JP2009253252A - Pattern drawing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a pattern drawing apparatus that checks and stocks a mask without conveying it out of the apparatus, whereby contamination and damage of the mask accompanying its conveyance can be prevented. <P>SOLUTION: A pattern drawing apparatus 1 includes a mask checking section 60, a mask cleaning section 70, a stocker section 50 within the apparatus, and a mask conveyance mechanism 40 for conveying a mask M among multiple optical heads 32a, 32b to 32g, the mask checking section 60, the mask cleaning section 70, and the stocker section 50. Consequently, without conveying the mask M out of the pattern drawing apparatus 1, it can be checked, cleaned, and stocked, thereby the contamination and damage of the mask M caused by the conveyance can be prevented. In addition, there is no need to prepare a conveyance route for the mask M outside the pattern drawing apparatus 1, thereby the work space for the total process flow can be decreased. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a pattern drawing apparatus for drawing a pattern on the surface of a substrate such as a glass substrate for a color filter, a glass substrate for a flat panel display, a semiconductor substrate, or a magnetic / optical disk substrate.

  In the substrate manufacturing process, a pattern drawing apparatus is used that draws a predetermined pattern on the surface of the substrate by irradiating light onto the surface of the substrate coated with the photosensitive material. The pattern writing apparatus includes a stage on which a substrate is placed and a plurality of optical heads that irradiate light on the upper surface of the substrate placed on the stage, and moves the substrate in the horizontal direction together with the stage, and a plurality of optical heads. A predetermined pattern is drawn on the upper surface of the substrate by irradiating light from the head.

  Each optical head of the pattern drawing apparatus is equipped with a mask which is a glass plate having a light transmitting part and a light shielding part corresponding to the pattern to be drawn. The pattern drawing apparatus projects the pattern on the mask onto the upper surface of the substrate by irradiating light emitted from the light source onto the upper surface of the substrate via a mask mounted on each optical head.

  Such a conventional pattern drawing apparatus is disclosed in Patent Document 1, for example.

JP 2006-145745 A

  In the conventional pattern drawing apparatus, the mask mounted on each optical head is exchanged according to the pattern to be drawn. However, conventionally, a stocker for storing a mask before and after use has been installed at a position away from the pattern drawing apparatus. Therefore, when exchanging the mask mounted on each optical head, the mask has to be transported between the stocker and the pattern drawing device by a human hand or a transport carriage (MGV). In particular, when using a large mask, it is difficult to secure a space for storing a plurality of masks used for each process in the vicinity of the pattern drawing apparatus. I had to store several masks.

  Further, the mask mounted on each optical head of the pattern writing apparatus is inspected periodically or as necessary in order to confirm the presence or absence of dirt or damage. However, such an inspection process is generally performed at a place different from a series of production processes including a drawing process. For this reason, conventionally, an inspection apparatus for inspecting a mask has also been installed at a position away from the pattern drawing apparatus. Therefore, when inspecting the mask, the mask has to be transported between the pattern drawing device and the inspection device by a human hand or a transport carriage (MGV).

  Thus, conventionally, it has been necessary to transport a mask between the pattern drawing device and a stocker or inspection device installed outside the pattern drawing device. For this reason, when carrying a mask, there existed a possibility that the new dirt and damage might generate | occur | produce on the surface of a mask. In addition, since it is necessary to secure a mask conveyance path between the pattern drawing apparatus and the stocker and inspection apparatus, there is a problem that the work space of the entire process becomes large.

  The present invention has been made in view of such circumstances, and pattern drawing that can inspect and store the mask without transporting it to the outside of the apparatus, thereby preventing the stain and damage of the mask accompanying transport. An object is to provide an apparatus.

  In order to solve the above-mentioned problem, the invention according to claim 1 is directed to a pattern drawing apparatus that draws a pattern on the surface of the substrate by irradiating the surface of the substrate with light through a mask having a light transmitting portion and a light shielding portion. A plurality of optical heads having a holding unit for holding the mask and irradiating light on the surface of the substrate through the mask held by the holding unit, and at positions different from the plurality of optical heads; A mask inspection unit for inspecting the mask, a stocker unit for storing the mask, and holding the mask by a predetermined hand, the plurality of optical heads, the mask inspection unit, and the stocker unit. And a mask carrying means for carrying the mask between them.

  The invention according to claim 2 is the pattern drawing apparatus according to claim 1, wherein the mask carrying means includes a moving means for moving the hand along an arrangement direction of the plurality of optical heads, At least one of the mask inspection unit and the stocker unit is disposed in the vicinity of an end of the moving path of the hand by the moving unit.

  The invention according to claim 3 is the pattern drawing apparatus according to claim 1 or 2, further comprising a mask cleaning unit that cleans the mask, wherein the mask transport means includes the plurality of optical heads. The mask is transported between the mask inspection unit, the stocker unit, and the mask cleaning unit.

  A fourth aspect of the present invention is the pattern drawing apparatus according to the third aspect, wherein the mask cleaning unit includes an ultraviolet irradiation unit that irradiates the mask with ultraviolet rays.

  The invention according to claim 5 is the pattern drawing apparatus according to claim 3 or claim 4, wherein the mask cleaning unit is configured to clean the mask with a chemical solution, a rinse with pure water, and a drying process. It is characterized by performing.

  The invention according to claim 6 is the pattern drawing apparatus according to any one of claims 3 to 5, wherein the mask by the mask transport unit is based on an inspection result of the mask by the mask inspection unit. Is further provided with a control unit that selects whether or not to perform the transfer to the mask cleaning unit.

  The invention according to claim 7 is the pattern drawing apparatus according to any one of claims 1 to 6, wherein the mask inspection unit transmits the mask while irradiating the mask with light. The contamination of the mask is detected by observing the light to be emitted.

