JP2009182087A - Stacked semiconductor package and electronic apparatus - Google Patents

Stacked semiconductor package and electronic apparatus Download PDF

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JP2009182087A
JP2009182087A JP2008018809A JP2008018809A JP2009182087A JP 2009182087 A JP2009182087 A JP 2009182087A JP 2008018809 A JP2008018809 A JP 2008018809A JP 2008018809 A JP2008018809 A JP 2008018809A JP 2009182087 A JP2009182087 A JP 2009182087A
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semiconductor package
connection
connection conductor
power supply
stacked semiconductor
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JP5153364B2 (en
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Shinji Hayakawa
慎二 早川
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Kyocera Corp
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Kyocera Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a stacked semiconductor package, in which the power bounce caused by inductance is reduced without increasing the mounting area. <P>SOLUTION: In a stacked semiconductor package 1 consisting of multiple stacked semiconductor package elements, power wires and grounding wires of adjacent semiconductor package elements are respectively connected together by connection conductors 4, and connection conductors 4 for connecting power wires and those for connecting grounding wires are alternately arranged. The capacitance between a connection conductor 4 for connecting power wires and that for connecting grounding wires acts as decoupling capacitance that prevents the power bounce. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、半導体素子が搭載される半導体パッケージが少なくとも2つ以上積層されてなる積層型半導体パッケージならびにその積層型半導体パッケージを用いた電子装置に関するものである。   The present invention relates to a stacked semiconductor package in which at least two semiconductor packages on which semiconductor elements are mounted are stacked, and an electronic device using the stacked semiconductor package.

近年、電子機器の小型化や高機能化に伴う高集積化に対応して、半導体素子をはじめとする電子部品が高密度に搭載された半導体パッケージに関する開発が活発に行なわれている。例えば、グリッド状にランドを持つBGA(Ball Grid Array)パッケージやCSP(Chip Scale Package)が採用されている。また更なる高密度化に対応するために、複数の半導体パッケージを上下に積み重ねて一体的に積層したPOP(Package On Package)と呼ばれる積層型半導体パッケージが使用されるようになってきている。   2. Description of the Related Art In recent years, development of a semiconductor package in which electronic components such as semiconductor elements are mounted at high density has been actively carried out in response to high integration due to miniaturization and high functionality of electronic devices. For example, a BGA (Ball Grid Array) package or CSP (Chip Scale Package) having lands in a grid shape is employed. In order to cope with higher density, a stacked type semiconductor package called POP (Package On Package) in which a plurality of semiconductor packages are stacked one above the other and integrated is increasingly used.

しかしながら、POP構造は半導体素子を実装した半導体パッケージが3次元的に接続されるので、上層に存在するパッケージに実装された半導体素子ほど、下層の半導体パッケージを介して接続されるために電源供給線路の接続点が多くなり、接続距離も長くなる。従って、電源供給経路のインダクタンスの変動が大きくなり、電源バウンスが発生して、安定した信号品質が保てなくなってしまう。   However, in the POP structure, the semiconductor package on which the semiconductor element is mounted is three-dimensionally connected, so that the semiconductor element mounted on the package existing in the upper layer is connected via the lower-layer semiconductor package. The number of connection points increases and the connection distance also increases. Therefore, the fluctuation of the inductance of the power supply path becomes large, the power bounce occurs, and the stable signal quality cannot be maintained.

ここで、電源バウンスとは上記インダクタンス成分により逆起電圧が生じ、電源供給線路の電圧が変動する事である。この解決法として、図5に示すように、2段目の半導体パッケージ102bよりも上に存在する半導体素子105bへの電源供給経路をプリント基板108と半田ボール104a,104bを介して直接接続し、接続点を少なくする方法が提案されている(例えば、特許文献1)。
特開2006−295136号公報
Here, the power bounce means that a back electromotive voltage is generated by the inductance component and the voltage of the power supply line fluctuates. As a solution to this, as shown in FIG. 5, the power supply path to the semiconductor element 105b existing above the second-stage semiconductor package 102b is directly connected to the printed circuit board 108 via the solder balls 104a and 104b. A method for reducing the number of connection points has been proposed (for example, Patent Document 1).
JP 2006-295136 A

しかしながら、上記従来の方法は、1段目の半導体パッケージ102aよりも2段目の半導体パッケージ102bのサイズが大きくなってしまい、積層型半導体パッケージ101全体の実装面積が大きくなるという問題がある。更に、積層型半導体パッケージ101は半導体素子105a,105b間の距離が短いため、半導体素子105a,105b間に挟まれた空間に熱が滞留し、熱の滞留が著しい場合は半導体素子105a,105bが動作不良を起こしてしまうという問題がある。   However, the conventional method has a problem that the size of the second-stage semiconductor package 102b is larger than that of the first-stage semiconductor package 102a, and the entire mounting area of the stacked semiconductor package 101 is increased. Furthermore, in the stacked semiconductor package 101, since the distance between the semiconductor elements 105a and 105b is short, heat stays in the space between the semiconductor elements 105a and 105b, and if the heat stays significantly, the semiconductor elements 105a and 105b There is a problem of causing malfunction.

本発明は、上記問題点を解決するために案出されたものであり、その目的は、実装面積を大きくする事なく、電源バウンスを減少させ、安定した信号品質を供給するパッケージを提供することにある。   The present invention has been devised to solve the above-described problems, and an object of the present invention is to provide a package that reduces power bounce and supplies stable signal quality without increasing the mounting area. It is in.

本発明の積層型半導体パッケージは、複数個の半導体パッケージを積層してなる積層型半導体パッケージにおいて、隣接する半導体パッケージの電源配線同士および接地配線同士を接続導体によって接続するとともに、電源配線接続用と接地配線接続用の接続導体を交互に並べて複数配設したことを特徴とする。   The stacked semiconductor package according to the present invention is a stacked semiconductor package in which a plurality of semiconductor packages are stacked, and power supply wirings and ground wirings of adjacent semiconductor packages are connected by a connection conductor, A plurality of connection conductors for ground wiring connection are arranged alternately and arranged.

また、好ましくは、本発明の積層型半導体パッケージにおいて、前記接続導体は複数列配設されており、隣接する列において、一方列の電源配線接続用の前記接続導体の隣には他方列の接地配線接続用の前記接続導体が位置するように前記接続導体が配設されていることを特徴とする。   Preferably, in the stacked semiconductor package of the present invention, the connection conductors are arranged in a plurality of rows, and adjacent rows are adjacent to the connection conductors for connecting the power supply wirings in one row and grounded in the other row. The connection conductor is arranged so that the connection conductor for wiring connection is located.

また、好ましくは、本発明の積層型半導体パッケージにおいて、前記接続導体は、金属バンプの周囲に低融点半田を溶着させて形成されていることを特徴とする。   Preferably, in the stacked semiconductor package of the present invention, the connection conductor is formed by welding a low melting point solder around a metal bump.

また、好ましくは、本発明の積層型半導体パッケージにおいて、前記接続導体は、誘電率の高い樹脂によって取り囲まれていることを特徴とする。   Preferably, in the stacked semiconductor package of the present invention, the connection conductor is surrounded by a resin having a high dielectric constant.

また、好ましくは、本発明の積層型半導体パッケージにおいて、前記接続導体は短冊形状であり、対向する長辺によって隣接する前記半導体パッケージの電源配線同士または接地配線同士を接続するとともに電源配線接続用の前記接続導体および接地配線接続用の前記接続導体の表面が対面するように複数配設されていることを特徴とする。   Preferably, in the stacked semiconductor package of the present invention, the connection conductor has a strip shape, and the power supply wirings or the grounding wirings of the semiconductor packages adjacent to each other are connected by the long sides facing each other and for connecting the power supply wirings. A plurality of the connection conductors and the surface of the connection conductor for ground wiring connection are arranged so as to face each other.

