JP2009229258A - Substrate conveying device and substrate inspection device - Google Patents

Substrate conveying device and substrate inspection device Download PDF

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JP2009229258A
JP2009229258A JP2008075380A JP2008075380A JP2009229258A JP 2009229258 A JP2009229258 A JP 2009229258A JP 2008075380 A JP2008075380 A JP 2008075380A JP 2008075380 A JP2008075380 A JP 2008075380A JP 2009229258 A JP2009229258 A JP 2009229258A
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substrate
floating mechanism
height
substrate transfer
floating
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JP5176631B2 (en
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Kenji Nose
健二 野瀬
Masaki Kono
正樹 河野
Yasuo Toda
保男 戸田
Ryosuke Kobayashi
亮介 小林
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Toppan Inc
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Toppan Printing Co Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a mounting and height-adjusting mechanism of a substrate floating mechanism that reduces the assembling man hour of the substrate floating mechanism and reduces the price of the whole device including precise processing. <P>SOLUTION: A substrate conveying device includes: a substrate floating mechanism 3 for floating and keeping the substrate 2 at a certain height by blowout and suction of air; a height position adjusting mechanism 4 for individually adjusting the height of the substrate floating mechanism 3; a substrate gripping mechanism 5 for fixing one end of the substrate 5 protruded from one side surface of the substrate floating mechanism 4; a substrate conveying mechanism 6 that is disposed adjacently to one side surface of the substrate floating mechanism 3 and conveys the substrate 2 in the direction along the conveying direction X via the substrate gripping mechanism 5; a floating control section A for supplying air to the substrate gripping mechanism 5 and sucking air from the substrate floating mechanism 3; and an inspection section B for inspecting the surface of the substrate 2. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

本発明は、例えば液晶ディスプレイパネルやプラズマディスプレイパネル等のフラットパネルディスプレイ用の基板の欠陥検査を行う基板検査装置に関するものであり、特に大型基板を振動等による上下変動無く安定して搬送するための装置に関するものである。   The present invention relates to a substrate inspection apparatus for inspecting defects of a substrate for a flat panel display such as a liquid crystal display panel or a plasma display panel, and in particular for stably transporting a large substrate without vertical fluctuation due to vibration or the like. It relates to the device.

近年の液晶ディスプレイパネルやプラズマディスプレイパネル等のフラットパネルディスプレイの大型化、薄型化に伴い、製造工程における基板の搬送方法として、従来はローラを用いたコンベアによる方法が主に用いられてきたが、例えば、搬送中の基板の重さによる撓みや、搬送時の上下変動等により、基板がローラに衝突してしまうことや、アライメント時による擦傷といった様々な問題が顕在化してきた。   With the recent increase in size and thickness of flat panel displays such as liquid crystal display panels and plasma display panels, as a substrate transport method in the manufacturing process, a conventional method using a roller has been mainly used. For example, various problems such as a substrate colliding with a roller due to bending due to the weight of the substrate being transported, vertical fluctuation during transport, and abrasion due to alignment have become apparent.

この様な、基板の損傷を回避するために、基板の重さによる撓みや搬送中の上下振動が大きい大型基板に関してはローラを用いたコンベア搬送に替わり、基板前面をエアによって浮上させ非接触に搬送する技術が用いられている(特許文献1、2)。   In order to avoid such damage to the substrate, instead of conveyor conveyance using rollers for large substrates with large deflection due to the weight of the substrate and large vertical vibration during conveyance, the front surface of the substrate is lifted by air and made non-contact The technique to convey is used (patent documents 1, 2).

また、フラットパネルディスプレイ、例えばカラーフィルタ等では、製造工程において欠陥等の検査が行われているが、近年、画面の高精細化が進み、これに伴って検査機自体も高性能なものが求められている。例えば、5μm以下の欠陥を検査するような場合、分解能が3μm以下の超高分解能カメラを用いた検査機が品質保証の点から必須となってきている。   In addition, in flat panel displays such as color filters, defects and the like are inspected in the manufacturing process. In recent years, screens have become higher in definition, and accordingly, inspection machines themselves are required to have high performance. It has been. For example, when inspecting defects of 5 μm or less, an inspection machine using an ultra-high resolution camera with a resolution of 3 μm or less has become essential from the viewpoint of quality assurance.

しかしながら、分解能が5μm以下の検査起用カメラは焦点深度が浅くまた、被写界深度も狭く、検査として撮像するためには、基板を被写界深度から外れないように安定して搬送することが求められる。ローラによる基板搬送では接触搬送によりローラ自体の凹凸や設置状況等で、基盤の搬送中の上下方向の変動が大きく、高分解能の検査用カメラの被写界深度から外れてしまう問題がある。   However, the inspection camera with a resolution of 5 μm or less has a shallow depth of focus and a narrow depth of field, and in order to capture images for inspection, the substrate can be stably transported so as not to deviate from the depth of field. Desired. There is a problem in the substrate conveyance by the rollers that the vertical fluctuation during the conveyance of the substrate is large due to the unevenness of the roller itself and the installation situation due to the contact conveyance, and it is out of the depth of field of the high resolution inspection camera.