  The invention according to an eighth aspect is the pattern drawing apparatus according to any one of the first to seventh aspects, wherein the mask inspection unit is held by the hand in the middle of a conveyance path of the mask conveyance means. The mask is inspected.

  The invention according to a ninth aspect is the pattern drawing apparatus according to any one of the first to eighth aspects, wherein the holding portions of the plurality of optical heads when a drawing process on the substrate is not executed. The apparatus further comprises auxiliary inspection means for inspecting the mask held on the substrate.

  The invention according to claim 10 is the pattern drawing apparatus according to any one of claims 1 to 9, wherein the stocker unit collects a plurality of masks simultaneously mounted on the plurality of optical heads. And having a cassette for storage.

  The invention according to an eleventh aspect is the pattern drawing apparatus according to the tenth aspect, wherein the cassette collectively stores a plurality of masks and spare masks that are simultaneously mounted on the plurality of optical heads. It is characterized by doing.

  A twelfth aspect of the present invention is the pattern drawing apparatus according to any one of the first to eleventh aspects, wherein the pattern drawing apparatus is installed in an environment in which an atmosphere is controlled by a HEPA filter.

  According to the first to twelfth aspects of the present invention, the pattern writing apparatus includes a mask inspection unit that inspects a mask at a position different from the plurality of optical heads, a stocker unit that stores the mask, and a mask by a predetermined hand. And a plurality of optical heads, a mask inspection section, and a mask transport means for transporting the mask between the stocker sections. For this reason, it is possible to inspect and store the mask without transporting it to the outside of the apparatus, thereby preventing the mask from being stained or damaged due to transport.

  In particular, according to the second aspect of the present invention, the mask carrying means has a moving means for moving the hand along the arrangement direction of the plurality of optical heads, and is near the end of the moving path of the hand by the moving means. At least one of a mask inspection part and a stocker part is arranged. For this reason, it is possible to carry the mask to the mask inspection unit or the stocker unit by using the moving axis of the hand along the arrangement direction of the plurality of optical heads.

  In particular, according to the invention described in claim 3, the mask transport means transports the mask among the plurality of optical heads, the mask inspection unit, the stocker unit, and the mask cleaning unit. For this reason, it is possible to inspect, clean, and store the mask without transporting it to the outside of the apparatus, thereby further preventing the mask from being contaminated or damaged due to transport.

  In particular, according to the fourth aspect of the present invention, the mask cleaning unit has an ultraviolet irradiation unit that irradiates the mask with ultraviolet rays. For this reason, it is possible to perform a cleaning process using ultraviolet rays on the mask without transporting the mask to the outside of the apparatus.

  In particular, according to the fifth aspect of the present invention, the mask cleaning section performs a cleaning process using a chemical solution, a rinsing process using pure water, and a drying process on the mask. For this reason, it is possible to perform a cleaning process using a chemical solution, a rinsing process using pure water, and a drying process without transporting the mask to the outside of the apparatus.

  In particular, according to the invention described in claim 6, the pattern drawing apparatus selects whether or not to carry the mask to the mask cleaning unit by the mask carrying unit based on the mask inspection result by the mask inspection unit. And a control unit. For this reason, it is possible to efficiently clean only the mask that needs to be cleaned.

  In particular, according to the seventh aspect of the present invention, the mask inspection unit detects the contamination of the mask by observing light transmitted through the mask while irradiating the mask with light. For this reason, it is possible to satisfactorily detect the dirt on the mask that affects the projection of the pattern.

  In particular, according to the invention described in claim 8, the mask inspection unit inspects the mask held by the hand in the middle of the transport path of the mask transport means. For this reason, it is possible to quickly inspect the mask without transferring the mask from the hand to another holder.

  In particular, according to the ninth aspect of the present invention, the pattern drawing apparatus further includes auxiliary inspection means for inspecting the masks held by the holding portions of the plurality of optical heads when drawing processing on the substrate is not performed. Prepare. For this reason, the mask can be inspected without carrying out the mask from the optical head during the time between drawing processes on the substrate.

  In particular, according to the invention described in claim 10, the stocker unit has a cassette that collectively stores a plurality of masks that are simultaneously mounted on a plurality of optical heads. For this reason, masks can be stored and managed in cassettes for each product type.

  In particular, according to the eleventh aspect of the present invention, the cassette collectively stores a plurality of masks and spare masks that are simultaneously mounted on a plurality of optical heads. For this reason, even if some masks out of the plurality of masks mounted on the plurality of optical heads cannot be used, the drawing process can be continued using the spare mask.

  In particular, according to the twelfth aspect of the present invention, the pattern drawing apparatus is installed in an environment where the atmosphere is controlled by the HEPA filter. For this reason, it is possible to prevent particles from adhering to the mask while the mask is being conveyed by the mask conveying means or when the mask is stored in the stocker unit.

  Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings. Note that FIGS. 1 to 4 and FIGS. 7 to 9 referred to in the following description show a common XYZ orthogonal coordinate system in order to clarify the positional relationship and operation direction of each part in the apparatus. Yes.

<1. Overall Configuration of Pattern Drawing Device>
1 and 2 are a side view and a top view of a pattern drawing apparatus 1 according to an embodiment of the present invention. In the pattern drawing device 1, in the process of manufacturing a color filter of a liquid crystal display device, a regular pattern that becomes pixels of the liquid crystal display device is formed on the upper surface of a glass substrate for color filter (hereinafter simply referred to as “substrate”) 9. It is a device for drawing.

