WO2009008241A1 - プラズマ処理装置 - Google Patents

プラズマ処理装置 Download PDF

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Publication number
WO2009008241A1
WO2009008241A1 PCT/JP2008/060763 JP2008060763W WO2009008241A1 WO 2009008241 A1 WO2009008241 A1 WO 2009008241A1 JP 2008060763 W JP2008060763 W JP 2008060763W WO 2009008241 A1 WO2009008241 A1 WO 2009008241A1
Authority
WO
WIPO (PCT)
Prior art keywords
feeding member
gas
gas feeding
treating
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/060763
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
Hirokazu Ueda
Masahiro Horigome
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of WO2009008241A1 publication Critical patent/WO2009008241A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
PCT/JP2008/060763 2007-07-10 2008-06-12 プラズマ処理装置 Ceased WO2009008241A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-180546 2007-07-10
JP2007180546A JP2009021272A (ja) 2007-07-10 2007-07-10 プラズマ処理装置

Publications (1)

Publication Number Publication Date
WO2009008241A1 true WO2009008241A1 (ja) 2009-01-15

Family

ID=40228420

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/060763 Ceased WO2009008241A1 (ja) 2007-07-10 2008-06-12 プラズマ処理装置

Country Status (3)

Country Link
JP (1) JP2009021272A (https=)
TW (1) TW200915419A (https=)
WO (1) WO2009008241A1 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014060378A (ja) * 2012-08-23 2014-04-03 Tokyo Electron Ltd シリコン窒化膜の成膜方法、有機電子デバイスの製造方法及びシリコン窒化膜の成膜装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07263354A (ja) * 1994-03-25 1995-10-13 Kobe Steel Ltd プラズマcvd膜の形成方法
JPH09223693A (ja) * 1995-12-11 1997-08-26 Sony Corp シリコン化合物系絶縁膜の成膜方法
JP2003086523A (ja) * 2001-06-25 2003-03-20 Mitsubishi Heavy Ind Ltd プラズマcvd装置及びクリーニング方法及び成膜方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4689372B2 (ja) * 2005-07-04 2011-05-25 株式会社日立プラントテクノロジー スタッカクレーンの走行駆動制御方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07263354A (ja) * 1994-03-25 1995-10-13 Kobe Steel Ltd プラズマcvd膜の形成方法
JPH09223693A (ja) * 1995-12-11 1997-08-26 Sony Corp シリコン化合物系絶縁膜の成膜方法
JP2003086523A (ja) * 2001-06-25 2003-03-20 Mitsubishi Heavy Ind Ltd プラズマcvd装置及びクリーニング方法及び成膜方法

Also Published As

Publication number Publication date
TW200915419A (en) 2009-04-01
TWI373805B (https=) 2012-10-01
JP2009021272A (ja) 2009-01-29

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