そこで、前述のように搬送面とは接触しない、エア浮上による搬送が行われるようになった。当初の非接触エア浮上搬送技術は基板をエアの吹き出しにより基板を浮かせるだけであったので、基板の浮上精度むらが大きく、搬送中の浮上むらから基板の上下変動が起きてしまい、検査面が検査用カメラ被写界深度から外れてしまう問題があった。そこで基板の浮上に関するこのような問題の解決策として、特許文献3に記載されるような、エアの吹き出しと同時に吸い込みを行うことで、浮上の上下変動をエアの吸引力によって抑える基板浮上機構が開発された。この技術により、基板の高精度浮上のものに関しては、搬送時の浮上むらが10μmまで抑えられるようになり、安定した基盤搬送ができるようになった。   Therefore, as described above, conveyance by air levitation that does not come into contact with the conveyance surface has been performed. The original non-contact air levitation transfer technology only lifted the substrate by blowing out air, so the floating accuracy of the substrate was large, and the vertical fluctuation of the substrate occurred due to the floating unevenness during transfer, and the inspection surface was There was a problem that it was out of the depth of field of the inspection camera. Therefore, as a solution to such a problem related to the floating of the substrate, there is a substrate floating mechanism that suppresses the vertical fluctuation of the floating by the suction force of the air by performing the suction simultaneously with the air blowing, as described in Patent Document 3. It has been developed. With this technology, even when the substrate is levitated with high precision, the non-uniformity of levitating during conveyance can be suppressed to 10 μm, and stable substrate conveyance can be performed.

このような基板浮上機構は小型であるため、大型の基板の安定した搬送を行うには、基板浮上機構を多量に用いなければならず、また、検査用のカメラの被写界深度から外れないように基板浮上機構の高さを精密に並べなければならず、基板浮上機構を装置に組み付ける場合、ベースとなるプレートと基板浮上機構間にシム等を挟み高さを調整するか、あるいは、ベースとなるプレートの表面を精密に研磨する、例えば、基板の浮上量を25μmとすると、ベースとなるプレートの表面を10μm程度に研磨し、その上に複数の基板浮上機構を設置するという方法が用いられてきた。   Since such a substrate floating mechanism is small, a large amount of the substrate floating mechanism must be used to stably transport a large substrate, and it does not deviate from the depth of field of the inspection camera. The height of the substrate levitation mechanism must be precisely aligned, and when assembling the substrate levitation mechanism into the device, the height is adjusted by inserting a shim or the like between the base plate and the substrate levitation mechanism, or The surface of the plate to be precisely polished is used. For example, if the floating amount of the substrate is 25 μm, the surface of the base plate is polished to about 10 μm and a plurality of substrate floating mechanisms are installed thereon. Has been.

特開2004−279335号公報JP 2004-279335 A 特開2006−258632号公報JP 2006-258632 A 特開2008−7319号公報JP 2008-7319 A

しかしながら、従来の調整方法ではシムを基板浮上機構とベースプレート間に挟み高さを調整する場合、高さを調整する都度プレートから取り外さなければならず多量の基板浮上機構を組み付ける場合組み付け工数の増加といった問題がでてくる。また、ベースとなるプレートを研磨する場合においては、精密に研磨する加工費用を含め装置全体の価格が高くなるという問題がある。   However, in the conventional adjustment method, when adjusting the height by sandwiching the shim between the substrate floating mechanism and the base plate, it must be removed from the plate every time the height is adjusted. The problem comes out. Further, when polishing the base plate, there is a problem that the price of the entire apparatus including the processing cost for precise polishing becomes high.

そこで、本考案は係る事実を考慮し、前記のシムを用いた調整方法や精密な研磨を行うのではなく、基板浮上機構の組み付け工数を減らし、また、精密な加工を含めた装置全体の価格を削減することができる基板浮上機構の取り付けおよび高さ調整機構を提供することを課題とする。   In view of this fact, the present invention considers such facts, and does not perform the adjustment method using the shim or precise polishing, but reduces the number of steps for assembling the substrate floating mechanism, and the price of the entire apparatus including precise processing. It is an object of the present invention to provide an attachment and height adjustment mechanism for a substrate floating mechanism that can reduce the above-described problem.

請求項1によれば、板搬送部に設置された基板を浮上させる基板浮上機構と、前記基板を搬送する基板搬送機構と、前記基板浮上機構表面の高さを調整する高さ調整機構とを具備する基板搬送装置であって、前記高さ調整機構は、前記浮上機構を支持する可動プレートと、前記可動プレートの下に設置された固定プレートと、前記2枚のプレートに形成された同軸上で相異なるピッチを有するネジ部に螺合し、前記2枚のプレートのクリアランスを調節する調節ネジと、前記クリアランスに挟み込まれているシール材とを具備することを特徴とする基板搬送装置である。   According to claim 1, a substrate floating mechanism for levitating a substrate installed in a plate conveying section, a substrate conveying mechanism for conveying the substrate, and a height adjusting mechanism for adjusting the height of the surface of the substrate floating mechanism. The height adjustment mechanism includes a movable plate that supports the levitation mechanism, a fixed plate installed under the movable plate, and a coaxial plate formed on the two plates. A substrate transport apparatus comprising: an adjustment screw that is screwed into screw portions having different pitches to adjust a clearance between the two plates; and a sealing material sandwiched between the clearances. .

