JP2008529290A5 - - Google Patents

Download PDF

Info

Publication number
JP2008529290A5
JP2008529290A5 JP2007552559A JP2007552559A JP2008529290A5 JP 2008529290 A5 JP2008529290 A5 JP 2008529290A5 JP 2007552559 A JP2007552559 A JP 2007552559A JP 2007552559 A JP2007552559 A JP 2007552559A JP 2008529290 A5 JP2008529290 A5 JP 2008529290A5
Authority
JP
Japan
Prior art keywords
irradiation system
axis
rotation angle
homogenizing
rod integrator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007552559A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008529290A (ja
Filing date
Publication date
Priority claimed from DE102005004216A external-priority patent/DE102005004216A1/de
Application filed filed Critical
Publication of JP2008529290A publication Critical patent/JP2008529290A/ja
Publication of JP2008529290A5 publication Critical patent/JP2008529290A5/ja
Pending legal-status Critical Current

Links

JP2007552559A 2005-01-29 2006-01-21 照射システム、具体的には、半導体リソグラフにおける投影露光装置のための照射システム Pending JP2008529290A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005004216A DE102005004216A1 (de) 2005-01-29 2005-01-29 Beleuchtungssystem, insbesondere für eine Projektionsbelichtungsanlage in der Halbleiterlithographie
PCT/EP2006/000535 WO2006079486A2 (en) 2005-01-29 2006-01-21 Illumination system, in particular for a projection exposure machine in semiconductor lithography

Publications (2)

Publication Number Publication Date
JP2008529290A JP2008529290A (ja) 2008-07-31
JP2008529290A5 true JP2008529290A5 (https=) 2009-02-05

Family

ID=36084237

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007552559A Pending JP2008529290A (ja) 2005-01-29 2006-01-21 照射システム、具体的には、半導体リソグラフにおける投影露光装置のための照射システム

Country Status (6)

Country Link
US (1) US20080273186A1 (https=)
EP (1) EP1842102A2 (https=)
JP (1) JP2008529290A (https=)
KR (1) KR20070100905A (https=)
DE (1) DE102005004216A1 (https=)
WO (1) WO2006079486A2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7609746B2 (en) * 2006-12-01 2009-10-27 Seiko Epson Corporation Light source device, image display device, projector, illumination device, and monitor device
US8164739B2 (en) * 2007-09-28 2012-04-24 Asml Holding N.V. Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus
JP6494339B2 (ja) * 2015-03-10 2019-04-03 キヤノン株式会社 照明光学系、露光装置、及び物品の製造方法
DE102018201010A1 (de) * 2018-01-23 2019-07-25 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
DE102018201009A1 (de) * 2018-01-23 2019-07-25 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie
CN112305863B (zh) * 2019-07-25 2021-12-03 上海微电子装备（集团）股份有限公司 照明系统、光瞳椭圆度补偿方法及光刻机
CN112445005B (zh) * 2019-08-29 2023-08-11 深圳市中光工业技术研究院 激光光源及激光光源系统
CN112445076B (zh) * 2019-08-30 2022-04-22 上海微电子装备（集团）股份有限公司 光刻机、曝光系统及实现离轴照明的方法与离轴照明装置

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6897942B2 (en) * 1990-11-15 2005-05-24 Nikon Corporation Projection exposure apparatus and method
US6285443B1 (en) * 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
JP2817615B2 (ja) * 1994-01-31 1998-10-30 日本電気株式会社 縮小投影露光装置
EP0687956B2 (de) * 1994-06-17 2005-11-23 Carl Zeiss SMT AG Beleuchtungseinrichtung
JPH0883743A (ja) * 1994-09-09 1996-03-26 Nikon Corp 照明光学装置
JPH09199390A (ja) * 1996-01-16 1997-07-31 Hitachi Ltd パターン形成方法、投影露光装置および半導体装置の製造方法
JPH11354424A (ja) * 1998-06-04 1999-12-24 Canon Inc 照明装置及びそれを用いた投影露光装置
JP2001313250A (ja) * 2000-02-25 2001-11-09 Nikon Corp 露光装置、その調整方法、及び前記露光装置を用いるデバイス製造方法
TW498408B (en) * 2000-07-05 2002-08-11 Asm Lithography Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2002158157A (ja) * 2000-11-17 2002-05-31 Nikon Corp 照明光学装置および露光装置並びにマイクロデバイスの製造方法
DE10132988B4 (de) * 2001-07-06 2005-07-28 Carl Zeiss Smt Ag Projektionsbelichtungsanlage
DE10158921A1 (de) * 2001-11-30 2003-06-26 Zeiss Carl Smt Ag Verfahren zum Bestimmen von mindestens einer Kenngröße, die für die Beleuchtungswinkelverteilung einer der Beleuchtung eines Gegenstandes dienenden Lichtquelle einer Projektionsbelichtungsanlage charakteristisch ist
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
EP1434092A1 (en) * 2002-12-23 2004-06-30 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US20040207829A1 (en) * 2003-04-17 2004-10-21 Asml Netherlands, B.V. Illuminator controlled tone reversal printing
US20050134820A1 (en) * 2003-12-22 2005-06-23 Asml Netherlands B.V. Method for exposing a substrate, patterning device, and lithographic apparatus

Similar Documents

Publication Publication Date Title
CN102939566B (zh) 微光刻投射曝光设备的光学系统
CN101568884B (zh) 光学系统、具体而言微光刻投射曝光设备的照明系统或投射物镜
TWI456267B (zh) 用於微影投射曝光設備之照明系統
JP2010192914A5 (https=)
JP2012168543A5 (ja) 投影光学系、露光装置、露光方法、およびデバイス製造方法
TWI463270B (zh) 雷射曝光裝置
CN101320222A (zh) 基于数字微镜阵列的步进式无掩模数字曝光装置
JP2013501348A (ja) 光学ビーム偏向要素及び調節方法
JP2011502275A5 (https=)
CN109031899A (zh) 一种高分辨率高效率投影光刻成像系统及曝光方法
JP2005532680A5 (https=)
JP2007220767A5 (https=)
JP2008529290A5 (https=)
JP2014081658A5 (https=)
JP2010020017A5 (https=)
TW201042400A (en) Optical integrator, optical lighting system, exposure device, and device production method
TWI592766B (zh) 微影投影曝光設備的光學系統
US20150160565A1 (en) Projection exposure methods and systems
JP5846471B2 (ja) 偏光影響光学装置及びマイクロリソグラフィ投影露光装置の光学系
WO2006079486A3 (en) Illumination system, in particular for a projection exposure machine in semiconductor lithography
JP2007273749A5 (https=)
JP2008242238A (ja) 露光装置
CN103454865A (zh) 一种深紫外光刻照明系统
JP2012504320A5 (https=)
CN208752391U (zh) 一种高分辨率高效率投影光刻成像系统