また、好ましくは、本発明の積層型半導体パッケージにおいて、隣接する前記半導体パッケージの層間に、前記半導体パッケージの表面と平行に2枚の金属板が対面させて配置され、その金属板は、電源配線接続用の前記接続導体および接地配線接続用の前記接続導体にそれぞれ接続されていることを特徴とする。   Preferably, in the stacked semiconductor package of the present invention, two metal plates are arranged in parallel between the surfaces of the semiconductor packages between the adjacent semiconductor packages, and the metal plates are connected to the power supply wiring. It is connected to the connection conductor for connection and the connection conductor for ground wiring connection, respectively.

また、好ましくは、本発明の積層型半導体パッケージにおいて、前記金属板の間に誘電率の高い樹脂を配置したことを特徴とする。   Preferably, in the stacked semiconductor package of the present invention, a resin having a high dielectric constant is disposed between the metal plates.

また、本発明の電子装置は、上記本発明の積層型半導体パッケージに、半導体素子を含む電子部品が搭載されて成る。   The electronic device of the present invention is formed by mounting an electronic component including a semiconductor element on the stacked semiconductor package of the present invention.

本発明の積層型半導体パッケージによれば、隣接する半導体パッケージの電源配線同士および接地配線同士を接続導体によって接続するとともに、電源配線接続用と接地配線接続用の接続導体を交互に並べて複数配設したことことから、電源配線接続用の接続導体と接地配線接続用の接続導体間に容量を持たせることができ、この容量から半導体素子への電荷供給ができるので、上段半導体素子への電荷供給経路が短くなる。これによって、電源供給経路に付随するインダクタンスによる電圧の変動、すなわち電源バウンスを小さくすることができる。   According to the stacked semiconductor package of the present invention, the power supply wirings and the grounding wirings of adjacent semiconductor packages are connected by the connection conductors, and a plurality of connection conductors for power supply wiring connection and ground wiring connection are arranged alternately. As a result, a capacitance can be provided between the connection conductor for connecting the power supply wiring and the connection conductor for connecting the ground wiring, and charge can be supplied from this capacitance to the semiconductor element. The route becomes shorter. As a result, the voltage fluctuation due to the inductance accompanying the power supply path, that is, the power bounce can be reduced.

また、本発明の積層型半導体パッケージにおいて、接続導体は複数列配設されており、隣接する列において、一方列の電源配線接続用の接続導体の隣には他方列の接地配線接続用の接続導体が位置するように接続導体が配設されている場合、複数列に配設された接続導体間の容量を大きくする事が可能となり、電源バウンスをより効果的に抑制する事が出来る。   In the stacked semiconductor package of the present invention, the connection conductors are arranged in a plurality of rows, and in the adjacent row, the connection conductor for connecting the power wiring in one row is adjacent to the connection for connecting the ground wiring in the other row. When the connection conductors are arranged so that the conductors are positioned, it is possible to increase the capacity between the connection conductors arranged in a plurality of rows, and it is possible to more effectively suppress the power bounce.

また、本発明の積層型半導体パッケージにおいて、接続導体は、金属バンプの周囲に低融点半田を溶着させて形成されている場合、リフローを通した際に液化した低融点半田が金属バンプの周囲を取り囲み、円柱形状の接続導体が形成されるとともに、金属バンプ径と同等の高さを持つ円柱形状となることから、半導体パッケージ間の距離を一定に保ちつつ、接続導体間の容量を一定のものとすることができる。   In the stacked semiconductor package of the present invention, when the connection conductor is formed by welding a low melting point solder around the metal bump, the low melting point solder liquefied when reflowing is passed around the metal bump. Surrounding, cylindrical connection conductors are formed, and the columnar shape has the same height as the metal bump diameter, so the capacitance between the connection conductors is constant while keeping the distance between the semiconductor packages constant. It can be.

また、本発明の積層型半導体パッケージにおいて、接続導体は、誘電率の高い樹脂によって取り囲まれている場合、樹脂は比誘電率が空気に比べて大きいので、接続導体間に形成される容量値を大きくする事が可能となる。従って、電源バウンスを小さくすることができる。   Further, in the stacked semiconductor package of the present invention, when the connection conductor is surrounded by a resin having a high dielectric constant, the resin has a relative dielectric constant larger than that of air. It can be enlarged. Therefore, power bounce can be reduced.

また、本発明の積層型半導体パッケージにおいて、接続導体は短冊形状であり、対向する長辺によって隣接する半導体パッケージの電源配線同士または接地配線同士を接続するとともに電源配線接続用の接続導体および接地配線接続用の接続導体の表面が対面するように複数配設されている場合、対面する接続導体の表面積を大きくすることができ、大きな容量を形成する事が可能となる。従って、電源バウンスをより効果的に抑制する事が出来る。   In the stacked semiconductor package of the present invention, the connection conductor has a strip shape, and the power supply wirings or grounding wirings of adjacent semiconductor packages are connected by the long sides facing each other, and the connection conductor and grounding wiring for connecting the power supply wirings When a plurality of connecting conductors for connection are arranged so that the surfaces of the connecting conductors face each other, the surface area of the connecting conductors facing each other can be increased, and a large capacity can be formed. Therefore, power bounce can be more effectively suppressed.

また、本発明の積層型半導体パッケージにおいて、隣接する半導体パッケージの層間に、半導体パッケージの表面と平行に2枚の金属板が対面させて配置され、その金属板は、電源配線接続用の接続導体および接地配線接続用の接続導体にそれぞれ接続されている場合、電源配線接続用の接続導体と接続した電源用金属板と接地配線接続用の接地導体に接続した接地用金属板間に容量を形成する事が可能となる。接続導体同士の容量形成に加えて、更に金属板による容量形成が可能となるので、電源バウンスをより効果的に抑制する事が出来る。   Further, in the stacked semiconductor package of the present invention, two metal plates are arranged between the adjacent semiconductor packages so as to face each other in parallel with the surface of the semiconductor package, and the metal plates are connection conductors for connecting power supply wirings. When connected to the connection conductor for ground wiring connection, a capacitor is formed between the power supply metal plate connected to the connection conductor for power supply wiring connection and the ground metal plate connected to the ground conductor for ground wiring connection. It becomes possible to do. In addition to forming the capacitance between the connecting conductors, it is possible to further form a capacitance using a metal plate, so that power bounce can be more effectively suppressed.

また、本発明の積層型半導体パッケージにおいて、金属板の間に誘電率の高い樹脂を配置した場合、電源配線接続用の接地導体と接続した電源用金属板と接地配線接続用の接地導体に接続した接地用金属板間に形成される容量を大きくする事が出来るので、電源バウンスをより抑制する事が可能となる。   In the stacked semiconductor package of the present invention, when a resin having a high dielectric constant is disposed between the metal plates, the power supply metal plate connected to the ground conductor for connecting the power supply wiring and the ground connected to the ground conductor for connecting the ground wiring Since the capacity formed between the metal plates can be increased, the power bounce can be further suppressed.