  As shown in FIGS. 1 and 2, the pattern drawing apparatus 1 includes a stage 10 that holds a substrate 9, a stage driving unit 20 that is connected to the stage 10, and a plurality of optical heads 32 a, 32 b,. , 32g, a mask transport mechanism 40 that transports the mask M mounted on each of the optical heads 32a, 32b,..., 32g, a stocker unit 50 that stores the mask M, and a mask inspection unit 60 that inspects the mask M. And a mask cleaning unit 70 for cleaning the mask M, and a control unit 80 for controlling the operation of each unit in the apparatus.

  The stage 10 has a flat outer shape, and is a holding unit for placing and holding the substrate 9 on the upper surface thereof in a horizontal posture. A plurality of suction holes (not shown) are formed on the upper surface of the stage 10. For this reason, when the substrate 9 is placed on the stage 10, the substrate 9 is fixedly held on the upper surface of the stage 10 by the suction pressure of the suction holes. A layer of a photosensitive material such as a color resist is formed on the surface of the substrate 9 held on the stage 10.

  The stage drive unit 20 is a mechanism for moving the stage 10 in the main scanning direction (Y-axis direction), the sub-scanning direction (X-axis direction), and the rotation direction (rotation direction around the Z-axis). The stage drive unit 20 includes a rotation mechanism 21 that rotates the stage 10, a support plate 22 that rotatably supports the stage 10, a sub-scanning mechanism 23 that moves the support plate 22 in the sub-scanning direction, and a sub-scanning mechanism 23. And a main scanning mechanism 25 for moving the base plate 24 in the main scanning direction.

  The rotation mechanism 21 includes a linear motor 21 a that includes a mover attached to the end of the stage 10 on the −Y side and a stator laid on the upper surface of the support plate 22. A rotation shaft 21 b is provided between the lower surface side of the center portion of the stage 10 and the support plate 22. For this reason, when the linear motor 21a is operated, the moving element moves in the sub-scanning direction along the stator, and the stage 10 rotates within a predetermined angle range around the rotating shaft 21b on the support plate 22.

  The sub-scanning mechanism 23 includes a linear motor 23 a configured by a mover attached to the lower surface of the support plate 22 and a stator laid on the upper surface of the base plate 24. In addition, a pair of guide portions 23 b extending in the sub-scanning direction is provided between the support plate 22 and the base plate 24. For this reason, when the linear motor 23a is operated, the support plate 22 moves in the sub-scanning direction along the guide portion 23b on the base plate 24.

  The main scanning mechanism 25 has a linear motor 25 a configured by a mover attached to the lower surface of the base plate 24 and a stator laid on the base 11 of the apparatus 1. A pair of guide portions 25 b extending in the main scanning direction is provided between the base plate 24 and the base 11. For this reason, when the linear motor 25 a is operated, the base plate 24 moves in the main scanning direction along the guide portion 25 b on the base 11.

  The head unit 30 is a mechanism for irradiating pulsed light toward the upper surface of the substrate 9 held on the stage 10. The head unit 30 includes a frame 31 installed on the base 11 so as to straddle the stage 10 and the stage driving unit 20, and seven optical heads 32a attached to the frame 31 at equal intervals along the sub-scanning direction. 32b, ..., 32g. The seven optical heads 32 a, 32 b,..., 32 g are connected to one laser oscillator 34 via the illumination optical system 33. The laser oscillator 34 is connected to a laser driving unit 35 that performs on / off driving of the laser oscillator 34. When the laser drive unit 35 is operated, pulsed light is oscillated from the laser oscillator 34, and the oscillated pulsed light is introduced into the optical heads 32a, 32b,..., 32g via the illumination optical system 33.

  In each of the optical heads 32a, 32b,..., 32g, an emission part 36 for emitting the pulsed light introduced from the illumination optical system 33 downward, and a mask for partially shielding the pulsed light. A unit 37 and a projection optical system 38 for forming an image of pulsed light on the upper surface of the substrate 9 are provided. On the mask unit 37, a mask M, which is a glass plate having a light transmitting portion and a light shielding portion corresponding to a pattern to be drawn, is mounted (held). The pulsed light emitted from the emission part 36 is shielded according to the pattern on the mask M when passing through the mask unit 37, and enters the projection optical system 38 as a light beam shaped into a predetermined pattern shape. Then, pulse light is irradiated onto the upper surface of the substrate 9 through the projection optical system 38, and a pattern is drawn on the upper surface of the substrate 9 by exposing the photosensitive material on the substrate 9.

  As described above, the pattern drawing apparatus 1 according to the present embodiment includes the plurality of optical heads 32a, 32b,..., 32g, and draws the upper surface of the substrate 9 by using the plurality of optical heads 32a, 32b,. . For this reason, the mask M mounted on each of the optical heads 32a, 32b,..., 32g can be a small piece of about 100 mm × 150 mm, for example. As a result, it is possible to carry, inspect, clean, and store the mask M in a small space in the apparatus. Further, as will be described later, a plurality of masks M can be individually conveyed, inspected, cleaned, and stored.

  As conceptually shown in FIG. 1, the mask unit 37 is moved to the −Y side when the mask M is transferred to and from the mask transport mechanism 40 to each of the optical heads 32a, 32b,. A mask moving mechanism 37a for advancing is provided. The mask moving mechanism 37a is realized, for example, as a mechanism in which a guide rail extending in the main scanning direction and a linear motor are combined. When the mask moving mechanism 37a is operated, the mask unit 37 moves to the positions inside the optical heads 32a, 32b,..., 32g (positions in FIG. 1) and the -Y side of the optical heads 32a, 32b,. It moves forward and backward between the position protruding to

  Further, an irradiation light photographing unit 39 for photographing pulse light emitted from each of the optical heads 32a, 32b,..., 32g is provided at a position below the head unit 30. The irradiation light photographing unit 39 includes a CCD camera 39a, a guide rail 39b fixed to the + Y side end of the base plate 24, and a camera moving mechanism 39c that moves the CCD camera 39a in the sub-scanning direction along the guide rail 39b. Have The camera moving mechanism 39c is realized as, for example, a linear motor provided between the CCD camera 39a and the guide rail 39b.

