JP2009239286A5 - - Google Patents

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Publication number
JP2009239286A5
JP2009239286A5 JP2009074674A JP2009074674A JP2009239286A5 JP 2009239286 A5 JP2009239286 A5 JP 2009239286A5 JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009074674 A JP2009074674 A JP 2009074674A JP 2009239286 A5 JP2009239286 A5 JP 2009239286A5
Authority
JP
Japan
Prior art keywords
liquid
immersion system
liquid recovery
recovery port
optical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009074674A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009239286A (ja
Filing date
Publication date
Priority claimed from US12/382,742 external-priority patent/US8233139B2/en
Application filed filed Critical
Publication of JP2009239286A publication Critical patent/JP2009239286A/ja
Publication of JP2009239286A5 publication Critical patent/JP2009239286A5/ja
Pending legal-status Critical Current

Links

JP2009074674A 2008-03-27 2009-03-25 液浸システム、露光装置、露光方法、及びデバイス製造方法 Pending JP2009239286A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US6481008P 2008-03-27 2008-03-27
US12/382,742 US8233139B2 (en) 2008-03-27 2009-03-23 Immersion system, exposure apparatus, exposing method, and device fabricating method

Publications (2)

Publication Number Publication Date
JP2009239286A JP2009239286A (ja) 2009-10-15
JP2009239286A5 true JP2009239286A5 (https=) 2013-03-14

Family

ID=40793250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009074674A Pending JP2009239286A (ja) 2008-03-27 2009-03-25 液浸システム、露光装置、露光方法、及びデバイス製造方法

Country Status (5)

Country Link
US (2) US8233139B2 (https=)
JP (1) JP2009239286A (https=)
KR (1) KR20100133446A (https=)
TW (1) TW200947145A (https=)
WO (1) WO2009119898A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI439813B (zh) * 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method
US8896806B2 (en) 2008-12-29 2014-11-25 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
US9223225B2 (en) * 2010-01-08 2015-12-29 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, and device manufacturing method
NL2009692A (en) * 2011-12-07 2013-06-10 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
US9323160B2 (en) 2012-04-10 2016-04-26 Nikon Corporation Liquid immersion member, exposure apparatus, exposure method, device fabricating method, program, and recording medium
US9823580B2 (en) * 2012-07-20 2017-11-21 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium
US9494870B2 (en) * 2012-10-12 2016-11-15 Nikon Corporation Exposure apparatus, exposing method, device manufacturing method, program, and recording medium
US9720331B2 (en) * 2012-12-27 2017-08-01 Nikon Corporation Liquid immersion member, exposure apparatus, exposing method, method of manufacturing device, program, and recording medium
KR20170026563A (ko) 2014-07-01 2017-03-08 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 리소그래피 장치를 제조하는 방법

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KR101431938B1 (ko) 2003-04-10 2014-08-19 가부시키가이샤 니콘 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템
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JP4378136B2 (ja) 2003-09-04 2009-12-02 キヤノン株式会社 露光装置及びデバイス製造方法
KR101250155B1 (ko) * 2004-03-25 2013-04-05 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
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JP5005226B2 (ja) * 2005-01-31 2012-08-22 株式会社ニコン 露光装置及びデバイス製造方法、液体保持方法
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JP4802604B2 (ja) * 2005-08-17 2011-10-26 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
US7751026B2 (en) 2005-08-25 2010-07-06 Nikon Corporation Apparatus and method for recovering fluid for immersion lithography
US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
TWI439813B (zh) 2006-05-10 2014-06-01 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
JP2007335662A (ja) * 2006-06-15 2007-12-27 Canon Inc 露光装置
JP2008034801A (ja) 2006-06-30 2008-02-14 Canon Inc 露光装置およびデバイス製造方法
US8134685B2 (en) 2007-03-23 2012-03-13 Nikon Corporation Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
US20090122282A1 (en) 2007-05-21 2009-05-14 Nikon Corporation Exposure apparatus, liquid immersion system, exposing method, and device fabricating method
US8233139B2 (en) * 2008-03-27 2012-07-31 Nikon Corporation Immersion system, exposure apparatus, exposing method, and device fabricating method

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