JP4373841B2 - Wiring board - Google Patents

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JP4373841B2
JP4373841B2 JP2004129884A JP2004129884A JP4373841B2 JP 4373841 B2 JP4373841 B2 JP 4373841B2 JP 2004129884 A JP2004129884 A JP 2004129884A JP 2004129884 A JP2004129884 A JP 2004129884A JP 4373841 B2 JP4373841 B2 JP 4373841B2
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conductor
dummy
insulating base
wiring
connection pads
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JP2005311253A (en
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浩一 平山
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Kyocera Corp
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/1517Multilayer substrate
    • H01L2924/15172Fan-out arrangement of the internal vias
    • H01L2924/15174Fan-out arrangement of the internal vias in different layers of the multilayer substrate

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Description

本発明は、半導体素子や容量素子等の電子部品を搭載するための配線基板に関するものである。   The present invention relates to a wiring board for mounting electronic components such as semiconductor elements and capacitive elements.

従来、例えばIC,LSI等の半導体集積回路素子、LD(半導体レーザ),LED(発光ダイオード),PD(フォトダイオード),CCD,ラインセンサ,イメージセンサ等の光半導体素子、圧電振動子,水晶振動子等の振動子、その他の種々の電子部品が搭載される配線基板は、酸化アルミニウム質焼結体やガラスセラミック焼結体(ガラスセラミックス)等のセラミック焼結体、エポキシ樹脂,ポリイミド樹脂等の有機樹脂、または酸化アルミニウム等の無機粉末をエポキシ樹脂等の有機樹脂で結合してなる複合材料等の電気絶縁材料からなる絶縁層を複数積層して形成され、上面に電子部品の搭載部を有する絶縁基体と、絶縁基体の内部に形成された配線導体と、絶縁基体の一方主面に配列形成され、配線導体と電気的に接続した複数の接続パッドとを具備した構造である。   Conventionally, for example, semiconductor integrated circuit elements such as IC and LSI, LD (semiconductor laser), LED (light emitting diode), PD (photodiode), CCD, line sensor, image sensor and other optical semiconductor elements, piezoelectric vibrator, crystal vibration Wiring boards on which vibrators such as children and other various electronic components are mounted include ceramic sintered bodies such as aluminum oxide sintered bodies and glass ceramic sintered bodies (glass ceramics), epoxy resins, polyimide resins, etc. It is formed by laminating a plurality of insulating layers made of an electrically insulating material such as a composite material formed by bonding an organic resin or inorganic powder such as aluminum oxide with an organic resin such as an epoxy resin, and has an electronic component mounting portion on the upper surface. An insulating base, a wiring conductor formed inside the insulating base, and an array formed on one main surface of the insulating base and electrically connected to the wiring conductor Is a structure in which and a number of connection pads.

配線導体と接続パッドとの電気的な接続は、通常、接続パッドから配線導体にかけて、絶縁層を厚み方向に貫通するようにして形成された貫通導体を介して行われる。   The electrical connection between the wiring conductor and the connection pad is usually made through a through conductor formed so as to penetrate the insulating layer in the thickness direction from the connection pad to the wiring conductor.

搭載部に電子部品を搭載し、電子部品の電極を接続パッドにはんだやボンディングワイヤ等の接続材を介して接続し、必要に応じて電子部品を蓋体や封止用樹脂等で封止することにより電子装置が形成される。   Mount the electronic component on the mounting part, connect the electrode of the electronic component to the connection pad via a connecting material such as solder or bonding wire, and seal the electronic component with a lid or sealing resin if necessary Thus, an electronic device is formed.

この電子装置について、配線導体の一部を絶縁基体の側面や下面に露出させ、この露出した部位を外部電気回路にはんだ等を介して接続することにより、電子部品の電極が接続パッドと貫通導体と配線導体とを介して外部の電気回路と電気的に接続される。   In this electronic device, a part of the wiring conductor is exposed on the side surface and the lower surface of the insulating base, and the exposed portion is connected to an external electric circuit via solder or the like so that the electrode of the electronic component is connected to the connection pad and the through conductor. Are electrically connected to an external electric circuit via the wiring conductor.