  When photographing with the irradiation light photographing unit 39, first, the base plate 24 is moved so that the CCD camera 39a is positioned below the head unit 30 (so as to be in the state of FIGS. 1 and 2). Then, while moving the CCD camera 39a in the sub-scanning direction along the guide rail 39b, the optical heads 32a, 32b,..., 32g are irradiated with pulsed light, and the irradiated pulsed light is photographed by the CCD camera 39a. The image data acquired by the CCD camera 39a is transmitted to the control unit 80 and used to inspect the state of the mask M mounted on each optical head 32a, 32b,.

  The mask transport mechanism 40 is a mechanism for transporting the mask M between the plurality of optical heads 32a, 32b,..., 32g, the stocker unit 50, the mask inspection unit 60, and the mask cleaning unit 70 while holding the mask M. It is. The mask transport mechanism 40 has a hand 41 that holds the mask M and a hand moving mechanism 42 conceptually shown in FIG. The hand 41 has a pair of holding claws at the top and bottom, and holds the mask M in a horizontal posture by pinching the end of the mask M with the pair of holding claws.

  The hand moving mechanism 42 extends along the conveyance main shaft 42a extending in the sub-scanning direction, the −Y side position of the optical heads 32a, 32b,..., 32g, the −Y side position of the stocker unit 50, and the mask cleaning unit 70. The hand 41 is moved between positions on the −X side. When transferring the mask M between the hand 41 and the optical heads 32a, 32b,..., 32g, the hand 41 is approached from the −X side with respect to the mask unit 37 advanced to the −Y side. The transfer of the mask M to the mask unit 37 or the transfer of the mask M from the mask unit 37 to the hand 41 is performed.

  Further, the hand moving mechanism 42 can rotate the hand 41 around the vertical axis and move it in the main scanning direction at the position on the −Y side of the stocker unit 50. When the mask M is transferred between the hand 41 and the stocker unit 50, the hand 41 is brought closer to the cassette 51 set in the stocker unit 50 from the -Y side, and the mask M from the hand 41 to the cassette 51 is transferred. Transfer of the mask M from the cassette 51 to the hand 41 is performed.

  Further, the hand moving mechanism 42 is located between the position facing the carry-in port 711 of the mask cleaning unit 70 and the position facing the carry-out port 712 of the mask cleaning unit 70 at the −X side position of the mask cleaning unit 70. The hand 41 can be moved up and down (see FIGS. 3 and 4). When carrying the mask M into the mask cleaning unit 70, the tip of the hand 41 is caused to enter the mask cleaning unit 70 through the carry-in port 711 from the position on the −X side of the carry-in port 711, and from the hand 41 to the mask cleaning unit 70. The mask M is transferred to. Further, when unloading the mask M from the mask cleaning unit 70, the tip of the hand 41 enters the inside of the mask cleaning unit 70 from the position on the −X side of the carry-out port 712 via the carry-out port 712, and the mask cleaning unit 70 The mask M is transferred to the hand 41.

  The hand moving mechanism 42 is, for example, a combination of a guide rail laid along the conveyance path of the hand 41, a linear motor that moves the hand 41 on the guide rail, and a rotation motor that rotates the hand 41 about the vertical axis. Can be realized as a mechanism.

  The stocker unit 50 is a mechanism for storing a mask M before and after use and a spare mask M. In the stocker unit 50, three cassettes 51 that can store a plurality of masks M in multiple stages up and down are arranged along the sub-scanning direction (the direction of the conveyance main shaft 42a of the mask conveyance mechanism 40). In each cassette 51, when drawing a single product, seven masks M and one spare mask M which are simultaneously mounted on the plurality of optical heads 32a, 32b,. Stored. That is, a plurality of masks M are stored in three cassettes 51 for each type (for each pattern), and eight masks M of the same type (the same pattern) are stored in one cassette 51.

  As conceptually shown in FIG. 2, the stocker unit 50 is connected to a cassette lifting mechanism 52 that individually moves the three cassettes 51 up and down. The cassette lifting / lowering mechanism 52 is realized, for example, as a mechanism that combines a ball screw erected along the vertical direction and a motor that rotates the ball screw. When the hand 41 of the mask transport mechanism 40 takes out the mask M from the cassette 51 or stores the mask M in the cassette 51, the cassette lifting mechanism 52 moves the cassette 51 up and down to take out or store the mask M. The height of the step for performing is matched with the height of the hand 41.

  The mask inspection unit 60 is a mechanism for inspecting the mask M outside the optical heads 32a, 32b,..., 32g. FIG. 3 is a side view of the mask inspection section 60 and the vicinity thereof as viewed from the −Y side. As shown in FIG. 3, the mask inspection unit 60 includes a light projecting unit 61 that irradiates inspection light from below the inspection position IP set on the transport path of the mask M toward the inspection position IP, and an inspection position IP. And an inspection camera 62 for photographing inspection light. When inspecting the mask M, first, the mask transport mechanism 40 places the mask M at the inspection position IP. Then, the inspection light is irradiated from the light projecting unit 61, the inspection light transmitted through the mask M is photographed by the inspection camera 62, and the acquired image data is analyzed by the control unit 80, so that it adheres on the mask M. Detect dirt such as particles.

  As described above, the mask inspection unit 60 inspects the mask M at a position different from the plurality of optical heads 32 a, 32 b,..., 32 g and at a position that does not interfere with the movement of the stage 10. For this reason, even if the drawing process is in progress, the mask M can be inspected independently of the drawing process. In particular, the mask inspection unit 60 of the present embodiment inspects the mask M held by the hand 41 in the middle of the mask M transport path by the mask transport mechanism 40. For this reason, the mask M can be inspected quickly without transferring the mask from the hand 41 to another holder.

