JP2009210295A5 - - Google Patents

Download PDF

Info

Publication number
JP2009210295A5
JP2009210295A5 JP2008051113A JP2008051113A JP2009210295A5 JP 2009210295 A5 JP2009210295 A5 JP 2009210295A5 JP 2008051113 A JP2008051113 A JP 2008051113A JP 2008051113 A JP2008051113 A JP 2008051113A JP 2009210295 A5 JP2009210295 A5 JP 2009210295A5
Authority
JP
Japan
Prior art keywords
guide surface
substrate
positioning
guide
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008051113A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009210295A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008051113A priority Critical patent/JP2009210295A/ja
Priority claimed from JP2008051113A external-priority patent/JP2009210295A/ja
Publication of JP2009210295A publication Critical patent/JP2009210295A/ja
Publication of JP2009210295A5 publication Critical patent/JP2009210295A5/ja
Pending legal-status Critical Current

Links

JP2008051113A 2008-02-29 2008-02-29 位置決め装置、露光装置及びデバイス製造方法 Pending JP2009210295A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008051113A JP2009210295A (ja) 2008-02-29 2008-02-29 位置決め装置、露光装置及びデバイス製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008051113A JP2009210295A (ja) 2008-02-29 2008-02-29 位置決め装置、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2009210295A JP2009210295A (ja) 2009-09-17
JP2009210295A5 true JP2009210295A5 (https=) 2011-04-14

Family

ID=41183617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008051113A Pending JP2009210295A (ja) 2008-02-29 2008-02-29 位置決め装置、露光装置及びデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2009210295A (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120064460A1 (en) * 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
KR101403458B1 (ko) * 2012-11-13 2014-06-30 삼성디스플레이 주식회사 기판 이송 장치 및 기판 처리 장치
JP6543525B2 (ja) * 2015-07-10 2019-07-10 株式会社ディスコ チャックテーブルの製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3031940B2 (ja) * 1990-02-21 2000-04-10 キヤノン株式会社 移動案内装置
JP3165926B2 (ja) * 1991-10-17 2001-05-14 北海道 セラミック溶射皮膜の封孔処理法
JPH07310163A (ja) * 1994-05-16 1995-11-28 Canon Inc セラミック溶射膜およびその形成方法
WO2000079574A1 (en) * 1999-06-18 2000-12-28 Nikon Corporation Stage device and exposure system
JP2001198766A (ja) * 2000-01-12 2001-07-24 Sumitomo Metal Ind Ltd 移動位置決め装置用部材およびその製造方法
JP2007194393A (ja) * 2006-01-19 2007-08-02 Taiheiyo Cement Corp 静電チャック

Similar Documents

Publication Publication Date Title
EP2584408A3 (en) Imprint method and imprint apparatus
JP2017027088A5 (https=)
TW200611082A (en) Exposure system and device production method
WO2002071150A3 (en) Lithographic template
JP2009539252A5 (https=)
SG141385A1 (en) Lithographic apparatus and device manufacturing method
JP2005183985A5 (https=)
JP2007103924A5 (https=)
TW200739137A (en) Method for forming surface unevenness
WO2004017388A3 (en) Lithographic template and method of formation
TW201421557A (zh) 位於載板上之可卸式基體
JP2015144193A (ja) インプリント方法、テンプレートおよびインプリント装置
JP2009025560A (ja) リソグラフィー用ペリクル
TW200737300A (en) Reflexible photo-mask blank, manufacturing method thereof, reflexible photomask, and manufacturing method of semiconductor apparatus
TW201829310A (zh) 石墨烯膜之製造方法及利用此石墨烯膜之防護薄膜組件之製造方法
SG140481A1 (en) A method for fabricating micro and nano structures
JP2009210295A5 (https=)
TW200700932A (en) Lithography process with an enhanced depth-of-depth
JP2011023660A (ja) パターン転写方法
TW200628996A (en) Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus
Park et al. 3D micro patterning on a concave substrate for creating the replica of a cylindrical PDMS stamp
JP2005136289A5 (https=)
TW201306689A (zh) 形成圖案之方法及採用該方法形成有圖案之殼體
CN1776527A (zh) 用于纳米印刷光刻技术的气动方法和装置
JP2005256090A5 (https=)