請求項2によれば、前記基板浮上機構は基板と対向する面が多孔質体で構成された通気穴と、複数の穴で構成された吸気穴を具備することを特徴とする請求項1記載の基板搬送装置である。   According to a second aspect of the present invention, the substrate floating mechanism includes a vent hole whose surface facing the substrate is formed of a porous body and an intake hole formed of a plurality of holes. This is a substrate transfer device.

請求項3によれば、前記可動プレート及び前記固定プレートは前記基板浮上機構の吸気穴から空気を排出するための通気穴を具備することを特徴とする請求項2記載の基板搬送装置である。   According to a third aspect of the present invention, in the substrate transfer apparatus according to the second aspect, the movable plate and the fixed plate include a vent hole for discharging air from an intake hole of the substrate floating mechanism.

請求項4によれば、前記シール材は、前記通気穴の同軸上に設けられたリング状の弾性材であることを特徴とする請求項3記載の基板搬送装置である。   According to a fourth aspect of the present invention, in the substrate transfer apparatus according to the third aspect, the sealing material is a ring-shaped elastic material provided coaxially with the vent hole.

請求項5によれば、前記可動プレート及び前記固定プレートは前記基板浮上機構の通気孔に空気の供給するための通気穴を具備することを特徴とする請求項2ないし4記載の基板搬送装置である。   5. The substrate transfer apparatus according to claim 2, wherein the movable plate and the fixed plate have a vent hole for supplying air to the vent hole of the substrate floating mechanism. is there.

請求項6によれば、請求項1ないし5に記載の基板搬送装置と、該基板搬送装置の基板搬送部に設置された基板を撮像するためのカメラとを有することを特徴とする基板検査装置である。   According to a sixth aspect of the present invention, there is provided a substrate inspection apparatus comprising: the substrate conveyance device according to any one of the first to fifth aspects; and a camera for imaging a substrate installed in a substrate conveyance unit of the substrate conveyance device. It is.

本考案では上記構成とすることで、基板浮上機構の組み付け工数の削減、また基板浮上機構を個別に取り付けることでメンテナンス性の向上、取り付けするベースプレートと独立して精密に高さ調整を行うことでベースプレートを精密研磨する加工費用を含め、装置全体の価格の削減を可能とする。   By adopting the above configuration in the present invention, it is possible to reduce the number of steps for assembling the substrate floating mechanism, to improve maintenance by attaching the substrate floating mechanism individually, and to precisely adjust the height independently of the base plate to be mounted. This makes it possible to reduce the price of the entire system, including the processing costs for precision polishing of the base plate.

図1は基板の検査装置に適用した本発明の基板搬送装置の構成図である。本発明に係る基板搬送装置1は、空気の吹き出し及び吸引によって基板2を一定の高さに浮上維持する基盤浮上機構3と、前記基板浮上機構3の高さを個別に調整する高さ位置調整機構4と、前記基板浮上機構3の一側面からはみ出した前記基板2の片端部を固定保持する基板把持機構5と前記基板浮上機構3の一側面と隣接して設けられ、前記基板把持機構5を介して前記基板2を搬送方向Xに沿った方向に搬送する基板搬送機構6と、前記基板浮上機構3へ空気の供給および前記基板浮上機構3からの空気の吸引を行う浮上制御部Aと、前記基板2の表面検査を行う検査部Bを備える。     FIG. 1 is a configuration diagram of a substrate transfer apparatus of the present invention applied to a substrate inspection apparatus. The substrate transfer apparatus 1 according to the present invention includes a base levitating mechanism 3 that keeps the substrate 2 levitating and maintaining at a constant height by blowing and sucking air, and a height position adjustment that individually adjusts the height of the substrate levitating mechanism 3. A mechanism 4, a substrate gripping mechanism 5 for fixing and holding one end of the substrate 2 protruding from one side surface of the substrate floating mechanism 3, and a side surface of the substrate floating mechanism 3; A substrate transport mechanism 6 that transports the substrate 2 in a direction along the transport direction X, and a levitation controller A that supplies air to the substrate levitation mechanism 3 and sucks air from the substrate levitation mechanism 3. The inspection unit B that performs surface inspection of the substrate 2 is provided.

次に前記基板浮上機構3について図2を用いて説明する。なお、図2は前記基板浮上機構3の断面模式図であり理解を容易にするために基板2の厚みおよび浮上量を誇張している。   Next, the substrate floating mechanism 3 will be described with reference to FIG. Note that FIG. 2 is a schematic cross-sectional view of the substrate floating mechanism 3, and the thickness and the flying height of the substrate 2 are exaggerated for easy understanding.