  The mask cleaning unit 70 is a mechanism for cleaning the mask M and removing dirt adhering to the surface of the mask M. FIG. 4 is a diagram schematically showing the internal configuration of the mask cleaning unit 70. As shown in FIG. 4, the mask cleaning unit 70 includes a chamber 71 containing a processing space for cleaning the mask M, a UV cleaning processing unit 72, a chemical solution cleaning processing unit 73 disposed inside the chamber 71, A rinse treatment unit 74, a drying treatment unit 75, a lower conveyor 76, a lifter 77, and an upper conveyor 78 are included. On the side surface of the chamber 71 on the −X side, a carry-in port 711 for carrying in the mask M and a carry-out port 712 for carrying out the mask M are formed in a lower stage and an upper stage, respectively. An opening / closing shutter is provided at each of the carry-in entrance 711 and the carry-out exit 712.

  Inside the chamber 71, a UV cleaning processing unit 72, a chemical solution cleaning processing unit 73, a rinse processing unit 74, and a drying processing unit 75 are sequentially arranged from the carry-in entrance 711 side to the back side. The mask M carried into the chamber 71 from the hand 41 via the carry-in port 711 is transported by the lower conveyor 76, while the UV cleaning processing unit 72, the chemical solution cleaning processing unit 73, the rinse processing unit 74, and the drying processing unit. In 75, a cleaning process by ultraviolet irradiation, a cleaning process with a chemical solution, a rinsing process with pure water, and a drying process with an air knife are performed. Then, the dried mask M is pulled up to the upper stage by the lifter 77, and then conveyed from the back side to the carry-out port 712 side by the upper conveyor 78, and is handed over to the hand 41 again through the carry-out port 712.

  The vicinity of the carry-in entrance 711 of the mask cleaning unit 70 is an area for transporting the mask M before cleaning, and is also an area where mist of chemicals and pure water scatters, so the cleanliness may be relatively low. In this regard, in this embodiment, a carry-out port 712 is provided separately from the carry-in port 711. For this reason, even if particles and mist exist near the carry-in entrance 711, the particles and mist do not adhere to the cleaned mask M. In the present embodiment, the pressure inside the chamber 71 is controlled to be slightly lower than the pressure outside the chamber 71. For this reason, even when the carry-in entrance 711 and the carry-out exit 712 are opened, particles and mist are scattered from the inside of the chamber 71 to the outside of the chamber 71 (region where drawing processing is performed) via the carry-in entrance 711 or the carry-out exit 712. There is nothing.

  The control unit 80 is an information processing unit for controlling operations of the above-described units of the pattern drawing apparatus 1. FIG. 5 is a block diagram illustrating a connection configuration between the above-described units of the pattern drawing apparatus 1 and the control unit 80. As shown in FIG. 5, the control unit 80 includes the rotation mechanism 21, the sub-scanning mechanism 23, the main scanning mechanism 25, the laser driving unit 35, the illumination optical system 33, the projection optical system 38, the mask moving mechanism 37a, the CCD. The camera 39a, the camera moving mechanism 39c, the hand moving mechanism 42, the cassette lifting mechanism 52, the mask inspection unit 60, and the mask cleaning unit 70 are electrically connected to control these operations. The control unit 80 is configured by a computer having a CPU and a memory, for example, and controls the above-described units by the computer operating according to programs installed in the computer and various input data.

  When performing a drawing process in such a pattern drawing apparatus 1, pulse light is emitted from each of the optical heads 32a, 32b,..., 32g while moving the stage 10 in the main scanning direction and the sub-scanning direction according to the inputted drawing data. By irradiating, a pattern is drawn on the upper surface of the substrate 9. Specifically, first, pulse light is irradiated from each of the optical heads 32a, 32b,..., 32g while moving the stage 10 in the main scanning direction. Thereby, a plurality of pattern groups are drawn on the upper surface of the substrate 9 in the main scanning direction with a predetermined exposure width (for example, 50 mm width). When one drawing in the main scanning direction is completed, the pattern drawing apparatus 1 moves the stage 10 by the exposure width in the sub-scanning direction, and moves the stage 10 in the main scanning direction again while moving the optical heads 32a, 32b, ..., 32g is irradiated with pulsed light. As described above, the pattern drawing apparatus 1 repeats drawing in the main scanning direction a predetermined number of times (for example, four times) while shifting the substrate 9 in the sub-scanning direction by the exposure width of the optical heads 32a, 32b,. Thus, a regular pattern for the color filter is drawn on the upper surface of the substrate 9.

<2. About mask inspection, cleaning, and replacement>
The pattern drawing apparatus 1 has a function of individually inspecting the masks M mounted on the optical heads 32a, 32b,..., 32g, and cleaning or replacing the masks M as necessary. Hereinafter, an example of such inspection, cleaning, and replacement operations of the mask M will be described with reference to the flowchart of FIG. The following series of operations proceeds as the control unit 80 controls the operation of each unit in the apparatus.

  First, the pattern drawing apparatus 1 takes out the mask M from the optical head to be inspected (hereinafter referred to as “optical head 32n”) (step S1). Specifically, the hand 41 of the mask transport mechanism 40 is moved to a position near the optical head 32n, and the mask unit 37 of the optical head 32n is advanced to the −Y side. Then, the hand 41 picks and takes out the mask M held by the mask unit 37. When the mask M is transferred from the mask unit 37 to the hand 41, the mask unit 37 moves backward to the + Y side.

