JP2009069284A5 - - Google Patents

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Publication number
JP2009069284A5
JP2009069284A5 JP2007235526A JP2007235526A JP2009069284A5 JP 2009069284 A5 JP2009069284 A5 JP 2009069284A5 JP 2007235526 A JP2007235526 A JP 2007235526A JP 2007235526 A JP2007235526 A JP 2007235526A JP 2009069284 A5 JP2009069284 A5 JP 2009069284A5
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JP
Japan
Prior art keywords
component
photoresist composition
positive photoresist
glycerol
alkali
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007235526A
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English (en)
Japanese (ja)
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JP2009069284A (ja
JP5090833B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2007235526A priority Critical patent/JP5090833B2/ja
Priority claimed from JP2007235526A external-priority patent/JP5090833B2/ja
Priority to TW097134586A priority patent/TW200912532A/zh
Priority to KR1020080089148A priority patent/KR101152163B1/ko
Publication of JP2009069284A publication Critical patent/JP2009069284A/ja
Publication of JP2009069284A5 publication Critical patent/JP2009069284A5/ja
Application granted granted Critical
Publication of JP5090833B2 publication Critical patent/JP5090833B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007235526A 2007-09-11 2007-09-11 ポジ型ホトレジスト組成物、及びそれを用いた感光性膜付基板 Active JP5090833B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007235526A JP5090833B2 (ja) 2007-09-11 2007-09-11 ポジ型ホトレジスト組成物、及びそれを用いた感光性膜付基板
TW097134586A TW200912532A (en) 2007-09-11 2008-09-09 Positive photoresist composition and substrate with photo-sensitive film using the same
KR1020080089148A KR101152163B1 (ko) 2007-09-11 2008-09-10 포지티브형 포토레지스트 조성물 및 그것을 사용한 감광성막 부착 기판

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007235526A JP5090833B2 (ja) 2007-09-11 2007-09-11 ポジ型ホトレジスト組成物、及びそれを用いた感光性膜付基板

Publications (3)

Publication Number Publication Date
JP2009069284A JP2009069284A (ja) 2009-04-02
JP2009069284A5 true JP2009069284A5 (https=) 2010-10-07
JP5090833B2 JP5090833B2 (ja) 2012-12-05

Family

ID=40605644

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007235526A Active JP5090833B2 (ja) 2007-09-11 2007-09-11 ポジ型ホトレジスト組成物、及びそれを用いた感光性膜付基板

Country Status (3)

Country Link
JP (1) JP5090833B2 (https=)
KR (1) KR101152163B1 (https=)
TW (1) TW200912532A (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20140086724A (ko) 2012-12-28 2014-07-08 제일모직주식회사 표시장치 절연막용 감광성 수지 조성물, 및 이를 이용한 표시장치 절연막 및 표시장치
JP2015064404A (ja) * 2013-09-24 2015-04-09 株式会社エスケーエレクトロニクス 位相シフトマスク及びその製造方法
TWI676864B (zh) * 2016-09-22 2019-11-11 奇美實業股份有限公司 正型感光性樹脂組成物、圖案化膜及凸塊的製造方法
JP2025102576A (ja) 2023-12-26 2025-07-08 東京応化工業株式会社 化学増幅型ポジ型感光性樹脂組成物、感光性ドライフィルム、及びパターン化されたレジスト膜の製造方法
JP2025102540A (ja) 2023-12-26 2025-07-08 東京応化工業株式会社 化学増幅型ポジ型感光性樹脂組成物、感光性ドライフィルム、及びパターン化されたレジスト膜の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3360363B2 (ja) * 1993-06-30 2002-12-24 ジェイエスアール株式会社 レジスト被膜の形成法
JP3859181B2 (ja) * 1997-03-27 2006-12-20 東京応化工業株式会社 導電パターン形成方法
KR20000076585A (ko) * 1999-02-02 2000-12-26 미우라 아끼라 방사선 민감성 수지 조성물
JP3977307B2 (ja) * 2003-09-18 2007-09-19 東京応化工業株式会社 ポジ型フォトレジスト組成物及びレジストパターン形成方法
JP4558443B2 (ja) * 2004-03-15 2010-10-06 ダイセル化学工業株式会社 レジスト組成物
JP2006003422A (ja) * 2004-06-15 2006-01-05 Fuji Photo Film Co Ltd パターン形成方法及びｔｆｔアレイ基板並びに液晶表示素子
JP4813193B2 (ja) * 2006-01-31 2011-11-09 Ａｚエレクトロニックマテリアルズ株式会社 スピンレス、スリットコーティングに適した感光性樹脂組成物

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