本発明の基板搬送装置1における前記基板浮上機構3は矩形状の中空構造体であり、基板2と対向する表面3aは無数の微細な孔の開いた板状の物質、例えば、多孔質カーボンや金属焼結体等で形成されている。この表面3aは内部の中空空間10に接続されている配管10pを通じて圧縮空気を加えることによって、表面3aの全域に均一な上向きの空気流13を形成することができる。この上向きの空気流13によって基板2をわずかに浮上させることが可能となる。   The substrate floating mechanism 3 in the substrate transfer apparatus 1 of the present invention is a rectangular hollow structure, and the surface 3a facing the substrate 2 is a plate-like substance having numerous fine holes, such as porous carbon or It is formed of a metal sintered body or the like. By applying compressed air to the surface 3a through a pipe 10p connected to the internal hollow space 10, a uniform upward air flow 13 can be formed over the entire surface 3a. The upward air flow 13 makes it possible to slightly lift the substrate 2.

また前記基板浮上機構3において表面3aには、10〜50mm程度の範囲で等間隔あるいは不規則な間隔で直径0.5〜2mm程度の吸引穴9が全域に設けられている。この吸引穴9は基板浮上機構3の内部に設けられている前記中空空間10とは導通しておらず、別に設けられた中空空間11と接続されており、配管11vを通じて中空空間11の内圧を下げることで前記吸引穴9から空気を吸い込む事が可能となる。   In the substrate levitation mechanism 3, the surface 3a is provided with suction holes 9 having a diameter of about 0.5 to 2 mm at equal intervals or irregular intervals in the range of about 10 to 50 mm. The suction hole 9 is not electrically connected to the hollow space 10 provided in the substrate floating mechanism 3 and is connected to a separately provided hollow space 11, and the internal pressure of the hollow space 11 is reduced through a pipe 11 v. By lowering, air can be sucked from the suction hole 9.

そして、前記表面3a全域から空気を吹き出すと同時に、前記吸引穴9からも空気の吸引を行うことにより、前記基板2の浮上量を高い精度で維持することができる。   The air can be blown from the entire surface 3a, and at the same time, the air can be sucked from the suction holes 9 to maintain the flying height of the substrate 2 with high accuracy.

本発明の基板搬送装置1における前記基板把持機構5は図1に示すように、少なくとも2つのブロック状の部材をエアアクチュエータ等により基板2に対し垂直方向に稼動させて基板2を挟持固定する、もしくはブロック状の部材に埋めこまれた吸着パッドによって基板を吸着固定する把持部7を2つ以上備えている。前記基板把持機構5は前記基板搬送機構6の稼動部分であるベースプレート8に固定されている。   As shown in FIG. 1, the substrate gripping mechanism 5 in the substrate transport apparatus 1 of the present invention operates at least two block-shaped members in a direction perpendicular to the substrate 2 by an air actuator or the like to clamp and fix the substrate 2. Alternatively, two or more gripping portions 7 are provided for sucking and fixing the substrate by suction pads embedded in a block-shaped member. The substrate gripping mechanism 5 is fixed to a base plate 8 that is an operating part of the substrate transport mechanism 6.

本発明の基板搬送装置1における基板搬送機構6は、図1に示すように、基板浮上機構3の一側面と隣接して設けられ、基板搬送方向Xに沿って基板2をムラ無く一定速度で搬送する一軸の搬送機構である。例えば、サーボモータとボールネジの組み合わせに比べ速度変動の小さなリニアモータとリニアガイドの組み合わせが適している。しかしながら、今後検査の要求精度が上がり超高分解能の検査機等に本搬送機構を適用させる場合などはコアレスタイプのリニアモータにエア浮上ガイド等を組み合わせていくことも考えられる。   As shown in FIG. 1, the substrate transport mechanism 6 in the substrate transport apparatus 1 of the present invention is provided adjacent to one side surface of the substrate floating mechanism 3, and moves the substrate 2 along the substrate transport direction X at a constant speed without unevenness. It is a uniaxial transport mechanism for transporting. For example, a combination of a linear motor and a linear guide whose speed fluctuation is small compared to a combination of a servo motor and a ball screw is suitable. However, in the future, when the required accuracy of inspection will increase and this transport mechanism will be applied to an ultra-high resolution inspection machine, it may be possible to combine an air levitation guide with a coreless type linear motor.

本発明の基板搬送装置1における前記浮上制御部Aは図1に示すように、基板浮上機構3の中へ圧縮空気を供給する圧空経路25と、基板浮上機構3から空気を吸引排気する排気経路26を備える。なお図1において前記浮上制御部Aは説明上基板搬送装置1の機側空間に配置されているが、特に配置位置に制限はない。実際には、例えば基板搬送装置の下、もしくは別体の筐体に収めることができる。   As shown in FIG. 1, the levitation control unit A in the substrate transfer apparatus 1 of the present invention has a compressed air path 25 for supplying compressed air into the substrate levitation mechanism 3 and an exhaust path for sucking and exhausting air from the substrate levitation mechanism 3. 26. In FIG. 1, the levitation control unit A is disposed in the machine-side space of the substrate transfer apparatus 1 for the sake of explanation, but the arrangement position is not particularly limited. Actually, for example, it can be stored under the substrate transfer device or in a separate housing.