  Next, the pattern drawing apparatus 1 inspects the mask M taken out from the optical head 32n (step S2). Specifically, the pattern drawing apparatus 1 moves the hand 41 to the + X side and places the mask M at the inspection position IP. Then, the inspection light is irradiated from the light projecting unit 61 of the mask inspection unit 60, and the inspection light that has passed through the mask M is photographed by the inspection camera 62. Image data acquired by the inspection camera 62 is transmitted to the control unit 80 and analyzed by the control unit 80. Thereby, the dirt on the mask M is detected.

  Subsequently, the control unit 80 of the pattern drawing apparatus 1 determines whether or not dirt is detected in the inspection in step S2 (step S3). If it is determined that no dirt has been detected, the mask M is returned to the optical head 32n without being transported to the mask cleaning unit 70 or the stocker unit 50 (step S4). Specifically, the hand 41 of the mask transport mechanism 40 is moved again to a position near the optical head 32n, and the mask unit 37 of the optical head 32n is advanced to the −Y side so that the mask M held by the hand 41 is masked. Transfer on the unit 37.

  After step S4, the controller 80 of the pattern drawing apparatus 1 determines whether or not the optical head 32n is the last optical head among the optical heads 32a, 32b,..., 32g to be inspected (step S5). ). When it is determined that the optical head 32n is the final optical head, the control unit 80 ends a series of operations of the pattern drawing apparatus 1 relating to the inspection, cleaning, and replacement of the mask M.

  If it is determined in step S5 that the optical head 32n is not the final optical head, the pattern drawing apparatus 1 changes the optical head 32n to be inspected (step S6) and returns to step S1. The pattern drawing apparatus 1 repeats the processes after step S1 for the mask M of the optical head 32n newly designated as the inspection target.

  On the other hand, if it is determined in step S3 that the contamination has been detected, the pattern drawing apparatus 1 further moves the hand 41 of the mask transport mechanism 40 in the + X direction and the −Z direction, and the mask cleaning unit. The mask M is transferred to the 70 carry-in entrance 711. Then, the mask M is transferred from the hand 41 to the inside of the mask cleaning unit 70 via the carry-in port 711. In the mask cleaning unit 70, the mask is subjected to a cleaning process using ultraviolet rays, a chemical cleaning process, and pure water. A rinsing process and an air knife drying process are sequentially performed (step S7). The mask M after the drying process is conveyed to the vicinity of the carry-out port 712 by the upper conveyor 78.

  While the mask cleaning process is being performed by the mask cleaning unit 70, the pattern drawing apparatus 1 takes out the spare mask M from the cassette 51 of the stocker unit 50 and mounts the spare mask M on the optical head 32n ( Step S8). Specifically, the hand 41 that has passed the mask M to the mask cleaning unit 70 in step S7 is moved to a position near the stocker unit 50, and the spare mask M stored in the cassette 51 is picked by the hand 41. Take out. Then, the hand 41 holding the spare mask M is moved to a position near the optical head 32n, and the mask unit 37 of the optical head 32n is advanced to the −Y side so that the spare mask M held by the hand 41 is moved. It is transferred onto the mask unit 37.

  When the spare mask M is mounted on the optical head 32n, the pattern writing apparatus 1 moves the hand 41 again to the + X side and makes the hand 41 stand by in front of the carry-out port 712 of the mask cleaning unit 70. Then, when the cleaning process of the mask M by the mask cleaning unit 70 is completed, the mask M after the cleaning process is transferred from the mask cleaning unit 70 to the hand 41 via the carry-out port 712. Thereafter, the pattern drawing apparatus 1 moves the hand 41 to a position near the stocker unit 50, stores the cleaned mask M in the cassette 51 (step S9), and ends a series of processes.

  As described above, the pattern drawing apparatus 1 of the present embodiment includes the mask inspection unit 60, the mask cleaning unit 70, and the stocker unit 50 in the apparatus, and a plurality of optical heads 32a, 32b,. A mask transport mechanism 40 that transports the mask M between the unit 60, the mask cleaning unit 70, and the stocker unit 50 is provided. For this reason, the mask M can be inspected, cleaned, and stored without being transported to the outside of the pattern drawing apparatus 1, thereby preventing the mask M from being soiled or damaged due to transport. Further, since it is not necessary to secure a transport path for the mask M outside the pattern drawing apparatus 1, the work space of the entire process can be reduced.

  In particular, the mask transport mechanism 40 of the present embodiment transports the mask M mainly along the arrangement direction of the plurality of optical heads 32a, 32b,. The mask inspection unit 60, the mask cleaning unit 70, and the stocker unit 50 are arranged in the vicinity of the end of the transport spindle 42a of the mask M. Therefore, the mask M is transported to both the plurality of optical heads 32a, 32b,..., 32g, the mask inspection unit 60, the mask cleaning unit 70, and the stocker unit 50 by using the transport spindle 42a of the mask M. can do.

  In addition, the mask transport mechanism 40, the mask inspection unit 60, and the mask cleaning unit 70 of the present embodiment all transport, inspect, and clean the mask M one by one. Therefore, only the desired mask M among the masks M mounted on the plurality of optical heads 32a, 32b,..., 32g can be transported, inspected, and cleaned. Further, while one mask is being cleaned, the drawing process can be continued using the spare mask M previously stored in the stocker unit 50. For this reason, the mask M can be cleaned while maintaining the productivity of the pattern writing apparatus 1.

  Further, the pattern drawing apparatus 1 of the present embodiment sequentially inspects a plurality of masks M in the mask inspection unit 60, and determines whether or not to transport the mask M to the mask cleaning unit 70 based on the inspection result. To do. Therefore, only the mask M that needs to be cleaned can be transported to the mask cleaning unit 70 and cleaned efficiently.

<3. Modification>
Although one embodiment of the present invention has been described above, the present invention is not limited to the above embodiment. For example, in the above embodiment, as an example of the drive mechanism of each part in the apparatus, a mechanism in which a motor and a ball screw are combined or a mechanism using a linear motor has been described. An equivalent operation may be realized using a known drive mechanism.