また、本発明の電子装置は、上記本発明の積層型パッケージに半導体素子を含む電子部品が搭載されてなることから、電子部品に供給される電源の電源バウンスが抑制されて、電子部品の作動性に優れる電子装置とすることができる。   In addition, since the electronic device of the present invention includes the electronic component including the semiconductor element mounted on the stacked package of the present invention, the power supply bounce of the power supplied to the electronic component is suppressed, and the electronic component is operated. An electronic device with excellent performance can be obtained.

本発明の積層型半導体パッケージについて以下に詳細に説明する。   The stacked semiconductor package of the present invention will be described in detail below.

図1は本発明の積層型半導体パッケージ1の実施の形態の一例を示す断面図であり、図2は図1の平面図である。また、図3は本発明の積層型半導体パッケージの実施の形態の他の例を示す平面図である。図1乃至図3において同じ部位には同じ符号を付している。図1は図2の断面A−AAを示している。また、図2、図3において、分かりやすくするために、特定導体部位にハッチングを付している。従って、このハッチングは断面を示すものではない。   FIG. 1 is a cross-sectional view showing an example of an embodiment of a stacked semiconductor package 1 of the present invention, and FIG. 2 is a plan view of FIG. FIG. 3 is a plan view showing another example of the embodiment of the stacked semiconductor package of the present invention. 1 to 3, the same parts are denoted by the same reference numerals. FIG. 1 shows a cross section A-AA of FIG. Further, in FIG. 2 and FIG. 3, the specific conductor portion is hatched for easy understanding. Therefore, this hatching does not indicate a cross section.

図1乃至図3において、1は本発明の積層型半導体パッケージを示す。2は半導体パッケージの基板を示し、2aは実装基板8からみて1層目の半導体パッケージの基板、2bは実装基板8からみて2層目の半導体パッケージの基板を示す。3は2枚の金属板を示し、3aは電源配線接続用の接続導体4aに接続されている金属板(以下、電源電位金属板ともいう)、3bは接地配線接続用の接続導体4bに接続されている金属板(以下、接地電位金属板ともいう)を示す。4は隣接する半導体パッケージ間を接続する接続導体を示し、4aは隣接する半導体パッケージの電源配線同士を接続する電源配線接続用の接続導体(以下、電源用接続導体ともいう)、4bは隣接する半導体パッケージの接地配線同士を接続する接地配線接続用の接続導体(以下、接地用接続導体ともいう)、4cは隣接する半導体パッケージの信号配線同士を接続する信号配線接続用の接続導体(以下、信号用接続導体ともいう)を示す。5は電子部品の例としての半導体素子を示す。6は接続導体4を取り囲む誘電率が高い樹脂および2枚の金属板3の間に配置された誘電率が高い樹脂を示す。   1 to 3, reference numeral 1 denotes a stacked semiconductor package of the present invention. Reference numeral 2 denotes a substrate of the semiconductor package, 2a denotes a substrate of the first semiconductor package as viewed from the mounting substrate 8, and 2b denotes a substrate of the second semiconductor package as viewed from the mounting substrate 8. Reference numeral 3 denotes two metal plates, 3a is a metal plate (hereinafter also referred to as a power supply potential metal plate) connected to the connection conductor 4a for connecting the power supply wiring, and 3b is connected to the connection conductor 4b for connecting the ground wiring. A metal plate (hereinafter also referred to as a ground potential metal plate) is shown. Reference numeral 4 denotes a connection conductor for connecting adjacent semiconductor packages, 4a is a connection conductor for connecting power supply lines for connecting power supply wirings of adjacent semiconductor packages (hereinafter also referred to as a power supply connection conductor), and 4b is adjacent to each other. A connection conductor for ground wiring connection (hereinafter also referred to as ground connection conductor) for connecting the ground wirings of the semiconductor package (hereinafter also referred to as ground connection conductor), and 4c is a connection conductor for signal wiring connection (hereinafter referred to as the connection conductor for signal wiring of adjacent semiconductor packages). Also referred to as a signal connection conductor). Reference numeral 5 denotes a semiconductor element as an example of an electronic component. Reference numeral 6 denotes a resin having a high dielectric constant surrounding the connection conductor 4 and a resin having a high dielectric constant disposed between the two metal plates 3.

本発明の積層型半導体パッケージ1において、基板2aおよび基板2bは、酸化アルミニウム質焼結体,窒化アルミニウム質焼結体,炭化珪素質焼結体,窒化珪素質焼結体,ムライト質焼結体またはガラスセラミックス等の無機絶縁材料と半導体素子5および実装基板8間を繋ぐ為の金属配線とから主として成っている。   In the stacked semiconductor package 1 of the present invention, the substrate 2a and the substrate 2b are made of an aluminum oxide sintered body, an aluminum nitride sintered body, a silicon carbide sintered body, a silicon nitride sintered body, and a mullite sintered body. Alternatively, it mainly comprises an inorganic insulating material such as glass ceramics and metal wiring for connecting the semiconductor element 5 and the mounting substrate 8.

金属配線は、例えば、タングステン(W),モリブデン(Mo),モリブデン−マンガン(Mo−Mn),銅(Cu),銀(Ag)または銀−パラジウム(Ag−Pd)等の金属粉末メタライズ、あるいは銅(Cu),銀(Ag),ニッケル(Ni),クロム(Cr),チタン(Ti),金(Au)またはニオブ(Nb)やそれらの合金等で形成される。この金属配線は、厚膜法や薄膜法等の金属層形成手段により上記セラミックス等の絶縁体に所定パターンに被着、形成される。   The metal wiring is, for example, metal powder metallization such as tungsten (W), molybdenum (Mo), molybdenum-manganese (Mo-Mn), copper (Cu), silver (Ag) or silver-palladium (Ag-Pd), or It is formed of copper (Cu), silver (Ag), nickel (Ni), chromium (Cr), titanium (Ti), gold (Au), niobium (Nb), or an alloy thereof. The metal wiring is deposited and formed in a predetermined pattern on an insulator such as ceramics by a metal layer forming means such as a thick film method or a thin film method.

例えば金属配線を厚膜法で形成する場合、W粉末に適当な有機バインダや溶剤等を添加混合して得た金属ペーストを、セラミックグリーンシートに所定のパターンで印刷塗布し、これらセラミックグリーンシートを積層して積層体とするともに焼成することによって形成することができる。   For example, when a metal wiring is formed by a thick film method, a metal paste obtained by adding and mixing an appropriate organic binder or solvent to W powder is printed and applied in a predetermined pattern on a ceramic green sheet. It can be formed by stacking to form a laminate and firing.

また、基板2aおよび基板2bの無機絶縁材料は、例えばセラミックグリーンシート積層法や、押し出し成形法等の基板形成手段によって形成される。   Moreover, the inorganic insulating material of the board | substrate 2a and the board | substrate 2b is formed by board | substrate formation means, such as a ceramic green sheet lamination method and an extrusion molding method, for example.

これらの無機絶縁材料は以下のようにして作製される。無機絶縁材料が例えば酸化アルミニウム質焼結体から成る場合、まず、酸化アルミニウム,酸化珪素,酸化カルシウムまたは酸化マグネシウム等の原料粉末に適当な有機バインダや溶剤等を添加混合して泥漿状となし、これをドクターブレード法等でシート状となすことによってセラミックグリーンシートを得る。そして、セラミックグリーンシートに各導体層と成る金属ペーストを所定のパターンに印刷塗布して、これらを上下に積層し、最後にこの積層体を還元雰囲気中で約1600℃の温度で焼成することによって製作される。   These inorganic insulating materials are produced as follows. When the inorganic insulating material is made of, for example, an aluminum oxide sintered body, first, a suitable organic binder or solvent is added to and mixed with the raw material powder such as aluminum oxide, silicon oxide, calcium oxide or magnesium oxide to form a slurry. A ceramic green sheet is obtained by making this into a sheet by a doctor blade method or the like. A ceramic green sheet is printed with a metal paste that forms each conductor layer in a predetermined pattern, and these are laminated one above the other. Finally, the laminate is fired at a temperature of about 1600 ° C. in a reducing atmosphere. Produced.

