JP2008540738A5 - - Google Patents

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Publication number
JP2008540738A5
JP2008540738A5 JP2008510114A JP2008510114A JP2008540738A5 JP 2008540738 A5 JP2008540738 A5 JP 2008540738A5 JP 2008510114 A JP2008510114 A JP 2008510114A JP 2008510114 A JP2008510114 A JP 2008510114A JP 2008540738 A5 JP2008540738 A5 JP 2008540738A5
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JP
Japan
Prior art keywords
group
atom
cation
combinations
formula
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Application number
JP2008510114A
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English (en)
Japanese (ja)
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JP2008540738A (ja
JP5166248B2 (ja
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Priority claimed from US11/120,822 external-priority patent/US7214740B2/en
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Publication of JP2008540738A publication Critical patent/JP2008540738A/ja
Publication of JP2008540738A5 publication Critical patent/JP2008540738A5/ja
Application granted granted Critical
Publication of JP5166248B2 publication Critical patent/JP5166248B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2008510114A 2005-05-03 2006-05-02 カルボニル末端基の量を減らしたフッ素化イオノマー Expired - Fee Related JP5166248B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/120,822 2005-05-03
US11/120,822 US7214740B2 (en) 2005-05-03 2005-05-03 Fluorinated ionomers with reduced amounts of carbonyl end groups
PCT/US2006/016696 WO2006119224A1 (en) 2005-05-03 2006-05-02 Fluorinated ionomers with reduced amounts of carbonyl end groups

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012236308A Division JP5973319B2 (ja) 2005-05-03 2012-10-26 カルボニル末端基の量を減らしたフッ素化イオノマー

Publications (3)

Publication Number Publication Date
JP2008540738A JP2008540738A (ja) 2008-11-20
JP2008540738A5 true JP2008540738A5 (enExample) 2009-04-30
JP5166248B2 JP5166248B2 (ja) 2013-03-21

Family

ID=36808353

Family Applications (3)

Application Number Title Priority Date Filing Date
JP2008510114A Expired - Fee Related JP5166248B2 (ja) 2005-05-03 2006-05-02 カルボニル末端基の量を減らしたフッ素化イオノマー
JP2012236308A Expired - Fee Related JP5973319B2 (ja) 2005-05-03 2012-10-26 カルボニル末端基の量を減らしたフッ素化イオノマー
JP2015215826A Withdrawn JP2016104854A (ja) 2005-05-03 2015-11-02 カルボニル末端基の量を減らしたフッ素化イオノマー

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2012236308A Expired - Fee Related JP5973319B2 (ja) 2005-05-03 2012-10-26 カルボニル末端基の量を減らしたフッ素化イオノマー
JP2015215826A Withdrawn JP2016104854A (ja) 2005-05-03 2015-11-02 カルボニル末端基の量を減らしたフッ素化イオノマー

Country Status (6)

Country Link
US (2) US7214740B2 (enExample)
EP (1) EP1877454B1 (enExample)
JP (3) JP5166248B2 (enExample)
KR (1) KR20080003857A (enExample)
CN (1) CN101171271B (enExample)
WO (1) WO2006119224A1 (enExample)