近年、このような電子装置においては、例えば、携帯電話等の電子機器に実装する部品として小型化および高密度実装が要求されるようになってきている。そのため、例えば、電子部品の接続方法として小型化に適したフリップチップ実装が提案されている。フリップチップ実装は、電子部品の主面に縦横に配列形成された複数の電極に、それぞれはんだバンプを形成し、その電極を絶縁基体の上面に形成された複数の接続パッドに位置合わせした後、はんだバンプを溶かして、電極と接続パッドとを接続する構成である。そのため、配線基板の接続パッドは、電子部品の主面に縦横に配列形成されている電極と対向するようにして形成する必要があり、絶縁基板の一方主面の中央部に複数が縦横に配列形成される。
特開2003−110220号公報 特開2003−017850号公報 特開2003−017857号公報
In recent years, in such an electronic device, for example, downsizing and high-density mounting have been required as components to be mounted on an electronic device such as a mobile phone. Therefore, for example, flip chip mounting suitable for miniaturization has been proposed as a method for connecting electronic components. In flip chip mounting, solder bumps are respectively formed on a plurality of electrodes arranged vertically and horizontally on the main surface of an electronic component, and the electrodes are aligned with a plurality of connection pads formed on the upper surface of an insulating substrate. The solder bump is melted to connect the electrode and the connection pad. Therefore, it is necessary to form the connection pads on the wiring board so as to face the electrodes arranged vertically and horizontally on the main surface of the electronic component, and a plurality of pads are arranged vertically and horizontally at the center of one main surface of the insulating substrate. It is formed.
JP 2003-110220 A Japanese Patent Laid-Open No. 2003-017850 JP 2003-017857 A

しかしながら、このような従来の配線基板においては、絶縁基体と、絶縁基体の上面に形成された複数の接続パッドおよび貫通導体との間で焼成時の収縮率に差があり、この収縮の差に起因して絶縁基体を変形させるような応力が生じること、接続パッドおよび接続パッドを配線導体に接続する貫通導体等が絶縁基体の中央部に集中して形成されていること等により、絶縁基体の一方主面の中央部に、絶縁基体をたわませるような応力が作用し、この応力により絶縁基体、特に接続パッドが形成されている領域に変形を生じてしまい、電子部品の電極との位置ずれが発生し、実装信頼性が低下するという問題があった。   However, in such a conventional wiring board, there is a difference in shrinkage ratio during firing between the insulating base and the plurality of connection pads and through conductors formed on the upper surface of the insulating base. As a result, stress that deforms the insulating base occurs, and the connection pads and the through conductors that connect the connection pads to the wiring conductors are concentrated in the central portion of the insulating base. On the other hand, a stress that bends the insulating base acts on the central portion of the main surface, and this stress causes deformation of the insulating base, particularly the region where the connection pads are formed. There was a problem that a shift occurred and the mounting reliability was lowered.

この変形は、特に焼成時の収縮率の差による応力が大きく作用する、接続パッドの並びの外周部分で大きなものとなる。   This deformation is particularly large at the outer peripheral portion of the connection pad array where stress due to a difference in shrinkage ratio during firing is greatly applied.

本発明は、上記従来の技術の問題を解決するために完成されたものであり、その目的は、絶縁基体の上面に形成された複数の接続パッドと電子部品の電極が強固に接合されるとともに、実装信頼性に優れた配線基板を提供することにある。   The present invention has been completed in order to solve the above-described problems of the prior art, and its purpose is to firmly bond a plurality of connection pads formed on the upper surface of an insulating substrate and electrodes of an electronic component. An object of the present invention is to provide a wiring board having excellent mounting reliability.

本発明の配線基板は、複数のセラミック層が積層されて成る四角形状の絶縁基体と、該絶縁基体の内部に形成された配線導体と、前記絶縁基体の一方主面の中央部に縦横に配列形成され、前記配線導体と貫通導体を介して電気的に接続された複数の接続パッドと、該複数の接続パッド全体の周囲に隣接して形成された、前記配線導体と電気的に接続されていない複数のダミー貫通導体とを具備しており、前記複数の接続パッドは、縦方向での隣接間隔および横方向での隣接間隔がそれぞれ同じであるとともに全体として四角形状の配列になるようにして形成されており、前記複数のダミー貫通導体は、前記複数の接続パッドの並びの延長線上に、前記ダミー貫通導体と隣接する前記接続パッドとの間の隣接間隔が前記接続パッド同士の隣接間隔と同じになるようにして形成されていることを特徴とするものである。 The wiring board of the present invention has a rectangular insulating base formed by laminating a plurality of ceramic layers, a wiring conductor formed inside the insulating base, and a vertical and horizontal arrangement at the center of one main surface of the insulating base. A plurality of connection pads formed and electrically connected via the wiring conductors and through conductors, and electrically connected to the wiring conductors formed adjacent to the periphery of the plurality of connection pads. A plurality of dummy through conductors, and the plurality of connection pads have the same adjacent spacing in the vertical direction and the adjacent spacing in the horizontal direction, and are arranged in a rectangular array as a whole. The plurality of dummy through conductors are formed on an extension line of the plurality of connection pads arranged so that an adjacent interval between the dummy through conductors and the adjacent connection pads is between adjacent connection pads. And it is characterized in that it is formed so as to be the same as.

また本発明の配線基板は好ましくは、前記ダミー貫通導体は、前記複数のセラミック層のうち前記一方主面を有する最外層の前記セラミック層に形成されていることを特徴とするものである。   The wiring board of the present invention is preferably characterized in that the dummy through conductor is formed in the outermost ceramic layer having the one main surface among the plurality of ceramic layers.

