JP2009161401A5 - - Google Patents

Download PDF

Info

Publication number
JP2009161401A5
JP2009161401A5 JP2008001044A JP2008001044A JP2009161401A5 JP 2009161401 A5 JP2009161401 A5 JP 2009161401A5 JP 2008001044 A JP2008001044 A JP 2008001044A JP 2008001044 A JP2008001044 A JP 2008001044A JP 2009161401 A5 JP2009161401 A5 JP 2009161401A5
Authority
JP
Japan
Prior art keywords
single crystal
content
producing
impurity element
impurity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008001044A
Other languages
English (en)
Japanese (ja)
Other versions
JP5066640B2 (ja
JP2009161401A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2008001044A priority Critical patent/JP5066640B2/ja
Priority claimed from JP2008001044A external-priority patent/JP5066640B2/ja
Publication of JP2009161401A publication Critical patent/JP2009161401A/ja
Publication of JP2009161401A5 publication Critical patent/JP2009161401A5/ja
Application granted granted Critical
Publication of JP5066640B2 publication Critical patent/JP5066640B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2008001044A 2008-01-08 2008-01-08 不純物の含有量が制御された単結晶の製造方法 Expired - Fee Related JP5066640B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008001044A JP5066640B2 (ja) 2008-01-08 2008-01-08 不純物の含有量が制御された単結晶の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008001044A JP5066640B2 (ja) 2008-01-08 2008-01-08 不純物の含有量が制御された単結晶の製造方法

Publications (3)

Publication Number Publication Date
JP2009161401A JP2009161401A (ja) 2009-07-23
JP2009161401A5 true JP2009161401A5 (enExample) 2011-03-10
JP5066640B2 JP5066640B2 (ja) 2012-11-07

Family

ID=40964461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008001044A Expired - Fee Related JP5066640B2 (ja) 2008-01-08 2008-01-08 不純物の含有量が制御された単結晶の製造方法

Country Status (1)

Country Link
JP (1) JP5066640B2 (enExample)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6386409B2 (ja) * 2014-03-31 2018-09-05 日本碍子株式会社 13族窒化物自立基板へのドーパント導入方法およびled素子の製造方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5192795A (ja) * 1975-02-12 1976-08-14 Ryukaaensoshosozai
JPS6058273B2 (ja) * 1983-04-07 1985-12-19 昭和電工株式会社 立方晶bn砥粒の改質法
JPS63108730A (ja) * 1986-10-27 1988-05-13 Sony Corp 3−5族化合物半導体のアニ−ル法
JPH02129098A (ja) * 1988-11-08 1990-05-17 Stanley Electric Co Ltd 不純物添加半導体結晶の製造方法
JP2004224600A (ja) * 2003-01-20 2004-08-12 Matsushita Electric Ind Co Ltd Iii族窒化物基板の製造方法および半導体装置
JP4624381B2 (ja) * 2007-07-12 2011-02-02 住友電気工業株式会社 GaN結晶の製造方法

Similar Documents

Publication Publication Date Title
TWI553144B (zh) Ga 2 O 3 A method for producing a crystalline film
JP5470349B2 (ja) p型シリコン単結晶およびその製造方法
RU2010145925A (ru) Способ получения кристаллического кремния фотоэлектрического качества добавлением легирующих примесей и фотоэлектрический элемент
JP2014515877A5 (enExample)
JP2016179937A5 (enExample)
TW200406915A (en) Light emitting element and method of making same
WO2014186210A3 (en) Mesoporous materials and processes preparation thereof
JP2009518263A5 (enExample)
JP2014511146A5 (enExample)
MX2025000300A (es) Metodo para producir edulcorante cristalino funcional
CN109056053A (zh) Ga2O3系单晶基板
WO2012165855A3 (en) Method of development for the enhancement of thermoelectric efficiency of thermoelectric material through annealing process
WO2009140406A3 (en) Crystal growth apparatus for solar cell manufacturing
JP2009161401A5 (enExample)
TW201130156A (en) Sapphire single crystal for producing sapphire single crystal substrate for LED, sapphire single crystal substrate for LED, light-eliciting element, and method for preparing the same
JP5372105B2 (ja) n型シリコン単結晶およびその製造方法
CN103628128A (zh) 坩埚及其制作方法、多晶硅锭的铸造方法
WO2012022349A3 (de) Verfahren zur herstellung einer solarzelle mit einem selektiven emitter
WO2008063715A3 (en) Crystal growth system and method for lead-contained compositions using batch auto-feeding
JP6005361B2 (ja) 半導体材料の選択堆積方法
KR101780306B1 (ko) 은 나노와이어의 제조방법 및 이에 의해 제조되는 은 나노와이어
CN102719893B (zh) p型氧化锌材料的制备方法
JP2007153719A (ja) 炭化珪素単結晶の製造方法
TW201204881A (en) Process for producing single-crystal sapphire, and single-crystal sapphire substrate
WO2009008609A3 (en) Ferromagnetic single-crystalline metal nanowire and the fabrication method thereof