JP2008541472A5 - - Google Patents
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- Publication number
- JP2008541472A5 JP2008541472A5 JP2008511830A JP2008511830A JP2008541472A5 JP 2008541472 A5 JP2008541472 A5 JP 2008541472A5 JP 2008511830 A JP2008511830 A JP 2008511830A JP 2008511830 A JP2008511830 A JP 2008511830A JP 2008541472 A5 JP2008541472 A5 JP 2008541472A5
- Authority
- JP
- Japan
- Prior art keywords
- gas discharge
- electrode
- gap
- source according
- conductive material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102005023060.1 | 2005-05-19 | ||
| DE102005023060A DE102005023060B4 (de) | 2005-05-19 | 2005-05-19 | Gasentladungs-Strahlungsquelle, insbesondere für EUV-Strahlung |
| PCT/IB2006/051428 WO2006123270A2 (en) | 2005-05-19 | 2006-05-08 | Gas discharge source, in particular for euv radiation |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008541472A JP2008541472A (ja) | 2008-11-20 |
| JP2008541472A5 true JP2008541472A5 (https=) | 2009-06-25 |
| JP4879974B2 JP4879974B2 (ja) | 2012-02-22 |
Family
ID=36933632
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008511830A Expired - Fee Related JP4879974B2 (ja) | 2005-05-19 | 2006-05-08 | 特にｅｕｖ放射のための、ガス放電源 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7630475B2 (https=) |
| EP (1) | EP1886542B1 (https=) |
| JP (1) | JP4879974B2 (https=) |
| KR (1) | KR101214136B1 (https=) |
| CN (1) | CN101180923B (https=) |
| AT (1) | ATE464776T1 (https=) |
| DE (2) | DE102005023060B4 (https=) |
| WO (1) | WO2006123270A2 (https=) |
Families Citing this family (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7518134B2 (en) * | 2006-12-06 | 2009-04-14 | Asml Netherlands B.V. | Plasma radiation source for a lithographic apparatus |
| US7759663B1 (en) * | 2006-12-06 | 2010-07-20 | Asml Netherlands B.V. | Self-shading electrodes for debris suppression in an EUV source |
| US7696493B2 (en) * | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
| US7696492B2 (en) * | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
| US7838853B2 (en) * | 2006-12-14 | 2010-11-23 | Asml Netherlands B.V. | Plasma radiation source, method of forming plasma radiation, apparatus for projecting a pattern from a patterning device onto a substrate and device manufacturing method |
| DE102007004440B4 (de) * | 2007-01-25 | 2011-05-12 | Xtreme Technologies Gmbh | Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung |
| JP5149514B2 (ja) * | 2007-02-20 | 2013-02-20 | ギガフォトン株式会社 | 極端紫外光源装置 |
| US20080239262A1 (en) * | 2007-03-29 | 2008-10-02 | Asml Netherlands B.V. | Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation |
| US7629593B2 (en) * | 2007-06-28 | 2009-12-08 | Asml Netherlands B.V. | Lithographic apparatus, radiation system, device manufacturing method, and radiation generating method |
| KR101477472B1 (ko) | 2007-09-07 | 2014-12-30 | 코닌클리케 필립스 엔.브이. | 가스 방전 소스를 위한 전극 장치 및 이 전극 장치를 갖는 가스 방전 소스를 동작시키는 방법 |
| CN101796892B (zh) | 2007-09-07 | 2013-02-06 | 皇家飞利浦电子股份有限公司 | 用于以高功率操作的包括轮盖的气体放电源的转轮式电极装置 |
| EP2198676A1 (en) * | 2007-10-01 | 2010-06-23 | Philips Intellectual Property & Standards GmbH | High voltage electrical connection line |
| JP4952513B2 (ja) * | 2007-10-31 | 2012-06-13 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| WO2009077943A1 (en) * | 2007-12-14 | 2009-06-25 | Philips Intellectual Property & Standards Gmbh | Method for laser-based plasma production and radiation source, in particular for euv radiation |
| DE102007060807B4 (de) | 2007-12-18 | 2009-11-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Gasentladungsquelle, insbesondere für EUV-Strahlung |
| NL1036595A1 (nl) * | 2008-02-28 | 2009-08-31 | Asml Netherlands Bv | Device constructed and arranged to generate radiation, lithographic apparatus, and device manufacturing method. |
| CN102099746B (zh) * | 2008-07-18 | 2013-05-08 | 皇家飞利浦电子股份有限公司 | 包含污染捕获器的极端紫外辐射生成设备 |
| EP2170021B1 (en) * | 2008-09-25 | 2015-11-04 | ASML Netherlands B.V. | Source module, radiation source and lithographic apparatus |
| JP4623192B2 (ja) * | 2008-09-29 | 2011-02-02 | ウシオ電機株式会社 | 極端紫外光光源装置および極端紫外光発生方法 |
