JP2009188348A5 - - Google Patents
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- Publication number
- JP2009188348A5 JP2009188348A5 JP2008029476A JP2008029476A JP2009188348A5 JP 2009188348 A5 JP2009188348 A5 JP 2009188348A5 JP 2008029476 A JP2008029476 A JP 2008029476A JP 2008029476 A JP2008029476 A JP 2008029476A JP 2009188348 A5 JP2009188348 A5 JP 2009188348A5
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- processing
- insulating film
- forming
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008029476A JP5374748B2 (ja) | 2008-02-08 | 2008-02-08 | 絶縁膜の形成方法、コンピュータ読み取り可能な記憶媒体および処理システム |
US12/865,969 US8034179B2 (en) | 2008-02-08 | 2009-02-06 | Method for insulating film formation, storage medium from which information is readable with computer, and processing system |
PCT/JP2009/052447 WO2009099254A1 (fr) | 2008-02-08 | 2009-02-06 | Procédé de formation de film isolant, support de stockage à partir duquel des informations sont lisibles par ordinateur, et système de traitement |
TW098103865A TWI445083B (zh) | 2008-02-08 | 2009-02-06 | Insulation film formation method, the computer can read the memory media and processing system |
KR1020107017596A KR101248651B1 (ko) | 2008-02-08 | 2009-02-06 | 절연막의 형성 방법, 컴퓨터 판독 가능한 기억 매체 및 처리 시스템 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008029476A JP5374748B2 (ja) | 2008-02-08 | 2008-02-08 | 絶縁膜の形成方法、コンピュータ読み取り可能な記憶媒体および処理システム |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009188348A JP2009188348A (ja) | 2009-08-20 |
JP2009188348A5 true JP2009188348A5 (fr) | 2011-03-10 |
JP5374748B2 JP5374748B2 (ja) | 2013-12-25 |
Family
ID=41071262
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008029476A Expired - Fee Related JP5374748B2 (ja) | 2008-02-08 | 2008-02-08 | 絶縁膜の形成方法、コンピュータ読み取り可能な記憶媒体および処理システム |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5374748B2 (fr) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5614407B2 (ja) | 2009-08-17 | 2014-10-29 | 旭硝子株式会社 | 溶融ガラスの製造方法、ガラス溶融炉、ガラス製品の製造方法、及びガラス製品の製造装置 |
JP5663384B2 (ja) * | 2011-04-19 | 2015-02-04 | 三菱電機株式会社 | 絶縁膜の製造方法 |
US8999773B2 (en) * | 2012-04-05 | 2015-04-07 | Semiconductor Energy Laboratory Co., Ltd. | Processing method of stacked-layer film and manufacturing method of semiconductor device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0443642A (ja) * | 1990-06-11 | 1992-02-13 | G T C:Kk | ゲート絶縁膜の形成方法 |
KR100833406B1 (ko) * | 2000-03-13 | 2008-05-28 | 다다히로 오미 | 플래시 메모리 소자 및 그 제조 방법, 유전체막의 형성 방법 |
-
2008
- 2008-02-08 JP JP2008029476A patent/JP5374748B2/ja not_active Expired - Fee Related
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