JP2009204611A5 - - Google Patents

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Publication number
JP2009204611A5
JP2009204611A5 JP2009040442A JP2009040442A JP2009204611A5 JP 2009204611 A5 JP2009204611 A5 JP 2009204611A5 JP 2009040442 A JP2009040442 A JP 2009040442A JP 2009040442 A JP2009040442 A JP 2009040442A JP 2009204611 A5 JP2009204611 A5 JP 2009204611A5
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sample
drift
imaging
reference mark
processing
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JP2009040442A
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Japanese (ja)
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JP5441242B2 (ja
JP2009204611A (ja
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Priority claimed from US12/039,535 external-priority patent/US7880151B2/en
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JP2009040442A 2008-02-28 2009-02-24 ビーム加工のための改善されたビーム位置決め Active JP5441242B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/039,535 US7880151B2 (en) 2008-02-28 2008-02-28 Beam positioning for beam processing
US12/039,535 2008-02-28

Publications (3)

Publication Number Publication Date
JP2009204611A JP2009204611A (ja) 2009-09-10
JP2009204611A5 true JP2009204611A5 (https=) 2014-01-16
JP5441242B2 JP5441242B2 (ja) 2014-03-12

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JP2009040442A Active JP5441242B2 (ja) 2008-02-28 2009-02-24 ビーム加工のための改善されたビーム位置決め

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US (1) US7880151B2 (https=)
EP (1) EP2096663B1 (https=)
JP (1) JP5441242B2 (https=)

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US10809637B1 (en) * 2019-05-30 2020-10-20 Applied Materials, Inc. Learning based digital corrections to compensate variations on lithography systems with multiple imaging units
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JP2020194789A (ja) * 2020-08-11 2020-12-03 株式会社日立ハイテク イオンミリング方法、およびイオンミリング装置
TWI837451B (zh) * 2021-01-19 2024-04-01 台灣積體電路製造股份有限公司 對一結構加工之機台及方法
CN114823259B (zh) * 2021-01-19 2026-04-21 台湾积体电路制造股份有限公司 用于对结构加工的机台及方法
CN113324488B (zh) * 2021-05-14 2023-04-18 长江存储科技有限责任公司 一种厚度测量方法和系统
JP2023039178A (ja) * 2021-09-08 2023-03-20 日本電子株式会社 荷電粒子ビーム描画装置及び荷電粒子ビーム描画装置の制御方法
DE102021213163A1 (de) 2021-11-23 2023-05-25 Carl Zeiss Smt Gmbh Verfahren und Vorrichtung zur Kalibrierung eines Arbeitsvorgangs auf einer Photomaske
DE102021213160B4 (de) 2021-11-23 2025-10-09 Carl Zeiss Smt Gmbh Verfahren und Vorrichtungen zur Untersuchung und/oder Bearbeitung eines Objekts für die Lithographie
JP7465299B2 (ja) 2022-03-23 2024-04-10 日本電子株式会社 荷電粒子線装置
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