| JP5245857B2 (ja) * | 2009-01-21 | 2013-07-24 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| JP5504673B2 (ja) * | 2009-03-30 | 2014-05-28 | ウシオ電機株式会社 | 極端紫外光光源装置 |
| KR101706908B1 (ko) * | 2009-10-29 | 2017-02-15 | 코닌클리케 필립스 엔.브이. | 특히 가스 방전 광원들을 위한 전극 시스템 |
| EP2555598A1 (en) * | 2011-08-05 | 2013-02-06 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for generating optical radiation by means of electrically operated pulsed discharges |
| NL2009683A (en) * | 2011-11-15 | 2013-05-16 | Asml Netherlands Bv | Radiation source device, lithographic apparatus, and device manufacturing method. |
| DE102012109809B3 (de) | 2012-10-15 | 2013-12-12 | Xtreme Technologies Gmbh | Vorrichtung zur Erzeugung von kurzwelliger elektromagnetischer Strahlung auf Basis eines Gasentladungsplasmas |
| DE102013103668B4 (de) * | 2013-04-11 | 2016-02-25 | Ushio Denki Kabushiki Kaisha | Anordnung zum Handhaben eines flüssigen Metalls zur Kühlung von umlaufenden Komponenten einer Strahlungsquelle auf Basis eines strahlungsemittierenden Plasmas |
| DE102013109048A1 (de) * | 2013-08-21 | 2015-02-26 | Ushio Denki Kabushiki Kaisha | Verfahren und Vorrichtung zur Kühlung von Strahlungsquellen auf Basis eines Plasmas |
| DE102013017655B4 (de) * | 2013-10-18 | 2017-01-05 | Ushio Denki Kabushiki Kaisha | Anordnung und Verfahren zum Kühlen einer plasmabasierten Strahlungsquelle |
| DE102014102720B4 (de) | 2014-02-28 | 2017-03-23 | Ushio Denki Kabushiki Kaisha | Anordnung zum Kühlen einer plasmabasierten Strahlungsquelle mit einer metallischen Kühlflüssigkeit und Verfahren zur Inbetriebnahme einer solchen Kühlanordnung |
| US10021773B2 (en) * | 2015-11-16 | 2018-07-10 | Kla-Tencor Corporation | Laser produced plasma light source having a target material coated on a cylindrically-symmetric element |
| CN111263577B (zh) * | 2018-12-03 | 2024-10-01 | 北京梦之墨科技有限公司 | 一种具有电磁屏蔽性能的旋转结构 |
| US11596048B2 (en) * | 2019-09-23 | 2023-02-28 | Kla Corporation | Rotating lamp for laser-sustained plasma illumination source |
| JP7626009B2 (ja) * | 2021-08-30 | 2025-02-04 | ウシオ電機株式会社 | 放電プラズマ生成ユニット、及びそれを搭載した光源装置 |
| CN113960019A (zh) * | 2021-10-26 | 2022-01-21 | 天津大学 | 一种双转盘电极原子发射光谱油液元素装置 |
| KR20250109087A (ko) | 2024-01-09 | 2025-07-16 | 한국표준과학연구원 | 레이저 생성 플라즈마를 사용하는 극자외선 발생 장치 및 방법 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000061839A (ja) | 1998-08-19 | 2000-02-29 | Rikagaku Kenkyusho | マイクロ放電ツルーイング装置とこれを用いた微細加工方法 |
| TW589924B (en) * | 2001-04-06 | 2004-06-01 | Fraunhofer Ges Forschung | Process and device for producing extreme ultraviolet ray/weak x-ray |
| CN101795527B (zh) * | 2002-09-19 | 2013-02-20 | Asml荷兰有限公司 | 辐射源、光刻装置和器件制造方法 |
| EP1401248B1 (en) * | 2002-09-19 | 2012-07-25 | ASML Netherlands B.V. | Radiation source, lithographic apparatus, and device manufacturing method |
| AU2003303542A1 (en) | 2003-01-02 | 2004-07-29 | Jmar Research Inc. | Method and apparatus for generating a membrane target for laser produced plasma |
| DE10342239B4 (de) * | 2003-09-11 | 2018-06-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zum Erzeugen von Extrem-Ultraviolettstrahlung oder weicher Röntgenstrahlung |
| RU2278483C2 (ru) * | 2004-04-14 | 2006-06-20 | Владимир Михайлович Борисов | Эуф источник с вращающимися электродами и способ получения эуф излучения из газоразрядной плазмы |
| US7501642B2 (en) * | 2005-12-29 | 2009-03-10 | Asml Netherlands B.V. | Radiation source |
-
2005
- 2005-05-19 DE DE102005023060A patent/DE102005023060B4/de not_active Expired - Lifetime
-
2006
- 2006-05-08 AT AT06744876T patent/ATE464776T1/de not_active IP Right Cessation
- 2006-05-08 EP EP06744876A patent/EP1886542B1/en not_active Expired - Lifetime
- 2006-05-08 WO PCT/IB2006/051428 patent/WO2006123270A2/en not_active Ceased
- 2006-05-08 CN CN200680017282XA patent/CN101180923B/zh not_active Expired - Fee Related
- 2006-05-08 US US11/914,773 patent/US7630475B2/en not_active Expired - Lifetime
- 2006-05-08 JP JP2008511830A patent/JP4879974B2/ja not_active Expired - Fee Related
- 2006-05-08 KR KR1020077029674A patent/KR101214136B1/ko not_active Expired - Fee Related
- 2006-05-08 DE DE602006013621T patent/DE602006013621D1/de not_active Expired - Lifetime
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