  In the above-described embodiment, the mask inspection unit 60 inspects the mask M held by the hand 41 on the transport path of the mask transport mechanism 40, but the holder unique to the mask inspection unit 60 is used. The mask M may be transferred from the hand 41 to the holder of the mask inspection unit 60 to inspect the mask M. In this case, for example, as shown in FIG. 7, the mask inspection unit 60 may be disposed at a position facing the stocker unit 50 with the conveyance spindle 42 a of the mask M interposed therebetween.

  In the above embodiment, the mask cleaning unit 70 is disposed at a position facing the transport spindle 42a of the mask transport mechanism 40 and directly transfers the mask M to and from the mask transport mechanism 40. The cleaning unit 70 is not necessarily arranged at a position where the mask transport mechanism 40 can be directly accessed. For example, as shown in FIG. 8, the mask cleaning unit 70 and the mask inspection unit 60 may be connected, and the mask M may be transferred between the mask cleaning unit 70 and the mask inspection unit 60. Further, the mask cleaning unit 70 may be disposed outside the pattern drawing apparatus 1.

  In the above-described embodiment, the stocker unit 50, the mask inspection unit 60, and the mask cleaning unit 70 are all disposed near one end (+ X side) of the transport main shaft 42a. It may be arranged in the vicinity of both ends of the. For example, as shown in FIG. 9, the stocker unit 50 is disposed near the + X side end of the transport spindle 42a, and the mask inspection unit 60 and the mask cleaning unit 70 are disposed near the −X side end. Also good.

  In the above embodiment, the mask M cleaned by the mask cleaning unit 70 is transported to the stocker unit 50 as it is. However, the mask M cleaned by the mask cleaning unit 70 is transported to the mask inspection unit 60. May be re-inspected. In this way, the state of the mask M after cleaning can be confirmed, and the quality of the operation state of the mask cleaning unit 70 can also be confirmed. In the above embodiment, the necessity of cleaning is determined based on the inspection result of the mask inspection unit 60. However, regardless of the inspection result, the mask M is transported to the mask cleaning unit 70 for cleaning, and the mask after cleaning is cleaned. M may be conveyed again to the mask inspection unit 60 for inspection.

  When a cassette 51 is newly set in the stocker unit 50, each mask M housed in the cassette 51 is inspected by the inspection unit 60 and then mounted on the plurality of optical heads 32a, 32b,. May be. Specifically, for each mask M, for example, a series of operations as shown in FIG. First, the pattern drawing apparatus 1 takes out the mask M from the cassette 51 by the hand 41 (step S11), and transports the taken mask M to the mask inspection unit 60 for inspection (step S12). The control unit 80 determines whether or not dirt is detected in the inspection of step S12 (step S13). If it is determined that no dirt is detected, the hand 41 further conveys the mask M, It is mounted on the optical head 32n (step S14). On the other hand, if it is determined in step S13 that dirt has been detected, the pattern drawing apparatus 1 transports and cleans the mask M to the mask cleaning unit 70 (step S15), and again cleans the mask M after cleaning. It is conveyed to the mask inspection unit 60 and inspected (step S16). The control unit 80 determines whether or not dirt is detected in the inspection of step S16 (step S17). If it is determined that no dirt is detected, the hand 41 further conveys the mask M, It is mounted on the optical head 32n (step S14). On the other hand, if it is determined in step S17 that dirt has been detected, the pattern drawing apparatus 1 issues an alarm and waits for a response from the apparatus administrator (step S18).

  In the above embodiment, the mask inspection unit 60 performs so-called transmitted light inspection for observing inspection light transmitted through the mask M. However, the mask inspection unit 60 performs reflected light inspection or the like. The mask M may be inspected by other inspection methods. However, the transmitted light inspection is desirable because it can detect satisfactorily the mask M that affects the projection of the pattern by the transmitted light.

  In the above embodiment, the irradiation light photographing unit 39 is not involved in the inspection of the mask M, but the irradiation light photographing unit 39 may be used as an auxiliary to inspect the mask M. Specifically, when the drawing process on the substrate 9 is not executed, the pulsed light emitted from the plurality of optical heads 32a, 32b,..., 32g is imaged by the irradiation light imaging unit 39, and based on the imaging result. Thus, dirt attached to the mask M may be detected. In this way, the mask M can be inspected without unloading the mask M from the optical heads 32a, 32b,..., 32g during the time between drawing processes on the substrate 9.

  In the above embodiment, the mask cleaning unit 70 has the carry-in port 711 for carrying in the mask M and the carry-out port 712 for carrying out the mask M, but the mask washing unit 70 has one carry-in / out port. The mask M may be carried in and out via the. The mask cleaning unit 70 may clean the mask M by a process other than the UV cleaning process, the chemical cleaning process, the rinsing process, and the drying process.

  In the above embodiment, one spare mask M is stored in each cassette 51 of the stocker unit 50. However, two or more spare masks M may be stored in each cassette 51. . In addition, although three cassettes 51 are arranged in the stocker unit 50, the number of cassettes arranged in the stocker unit 50 may be one, two, or four or more. The stocker unit 50 may store the mask M in a storage device other than the cassette 51.

  Moreover, in said embodiment, although the installation environment of the pattern drawing apparatus 1 was not mentioned in particular, the pattern drawing apparatus 1 may be installed in the clean room where temperature, humidity, and cleanliness were well managed. desirable. Specifically, it is desirable to install in a clean room of, for example, class 10 or so where a downdraft (down flow) cleaned by the HEPA filter is formed. If the pattern drawing apparatus 1 is installed in such a clean room, it is possible to better prevent particles from adhering to the mask M during conveyance by the mask conveyance mechanism 40 or when the mask M is stored in the stocker unit 50. it can.