本発明の配線基板によれば、複数のセラミック層が積層されて成る四角形状の絶縁基体と、絶縁基体の内部に形成された配線導体と、絶縁基体の一方主面の中央部に縦横に配列形成され、配線導体と貫通導体を介して電気的に接続された複数の接続パッドと、複数の接続パッド全体の周囲に隣接して形成された、配線導体と電気的に接続されていない複数のダミー貫通導体とを具備しており、複数の接続パッドは、縦方向での隣接間隔および横方向での隣接間隔がそれぞれ同じであるとともに全体として四角形状の配列になるようにして形成されており、複数のダミー貫通導体は、複数の接続パッドの並びの延長線上に、ダミー貫通導体と隣接する接続パッドとの間の隣接間隔が接続パッド同士の隣接間隔と同じになるようにして形成されていることから、絶縁基体と、絶縁基体の上面に形成された複数の接続パッドおよびダミー貫通導体との間の焼成時の収縮率の差に起因して生じる応力は、ダミー貫通導体の外側に収縮率の異なる絶縁基体のみが存在しているためダミー貫通導体において上記収縮率の差が最も大きくなり易く、また接続パッドや貫通導体、ダミー貫通導体等の導体の並びの最外周の部位に応力が集中し易いため、ダミー貫通導体が形成されている部位に集中することとなり、絶縁基体の一方主面の中央部で特に大きくなることはない。その結果、焼成時における絶縁基体と、絶縁基体の上面に形成された複数の接続パッドと、貫通導体との収縮差による変形を緩和させることができ、絶縁基体の上面に形成された複数の接続パッドと電子部品の電極の位置が揃うので、配線基板に電子部品を強固に接合することができ、電子部品の実装信頼性に優れた配線基板を提供することができる。 According to the wiring board of the present invention, a rectangular insulating base formed by laminating a plurality of ceramic layers, a wiring conductor formed inside the insulating base, and a vertical and horizontal arrangement at the center of one main surface of the insulating base A plurality of connection pads formed and electrically connected through the wiring conductor and the through conductor, and a plurality of connection pads formed adjacent to the periphery of the plurality of connection pads and not electrically connected to the wiring conductor The plurality of connection pads are formed such that the adjacent spacing in the vertical direction and the adjacent spacing in the horizontal direction are the same, and the overall arrangement is a square shape. , a plurality of dummy vias is an extension of the arrangement of a plurality of connection pads, adjacent spacing between the connection pads and the adjacent dummy vias are formed so as to be the same as the adjacent interval between the connection pads Therefore, the stress caused by the difference in shrinkage rate during firing between the insulating base, the plurality of connection pads formed on the upper surface of the insulating base and the dummy through conductor contracts to the outside of the dummy through conductor. stress since only different insulating substrates of rate exists, the difference in the shrinkage rate tends to be greatest in the dummy via conductors, also connection pads and through conductor, the portions of the outermost periphery of the arrangement of the conductors of such dummy vias Since it tends to concentrate, it concentrates on the portion where the dummy through conductor is formed, and does not become particularly large at the central portion of the one main surface of the insulating base. As a result, deformation due to shrinkage difference between the insulating base during firing, the plurality of connection pads formed on the upper surface of the insulating base, and the through conductor can be reduced, and the plurality of connections formed on the upper surface of the insulating base. Since the positions of the pads and the electrodes of the electronic component are aligned, the electronic component can be firmly bonded to the wiring substrate, and a wiring substrate excellent in mounting reliability of the electronic component can be provided.

また、ダミー貫通導体および接続パッドが形成されている領域で絶縁基体に多少の変形が生じたとしても、その変形は、主にダミー貫通導体が形成されている外側の部分に限定されるので、電子部品を接続するための接続パッドが形成されている領域で絶縁基体に変形が生じることが効果的に防止され、電子部品の電極を接続パッドに対向させて、確実に接続させることができる。   Even if some deformation occurs in the insulating base in the region where the dummy through conductor and the connection pad are formed, the deformation is mainly limited to the outer portion where the dummy through conductor is formed. It is possible to effectively prevent the insulating base from being deformed in the region where the connection pad for connecting the electronic component is formed, and the electrode of the electronic component can be opposed to the connection pad and reliably connected.

また、本発明の配線基板は、複数の接続パッドは、縦方向での隣接間隔および横方向での隣接間隔がそれぞれ同じであるとともに全体として四角形状の配列になるようにして形成されており、複数のダミー貫通導体は、複数の接続パッドの並びの延長線上に、ダミー貫通導体と隣接する接続パッドとの間の隣接間隔が接続パッド同士の隣接間隔と同じになるようにして形成されていることから、焼成時における収縮の影響を受け易い最外周の接続パッドは、配線導体と電気的に接続しない複数のダミー貫通導体により収縮差が効果的に吸収され、配列の位置ずれが確実に緩和される。 In the wiring board of the present invention , the plurality of connection pads are formed so that the adjacent distance in the vertical direction and the adjacent distance in the horizontal direction are the same and are arranged in a square shape as a whole, The plurality of dummy through conductors are formed on the extended line of the plurality of connection pads so that the adjacent interval between the dummy through conductor and the adjacent connection pad is the same as the adjacent interval between the connection pads. since, connection pads easily outermost affected shrinkage during firing, shrinkage difference is absorbed effectively by the plurality of dummy via conductors not connected to the wiring conductor and electrical, position shift sequences securely Alleviated.