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JP5219163B2 (ja) * 2008-01-21 2013-06-26 ダイキン工業株式会社 末端処理されたフッ化ビニリデン系エラストマーの製造方法
KR100978553B1 (ko) * 2008-07-10 2010-08-27 한양대학교 산학협력단 불소계 또는 부분불소계 분산제를 포함하는 불소계 고분자전해질막 및 이를 포함하는 연료전지
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CN110272512A (zh) 2009-06-12 2019-09-24 索尔维索莱克西斯公司 具有低表面张力、低液体粘度以及高固体含量的氟代离聚物分散体
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CN107223139B (zh) 2015-02-12 2020-06-30 3M创新有限公司 包含全氟烷氧基烷基侧基的四氟乙烯/六氟丙烯共聚物及其制备和使用方法
CN105037604B (zh) * 2015-05-25 2017-10-10 上海交通大学 燃料电池用短链全氟磺酰胺阴离子离聚物及其制备和应用
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US11492431B2 (en) 2017-09-14 2022-11-08 3M Innovative Properties Company Fluorinated copolymer having sulfonyl pendant groups and compositions and articles including the same
US11767379B2 (en) 2018-03-01 2023-09-26 Daikin Industries, Ltd. Method for manufacturing fluoropolymer
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TWI821458B (zh) 2018-11-19 2023-11-11 日商大金工業股份有限公司 組成物及拉伸體
EP3885372A4 (en) 2018-11-19 2022-08-17 Daikin Industries, Ltd. PROCESS FOR PRODUCTION OF MODIFIED POLYTETRAFLUORETHYLENE AND COMPOSITION
WO2020218620A1 (ja) 2019-04-26 2020-10-29 ダイキン工業株式会社 フルオロポリマー水性分散液の製造方法、排水の処理方法、及び、フルオロポリマー水性分散液
JP7417129B2 (ja) 2019-04-26 2024-01-18 ダイキン工業株式会社 水の処理方法および組成物
CN120271939A (zh) 2019-09-05 2025-07-08 大金工业株式会社 组合物及其制造方法
JP7368759B2 (ja) 2019-09-05 2023-10-25 ダイキン工業株式会社 パーフルオロエラストマーの製造方法および組成物
WO2021100836A1 (ja) 2019-11-19 2021-05-27 ダイキン工業株式会社 フルオロポリマーの製造方法、ポリテトラフルオロエチレンの製造方法、パーフルオロエラストマーの製造方法および組成物
WO2021127346A1 (en) 2019-12-20 2021-06-24 3M Innovative Properties Company Fluorinated copolymer and compositions and articles including the same
US20230090482A1 (en) 2020-04-09 2023-03-23 3M Innovative Properties Company Composite including fluorinated polymer and salt nanoparticles and articles including the same
CN116406386A (zh) 2020-11-19 2023-07-07 大金工业株式会社 含氟弹性体水性分散液的制造方法和组合物
EP4249525A4 (en) 2020-11-19 2024-10-16 Daikin Industries, Ltd. METHOD FOR PREPARING AN AQUEOUS PERFLUOROLASTOMER DISPERSION, COMPOSITION, CROSS-LINKABLE COMPOSITION AND CROSS-LINKED PRODUCT
JP7606110B2 (ja) 2020-11-19 2024-12-25 ダイキン工業株式会社 ポリテトラフルオロエチレンの製造方法およびポリテトラフルオロエチレンを含有する組成物
CN116981741A (zh) 2021-03-10 2023-10-31 大金工业株式会社 涂料组合物、涂布膜、层积体和涂装物品
EP4342921A4 (en) 2021-05-19 2025-04-23 Daikin Industries, Ltd. Process for producing a fluoropolymer, process for producing polytetrafluoroethylene and composition
JP7741413B2 (ja) 2021-06-11 2025-09-18 ダイキン工業株式会社 含フッ素エラストマー水性分散液の製造方法、組成物および水性分散液
CN117500848A (zh) 2021-06-30 2024-02-02 大金工业株式会社 含氟聚合物组合物的制造方法和含氟聚合物组合物
WO2023277140A1 (ja) 2021-06-30 2023-01-05 ダイキン工業株式会社 高純度フルオロポリマー含有組成物の製造方法および高純度フルオロポリマー含有組成物
WO2023057926A1 (en) 2021-10-07 2023-04-13 3M Innovative Properties Company Composite including fluorinated polymer and lithium fluoride nanoparticles and articles including the same
AU2023227088A1 (en) * 2022-03-01 2024-08-22 Syensqo Specialty Polymers Italy S.p.A. Method for making fluoropolymers containing ion exchange groups
WO2023182229A1 (ja) 2022-03-23 2023-09-28 ダイキン工業株式会社 フルオロポリマーの製造方法および組成物
CN119072500A (zh) 2022-04-28 2024-12-03 大金工业株式会社 含有氟树脂的组合物的制造方法和含有氟树脂的组合物
WO2023210818A1 (ja) 2022-04-28 2023-11-02 ダイキン工業株式会社 フッ素ゴムを含有する組成物
WO2023210819A1 (ja) 2022-04-28 2023-11-02 ダイキン工業株式会社 フルオロポリマーの製造方法
CN120530501A (zh) 2023-01-18 2025-08-22 大金工业株式会社 四氟乙烯系聚合物组合物、电化学器件用粘结剂、电极合剂、电极和二次电池
CN120548621A (zh) 2023-01-18 2025-08-26 大金工业株式会社 电化学器件用合剂、电化学器件用合剂片、电极和电化学器件
CN121712810A (zh) 2023-08-14 2026-03-20 大金工业株式会社 含氟聚合物水性分散液的制造方法和含氟聚合物水性分散液
CN121752344A (zh) 2023-08-28 2026-03-27 大金工业株式会社 水溶性含氟聚合物的回收方法
WO2026032894A1 (en) 2024-08-08 2026-02-12 Syensqo Specialty Polymers Itatly S.P.A. Method for preparing a fluorinated polymer comprising ion exchange groups or precursor groups thereof

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