  Moreover, as shown in FIG. 11, the pattern drawing apparatus 1 may be arrange | positioned inside the clean bench CB installed in the clean room CR. In the example of FIG. 11, a HEPA filter 90 is provided on the upper portion of the clean bench CB, and a downdraft that has been cleaned by the HEPA filter 90 is formed inside the clean bench CB. In the example of FIG. 11, the mask cleaning unit 70 is connected to the side of the clean bench CB, and the carry-in entrance 711 and the carry-out exit 712 face the internal space of the clean bench CB. In this way, the mask M can be transported in a clean and isolated space inside the clean bench CB. For this reason, it is possible to further prevent particles from adhering to the mask M.

  Moreover, in said embodiment, although the pattern drawing apparatus 1 had seven optical heads 32a, 32b, ..., 32g, the number of optical heads is not limited to seven. In addition, the pattern drawing apparatus 1 described above is targeted for processing the glass substrate 9 for the color filter. However, the pattern drawing apparatus of the present invention is not limited to a glass substrate for flat panel display, a semiconductor substrate, a magnetic / optical disk substrate, and the like. The substrate to be processed may be used.

It is a side view of a pattern drawing apparatus. It is a top view of a pattern drawing apparatus. It is the side view which looked at the mask inspection part and its neighborhood from the -Y side. It is the figure which showed typically the structure inside a mask washing | cleaning part. It is the block diagram which showed the connection structure between each part and control part of a pattern drawing apparatus. It is the flowchart which showed the flow of operation | movement of a test | inspection of mask, cleaning, and replacement | exchange. It is a top view of the pattern drawing apparatus which concerns on a modification. It is a top view of the pattern drawing apparatus which concerns on a modification. It is a top view of the pattern drawing apparatus which concerns on a modification. It is the flowchart which showed the flow of operation | movement when mounting the mask accommodated in the cassette set newly to an optical head. It is the figure which showed an example of the installation environment of a pattern drawing apparatus.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Pattern drawing apparatus 9 Board | substrate 10 Stage 20 Stage drive part 30 Head part 32a, 32b, ..., 32g Optical head 37 Mask unit 39 Irradiation light imaging part 40 Mask conveyance mechanism 41 Hand 42 Hand movement mechanism 42a Conveyance spindle 50 Stocker part 51 Cassette DESCRIPTION OF SYMBOLS 60 Mask test | inspection part 61 Light projection part 62 Camera for inspection 70 Mask cleaning part 711 Carry-in port 712 Carry-out port 72 UV cleaning process part 73 Chemical solution washing process part 74 Rinse process part 75 Drying process part 80 Control part

Claims (12)

A pattern drawing apparatus that draws a pattern on a surface of a substrate by irradiating the surface of the substrate with light through a mask having a light transmitting portion and a light shielding portion,
A plurality of optical heads having a holding unit for holding the mask, and irradiating the surface of the substrate with light through the mask held by the holding unit;
A mask inspection unit for inspecting the mask at a position different from the plurality of optical heads;
A stocker section for storing the mask;
A mask transport means for transporting the mask between the plurality of optical heads, the mask inspection unit, and the stocker unit while holding the mask by a predetermined hand;
A pattern drawing apparatus comprising: The pattern drawing apparatus according to claim 1,
The mask carrying means has a moving means for moving the hand along an arrangement direction of the plurality of optical heads,
The pattern drawing apparatus, wherein at least one of the mask inspection unit and the stocker unit is disposed in the vicinity of an end portion of the moving path of the hand by the moving unit. The pattern drawing apparatus according to claim 1 or 2,
A mask cleaning unit for cleaning the mask;
The pattern drawing apparatus, wherein the mask transporting unit transports the mask among the plurality of optical heads, the mask inspection unit, the stocker unit, and the mask cleaning unit. It is a pattern drawing apparatus of Claim 3, Comprising:
The pattern drawing apparatus, wherein the mask cleaning unit includes an ultraviolet irradiation unit that irradiates the mask with ultraviolet rays. The pattern drawing apparatus according to claim 3 or 4, wherein:
The pattern drawing apparatus, wherein the mask cleaning unit performs a cleaning process using a chemical solution, a rinsing process using pure water, and a drying process on the mask. A pattern drawing apparatus according to any one of claims 3 to 5,
The pattern drawing further comprising: a control unit that selects whether or not to carry the mask to the mask cleaning unit by the mask carrying unit based on an inspection result of the mask by the mask inspection unit. apparatus. A pattern drawing apparatus according to any one of claims 1 to 6,
The pattern inspection apparatus, wherein the mask inspection unit detects dirt on the mask by observing light transmitted through the mask while irradiating the mask with light. A pattern drawing apparatus according to any one of claims 1 to 7,
The pattern drawing apparatus, wherein the mask inspection unit inspects the mask held by the hand in the middle of a transport path of the mask transport unit. A pattern drawing apparatus according to any one of claims 1 to 8,
An apparatus for pattern drawing, further comprising auxiliary inspection means for inspecting the mask held by the holding portions of the plurality of optical heads when drawing processing is not performed on the substrate. A pattern drawing apparatus according to any one of claims 1 to 9,
The pattern drawing apparatus, wherein the stocker unit includes a cassette that collectively stores a plurality of masks that are simultaneously mounted on the plurality of optical heads. It is a pattern drawing apparatus of Claim 10, Comprising:
The pattern drawing apparatus, wherein the cassette collectively stores a plurality of masks and spare masks that are simultaneously mounted on the plurality of optical heads. It is a pattern drawing apparatus in any one of Claim 1- Claim 11, Comprising:
A pattern drawing apparatus, wherein the pattern drawing apparatus is installed in an atmosphere controlled by an HEPA filter.

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