JP2009021272A5 - - Google Patents

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Publication number
JP2009021272A5
JP2009021272A5 JP2007180546A JP2007180546A JP2009021272A5 JP 2009021272 A5 JP2009021272 A5 JP 2009021272A5 JP 2007180546 A JP2007180546 A JP 2007180546A JP 2007180546 A JP2007180546 A JP 2007180546A JP 2009021272 A5 JP2009021272 A5 JP 2009021272A5
Authority
JP
Japan
Prior art keywords
gas supply
supply member
plasma
gas
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007180546A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009021272A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007180546A priority Critical patent/JP2009021272A/ja
Priority claimed from JP2007180546A external-priority patent/JP2009021272A/ja
Priority to TW97121588A priority patent/TW200915419A/zh
Priority to PCT/JP2008/060763 priority patent/WO2009008241A1/ja
Publication of JP2009021272A publication Critical patent/JP2009021272A/ja
Publication of JP2009021272A5 publication Critical patent/JP2009021272A5/ja
Pending legal-status Critical Current

Links

JP2007180546A 2007-07-10 2007-07-10 プラズマ処理装置 Pending JP2009021272A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007180546A JP2009021272A (ja) 2007-07-10 2007-07-10 プラズマ処理装置
TW97121588A TW200915419A (en) 2007-07-10 2008-06-10 Plasma treating apparatus
PCT/JP2008/060763 WO2009008241A1 (ja) 2007-07-10 2008-06-12 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007180546A JP2009021272A (ja) 2007-07-10 2007-07-10 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JP2009021272A JP2009021272A (ja) 2009-01-29
JP2009021272A5 true JP2009021272A5 (https=) 2011-10-06

Family

ID=40228420

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007180546A Pending JP2009021272A (ja) 2007-07-10 2007-07-10 プラズマ処理装置

Country Status (3)

Country Link
JP (1) JP2009021272A (https=)
TW (1) TW200915419A (https=)
WO (1) WO2009008241A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014060378A (ja) * 2012-08-23 2014-04-03 Tokyo Electron Ltd シリコン窒化膜の成膜方法、有機電子デバイスの製造方法及びシリコン窒化膜の成膜装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07263354A (ja) * 1994-03-25 1995-10-13 Kobe Steel Ltd プラズマｃｖｄ膜の形成方法
JP3440714B2 (ja) * 1995-12-11 2003-08-25 ソニー株式会社 シリコン化合物系絶縁膜の成膜方法
JP3935731B2 (ja) * 2001-06-25 2007-06-27 三菱重工業株式会社 プラズマｃｖｄ装置及びクリーニング方法及び成膜方法
JP4689372B2 (ja) * 2005-07-04 2011-05-25 株式会社日立プラントテクノロジー スタッカクレーンの走行駆動制御方法

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