また、基板2aおよび基板2bの無機絶縁材料は、ポリイミド,エポキシ樹脂,フッ素樹脂,ポリノルボルネンまたはベンゾシクロブテン等の有機絶縁材料、あるいはセラミック粉末等の無機絶縁物粉末をエポキシ樹脂等の熱硬化性樹脂で結合して成る複合絶縁材料等の電気的な絶縁材料から成っていてもよい。   Further, the inorganic insulating material of the substrate 2a and the substrate 2b is an organic insulating material such as polyimide, epoxy resin, fluororesin, polynorbornene or benzocyclobutene, or an inorganic insulating powder such as ceramic powder, which is thermosetting such as epoxy resin. You may consist of electrically insulating materials, such as a composite insulating material couple | bonded with resin.

例えば、複合絶縁材料からなる場合、まず酸化アルミニウム質焼結体から成るセラミックスを混合した熱硬化性のエポキシ樹脂、あるいはガラス繊維を織り込んだ布にエポキシ樹脂を含浸させて成るガラスエポキシ樹脂等から成る絶縁層の上面に、有機樹脂前駆体をスピンコート法もしくはカーテンコート法等により被着させ、これを熱硬化処理することによって絶縁層を形成する。この絶縁層と、銅層を無電解めっき法や蒸着法等の薄膜形成技術およびフォトリソグラフィ技術を採用することによって形成して成る薄膜配線導体層とを交互に積層し、約170℃程度の温度で加熱硬化することによって製作される。これらの積層された無機絶縁材料の厚みは、使用する材料の特性に応じて、要求される仕様に対応する機械的強度や電気的特性等の条件を満たすように設定される。   For example, in the case of a composite insulating material, first, a thermosetting epoxy resin mixed with ceramics made of an aluminum oxide sintered body, or a glass epoxy resin made by impregnating a glass fiber woven cloth with an epoxy resin, etc. An organic resin precursor is deposited on the upper surface of the insulating layer by a spin coating method or a curtain coating method, and the insulating layer is formed by thermosetting the organic resin precursor. This insulating layer and a thin film wiring conductor layer formed by adopting a copper layer by employing a thin film forming technique such as an electroless plating method or a vapor deposition method and a photolithography technique are alternately laminated, and a temperature of about 170 ° C. It is manufactured by heating and curing. The thickness of these laminated inorganic insulating materials is set so as to satisfy the conditions such as mechanical strength and electrical characteristics corresponding to the required specifications in accordance with the characteristics of the materials used.

また、本発明の積層型半導体パッケージ1において、基板2aおよび基板2bの表面には、高速で動作するIC,LSI等の半導体素子5や半導体レーザ(LD),フォトダイオード(PD)等の光半導体素子5が搭載される。この半導体素子5は、裏面側に信号用や電源用、接地用の端子(図示せず)が形成され、各端子が基板2aおよび基板2bの表面に形成されたフリップチップ用電極パッドに、錫−鉛(Sn−Pb)合金や錫-銀-銅(Sn−Ag−Cu)等の半田または金(Au)等から成るフリップチップ接続用導体バンプを介して電気的に接続されて実装される。   Further, in the stacked semiconductor package 1 of the present invention, on the surfaces of the substrate 2a and the substrate 2b, a semiconductor element 5 such as an IC or LSI operating at high speed, or an optical semiconductor such as a semiconductor laser (LD) or a photodiode (PD). Element 5 is mounted. This semiconductor element 5 has signal, power supply, and ground terminals (not shown) formed on the back side, and each terminal is connected to a flip chip electrode pad formed on the surface of the substrate 2a and the substrate 2b. -Electrically connected and mounted via a flip-chip connecting conductor bump made of solder such as lead (Sn-Pb) alloy, tin-silver-copper (Sn-Ag-Cu), or gold (Au). .

各フリップチップ用電極パッドは、基板2aおよび基板2bの内部に形成されている金属配線と、基板2aおよび基板2bの表面から内部にかけて形成されたビア導体等の貫通導体等とを介してそれぞれ所望の回路に電気的に接続され、半導体素子5の各端子が、対応する回路配線と電気的に接続される。   Each flip chip electrode pad is desired via a metal wiring formed inside the substrate 2a and the substrate 2b and a through conductor such as a via conductor formed from the surface of the substrate 2a and the substrate 2b to the inside. Each terminal of the semiconductor element 5 is electrically connected to a corresponding circuit wiring.

また、基板2aと基板2b内に形成された貫通導体(図示せず)は、セラミックグリーンシートに貫通孔を金型やパンチングによる打ち抜き方法またはレーザ加工等の加工方法により形成しておき、W粉末に適当な有機バインダや溶剤等を添加混合して得た金属ペーストを貫通孔の内側側面の所定の領域に塗布し、これをセラミックグリーンシートの積層体とともに焼成することによって形成することができる。   The through conductors (not shown) formed in the substrate 2a and the substrate 2b are formed by forming a through hole in a ceramic green sheet by a punching method using a die or punching or a processing method such as laser processing. It can be formed by applying a metal paste obtained by adding and mixing a suitable organic binder, solvent or the like to a predetermined region on the inner side surface of the through hole and firing it together with a laminate of ceramic green sheets.

本発明の積層型半導体パッケージ1において、信号波形を伝送する基板2aと基板2b内に形成された線路導体(図示せず)は、各線路導体の配線幅および基板2aと基板2b内に形成された絶縁層厚みを設定することにより、線路導体の特性インピーダンスを任意の値に設定することができる。そのため、例えば複数の線路導体により、良好な伝送特性を有する線路導体を形成することが可能となる。各線路導体の特性インピーダンスは一般的には50Ωに設定される。なお、複数の線路導体は、それぞれ異なる電気信号を伝送するものとしてもよい。   In the stacked semiconductor package 1 of the present invention, the line conductors (not shown) formed in the substrate 2a and the substrate 2b for transmitting signal waveforms are formed in the wiring width of each line conductor and in the substrate 2a and the substrate 2b. By setting the thickness of the insulating layer, the characteristic impedance of the line conductor can be set to an arbitrary value. Therefore, for example, a line conductor having good transmission characteristics can be formed by a plurality of line conductors. The characteristic impedance of each line conductor is generally set to 50Ω. The plurality of line conductors may transmit different electrical signals.

本発明の積層型半導体パッケージ1は、半導体パッケージ基板2と半導体素子5とを含む複数個の半導体パッケージが積層されてなる。隣接する半導体パッケージ基板2の電源配線同士および接地配線同士は接続導体4によって接続される。この接続導体4は、隣接する半導体パッケージ基板2の層間に、電源用接続導体4aと接地用接続導体4bとが基板2の表面に沿って、交互に並べて複数配設される。   The stacked semiconductor package 1 of the present invention is formed by stacking a plurality of semiconductor packages including a semiconductor package substrate 2 and a semiconductor element 5. The power supply wirings and the ground wirings of the adjacent semiconductor package substrates 2 are connected by the connection conductor 4. A plurality of power supply connection conductors 4 a and ground connection conductors 4 b are alternately arranged along the surface of the substrate 2 between adjacent semiconductor package substrates 2.

半導体素子5のスイッチング動作に必要な電荷は基板2aの場合、外部電気回路と接続される外部接続用導体バンプ7および基板2a内の金属配線を介して供給され、基板2bの場合、実装基板8上に形成された外部電気回路と接続される外部接続用導体バンプ7、基板2a内の金属配線、電源用接続導体4a、電源電位金属板3aおよび基板2b内の金属配線を介して供給される。また、接地電位が外部接続用導体バンプ7、基板2a内の金属配線、接地用接続導体4b、接地電位金属板3bおよび基板2b内の金属配線を介して供給される。   In the case of the substrate 2a, the charge necessary for the switching operation of the semiconductor element 5 is supplied through the external connection conductor bumps 7 connected to the external electric circuit and the metal wiring in the substrate 2a. In the case of the substrate 2b, the mounting substrate 8 The external connection conductor bumps 7 connected to the external electric circuit formed above, the metal wiring in the substrate 2a, the power supply connection conductor 4a, the power supply potential metal plate 3a, and the metal wiring in the substrate 2b are supplied. . The ground potential is supplied via the external connection conductor bump 7, the metal wiring in the substrate 2a, the ground connection conductor 4b, the ground potential metal plate 3b, and the metal wiring in the substrate 2b.

そして本発明の積層型半導体パッケージ1においては、電源用接続導体4aと接地用接続導体4b、電源電位金属板3aと接地電位金属板3b間に形成されるデカップリング容量が半導体素子5に供給される電荷を補う役目をする。その結果、半導体素子5のスイッチング動作によって得られた信号波形は積層型半導体パッケージ1内に形成された配線を伝播し、外部接続用導体バンプ7を介して実装基板8上に形成された外部電気回路に伝送される。   In the stacked semiconductor package 1 of the present invention, the decoupling capacitance formed between the power connection conductor 4 a and the ground connection conductor 4 b and between the power supply potential metal plate 3 a and the ground potential metal plate 3 b is supplied to the semiconductor element 5. It serves to compensate for the electric charge. As a result, the signal waveform obtained by the switching operation of the semiconductor element 5 propagates through the wiring formed in the stacked semiconductor package 1, and the external electric current formed on the mounting substrate 8 via the external connection conductor bump 7. Transmitted to the circuit.

このように、電源用接続導体4aと接地用接続導体4bとの間および電源電位金属板3aと接地電位金属板3bとの間のデカップリング容量から半導体素子5の動作に必要な電荷が供給される。このデカップリング容量は半導体素子5の近辺に配置される為、デカップリング容量から半導体素子5への電荷供給経路が短くなる。これによって、電源供給経路に付随するインダクタンスにより生じる電圧の変動、すなわち半導体素子5に供給される電源供給回路の電源バウンスは小さくなる。   In this way, charges necessary for the operation of the semiconductor element 5 are supplied from the decoupling capacitance between the power connection conductor 4a and the ground connection conductor 4b and between the power supply potential metal plate 3a and the ground potential metal plate 3b. The Since the decoupling capacitance is arranged in the vicinity of the semiconductor element 5, the charge supply path from the decoupling capacitance to the semiconductor element 5 is shortened. As a result, the voltage fluctuation caused by the inductance associated with the power supply path, that is, the power bounce of the power supply circuit supplied to the semiconductor element 5 is reduced.

本発明の積層型半導体パッケージ1において、積層型半導体パッケージ1を上面から透視する図2に示すように、電源用接続導体4aおよび接地用接続導体4bは、基板2の半導体素子5を実装する中心部および半導体素子5のスイッチング動作によって得られた信号波形を伝送する為の信号用接続導体4cを除く部分に配置されるのが好ましい。配置の仕方は、例えば、信号用接続導体4cが半導体素子5の周囲に配置され、電源用接続導体4aおよび接地用接続導体4bがその外周部に千鳥状の配置となるように配置されるのが好ましい。つまり、接続導体4a,4bは、図2に示すように、縦、横グリッド状の交点に複数列に配置され、第1列目41に隣接する第2列目42において、第1列目41の電源用接続導体4a(右上がりのハッチングを付した接続導体)の隣には第2列目42の接地用接続導体4b(右下がりのハッチングを付した接続導体)が位置するように電源用接続導体4aと接地用接続導体4bとが配置される。   In the stacked semiconductor package 1 of the present invention, the power supply connection conductor 4a and the ground connection conductor 4b are the center on which the semiconductor element 5 of the substrate 2 is mounted, as shown in FIG. And the signal connection conductor 4c for transmitting the signal waveform obtained by the switching operation of the semiconductor element 5 is preferably arranged. For example, the signal connection conductor 4c is arranged around the semiconductor element 5, and the power connection conductor 4a and the ground connection conductor 4b are arranged in a staggered manner on the outer periphery thereof. Is preferred. That is, as shown in FIG. 2, the connection conductors 4 a and 4 b are arranged in a plurality of rows at intersections of vertical and horizontal grids, and in the second row 42 adjacent to the first row 41, the first row 41. Next to the power connection conductor 4a (the connection conductor with the right-up hatching), the ground connection conductor 4b (connection conductor with the right-down hatching) in the second row 42 is positioned for the power supply. A connection conductor 4a and a ground connection conductor 4b are arranged.

また、半導体素子5への確実な電荷供給という観点から、電源配線接続用の接続導体4aおよび接地配線接続用の接続導体4bおよび信号配線接続用の接続導体4cがそれぞれ接触しないように密に配置されるのがよい。   Further, from the viewpoint of reliable charge supply to the semiconductor element 5, the connection conductor 4a for connecting the power supply wiring, the connection conductor 4b for connecting the ground wiring, and the connection conductor 4c for connecting the signal wiring are arranged closely so as not to contact each other. It is good to be done.

電源接続用導体4aおよび接地用接続導体4bの間には、誘電率の高い樹脂6が配置されるのが好ましい。これによって、電源用接続導体4aおよび接地用接続導体4bの間の容量値を大きくすることができる。   A resin 6 having a high dielectric constant is preferably disposed between the power connection conductor 4a and the ground connection conductor 4b. As a result, the capacitance value between the power connection conductor 4a and the ground connection conductor 4b can be increased.

電源用接続導体4aおよび接地用接続導体4bは、例えば、高融点半田バンプの外周に溶着された低融点半田バンプを溶融させて隣接する半導体パッケージの間を接続するように柱状に形成される。または、金属バンプの周囲に低融点半田を溶着させて隣接する半導体パッケージの間を接続するように柱状に形成される。ここで、低融点半田バンプは、錫の割合が63%、融点が184℃である共晶半田や、共晶半田よりも低融点の金属、例えば、亜鉛およびインジューム等を混合させて更に融点を低くした半田が好ましい。   The power connection conductor 4a and the ground connection conductor 4b are, for example, formed in a column shape so as to connect the adjacent semiconductor packages by melting the low melting point solder bumps welded to the outer periphery of the high melting point solder bumps. Alternatively, a low melting point solder is welded around the metal bumps so as to connect adjacent semiconductor packages. Here, the low melting point solder bump is a eutectic solder having a tin ratio of 63% and a melting point of 184 ° C., or a metal having a lower melting point than eutectic solder, such as zinc and indium. Solder with a low is preferred.

また、電源用接続導体4aおよび接地用接続導体4bは、長方形、正方形、円筒形状であってもよい。円筒形状である場合は、導体厚みを信号が伝送する際の最大周波数成分における表皮深さ分の厚みとなるようにするのが好ましい。すなわち、円筒形状を上から見た場合、円筒形状の外周から内周に向い、表皮深さまでは導体が存在する部分とすることが好ましい。その内側は非導体であってもよい。   The power connection conductor 4a and the ground connection conductor 4b may be rectangular, square, or cylindrical. In the case of a cylindrical shape, it is preferable that the conductor thickness is equal to the skin depth of the maximum frequency component when a signal is transmitted. That is, when the cylindrical shape is viewed from above, it is preferable that the cylindrical shape is a portion where the conductor exists from the outer periphery to the inner periphery and deep in the skin. The inside may be a non-conductor.

また、本発明の積層型半導体パッケージ1において、図1に示されるように、層方向に隣接する半導体パッケージ基板2の層間に、半導体パッケージ基板2の表面と平行に2枚の金属板3(電源電位金属板3a,接地電位金属板3b)の広い面同士が対面させて配置され、その2枚の金属板3は、電源用接続導体4aおよび接地用接続導体4bにそれぞれ接続されており、信号用接続導体4cとは接続されていない構造となっている。   Further, in the stacked semiconductor package 1 of the present invention, as shown in FIG. 1, two metal plates 3 (power supply) are provided between the semiconductor package substrates 2 adjacent in the layer direction in parallel with the surface of the semiconductor package substrate 2. The wide surfaces of the potential metal plate 3a and the ground potential metal plate 3b) are arranged to face each other, and the two metal plates 3 are connected to the power connection conductor 4a and the ground connection conductor 4b, respectively, The connection conductor 4c for use is not connected.

このような2枚の金属板は例えば、タングステン(W),モリブデン(Mo),モリブデン−マンガン(Mo−Mn),銅(Cu),銀(Ag)または銀−パラジウム(Ag−Pd)等の金属粉末メタライズ、あるいは銅(Cu),銀(Ag),ニッケル(Ni),クロム(Cr),チタン(Ti),金(Au)またはニオブ(Nb)やそれらの合金等で形成されている。   Such two metal plates are, for example, tungsten (W), molybdenum (Mo), molybdenum-manganese (Mo-Mn), copper (Cu), silver (Ag), or silver-palladium (Ag-Pd). It is made of metal powder metallization, or copper (Cu), silver (Ag), nickel (Ni), chromium (Cr), titanium (Ti), gold (Au), niobium (Nb), or an alloy thereof.

金属板3は、隣接する半導体パッケージ間の電磁干渉(EMIノイズ)をシールドすることにもなる。さらに、半導体パッケージ間に滞留する熱を金属板3により熱伝導させて放散させる機能も有する。   The metal plate 3 also shields electromagnetic interference (EMI noise) between adjacent semiconductor packages. Furthermore, it also has a function to dissipate the heat retained between the semiconductor packages by conducting heat through the metal plate 3.

また、電源電位金属板3aと接地電位金属板3b間の距離は短いほど好ましい。また、2枚の金属板3の平面視における形状は、正方形、長方形の他に、菱形形状、多角形であってもよく、円形であってもよい。   Further, the distance between the power supply potential metal plate 3a and the ground potential metal plate 3b is preferably as short as possible. Further, the shape of the two metal plates 3 in plan view may be a rhombus shape, a polygon, or a circle in addition to a square and a rectangle.

また、上記2枚の金属板3の間または電源用接続導体4aおよび接地用接続導体4bの間には、誘電率の高い樹脂が用いられるのが好ましく、例えば、エポキシ樹脂、ポリイミド樹脂が用いられる。また、例えば、アクリル樹脂やフェノール樹脂やシリコン樹脂等の高誘電率を持つ材料を混合して得られる樹脂を配置することにより構成してもよい。   Further, a resin having a high dielectric constant is preferably used between the two metal plates 3 or between the power connection conductor 4a and the ground connection conductor 4b. For example, an epoxy resin or a polyimide resin is used. . For example, you may comprise by arrange | positioning resin obtained by mixing materials with high dielectric constant, such as an acrylic resin, a phenol resin, and a silicon resin.

また、本発明の積層型半導体パッケージ1において、隣接する半導体パッケージ間を接続する接続導体4は、図3に示されるように、細長い金属板を用いた短冊形状であってもよい。この場合、短冊板状体を長辺が上下に位置するように立てて並べ、上下互いに対向するそれぞれの長辺を隣接する半導体パッケージ基板2の電源配線同士または接地配線同士に接続するとともに、板の広い表面が隣接する板の広い表面に対面するように電源用接続導体4aおよび接地用接続導体4bが交互に並べて複数配設される。   Further, in the stacked semiconductor package 1 of the present invention, the connection conductor 4 that connects adjacent semiconductor packages may have a strip shape using an elongated metal plate as shown in FIG. In this case, the strips are arranged so that the long sides are positioned vertically, and the long sides facing each other are connected to the power supply wirings or the grounding wirings of the adjacent semiconductor package substrate 2, and A plurality of power supply connection conductors 4a and ground connection conductors 4b are alternately arranged so that the wide surfaces of the electrodes face the wide surfaces of adjacent plates.

ここで、半導体素子5のスイッチング動作によって得られた信号波形を伝送する為の信号用接続導体4cは半導体素子5の周囲に配置されているのがよい。電源用接続導体4aおよび接地用接続導体4bは、その外側に配置され、半導体パッケージ基板2の辺に対して斜め45°の角度で左または右に傾いたように並べられる。また、電源用接続導体4aと接地用接続導体4bとは、交互に広い表面が対面するように並べられ、また、電源用接続導体4aと接地用接続導体4bの厚みは信号用接続導体4cの直径の値と略同等の厚みを持っていることが望ましい。   Here, the signal connection conductor 4 c for transmitting the signal waveform obtained by the switching operation of the semiconductor element 5 is preferably disposed around the semiconductor element 5. The power supply connection conductor 4a and the ground connection conductor 4b are arranged outside thereof, and are arranged so as to be inclined to the left or right at an angle of 45 ° with respect to the side of the semiconductor package substrate 2. The power connection conductor 4a and the ground connection conductor 4b are alternately arranged so that the wide surfaces face each other. The thickness of the power connection conductor 4a and the ground connection conductor 4b is the same as that of the signal connection conductor 4c. It is desirable to have a thickness approximately equal to the diameter value.

また、本発明の積層型半導体パッケージ1に搭載される電子部品は、半導体素子5のみに限らず、チップ抵抗,薄膜抵抗,コイルインダクタ,クロスインダクタ,チップキャパシターまたは電解キャパシター等を用いた、電子回路モジュール等を構成したものでもよい。   The electronic component mounted on the stacked semiconductor package 1 of the present invention is not limited to the semiconductor element 5, but an electronic circuit using a chip resistor, a thin film resistor, a coil inductor, a cross inductor, a chip capacitor, an electrolytic capacitor, or the like. A module or the like may be configured.

また、積層型半導体パッケージ1の平面視における形状は、正方形状や長方形状の他に、菱形状,六角形状または八角形状、円形状等の形状であってもよい。   Further, the shape of the stacked semiconductor package 1 in plan view may be a rhombus shape, a hexagonal shape, an octagonal shape, a circular shape or the like in addition to a square shape or a rectangular shape.

そして、このような本発明の積層型半導体パッケージ1は、半導体素子収納用パッケージ等の電子部品収納用パッケージや電子部品搭載用基板、多数の半導体素子5が搭載されるいわゆるマルチチップモジュールやマルチチップパッケージ、あるいはマザーボード等として使用される。   The stacked semiconductor package 1 according to the present invention includes an electronic component storage package such as a semiconductor element storage package, an electronic component mounting substrate, a so-called multichip module or multichip on which a large number of semiconductor elements 5 are mounted. Used as a package or motherboard.

また、図4は本発明の実施形態による積層型半導体パッケージ1の半導体パッケージ基板2間を形成する製造工程の一部を示す図である。   FIG. 4 is a diagram showing a part of the manufacturing process for forming the space between the semiconductor package substrates 2 of the stacked semiconductor package 1 according to the embodiment of the present invention.

(a)まず、図4(a)に示されるように、基板2aと基板2bの主面中央部へ半導体素子5を実装する。   (A) First, as shown in FIG. 4A, the semiconductor element 5 is mounted on the central portions of the main surfaces of the substrate 2a and the substrate 2b.

(b)次に、図4(b)に示されるように、電源電位金属板3aに対して、電源配線接続用低融点半田ペースト4abを用いて電源配線接続用高融点半田ボール4aaを電源電位金属板3aの所定箇所に接続する。   (B) Next, as shown in FIG. 4B, the high melting point solder ball 4aa for connecting the power supply wiring is applied to the power supply potential metal plate 3a by using the low melting point solder paste 4ab for connecting the power supply wiring. It connects to the predetermined location of the metal plate 3a.

また、接地電位金属板3bに対して、接地配線接続用低融点半田ペースト4bbを用いて接地配線接続用高融点半田ボール4baを接地電位金属板3bの所定箇所に接続する。   Further, a ground wiring connecting high melting point solder ball 4ba is connected to a predetermined portion of the ground potential metal plate 3b by using a ground wiring connecting low melting point solder paste 4bb to the ground potential metal plate 3b.

また、電源電位金属板3aまたは接地電位金属板3bの半田ボール4aa,4ba,4caを接続しない位置には、半田ボール4aa,4ba,4caよりも直径の大きな貫通孔を設けておく。   A through hole having a diameter larger than that of the solder balls 4aa, 4ba, 4ca is provided at a position where the solder balls 4aa, 4ba, 4ca are not connected to the power supply potential metal plate 3a or the ground potential metal plate 3b.

2つの電源配線接続用高融点半田ボール4aaを電源配線接続用低融点半田ペースト4abにて接続したもの、2つの接地配線接続用高融点半田ボール4baを接地配線接続用低融点半田ペースト4bbにて接続したもの、2つの信号配線接続用高融点半田ボール4caを信号配線接続用低融点半田ペースト4cbにて接続する。そして、メタルマスクなどの半田ボールを支持するものを用いて、2つが接続された接地配線用高融点半田ボール4ba、2つが接続された信号配線用高融点半田ボール4caを電源電位金属板3aの貫通孔の内部に、また、2つが接続された電源配線用接続用高融点半田ボール4aa、2つが接続された信号配線用高融点半田ボール4caを接地電位金属板3bの貫通孔の内部にそれぞれ金属板3と接触しないように配置する。   Two high melting point solder balls 4aa for connecting power lines are connected by a low melting point solder paste 4ab for connecting power lines. Two high melting point solder balls 4ba for connecting ground lines are connected by low melting point solder paste 4bb for connecting ground lines. Two connected high melting point solder balls 4ca for signal wiring are connected by a low melting point solder paste 4cb for signal wiring connection. Then, using a metal mask or the like supporting a solder ball, the ground wiring high melting point solder ball 4ba connected to the two and the signal wiring high melting point solder ball 4ca connected to the two are connected to the power supply potential metal plate 3a. The high melting point solder ball 4aa for connecting the power supply wiring to which the two are connected and the high melting point solder ball 4ca for the signal wiring to which the two are connected are respectively inserted into the through hole of the ground potential metal plate 3b. It arrange | positions so that the metal plate 3 may not be contacted.

(c)次に、図4(c)に示されるように、(a)にて作製された半導体素子5が実装された基板2aと基板2bに、(b)にて作製された電源電位金属板3aと接地電位金属板3bを実装する。   (C) Next, as shown in FIG. 4C, the power supply potential metal fabricated in (b) is mounted on the substrate 2a and the substrate 2b on which the semiconductor element 5 fabricated in (a) is mounted. The plate 3a and the ground potential metal plate 3b are mounted.

(d)次に、図4(d)に示されるように、(c)にて作製された基板2aの上に基板2bを半導体素子5が対面するように、基板2bを反転して積層する。   (D) Next, as shown in FIG. 4D, the substrate 2b is inverted and laminated so that the semiconductor element 5 faces the substrate 2a produced in (c). .

(e)最後に、図4(e)に示されるように、(d)にて積層して作製した基板2aおよび基板2bをリフローにより接合し、その後、隣接する半導体パッケージ基板2の層間に封止樹脂6を配置する。   (E) Finally, as shown in FIG. 4 (e), the substrate 2a and the substrate 2b prepared by stacking in (d) are joined by reflow, and then sealed between adjacent semiconductor package substrates 2. Stop resin 6 is disposed.

このようにして積層型半導体パッケージ1の外部接続用導体バンプ7上に実装される構造が作製される。   In this way, a structure to be mounted on the external connection conductor bump 7 of the stacked semiconductor package 1 is produced.

なお、本発明は上述の実施の形態および実施例に限定されるものではなく、本発明の要旨を逸脱しない範囲内であれば種々の変更は可能である。   The present invention is not limited to the above-described embodiments and examples, and various modifications can be made without departing from the scope of the present invention.

また、上記実施の形態の説明において上下左右という用語は、単に図面上の位置関係を説明するために用いたものであり、実際の使用時における位置関係を意味するものではない。   In the description of the above embodiment, the terms “upper, lower, left and right” are merely used to describe the positional relationship in the drawings, and do not mean the positional relationship in actual use.

本発明の積層型半導体パッケージの実施の形態の一例を示す断面図である。It is sectional drawing which shows an example of embodiment of the laminated semiconductor package of this invention. 図1に示す積層型半導体パッケージの平面図である。FIG. 2 is a plan view of the stacked semiconductor package shown in FIG. 1. 本発明の積層型半導体パッケージの実施の形態の他の例を示す平面図である。It is a top view which shows the other example of embodiment of the laminated semiconductor package of this invention. 図1に示す積層型半導体パッケージの製造方法の一部を示す断面図である。FIG. 7 is a cross-sectional view showing a part of the method for manufacturing the stacked semiconductor package shown in FIG. 1. 従来の積層型半導体パッケージの例を示す断面図である。It is sectional drawing which shows the example of the conventional laminated semiconductor package.