また、ダミー貫通導体と隣接する接続パッドとの間の隣接間隔が、接続パッド同士の隣接間隔と同じになるようにして形成されていることから、収縮の影響が、最外周の配線導体と電気的に接続された複数の接続パッドに均一に掛かることとなる。   In addition, since the adjacent interval between the dummy through conductor and the adjacent connection pad is formed so as to be the same as the adjacent interval between the connection pads, the influence of the shrinkage is affected by the electrical connection with the outermost wiring conductor. Therefore, it is applied uniformly to the plurality of connection pads connected to each other.

また、本発明の配線基板は好ましくは、ダミー貫通導体は、複数のセラミック層のうち一方主面を有する最外層のセラミック層に形成されていることから、絶縁基体の内部において、ダミー貫通導体に妨げられることなく配線導体を形成することが可能な領域を確保することができるので、従来の配線基板と同様の配線の高密度化が可能となる。   In the wiring board of the present invention, preferably, the dummy through conductor is formed in the outermost ceramic layer having one main surface among the plurality of ceramic layers, so that the dummy through conductor is formed inside the insulating base. Since it is possible to secure a region where the wiring conductor can be formed without being hindered, it is possible to increase the density of the wiring as in the conventional wiring board.

本発明の配線基板について図面に基づき以下に説明する。図1(a)は、本発明の配線基板の実施の形態の一例を示す平面図であり、(b)はその断面図である。図1において、1は絶縁基体、2は接続パッド、3は配線導体、6はダミー貫通導体である。これらの絶縁基体1、接続パッド2、配線導体3およびダミー貫通導体6により、本発明の配線基板9が基本的に構成される。   The wiring board of the present invention will be described below with reference to the drawings. FIG. 1A is a plan view showing an example of an embodiment of a wiring board according to the present invention, and FIG. 1B is a sectional view thereof. In FIG. 1, 1 is an insulating substrate, 2 is a connection pad, 3 is a wiring conductor, and 6 is a dummy through conductor. The insulating substrate 1, the connection pad 2, the wiring conductor 3, and the dummy through conductor 6 basically constitute the wiring board 9 of the present invention.

絶縁基体1は、酸化アルミニウム質焼結体やガラスセラミック焼結体(ガラスセラミックス)、窒化アルミニウム質焼結体、ムライト質焼結体等のセラミック焼結体、エポキシ樹脂、ポリイミド樹脂等の有機樹脂、または、酸化アルミニウム等の無機粉末をエポキシ樹脂等の有機樹脂で結合してなる複合材料等の電気絶縁材料からなる絶縁層1aを複数積層して形成されている。   The insulating substrate 1 is an aluminum oxide sintered body, a glass ceramic sintered body (glass ceramic), an aluminum nitride sintered body, a ceramic sintered body such as a mullite sintered body, or an organic resin such as an epoxy resin or a polyimide resin. Alternatively, a plurality of insulating layers 1a made of an electrical insulating material such as a composite material formed by bonding inorganic powder such as aluminum oxide with an organic resin such as an epoxy resin are stacked.

絶縁基体1は、例えば各絶縁層1aが酸化アルミニウム質焼結体から成る場合、酸化アルミニウム,酸化珪素,酸化カルシウム,酸化マグネシウム等の原料粉末に適当な有機バインダ,溶剤を添加混合して泥漿状のセラミックスラリーとなすとともに、このセラミックスラリーをドクターブレード法やカレンダーロール法等のシート成形技術を採用しシート状となすことによって複数のセラミックグリーンシート(セラミック生シート)を得て、しかる後、このセラミックグリーンシートを切断加工や打ち抜き加工により適当な形状とするとともにこれらのセラミックグリーンシートを積層して積層体とし、最後にこの積層体を還元雰囲気中で約1600℃の温度で焼成することによって絶縁基体1が製作される。   For example, when each insulating layer 1a is made of an aluminum oxide sintered body, the insulating base 1 is in the form of a mud by adding and mixing an appropriate organic binder and solvent to raw material powders such as aluminum oxide, silicon oxide, calcium oxide, and magnesium oxide. A plurality of ceramic green sheets (ceramic raw sheets) are obtained by using a sheet forming technique such as a doctor blade method and a calender roll method to obtain a plurality of ceramic green sheets. The ceramic green sheet is formed into an appropriate shape by cutting or punching, and these ceramic green sheets are laminated to form a laminated body. Finally, the laminated body is fired in a reducing atmosphere at a temperature of about 1600 ° C. for insulation. The substrate 1 is manufactured.

