05 | Cambridge Display Tech Ltd | Methods of Increasing the Efficiency of Organic Electroluminescent Devices |
WO1999029789A1 (en) * | 1997-12-04 | 1999-06-17 | Metal Sign & Label Pty. Ltd. | Printing method and ink compositions therefor |
JP4989012B2 (ja) | 2000-08-30 | 2012-08-01 | ケンブリッジ ディスプレイ テクノロジー リミテッド | 共役ポリマー層を成膜するための組成物 |
-
2002
- 2002-02-27 CN CNB028055950A patent/CN100377380C/zh not_active Expired - Lifetime
- 2002-02-27 US US10/469,443 patent/US20060082627A9/en not_active Abandoned
-
2008
- 2008-10-09 US US12/248,858 patent/US7807070B2/en not_active Expired - Fee Related
-
2009
- 2009-06-10 JP JP2009138834A patent/JP5175799B2/ja not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63264684A (ja) * | 1986-12-05 | 1988-11-01 | Dainippon Ink & Chem Inc | インク組成物 |
JPH1154272A (ja) * | 1997-07-31 | 1999-02-26 | Seiko Epson Corp | 発光ディスプレイの製造方法 |
WO2000059267A1 (fr) * | 1999-03-29 | 2000-10-05 | Seiko Epson Corporation | Composition, procede de preparation d'un film, et element fonctionnel et son procede de preparation |
JP2001052861A (ja) * | 1999-08-06 | 2001-02-23 | Sharp Corp | 有機ledディスプレイの有機層形成用塗液及び有機ledディスプレイの製造法 |
JP2003527955A (ja) * | 2000-03-23 | 2003-09-24 | セイコーエプソン株式会社 | 可溶性材料の堆積 |
JP4347569B2 (ja) * | 2001-02-27 | 2009-10-21 | ケンブリッジ ディスプレイ テクノロジー リミテッド | 基板に材料を蒸着する方法 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011042794A (ja) * | 1999-03-29 | 2011-03-03 | Seiko Epson Corp | 機能デバイスの製造方法 |
WO2012001744A1 (ja) * | 2010-07-01 | 2012-01-05 | パナソニック株式会社 | 有機発光素子用インク、有機発光素子の製造方法、有機表示パネル、有機表示装置、有機発光装置、インク、機能層の形成方法、および有機発光素子 |
US8308979B2 (en) | 2010-07-01 | 2012-11-13 | Panasonic Corporation | Ink for organic electroluminescent device, manufacturing method of organic electroluminescent device, organic display panel, organic display apparatus, organic electroluminescent apparatus, ink, forming method of functional layer, and organic electroluminescent device |
JP5543440B2 (ja) * | 2010-07-01 | 2014-07-09 | パナソニック株式会社 | 有機発光素子用インク、有機発光素子の製造方法、有機表示パネル、有機表示装置、有機発光装置、インク、機能層の形成方法、および有機発光素子 |
JP2015050095A (ja) * | 2013-09-03 | 2015-03-16 | セイコーエプソン株式会社 | 機能層形成用インクの製造方法、有機el素子の製造方法 |
WO2016121498A1 (ja) * | 2015-01-26 | 2016-08-04 | 住友化学株式会社 | 組成物およびそれを用いた発光素子 |
JPWO2016121498A1 (ja) * | 2015-01-26 | 2017-04-27 | 住友化学株式会社 | 組成物およびそれを用いた発光素子 |
US10323181B2 (en) | 2015-01-26 | 2019-06-18 | Sumitomo Chemical Company, Limited | Composition containing phosphorescent compound and light emitting device using the same |
JP2015166457A (ja) * | 2015-03-13 | 2015-09-24 | セイコーエプソン株式会社 | 成膜用インク、成膜方法、液滴吐出装置、膜付きデバイスおよび電子機器 |
JP2020508362A (ja) * | 2017-02-17 | 2020-03-19 | ナージン テクノロジー コーポレーション リミテッドNajing Technology Corporation Limited | インク組成物、光電デバイスおよび光電デバイスの機能層の製造方法 |
US11453795B2 (en) | 2017-02-17 | 2022-09-27 | Najing Technology Corporation Limited | Ink formulation, optoelectronic devices, and preparation methods of functional layer of optoelectronic devices |
Also Published As
Publication number | Publication date |
---|---|
CN100377380C (zh) | 2008-03-26 |
US20040109051A1 (en) | 2004-06-10 |
US20060082627A9 (en) | 2006-04-20 |
US7807070B2 (en) | 2010-10-05 |
JP5175799B2 (ja) | 2013-04-03 |
CN1505846A (zh) | 2004-06-16 |
US20090041928A1 (en) | 2009-02-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5175799B2 (ja) | 基板に材料を蒸着する方法 | |
JP4347569B2 (ja) | 基板に材料を蒸着する方法 | |
EP0954205B1 (en) | Organic electroluminescent device and method for producing it | |
KR101237264B1 (ko) | 막형성용 조성물 및 유기 전계 발광 소자 | |
Chen et al. | High performance inkjet-printed QLEDs with 18.3% EQE: improving interfacial contact by novel halogen-free binary solvent system | |
JP5417279B2 (ja) | 有機エレクトロルミネッセンス素子の製造方法及び有機エレクトロルミネッセンス素子用溶液 | |
JP2004535653A (ja) | 有機半導体の溶液および分散液 | |
JPWO2005123856A1 (ja) | 塗液、膜の製造方法、機能素子の製造方法、及び、機能素子 | |
EP1929560A1 (en) | Neutralized anode buffer layers to improve processing and performances of organic electronic devices | |
US20110018431A1 (en) | Organic electroluminescent device and method for manufacturing the same | |
KR101942266B1 (ko) | 전기 분무법을 이용한 유기 다층 박막의 제조방법 | |
Cole et al. | Flexible Ink‐Jet Printed Polymer Light‐Emitting Diodes using a Self‐Hosted Non‐Conjugated TADF Polymer | |
US8734196B2 (en) | Method for producing an organic radiation-emitting component and organic radiation-emitting component | |
US20060065889A1 (en) | Compositions for making organic thin films used in organic electronic devices | |
CN101222021B (zh) | 供沉积在基材上的材料配方和方法 | |
US10923661B2 (en) | Organic light emitting diode and fabricating method thereof | |
TWI829765B (zh) | 塗料組成物 | |
WO2002069119A2 (en) | Formulation for depositing a material on a substrate using ink jet printing | |
JP2007324367A (ja) | 有機エレクトロルミネッセンス素子 | |
TW201906946A (zh) | 非水系墨組成物 | |
Nag | Solution processed organic light emitting diodes |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110602 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A132 Effective date: 20111129 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120223 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120327 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120420 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20121211 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130107 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5175799 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |