JP2009194238A5 - - Google Patents

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Publication number
JP2009194238A5
JP2009194238A5 JP2008035084A JP2008035084A JP2009194238A5 JP 2009194238 A5 JP2009194238 A5 JP 2009194238A5 JP 2008035084 A JP2008035084 A JP 2008035084A JP 2008035084 A JP2008035084 A JP 2008035084A JP 2009194238 A5 JP2009194238 A5 JP 2009194238A5
Authority
JP
Japan
Prior art keywords
optical system
measurement unit
birefringence
light
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008035084A
Other languages
English (en)
Japanese (ja)
Other versions
JP5033015B2 (ja
JP2009194238A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008035084A priority Critical patent/JP5033015B2/ja
Priority claimed from JP2008035084A external-priority patent/JP5033015B2/ja
Priority to US12/369,581 priority patent/US7889319B2/en
Priority to TW098104359A priority patent/TWI411888B/zh
Priority to KR1020090012032A priority patent/KR101062075B1/ko
Publication of JP2009194238A publication Critical patent/JP2009194238A/ja
Publication of JP2009194238A5 publication Critical patent/JP2009194238A5/ja
Application granted granted Critical
Publication of JP5033015B2 publication Critical patent/JP5033015B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2008035084A 2008-02-15 2008-02-15 露光装置、露光方法及びデバイス製造方法 Expired - Fee Related JP5033015B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2008035084A JP5033015B2 (ja) 2008-02-15 2008-02-15 露光装置、露光方法及びデバイス製造方法
US12/369,581 US7889319B2 (en) 2008-02-15 2009-02-11 Exposure apparatus and device fabrication method
TW098104359A TWI411888B (zh) 2008-02-15 2009-02-11 曝光設備及裝置製造方法
KR1020090012032A KR101062075B1 (ko) 2008-02-15 2009-02-13 노광 장치 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008035084A JP5033015B2 (ja) 2008-02-15 2008-02-15 露光装置、露光方法及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009194238A JP2009194238A (ja) 2009-08-27
JP2009194238A5 true JP2009194238A5 (enExample) 2011-03-31
JP5033015B2 JP5033015B2 (ja) 2012-09-26

Family

ID=40954831

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008035084A Expired - Fee Related JP5033015B2 (ja) 2008-02-15 2008-02-15 露光装置、露光方法及びデバイス製造方法

Country Status (4)

Country Link
US (1) US7889319B2 (enExample)
JP (1) JP5033015B2 (enExample)
KR (1) KR101062075B1 (enExample)
TW (1) TWI411888B (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102009015393B3 (de) * 2009-03-20 2010-09-02 Carl Zeiss Smt Ag Messverfahren und Messsystem zur Messung der Doppelbrechung
US8960909B2 (en) * 2012-01-20 2015-02-24 Canon Kabushiki Kaisha Control apparatus and control method
KR102527672B1 (ko) * 2018-04-06 2023-04-28 에이에스엠엘 네델란즈 비.브이. 비선형 광학계를 갖는 검사 장치
CN111883408B (zh) * 2020-08-13 2025-03-14 深圳市奥谱太赫兹技术研究院 多电子束聚焦装置和控制方法
JP7750648B2 (ja) * 2020-10-23 2025-10-07 レーザーテック株式会社 測定装置、及び測定方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001296206A (ja) * 2000-04-13 2001-10-26 Nikon Corp 複屈折測定装置及び複屈折測定方法
JP2002071515A (ja) * 2000-08-31 2002-03-08 Canon Inc 測定装置及び測定方法
KR100379521B1 (ko) 2000-11-27 2003-04-10 주식회사 하이닉스반도체 반도체 소자의 제조방법
JP2004061515A (ja) * 2002-07-29 2004-02-26 Cark Zeiss Smt Ag 光学系による偏光状態への影響を決定する方法及び装置と、分析装置
JP3971363B2 (ja) * 2003-10-07 2007-09-05 株式会社東芝 露光装置及び露光装置の光学系のミュラー行列を測定する方法
JP2006214856A (ja) * 2005-02-03 2006-08-17 Canon Inc 測定装置及び方法
JP4976670B2 (ja) * 2005-08-24 2012-07-18 キヤノン株式会社 露光装置及びデバイス製造方法
US7605914B2 (en) * 2005-09-29 2009-10-20 Carl Zeiss Smt Ag Optical system and method for improving imaging properties thereof
JP2008277632A (ja) * 2007-05-01 2008-11-13 Canon Inc 測定方法、測定装置、露光装置及びデバイス製造方法

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