この絶縁基体1は、例えば上面に、IC,LSI等の半導体集積回路素子、LD(半導体レーザ),LED(発光ダイオード),PD(フォトダイオード),CCD,ラインセンサ,イメージセンサ等の光半導体素子、圧電振動子,水晶振動子等の振動子、その他の種々の電子部品を搭載するための搭載部(図示せず)を有している。   The insulating base 1 has, for example, a semiconductor integrated circuit element such as an IC or LSI, an optical semiconductor element such as an LD (semiconductor laser), an LED (light emitting diode), a PD (photodiode), a CCD, a line sensor, or an image sensor. And a mounting portion (not shown) for mounting a vibrator such as a piezoelectric vibrator and a crystal vibrator and other various electronic components.

また、絶縁基体1の一方主面(図1(b)では上面)の中央部には、接続パッド2が形成され、絶縁基体1の内部(セラミック層1aの層間)には配線導体3が形成されている。接続パッド2と配線導体3とは、図1の例では、セラミック層1aを厚み方向に貫通するようにして形成された貫通導体4を介して電気的に接続されている。   In addition, a connection pad 2 is formed at the center of one main surface (upper surface in FIG. 1B) of the insulating base 1, and a wiring conductor 3 is formed inside the insulating base 1 (between the ceramic layers 1a). Has been. In the example of FIG. 1, the connection pad 2 and the wiring conductor 3 are electrically connected through a through conductor 4 formed so as to penetrate the ceramic layer 1a in the thickness direction.

絶縁基体1の一方主面の中央部に搭載される電子部品(図示せず)の主面に縦横に配列形成されている複数の電極を、接続パッド2に対向させて、はんだ等の導電性接続材(図示せず)を介して電気的に接続させ、配線導体3の一部を絶縁基体1の側面や下面等に露出させておくことにより、電子部品の電極が、接続パッド2および配線導体3を介して絶縁基体1の側面や下面に導出される。この配線導体3の導出部分を外部電気回路にはんだ等を介して電気的に接続することにより、電子部品の電極が、接続パッド2および配線導体3を介して外部電気回路と電気的に接続される。   A plurality of electrodes arranged vertically and horizontally on the main surface of an electronic component (not shown) mounted on the central portion of one main surface of the insulating substrate 1 are opposed to the connection pads 2 so as to be conductive such as solder. Electrical connection is made through a connecting material (not shown), and a part of the wiring conductor 3 is exposed on the side surface or the lower surface of the insulating base 1 so that the electrodes of the electronic component are connected to the connection pad 2 and the wiring. It is led out to the side surface and the lower surface of the insulating substrate 1 through the conductor 3. By electrically connecting the lead-out portion of the wiring conductor 3 to the external electric circuit via solder or the like, the electrode of the electronic component is electrically connected to the external electric circuit via the connection pad 2 and the wiring conductor 3. The

また、絶縁基体1は、一方主面(上面)に、複数の接続パッド2の全体の周囲に隣接して、配線導体3と電気的に接続されていないダミー貫通導体6が形成されている。この構成により、絶縁基体1と、絶縁基体1の上面に形成された複数の接続パッド2および貫通導体4との間の焼成時の収縮率の差に起因して生じる応力は、ダミー貫通導体6の外側に収縮率の異なる絶縁基体1のみが存在しているためダミー貫通導体6において上記収縮率の差が最も大きくなり易く、また接続パッド2や貫通導体4、ダミー貫通導体6等の導体の並びの最外周の部位に応力が集中し易いため、ダミー貫通導体6が形成されている部位に集中することとなり、絶縁基体1の一方主面の中央部で特に大きくなることはない。その結果、焼成時における絶縁基体1と、絶縁基体1の上面に形成された複数の接続パッド2と、貫通導体4との収縮差による変形を緩和させることができ、絶縁基体1の上面に形成された複数の接続パッド2と電子部品の電極の位置が揃うので、配線基板9に電子部品を強固に接合することができ、電子部品の実装信頼性に優れた配線基板9を提供することができる。   In addition, the insulating base 1 is provided with a dummy through conductor 6 not electrically connected to the wiring conductor 3 adjacent to the entire periphery of the plurality of connection pads 2 on one main surface (upper surface). With this configuration, the stress generated due to the difference in shrinkage rate during firing between the insulating base 1 and the plurality of connection pads 2 and the through conductors 4 formed on the upper surface of the insulating base 1 is caused by the dummy through conductor 6. Since there is only the insulating base body 1 having a different shrinkage ratio outside, the difference between the shrinkage ratios of the dummy penetrating conductor 6 tends to be the largest, and the conductors such as the connection pad 2, the penetrating conductor 4, and the dummy penetrating conductor 6 Since stress tends to concentrate on the outermost peripheral portion of the line, it concentrates on the portion where the dummy through conductors 6 are formed, and does not become particularly large at the central portion of one main surface of the insulating base 1. As a result, the deformation due to the shrinkage difference between the insulating base 1 during firing, the plurality of connection pads 2 formed on the upper surface of the insulating base 1, and the through conductors 4 can be alleviated and formed on the upper surface of the insulating base 1. Since the positions of the plurality of connection pads 2 and the electrodes of the electronic component are aligned, the electronic component can be firmly bonded to the wiring substrate 9, and the wiring substrate 9 having excellent mounting reliability of the electronic component can be provided. it can.