また前記圧空経路25の上流側には供給圧力を調整する圧力調整弁23と配管を分岐して基板浮上機構3に圧空を分配供給するマニホールド24を備える。また、前記排気経路26は上流側に空気吸引の動力源となるブロアーポンプ21と吸引流量を調整するボールバルブ22が具備されている。さらに、前記排気経路26にはボールバルブ22と前記基板浮上機構との間にある容積を持ったチャンバー29を設けることにより前記基板浮上機構内の圧力変動を小さくしている。供給圧力および吸引流量を調整することにより、前記基板浮上機構3上の基板の浮上精度を高めることができる。   Further, on the upstream side of the compressed air path 25, a pressure adjusting valve 23 for adjusting the supply pressure and a manifold 24 that branches the piping and distributes and supplies the compressed air to the substrate floating mechanism 3 are provided. The exhaust path 26 is provided with a blower pump 21 serving as a power source for air suction and a ball valve 22 for adjusting the suction flow rate on the upstream side. Further, the exhaust path 26 is provided with a chamber 29 having a volume between the ball valve 22 and the substrate floating mechanism, thereby reducing the pressure fluctuation in the substrate floating mechanism. By adjusting the supply pressure and the suction flow rate, the floating accuracy of the substrate on the substrate floating mechanism 3 can be increased.

本発明の基板搬送装置1における前記検査部Bは図1に示すように、基板搬送機構6、基板浮上機構3を搬送方向Xに垂直な幅方向に跨ぐように設置された梁状部材40によって基板浮上機構3の上面より所定の高さ位置に設置され、基板2の上面を撮像するカメラ装置41と基板浮上機構3の上面よりも下方に前記カメラ装置41の導光方向に光を照射する光源42を備える。また、カメラ装置41は基板搬送面に垂直な方向の位置調整および搬送方向Xと平行な回転軸回りの角度調整自在なアライメントステージ43を介して梁状部材40に固定されている。   As shown in FIG. 1, the inspection section B in the substrate transport apparatus 1 of the present invention includes a beam-shaped member 40 installed so as to straddle the substrate transport mechanism 6 and the substrate floating mechanism 3 in the width direction perpendicular to the transport direction X. The camera device 41 is installed at a predetermined height position from the upper surface of the substrate floating mechanism 3 and irradiates light in the light guide direction of the camera device 41 below the upper surface of the camera floating mechanism 3 and the camera device 41 that images the upper surface of the substrate 2. A light source 42 is provided. Further, the camera device 41 is fixed to the beam-like member 40 via an alignment stage 43 capable of adjusting the position in the direction perpendicular to the substrate transfer surface and adjusting the angle around the rotation axis parallel to the transfer direction X.

次に、前記高さ位置調整機構4について図3および図4を用いて説明する。   Next, the height position adjusting mechanism 4 will be described with reference to FIGS.

まず本発明の基板搬送装置1における前記基板浮上機構3は、その表面3aに前記中空空間10および前記中空空間11とは導通していない少なくとも2個以上の貫通座グリ穴52を具備し、当該貫通座グリ穴52を通して取り付けネジ53によって可動プレート51の雌ネジ部51aに固定されている。可動プレートは基板浮上機構を支持し、また当該可動プレートの高さを制御することで基板搬送装置の高さ制御を可能とするものである。前記可動プレート51には圧空経路25から前記基板浮上機構3内の中空空間10に圧縮空気を供給するための配管継手54を取り付けるテーパネジ部51bおよび基板浮上機構3内の中空空間11とチャンバー29間の空気を通すために通気穴51cが設けられている。また、前記可動プレート51には前記基板浮上機構3の上面の高さを調整するためにネジ部51dが設けられている。ここでは、一例として前記ネジ部を3つ備えた三点支持によって基板浮上機構3の高さおよび平面度を調整する。   First, the substrate floating mechanism 3 in the substrate transport apparatus 1 of the present invention includes at least two through-spotted holes 52 that are not electrically connected to the hollow space 10 and the hollow space 11 on the surface 3a thereof. The through screw hole 52 is fixed to the female screw part 51 a of the movable plate 51 by an attachment screw 53. The movable plate supports the substrate floating mechanism and controls the height of the movable substrate by controlling the height of the movable plate. The movable plate 51 has a taper screw portion 51b for attaching a pipe joint 54 for supplying compressed air from the compressed air path 25 to the hollow space 10 in the substrate floating mechanism 3 and between the hollow space 11 in the substrate floating mechanism 3 and the chamber 29. A vent hole 51c is provided to allow the air to pass therethrough. The movable plate 51 is provided with a screw portion 51d for adjusting the height of the upper surface of the substrate floating mechanism 3. Here, as an example, the height and flatness of the substrate floating mechanism 3 are adjusted by three-point support including three screw portions.