符号の説明Explanation of symbols

1:積層型半導体パッケージ
2a :(半導体パッケージの)基板
2b :(半導体パッケージの)基板
3a :電源配線接続用の接続導体に接続されている金属板(電源電位金属板)
3b :接地配線接続用の接続導体に接続されている金属板(接地電位金属板)
4a :隣接する半導体パッケージの電源配線同士を接続する接続導体(電源用接続導体)
4b :隣接する半導体パッケージの接地配線同士を接続する接続導体(接地用接続導体)
4c :隣接する半導体パッケージの信号配線同士を接続する接続導体(信号用接続導体)
4aa:電源配線接続用高融点半田ボール
4ab:電源配線接続用低融点半田ペースト
4ba:接地配線接続用高融点半田ボール
4bb:接地配線接続用低融点半田ペースト
4ca:信号配線接続用高融点半田ボール
4cb:信号配線接続用低融点半田ペースト
5:半導体素子
6:樹脂
7:外部接続用導体バンプ
8:実装基板
1: Stacked semiconductor package 2a: Substrate 2b (of semiconductor package): Substrate 3a (of semiconductor package): Metal plate connected to connection conductor for connecting power supply wiring (power supply potential metal plate)
3b: Metal plate (ground potential metal plate) connected to the connection conductor for ground wiring connection
4a: Connection conductor for connecting power supply wirings of adjacent semiconductor packages (connection conductor for power supply)
4b: Connection conductor for connecting ground wirings of adjacent semiconductor packages (connection conductor for grounding)
4c: Connection conductor (signal connection conductor) for connecting signal wirings of adjacent semiconductor packages
4aa: High melting point solder ball 4ab for power wiring connection Low melting point solder paste 4ba for power wiring connection High melting point solder ball 4bb for ground wiring connection Low melting point solder paste 4ca for ground wiring connection High melting point solder ball for signal wiring connection 4cb: low melting point solder paste for signal wiring connection 5: semiconductor element 6: resin 7: conductor bump for external connection
8: Mounting board

Claims (8)

複数個の半導体パッケージを積層してなる積層型半導体パッケージにおいて、隣接する前記半導体パッケージの電源配線同士および接地配線同士を接続導体によって接続するとともに、電源配線接続用と接地配線接続用の前記接続導体を交互に並べて複数配設したことを特徴とする積層型半導体パッケージ。 In a stacked semiconductor package formed by stacking a plurality of semiconductor packages, the power supply wirings and grounding wirings of adjacent semiconductor packages are connected by a connection conductor, and the connection conductors for power supply wiring connection and ground wiring connection A stacked semiconductor package characterized in that a plurality of layers are arranged alternately. 前記接続導体は複数列配設されており、隣接する列において、一方列の電源配線接続用の前記接続導体の隣には他方列の接地配線接続用の前記接続導体が位置するように前記接続導体が配設されていることを特徴とする請求項1記載の積層型半導体パッケージ。 The connection conductors are arranged in a plurality of rows, and in adjacent rows, the connection conductors for ground wiring connection in the other row are positioned next to the connection conductors for power supply wire connection in one row. 2. The stacked semiconductor package according to claim 1, further comprising a conductor. 前記接続導体は、金属バンプの周囲に低融点半田を溶着させて形成されていることを特徴とする請求項1または2記載の積層型半導体パッケージ。 3. The stacked semiconductor package according to claim 1, wherein the connection conductor is formed by welding a low melting point solder around a metal bump. 前記接続導体は、誘電率の高い樹脂によって取り囲まれていることを特徴とする請求項1乃至3のいずれかに記載の積層型半導体パッケージ。 4. The stacked semiconductor package according to claim 1, wherein the connection conductor is surrounded by a resin having a high dielectric constant. 前記接続導体は短冊形状であり、対向する長辺によって隣接する前記半導体パッケージの電源配線同士または接地配線同士を接続するとともに電源配線接続用の前記接続導体および接地配線接続用の前記接続導体の表面が対面するように複数配設されていることを特徴とする請求項1記載の積層型半導体パッケージ。 The connection conductor has a strip shape and connects the power supply wirings or the grounding wirings of the semiconductor packages adjacent to each other by long sides facing each other, and the surface of the connection conductor for connecting the power supply wiring and the connection conductor for connecting the grounding wiring 2. The stacked semiconductor package according to claim 1, wherein a plurality of the semiconductor packages are arranged so as to face each other. 隣接する前記半導体パッケージの層間に、前記半導体パッケージの表面と平行に2枚の金属板が対面させて配置され、該金属板は、電源配線接続用の前記接続導体および接地配線接続用の前記接続導体にそれぞれ接続されていることを特徴とする請求項1乃至5のいずれかに記載の積層型半導体パッケージ。 Two metal plates are arranged between the adjacent semiconductor packages so as to face each other in parallel with the surface of the semiconductor package, and the metal plates are connected to the connection conductor for connecting the power supply wiring and the connection for connecting the ground wiring. 6. The stacked semiconductor package according to claim 1, wherein the stacked semiconductor package is connected to a conductor. 前記金属板の間に誘電率の高い樹脂を配置したことを特徴とする請求項6記載の積層型半導体パッケージ。 7. The stacked semiconductor package according to claim 6, wherein a resin having a high dielectric constant is disposed between the metal plates. 請求項1乃至7のいずれかに記載の積層型半導体パッケージに、半導体素子を含む電子部品が搭載されて成る電子装置。 An electronic device comprising an electronic component including a semiconductor element mounted on the stacked semiconductor package according to claim 1.
JP2008018809A 2008-01-30 2008-01-30 Stacked semiconductor package and electronic device Expired - Fee Related JP5153364B2 (en)

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011060800A (en) * 2009-09-07 2011-03-24 Shin Kobe Electric Mach Co Ltd Resin molded compact
JP2014053513A (en) * 2012-09-10 2014-03-20 Canon Inc Laminated semiconductor device and printed circuit board
US20160233195A1 (en) * 2015-02-05 2016-08-11 Fujitsu Limited Stacked semiconductor device
US9478522B2 (en) 2014-07-16 2016-10-25 Fujitsu Limited Electronic part, electronic device, and manufacturing method

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08236694A (en) * 1995-02-24 1996-09-13 Nec Corp Semiconductor package and manufacture thereof
JP2005244068A (en) * 2004-02-27 2005-09-08 Shinko Electric Ind Co Ltd Laminated semiconductor device
JP2006186063A (en) * 2004-12-27 2006-07-13 Shinko Electric Ind Co Ltd Semiconductor device and substrate thereof
JP2006344787A (en) * 2005-06-09 2006-12-21 Canon Inc Semiconductor device
JP2008004853A (en) * 2006-06-26 2008-01-10 Hitachi Ltd Laminated semiconductor device, and module

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08236694A (en) * 1995-02-24 1996-09-13 Nec Corp Semiconductor package and manufacture thereof
JP2005244068A (en) * 2004-02-27 2005-09-08 Shinko Electric Ind Co Ltd Laminated semiconductor device
JP2006186063A (en) * 2004-12-27 2006-07-13 Shinko Electric Ind Co Ltd Semiconductor device and substrate thereof
JP2006344787A (en) * 2005-06-09 2006-12-21 Canon Inc Semiconductor device
JP2008004853A (en) * 2006-06-26 2008-01-10 Hitachi Ltd Laminated semiconductor device, and module

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011060800A (en) * 2009-09-07 2011-03-24 Shin Kobe Electric Mach Co Ltd Resin molded compact
JP2014053513A (en) * 2012-09-10 2014-03-20 Canon Inc Laminated semiconductor device and printed circuit board
CN103681641A (en) * 2012-09-10 2014-03-26 佳能株式会社 Stacked semiconductor device and printed circuit board
US9059084B2 (en) 2012-09-10 2015-06-16 Canon Kabushiki Kaisha Stacked semiconductor device and printed circuit board
US9478522B2 (en) 2014-07-16 2016-10-25 Fujitsu Limited Electronic part, electronic device, and manufacturing method
US9508705B2 (en) 2014-07-16 2016-11-29 Fujitsu Limited Electronic part, electronic device, and manufacturing method
US20160233195A1 (en) * 2015-02-05 2016-08-11 Fujitsu Limited Stacked semiconductor device
US9711486B2 (en) 2015-02-05 2017-07-18 Fujitsu Limited Stacked semiconductor device

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