JP2009210295A5 - - Google Patents
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- JP2009210295A5 JP2009210295A5 JP2008051113A JP2008051113A JP2009210295A5 JP 2009210295 A5 JP2009210295 A5 JP 2009210295A5 JP 2008051113 A JP2008051113 A JP 2008051113A JP 2008051113 A JP2008051113 A JP 2008051113A JP 2009210295 A5 JP2009210295 A5 JP 2009210295A5
- Authority
- JP
- Japan
- Prior art keywords
- guide surface
- substrate
- positioning
- guide
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Claims (5)
前記ガイド面は、封孔処理された後に研磨されていることを特徴とする位置決め装置。 The guide surface has a ceramic sprayed guide and a stage , and the stage is controlled along the guide surface while controlling a gap between the guide and the stage by air pressure and a suction force by a pressurizing magnet. A positioning device for moving
The positioning apparatus, wherein the guide surface is polished after being sealed.
前記第２部分の厚さは２００μｍ以下であることを特徴とする請求項１または請求項２に記載の位置決め装置。 The guide includes a first portion made of a metal and a second portion having the guide surface be formed on the first portion, said second portion, said guide surface is a sealing treatment Ri ceramics Tona,
The positioning device according to claim 1, wherein a thickness of the second portion is 200 μm or less.
前記フォトマスクを位置決めする機構および前記基板を位置決めする機構の少なくとも一方として請求項１乃至請求項３のいずれか１項に記載の位置決め装置を備えることを特徴とする露光装置。 An exposure apparatus that projects a pattern of a photomask onto a substrate and exposes the substrate,
An exposure apparatus comprising: the positioning device according to claim 1 as at least one of a mechanism for positioning the photomask and a mechanism for positioning the substrate.
請求項４に記載の露光装置を用いて基板を露光する工程と、
該基板を現像する工程と、
を有することを特徴とするデバイス製造方法。 A device manufacturing method comprising:
A step of exposing the substrate using the exposure apparatus according to claim 4;
Developing the substrate;
A device manufacturing method comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008051113A JP2009210295A (en) | 2008-02-29 | 2008-02-29 | Positioning equipment, exposure system and device manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008051113A JP2009210295A (en) | 2008-02-29 | 2008-02-29 | Positioning equipment, exposure system and device manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2009210295A JP2009210295A (en) | 2009-09-17 |
| JP2009210295A5 true JP2009210295A5 (en) | 2011-04-14 |
Family
ID=41183617
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008051113A Pending JP2009210295A (en) | 2008-02-29 | 2008-02-29 | Positioning equipment, exposure system and device manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2009210295A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120064460A1 (en) * | 2010-09-07 | 2012-03-15 | Nikon Corporation | Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method |
| KR101403458B1 (en) * | 2012-11-13 | 2014-06-30 | 삼성디스플레이 주식회사 | Apparatus for transfering substrate and processing substrate |
| JP6543525B2 (en) * | 2015-07-10 | 2019-07-10 | 株式会社ディスコ | Chuck table manufacturing method |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3031940B2 (en) * | 1990-02-21 | 2000-04-10 | キヤノン株式会社 | Travel guide device |
| JP3165926B2 (en) * | 1991-10-17 | 2001-05-14 | 北海道 | Sealing treatment method for ceramic spray coating |
| JPH07310163A (en) * | 1994-05-16 | 1995-11-28 | Canon Inc | Ceramic thermally sprayed coating and its formation |
| WO2000079574A1 (en) * | 1999-06-18 | 2000-12-28 | Nikon Corporation | Stage device and exposure system |
| JP2001198766A (en) * | 2000-01-12 | 2001-07-24 | Sumitomo Metal Ind Ltd | Member for moving and positioning device and manufacturing method |
| JP2007194393A (en) * | 2006-01-19 | 2007-08-02 | Taiheiyo Cement Corp | Electrostatic chuck |
-
2008
- 2008-02-29 JP JP2008051113A patent/JP2009210295A/en active Pending
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