高さ位置調整機構4において、固定プレート50には前記可動プレート51の高さ調整用ネジ部51dと同軸上に前記ネジ部51dと異なるピッチのネジ部50dが設けられ、圧空経路25から前記基板浮上機構3内の中空空間10に圧縮空気を供給するための配管継手54を通す穴50bおよび基板浮上機構3内の中空空間11とチャンバー29間の空気を通すための通気穴50cが設けられ、固定プレート50を基板搬送装置1あるいはチャンバー29に取り付けるための図示しない穴が設けられている。   In the height position adjusting mechanism 4, the fixed plate 50 is provided with a screw portion 50 d having a different pitch from the screw portion 51 d on the same axis as the height adjusting screw portion 51 d of the movable plate 51. A hole 50b through which a pipe joint 54 for supplying compressed air to the hollow space 10 in the levitation mechanism 3 is passed, and a vent hole 50c for passing air between the hollow space 11 in the substrate levitation mechanism 3 and the chamber 29 are provided. A hole (not shown) for attaching the fixing plate 50 to the substrate transport apparatus 1 or the chamber 29 is provided.

前記高さ位置調整機構4において、前記可動プレート51のネジ部51dと前記固定プレート50のネジ部50dとに螺合する雄ネジ部を持つ調整ネジ56が設けられている。ここで、前記可動プレート51と前記固定プレート50の雌ネジ部および調整ネジ56の雄ネジ部は右ネジかあるいは左ネジのいずれかに統一されている。また、両プレート間に基板搬送装置1の振動等による調整ネジ56の緩み止めの役割となるバネ57、例えば圧縮バネ等が両プレート間の調整ネジ56に備えられている。   In the height position adjusting mechanism 4, an adjustment screw 56 having a male screw portion that is screwed into the screw portion 51 d of the movable plate 51 and the screw portion 50 d of the fixed plate 50 is provided. Here, the female screw portion of the movable plate 51 and the fixed plate 50 and the male screw portion of the adjustment screw 56 are unified as either a right screw or a left screw. In addition, a spring 57, for example, a compression spring, is provided on the adjustment screw 56 between the plates so as to prevent the adjustment screw 56 from loosening due to vibrations of the substrate transfer apparatus 1 between the plates.

前記高さ位置調整機構4において、前記可動プレート51の通気穴51cと前記固定プレート50の通気穴50cと同軸上に基板浮上機構上面3aから吸い込まれる空気の漏れを塞ぐために、両プレートのクリアランスには空気の吸引路を形成するシール材58が設けられている。具体的には、両通気穴を中継するように設けられたリング状の弾性材である。シール材によって、浮上機構の吸気穴から排気された空気が可動プレートと固定プレートの間で漏れることがないため、浮上機構の吸引力を保持して安定した高さ精度での搬送が可能である。   In the height position adjusting mechanism 4, the clearance between both plates is set to block leakage of air sucked from the upper surface 3 a of the substrate floating mechanism coaxially with the vent hole 51 c of the movable plate 51 and the vent hole 50 c of the fixed plate 50. Is provided with a sealing material 58 for forming an air suction path. Specifically, it is a ring-shaped elastic material provided so as to relay both the air holes. Since the air exhausted from the intake hole of the levitation mechanism does not leak between the movable plate and the fixed plate by the sealing material, the suction force of the levitation mechanism can be maintained and conveyance with stable height accuracy is possible. .

次に、本発明の基板搬送装置1における前記高さ位置調整機構4の作動原理について図4を用いて説明する。なお、図4は前記高さ位置調整機構の断面模式図であり、理解を容易にするため可動プレート51と固定プレート50間のクリアランスを誇張している。   Next, the operation principle of the height position adjusting mechanism 4 in the substrate transfer apparatus 1 of the present invention will be described with reference to FIG. 4 is a schematic cross-sectional view of the height position adjusting mechanism, and the clearance between the movable plate 51 and the fixed plate 50 is exaggerated for easy understanding.

高さ位置調整機構4において、調整ネジ56を一回転させることで、前記固定プレート50のネジ部50dと前記可動プレート51のネジ部51dのピッチ差分だけ可動プレート51の高さを調整することができる。例えば、前記可動プレート51のネジ部51dをM6の細目ピッチ0.75mm、固定プレート50のネジ部50dを並目ピッチ0.8mmとする場合、可動プレート51の高さを調整ネジ56一回転当たり0.05mmという高精度な調整が可能となる。例えばレーザー変位計や水準器等の計測器を用いながら調整ネジ56で前記可動プレート51の3点の高さを調整することで、基板板浮上機構3の上面の高さおよび水平を高精度にかつ容易に調整することが可能となる。また、前記可動プレート51はバネ57の力によって常に上方へ押し上げられた状態となっているため、高さ調整後にダブルナット等によるロックを行う必要が無く、常に高い位置精度を保つ事が可能となる。   In the height position adjusting mechanism 4, the height of the movable plate 51 can be adjusted by a pitch difference between the screw portion 50 d of the fixed plate 50 and the screw portion 51 d of the movable plate 51 by rotating the adjustment screw 56 once. it can. For example, when the screw portion 51d of the movable plate 51 is M6 fine pitch 0.75mm and the screw portion 50d of the fixed plate 50 is coarse pitch 0.8mm, the height of the movable plate 51 is adjusted per rotation of the adjusting screw 56. Adjustment with high accuracy of 0.05 mm is possible. For example, by adjusting the height of the three points of the movable plate 51 with the adjusting screw 56 while using a measuring instrument such as a laser displacement meter or a level, the height and level of the upper surface of the substrate plate floating mechanism 3 can be adjusted with high accuracy. And it becomes possible to adjust easily. Further, since the movable plate 51 is always pushed upward by the force of the spring 57, it is not necessary to lock it with a double nut after adjusting the height, and it is possible to always maintain a high positional accuracy. Become.

