JP2009000347A - 粒子線照射システム - Google Patents
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- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N5/00—Radiation therapy
- A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
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Abstract
【解決手段】粒子線照射システムは、荷電粒子ビームを出射する加速装置6と、走査磁石24,25と、荷電粒子ビーム位置検出器26,27を有する。制御装置70は、荷電粒子ビーム位置検出器26,27からの信号に基づき、標的位置でのビーム位置を算出し、走査磁石24,25を制御して荷電粒子ビームを標的位置にて所望の照射位置へ移動させる。制御装置70は、所定の周期毎に荷電粒子ビームの位置と角度の情報を基に走査磁石24,25への励磁電流の値を補正する。
【選択図】図1
Description
最初に、図1を用いて、本実施形態による粒子線照射システムの全体構成について説明する。
図1は、本発明の一実施形態による粒子線照射システムの全体構成を示すシステムブロック図である。
図3は、本発明の一実施形態による粒子線照射システムにおける標的の深さとイオンビームのエネルギーとの関係の説明図である。
図4及び図5は、本発明の一実施形態による粒子線照射システムの照射装置の内部におけるビーム挙動の説明図である。図6は、本発明の一実施形態による粒子線照射システムの制御装置における補正方法を示すフローチャートである。
図7は、本発明の一実施形態による粒子線照射システムによる標的位置での照射位置の補正効果の説明図である。
2…ビーム輸送系
3…ライナック
4…シンクロトロン
5…高周波印加装置
6…加速装置
7…高周波印加電極
8…高周波印加電源
9…スイッチ
10…蓄積電荷量検出器
11…出射用デフレクタ
14,18…四極電磁石
15,19,20…偏向電磁石
16…照射装置
21…照射ベッド
22…照射対象物
23…標的
24,25…走査電磁石
26…上流側ビーム位置検出器
27…下流側ビーム位置検出器
28…線量検出器
70…制御装置
72…加速器制御部
73…照射制御部
74…記録装置
75…計算機
77…照射計画装置
Claims (13)
- 荷電粒子ビームを出射する加速器と、荷電粒子ビーム走査装置と、荷電粒子ビーム位置検出装置を有する粒子線照射システムであって、
前記荷電粒子ビーム位置検出装置からの信号に基づき、標的位置でのビーム位置を算出し、前記荷電粒子ビーム走査装置を制御して前記荷電粒子ビームを前記標的位置にて所望の照射位置へ移動させる制御装置を備えたことを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記制御装置は、所定の周期毎に前記荷電粒子ビームの位置と角度の情報を基に前記荷電粒子ビーム走査装置への励磁電流の値を補正することを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記制御装置は、前記加速器の出射周期毎に前記荷電粒子ビームの位置と角度の情報を基に前記荷電粒子ビーム走査装置への励磁電流の値を補正することを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記制御装置は、前記標的位置での前記荷電粒子ビーム位置と前記所望の照射位置との距離に対し、次の前記周期では前記所望の位置を基準として前記ビーム位置の反対側に前記距離だけ離れた点を、前記ビーム位置と前記所望の照射位置が一致するような荷電粒子ビームが照射するような励磁電流量を前記荷電粒子ビーム走査装置に設定することを特徴とする粒子線照射システム。 - 請求項3記載の粒子線照射システムにおいて、
前記制御装置は、前記荷電粒子ビーム走査装置が前記荷電粒子ビームを走査した場合でも、前記荷電粒子ビーム位置検出装置位置での、前記所望の照射位置に向かう前記荷電粒子ビームの位置と、前記荷電粒子ビームの経路との距離により、前記標的位置での前記所望の位置と前記荷電粒子ビーム位置との距離を算出することを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記制御装置は、前記出射周期の位相の進行は、同一の出射周期内の照射済み電荷量から識別することを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記制御装置は、前記出射周期の位相の進行は、同一の出射周期内の照射済み電荷量を蓄積電荷量で割った数値により識別することを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記制御装置は、前記出射周期での前記位相に従って前期荷電粒子ビーム照射位置が変化する位置を、前記出射周期の位相の関数で近似した関数により、前記出射周期の次の出射周期での前記荷電粒子ビーム照射位置を補正することを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記荷電粒子ビーム位置検出装置を二台設置し、一台は前記荷電粒子ビーム走査装置の上流側に、もう一台は下流側に設置したことを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記荷電粒子ビーム位置検出装置を二台設置し、二台共に、前記荷電粒子走査装置の下流に設置したことを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記荷電粒子ビーム位置検出器が1台であり、前記荷電粒子ビームの位置と角度を測定することができることを特徴とすることを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記制御装置が算出する前期標的位置での前記荷電粒子ビーム位置と、前記所望の照射位置との差が閾値を超えた場合にインターロックシステムを作動させることを特徴とする粒子線照射システム。 - 請求項1記載の粒子線照射システムにおいて、
前記荷電粒子ビーム位置検出装置を二台設置し、二台共に、前記荷電粒子走査装置の上流に設置したことを特徴とする粒子線照射システム。
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JP2007164990A JP4378396B2 (ja) | 2007-06-22 | 2007-06-22 | 粒子線照射システム |
US12/141,603 US7838855B2 (en) | 2007-06-22 | 2008-06-18 | Charged particle irradiation system |
EP08011251.9A EP2005993B1 (en) | 2007-06-22 | 2008-06-20 | Charged particle irradiation system |
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Cited By (17)
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JP4478753B1 (ja) * | 2009-06-09 | 2010-06-09 | 三菱電機株式会社 | 粒子線照射装置 |
JP4560142B1 (ja) * | 2010-03-31 | 2010-10-13 | 三菱電機株式会社 | 粒子線照射装置及び粒子線治療装置 |
JP2010238463A (ja) * | 2009-03-31 | 2010-10-21 | Hitachi Ltd | 荷電粒子ビーム照射装置 |
JP2011050585A (ja) * | 2009-09-02 | 2011-03-17 | Toshiba Corp | 粒子線ビーム照射装置および粒子線ビーム照射方法 |
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US7838855B2 (en) | 2010-11-23 |
EP2005993B1 (en) | 2015-12-09 |
US20090039256A1 (en) | 2009-02-12 |
JP4378396B2 (ja) | 2009-12-02 |
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