また、ダミー貫通導体6および接続パッド2が形成されている領域で、絶縁基体1に多少の変形が生じたとしても、その変形は、主にダミー貫通導体6が形成されている外側の部分に限定されるので、電子部品を接続するための接続パッド2が形成されている領域で絶縁基体1に変形が生じることは効果的に防止され、電子部品の電極を接続パッド2に対向させて、確実に接続させることができる。   Further, even if some deformation occurs in the insulating base 1 in the region where the dummy through conductor 6 and the connection pad 2 are formed, the deformation is mainly applied to the outer portion where the dummy through conductor 6 is formed. Since it is limited, it is effectively prevented that the insulating substrate 1 is deformed in the region where the connection pad 2 for connecting the electronic component is formed, and the electrode of the electronic component is opposed to the connection pad 2. It can be securely connected.

この場合、ダミー貫通導体6が、接続パッド2との間の距離が離れていたり、接続パッド2の配列と部分的にしか隣接していなかったりした場合、絶縁基体1の変形を緩和させる作用が不十分になったり、偏ったりするため、接続パッド2が形成されている領域で絶縁基体1に変形が生じる。   In this case, when the distance between the dummy penetrating conductor 6 and the connection pad 2 is increased, or when the dummy through conductor 6 is only partially adjacent to the arrangement of the connection pads 2, the action of alleviating the deformation of the insulating substrate 1 is achieved. Since it becomes insufficient or biased, the insulating substrate 1 is deformed in the region where the connection pad 2 is formed.

そのため、ダミーの貫通導体6と接続パッド2との間の距離は、接続パッド2同士の隣接間隔の2倍以下が好ましく、ダミー貫通導体6と接続パッド2との間の電気絶縁性の確保を考慮すると、2倍以下でかつ50μm以上とすることがより一層好ましい。また、ダミー貫通導体6は、隣接する接続パッド2の最外周の並びに沿って、接続パッド2と同じ数で形成することが好ましい。   For this reason, the distance between the dummy through conductor 6 and the connection pad 2 is preferably not more than twice the adjacent interval between the connection pads 2, and electrical insulation between the dummy through conductor 6 and the connection pad 2 can be ensured. Considering it, it is more preferable to set it to 2 times or less and 50 μm or more. The dummy through conductors 6 are preferably formed in the same number as the connection pads 2 along the outermost periphery of the adjacent connection pads 2.

なお、ダミー貫通導体6は、絶縁基体1の一方主面側に露出する端面に、その端面を覆うようにして、接続パッド2とほぼ同じ形状、大きさのダミー接続パッド5を形成することが好ましい。この場合、ダミー貫通導体6の側面と絶縁基体1との間の微細な隙間から外気中の水分等が絶縁基体1の内部に浸入することを確実に防止することができ、絶縁基体1内部の配線導体3等の酸化腐食やマイグレーション等を効果的に防止できるので、電子部品を搭載する配線基板9としての長期信頼性をより一層優れたものとすることができる。   The dummy penetrating conductor 6 may be formed on the end surface exposed on the one main surface side of the insulating base 1 so as to cover the end surface and to form the dummy connection pad 5 having substantially the same shape and size as the connection pad 2. preferable. In this case, moisture or the like in the outside air can be reliably prevented from entering the inside of the insulating base 1 from a minute gap between the side surface of the dummy through conductor 6 and the insulating base 1. Since oxidation corrosion, migration, and the like of the wiring conductor 3 can be effectively prevented, the long-term reliability as the wiring board 9 on which electronic components are mounted can be further improved.

また、ダミー接続パッド5を形成しておくと、接続パッド2と貫通導体4とから成る構造と近似した構造を、ダミー貫通導体6とダミー接続パッド5とにより、少なくとも絶縁基体1の一方主面およびその直下のセラミック層1aにおいて形成することができる。その結果、接続パッド2と絶縁基体1、および貫通導体4と絶縁基体1との焼成時の収縮率の差に起因する応力を、より確実に絶縁基体1の一方主面の全面に分散させることができ、接続パッド2が形成されている領域における絶縁基体1の変形をより効果的に防止することができる。   Further, if the dummy connection pad 5 is formed, at least one main surface of the insulating substrate 1 has a structure approximate to the structure composed of the connection pad 2 and the through conductor 4 by the dummy through conductor 6 and the dummy connection pad 5. And can be formed in the ceramic layer 1a immediately below. As a result, it is possible to more reliably disperse the stress caused by the difference in shrinkage rate during firing between the connection pad 2 and the insulating base 1 and between the through conductor 4 and the insulating base 1 over the entire one main surface of the insulating base 1. Therefore, the deformation of the insulating substrate 1 in the region where the connection pad 2 is formed can be more effectively prevented.

なお、配線導体3,接続パッド2,貫通導体4,ダミー接続パッド5およびダミー貫通導体6は、タングステン,モリブデン,マンガン,銅,銀,パラジウム,金等の金属材料からなり、メタライズ導体や蒸着層,金属箔,めっき層等の形態で絶縁基体1のセラミック層1aに形成される。   In addition, the wiring conductor 3, the connection pad 2, the through conductor 4, the dummy connection pad 5, and the dummy through conductor 6 are made of a metal material such as tungsten, molybdenum, manganese, copper, silver, palladium, gold, and the like. , Formed on the ceramic layer 1a of the insulating substrate 1 in the form of a metal foil, a plating layer, or the like.

配線導体3,接続パッド2,貫通導体4,ダミー接続パッド5およびダミー貫通導体6は、例えば、銅のメタライズ導体からなる場合、銅粉末に有機溶剤,樹脂バインダ等を添加して作製した金属ペーストを、セラミック層1aとなるセラミックグリーンシートの表面や、予めセラミックスグリーンシートに打抜き形成しておいた貫通孔の内部に、印刷塗布、充填することにより形成される。   For example, when the wiring conductor 3, the connection pad 2, the through conductor 4, the dummy connection pad 5 and the dummy through conductor 6 are made of a copper metallized conductor, a metal paste prepared by adding an organic solvent, a resin binder, or the like to copper powder. Is formed by printing, filling and filling the surface of the ceramic green sheet to be the ceramic layer 1a or the inside of the through hole previously punched and formed in the ceramic green sheet.

なお、ダミー貫通導体6は、その横断面における形状および大きさが貫通導体4の横断面における形状および大きさと同じかまたは大きい方が好ましい。例えば、ダミー貫通導体6および貫通導体4がともに横断面形状が円形状の場合、両者の直径が同じかまたはダミー貫通導体6の方が大きいのがよい。これにより、ダミー貫通導体6の方により大きく応力が作用し、貫通導体4および接続パッド2が形成されている絶縁基体1の中央部の変形をより確実に防止することができる。この場合、ダミー貫通導体6が形成されている部位における絶縁基体1の機械的強度を確保することも考慮すると、ダミー貫通導体6は、その直径が貫通導体4と同じ直径以上150μm以下であり、かつ隣接間隔を50μm以上確保するのがより好ましい。   The dummy penetrating conductor 6 preferably has the same or larger shape and size in the cross section than the shape and size in the cross section of the penetrating conductor 4. For example, when the dummy penetrating conductor 6 and the penetrating conductor 4 both have a circular cross-sectional shape, the diameters of both of them should be the same or the dummy penetrating conductor 6 should be larger. As a result, a greater stress is applied to the dummy penetrating conductor 6, and deformation of the central portion of the insulating base 1 on which the penetrating conductor 4 and the connection pad 2 are formed can be prevented more reliably. In this case, in consideration of ensuring the mechanical strength of the insulating substrate 1 in the portion where the dummy through conductor 6 is formed, the dummy through conductor 6 has a diameter equal to or greater than that of the through conductor 4 and equal to or less than 150 μm. In addition, it is more preferable to secure an adjacent interval of 50 μm or more.

また、本発明の配線基板において複数の接続パッド2は、縦方向での隣接間隔および横方向での隣接間隔がそれぞれ同じであるとともに全体として四角形状の配列になるようにして形成されており、複数のダミー貫通導体6は、複数の接続パッド2の並びの延長線上に、ダミー貫通導体6と隣接する接続パッド2との間の隣接間隔が接続パッド2同士の隣接間隔と同じになるようにして形成されている。この構成により、焼成時における収縮の影響を生じ易い最外周の配線導体3と電気的に接続された複数の接続パッド2が、配線導体3と電気的に接続しない複数のダミー貫通導体6により収縮差が吸収され配列の位置ずれが緩和されるので、より一層実装信頼性に優れた配線基板9を提供することができる。 Further, in the wiring board 9 of the present invention , the plurality of connection pads 2 are formed such that the adjacent spacing in the vertical direction and the adjacent spacing in the horizontal direction are the same and are arranged in a square shape as a whole. In the plurality of dummy through conductors 6, the adjacent interval between the dummy through conductor 6 and the adjacent connection pad 2 is the same as the adjacent interval between the connection pads 2 on the extended line of the plurality of connection pads 2. way that has been formed. With this configuration, the plurality of connection pads 2 that are electrically connected to the outermost wiring conductor 3 that is susceptible to shrinkage during firing are contracted by the plurality of dummy through conductors 6 that are not electrically connected to the wiring conductor 3. the difference is reduced misalignment of the array are absorbed Runode, it is possible to provide a wiring board 9 having excellent more mounting reliability.

また、本発明の配線基板において、ダミー貫通導体6は、複数のセラミック層1aのうち一方主面を有する最外層のセラミック層1aに形成されていることが好ましい。この構成により、絶縁基体1内部において、ダミー貫通導体6に妨げられることなく、配線導体3を形成することが可能な領域を確保することができるので、従来の配線基板9と同様に配線の高密度化が可能となる。 In the wiring board 9 of the present invention, the dummy through conductor 6 is preferably formed on the outermost ceramic layer 1a having one main surface among the plurality of ceramic layers 1a. With this configuration, an area in which the wiring conductor 3 can be formed without being obstructed by the dummy through conductor 6 can be secured inside the insulating base 1. Densification is possible.

そして、本発明の配線基板9において、絶縁基体1の上面に電子部品を搭載するとともに、電子部品の電極を接続パッド2に電気的に接続し、必要に応じて電子部品を蓋体や封止用樹脂等で封止することにより電子装置が形成される。この電子装置は、小型で高精度の携帯電話等の電子機器の部品として使用される。   And in the wiring board 9 of this invention, while mounting an electronic component on the upper surface of the insulating base | substrate 1, the electrode of an electronic component is electrically connected to the connection pad 2, and a lid or sealing is carried out as needed. An electronic device is formed by sealing with a resin or the like. This electronic device is used as a component of electronic equipment such as a small and high-precision mobile phone.

なお、本発明は上記の実施の形態に限定されるものではなく、本発明の要旨を逸脱しない範囲内であれば種々の変更は可能である。   The present invention is not limited to the above-described embodiment, and various modifications can be made without departing from the gist of the present invention.

(a),(b)は本発明の配線基板の実施の形態の一例を示す平面図および断面図である。(A), (b) is the top view and sectional drawing which show an example of embodiment of the wiring board of this invention.

符号の説明Explanation of symbols

1・・・絶縁基体
1a・・・セラミック層
2・・・接続パッド
3・・・配線導体
4・・・貫通導体
5・・・ダミー接続パッド
6・・・ダミー貫通導体
9・・・配線基板
DESCRIPTION OF SYMBOLS 1 ... Insulation base | substrate 1a ... Ceramic layer 2 ... Connection pad 3 ... Wiring conductor 4 ... Through conductor 5 ... Dummy connection pad 6 ... Dummy through conductor 9 ... Wiring board

Claims (2)

複数のセラミック層が積層されて成る四角形状の絶縁基体と、該絶縁基体の内部に形成された配線導体と、前記絶縁基体の一方主面の中央部に縦横に配列形成され、前記配線導体と貫通導体を介して電気的に接続された複数の接続パッドと、該複数の接続パッド全体の周囲に隣接して形成された、前記配線導体と電気的に接続されていない複数のダミー貫通導体とを具備しており、前記複数の接続パッドは、縦方向での隣接間隔および横方向での隣接間隔がそれぞれ同じであるとともに全体として四角形状の配列になるようにして形成されており、前記複数のダミー貫通導体は、前記複数の接続パッドの並びの延長線上に、前記ダミー貫通導体と隣接する前記接続パッドとの間の隣接間隔が前記接続パッド同士の隣接間隔と同じになるようにして形成されていることを特徴とする配線基板。 A rectangular insulating base formed by laminating a plurality of ceramic layers; a wiring conductor formed inside the insulating base; and a wiring conductor formed vertically and horizontally at a central portion of one main surface of the insulating base; A plurality of connection pads electrically connected through the through conductors, and a plurality of dummy through conductors formed adjacent to the periphery of the plurality of connection pads and not electrically connected to the wiring conductor; The plurality of connection pads are formed such that the adjacent spacing in the vertical direction and the adjacent spacing in the horizontal direction are the same and are arranged in a square shape as a whole. The dummy penetrating conductor has an adjacent interval between the dummy penetrating conductor and the adjacent connecting pad on the extension line of the plurality of connecting pads arranged to be the same as the adjacent interval between the connecting pads. Wiring board, characterized by being formed Te. 前記ダミー貫通導体は、前記複数のセラミック層のうち前記一方主面を有する最外層の前記セラミック層に形成されていることを特徴とする請求項1記載の配線基板。 It said dummy through conductor, the wiring board according to claim 1 Symbol mounting, characterized in that it is formed on the ceramic layer of the outermost layer having the one main surface of the plurality of ceramic layers.
JP2004129884A 2004-04-26 2004-04-26 Wiring board Expired - Fee Related JP4373841B2 (en)

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