以上より、前記高さ位置調整機構4を用いることで前記基板搬送装置1に基板浮上機構3を取り付けする際の組み付け工数の減少、例えば、シム等で調整する場合と異なり高さ調整するたびに基板浮上機構3を装置から取り外す必要なく、調整に用いる工具の統一化や、アプローチの一本化が実現できる。また、前記高さ調整機構4を用いることで、個別の高さ調整を容易に行うことができるため、前記基板浮上機構3を取り付けるベースプレート50の面精度は必要無くなる。すなわちベースプレート50に精密な研磨処理等を行う必要がなく、基板搬送装置1の全体としての価格の削減を実現させることができる。   As described above, the height position adjusting mechanism 4 is used to reduce the number of assembling steps when attaching the substrate floating mechanism 3 to the substrate transport apparatus 1, for example, every time the height is adjusted unlike when adjusting with a shim or the like. It is possible to unify tools used for adjustment and unify the approach without having to remove the substrate floating mechanism 3 from the apparatus. In addition, since the individual height adjustment can be easily performed by using the height adjusting mechanism 4, the surface accuracy of the base plate 50 to which the substrate floating mechanism 3 is attached is not necessary. That is, it is not necessary to perform a precise polishing process or the like on the base plate 50, and the overall price of the substrate transfer apparatus 1 can be reduced.

本発明による基板搬送装置の実施例を示す概略斜視図The schematic perspective view which shows the Example of the board | substrate conveyance apparatus by this invention 同上基板搬送装置の基板浮上機構の断面模式図Cross-sectional schematic diagram of substrate floating mechanism of substrate transfer device 同上基板搬送装置の高さ調整機構の概略模式図Schematic diagram of the height adjustment mechanism of the substrate transfer device 同上基板搬送装置の高さ調整機構の断面模式図Cross-sectional schematic diagram of the height adjustment mechanism of the substrate transfer device

符号の説明Explanation of symbols

1・・・ 基板搬送装置
2・・・ 基板
3・・・ 基板浮上機構
3a・・・ 表面(基板浮上機構)
4・・・ 高さ位置調整機構
5・・・ 基板把持機構
6・・・ 基板搬送機構
7・・・ 把持部(基板把持機構)
8・・・ ベースプレート
9・・・ 吸引穴(基板浮上機構)
10・・・ 中空空間(基板浮上機構:吹き上げ)
10p・・・ 配管(基板浮上機構:吹き上げ)
11・・・ 中空空間(基板浮上機構:吸引)
11v・・・ 配管(基板浮上機構:吸引)
13・・・ 空気流(基板浮上機構:吹き上げ)
21・・・ ブロアーポンプ
22・・・ ボールバルブ
23・・・ 圧力調整弁
24・・・ マニホールド
25・・・ 圧空経路
26・・・ 排気経路
29・・・ チャンバー
40・・・ 梁状部材
41・・・ カメラ装置
42・・・ 光源
43・・・ アライメントステージ
50・・・ 固定プレート
50b・・・ 通気穴(圧空経路)
50c・・・ 通気穴(吸引経路)
50d・・・ ネジ部
51・・・ 可動プレート
51a・・・ 雌ネジ部(基板浮上機構取り付け)
51b・・・ テーパネジ部
51c・・・ 通気穴(吸引経路)
51d・・・ 雌ネジ部
52・・・ 貫通座グリ穴(基板浮上機構)
53・・・ 取り付けネジ
54・・・ 配管継手
56・・・ 調整ネジ
57・・・ バネ
58・・・ 弾性材(シール材)
DESCRIPTION OF SYMBOLS 1 ... Substrate conveyance apparatus 2 ... Substrate 3 ... Substrate levitation mechanism 3a ... Surface (substrate levitation mechanism)
4 ... Height position adjustment mechanism 5 ... Substrate gripping mechanism 6 ... Substrate transport mechanism 7 ... Grasping part (Substrate gripping mechanism)
8 ... Base plate 9 ... Suction hole (substrate floating mechanism)
10 ... Hollow space (Substrate levitation mechanism: blowing up)
10p ... Piping (substrate floating mechanism: blowing up)
11 ... Hollow space (substrate floating mechanism: suction)
11v ... Piping (substrate floating mechanism: suction)
13 ... Air flow (substrate floating mechanism: blowing up)
21 ... Blower pump 22 ... Ball valve 23 ... Pressure regulating valve 24 ... Manifold 25 ... Pressure air passage 26 ... Exhaust passage 29 ... Chamber 40 ... Beam-like member 41 .... Camera device 42 ... Light source 43 ... Alignment stage 50 ... Fixed plate 50b ... Vent hole (pressure air path)
50c ... Vent hole (suction path)
50d ... Screw part 51 ... Movable plate 51a ... Female screw part (attachment of substrate floating mechanism)
51b ... Taper screw part 51c ... Vent hole (suction path)
51d ... Female thread part 52 ... Through counterbore hole (substrate floating mechanism)
53 ... Installation screw 54 ... Pipe joint 56 ... Adjustment screw 57 ... Spring 58 ... Elastic material (seal material)

Claims (6)

基板搬送部に設置された基板を浮上させる基板浮上機構と、前記基板を搬送する基板搬送機構と、前記基板浮上機構表面の高さを調整する高さ調整機構とを具備する基板搬送装置であって、
前記高さ調整機構は、前記浮上機構を支持する可動プレートと、前記可動プレートの下に設置された固定プレートと、前記2枚のプレートに形成された同軸上で相異なるピッチを有するネジ部に螺合し、前記2枚のプレートのクリアランスを調節する調節ネジと、前記クリアランスに挟み込まれているシール材とを具備することを特徴とする基板搬送装置。
A substrate transfer apparatus comprising: a substrate floating mechanism for levitating a substrate installed in a substrate transfer unit; a substrate transfer mechanism for transferring the substrate; and a height adjusting mechanism for adjusting the height of the surface of the substrate floating mechanism. And
The height adjusting mechanism includes a movable plate that supports the levitation mechanism, a fixed plate installed under the movable plate, and a screw portion having a different pitch on the same axis formed on the two plates. An apparatus for transporting a substrate, comprising: an adjusting screw that is screwed to adjust a clearance between the two plates; and a sealing material sandwiched between the clearances.
前記基板浮上機構は基板と対向する面が多孔質体で構成された通気孔と、複数の穴で構成された吸気穴を具備することを特徴とする請求項1記載の基板搬送装置。   2. The substrate transfer apparatus according to claim 1, wherein the substrate floating mechanism includes a vent hole whose surface facing the substrate is formed of a porous body and an intake hole formed of a plurality of holes. 前記可動プレート及び前記固定プレートは前記基板浮上機構の吸気穴から空気を排出するための通気穴を具備することを特徴とする請求項2記載の基板搬送装置。   3. The substrate transfer apparatus according to claim 2, wherein the movable plate and the fixed plate are provided with a vent hole for discharging air from an intake hole of the substrate floating mechanism. 前記シール材は、前記通気穴の同軸上に設けられたリング状の弾性材であることを特徴とする請求項3記載の基板搬送装置。   4. The substrate transfer apparatus according to claim 3, wherein the sealing material is a ring-shaped elastic material provided coaxially with the vent hole. 前記可動プレート及び前記固定プレートは前記基板浮上機構の通気孔に空気の供給するための通気穴を具備することを特徴とする請求項2ないし4記載の基板搬送装置。   5. The substrate transfer apparatus according to claim 2, wherein the movable plate and the fixed plate include a vent hole for supplying air to a vent hole of the substrate floating mechanism. 請求項1ないし5に記載の基板搬送装置と、該基板搬送装置の基板搬送部に設置された基板を撮像するためのカメラとを有することを特徴とする基板検査装置。   6. A substrate inspection apparatus comprising: the substrate transfer apparatus according to claim 1; and a camera for imaging a substrate installed in a substrate transfer section of the substrate transfer apparatus.
JP2008075380A 2008-03-24 2008-03-24 Substrate transfer device and substrate inspection device Expired - Fee Related JP5176631B2 (en)

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JP2012162364A (en) * 2011-02-07 2012-08-30 Oiles Corp Separation distance adjusting device and conveying device using the same
CN103313922A (en) * 2011-01-31 2013-09-18 奥依列斯工业株式会社 Spacing adjustment device and conveying apparatus using same
US9227796B2 (en) 2012-04-16 2016-01-05 Oiles Corporation Interval adjustment device and transport device using same

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JP2002182321A (en) * 2000-10-03 2002-06-26 Fuji Photo Film Co Ltd Position regulating mechanism and image scanner having the same
JP2002289670A (en) * 2001-03-28 2002-10-04 Takehide Hayashi Floating unit
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JP2008007319A (en) * 2006-06-30 2008-01-17 Myotoku Ltd Floating conveying unit

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Publication number Priority date Publication date Assignee Title
JPS6059208U (en) * 1983-09-30 1985-04-24 株式会社東芝 Focus adjustment mechanism of photoelectric conversion device
JP2002182321A (en) * 2000-10-03 2002-06-26 Fuji Photo Film Co Ltd Position regulating mechanism and image scanner having the same
JP2002289670A (en) * 2001-03-28 2002-10-04 Takehide Hayashi Floating unit
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Publication number Priority date Publication date Assignee Title
CN103313922A (en) * 2011-01-31 2013-09-18 奥依列斯工业株式会社 Spacing adjustment device and conveying apparatus using same
KR101801434B1 (en) 2011-01-31 2017-11-24 오일레스고교 가부시키가이샤 Spacing adjustment device and conveying apparatus using same
JP2012162364A (en) * 2011-02-07 2012-08-30 Oiles Corp Separation distance adjusting device and conveying device using the same
US9227796B2 (en) 2012-04-16 2016-01-05 Oiles Corporation Interval adjustment device and transport device using same

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