JP2008529235A5 - - Google Patents

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Publication number
JP2008529235A5
JP2008529235A5 JP2007552791A JP2007552791A JP2008529235A5 JP 2008529235 A5 JP2008529235 A5 JP 2008529235A5 JP 2007552791 A JP2007552791 A JP 2007552791A JP 2007552791 A JP2007552791 A JP 2007552791A JP 2008529235 A5 JP2008529235 A5 JP 2008529235A5
Authority
JP
Japan
Prior art keywords
lamp
processing apparatus
reactor according
electrode
medium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007552791A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008529235A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/IB2006/050272 external-priority patent/WO2006079982A1/en
Publication of JP2008529235A publication Critical patent/JP2008529235A/ja
Publication of JP2008529235A5 publication Critical patent/JP2008529235A5/ja
Pending legal-status Critical Current

Links

JP2007552791A 2005-01-28 2006-01-25 誘電バリア放電ランプを備えた処理装置 Pending JP2008529235A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP05100564 2005-01-28
PCT/IB2006/050272 WO2006079982A1 (en) 2005-01-28 2006-01-25 Treatment system comprising a dielectric barrier discharge lamp

Publications (2)

Publication Number Publication Date
JP2008529235A JP2008529235A (ja) 2008-07-31
JP2008529235A5 true JP2008529235A5 (enExample) 2009-03-12

Family

ID=36590850

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007552791A Pending JP2008529235A (ja) 2005-01-28 2006-01-25 誘電バリア放電ランプを備えた処理装置

Country Status (5)

Country Link
US (1) US7683343B2 (enExample)
EP (1) EP1843981B1 (enExample)
JP (1) JP2008529235A (enExample)
CN (1) CN101111458B (enExample)
WO (1) WO2006079982A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8834789B2 (en) * 2006-07-13 2014-09-16 Koninklijke Philips N.V. Fluid treatment system comprising radiation source module and cooling means
US8022377B2 (en) * 2008-04-22 2011-09-20 Applied Materials, Inc. Method and apparatus for excimer curing
WO2010079401A1 (en) * 2009-01-06 2010-07-15 Philips Intellectual Property & Standards Gmbh Optical reactor and driving circuit for optical reactor
JP2011098275A (ja) * 2009-11-05 2011-05-19 Gowlin Lam マイクロエネルギーの量子制御方法及びその装置
TWI569301B (zh) 2010-06-04 2017-02-01 通路實業集團國際公司 感應耦合介電質屏障放電燈
US20130119266A1 (en) * 2010-07-26 2013-05-16 Koninklijke Philips Electronics N.V. Device for subjecting a fluid to a disinfecting treatment by exposing the fluid to ultraviolet light
EP2641262B1 (en) * 2010-11-16 2014-06-25 Koninklijke Philips N.V. Dielectric barrier discharge lamp device, and optical fluid treatment device provided with the dielectric barrier discharge lamp device
CN103959431B (zh) * 2011-12-02 2016-06-29 优志旺电机株式会社 准分子灯
MX2014006561A (es) * 2011-12-02 2014-09-22 Aquamost Inc Aparato y metodo para tratar soluciones acuosas y contaminantes en las mismas.
DE102012017779A1 (de) * 2012-09-07 2014-03-13 Karlsruher Institut für Technologie Dielektrisch behinderte Entladungs-Lampe
CA2900722A1 (en) 2013-02-11 2014-08-14 AquaMost, Inc. Apparatus and method for treating aqueous solutions and contaminants therein
DE102014207690A1 (de) * 2014-04-24 2015-10-29 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur photochemischen Behandlung oder Reinigung eines flüssigen Mediums
JP6365096B2 (ja) * 2014-08-07 2018-08-01 ウシオ電機株式会社 紫外線照射式オゾン生成装置
CN210012631U (zh) * 2018-10-31 2020-02-04 厦门百霖净水科技有限公司 一种带uv灯的过滤装置
WO2023084278A1 (es) * 2021-11-11 2023-05-19 Pontificia Universidad Javeriana Sistema de purificación de agua con luz ultravioleta

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4022279A1 (de) 1989-08-17 1991-02-21 Asea Brown Boveri Bestrahlungseinrichtung
DE59105798D1 (de) 1991-04-15 1995-07-27 Heraeus Noblelight Gmbh Bestrahlungseinrichtung.
EP0517929B1 (de) * 1991-06-01 1995-03-15 Heraeus Noblelight GmbH Bestrahlungseinrichtung mit einem Hochleistungsstrahler
DE4140497C2 (de) * 1991-12-09 1996-05-02 Heraeus Noblelight Gmbh Hochleistungsstrahler
EP0697374B1 (de) * 1994-08-15 2000-03-22 Sulzer Chemtech AG Vorrichtung zum Behandeln von Fluiden mit UV-Strahlung
JP3025414B2 (ja) 1994-09-20 2000-03-27 ウシオ電機株式会社 誘電体バリア放電ランプ装置
JP3789972B2 (ja) 1996-03-18 2006-06-28 独立行政法人科学技術振興機構 酸素添加反応の放射検出方法
US6194821B1 (en) 1997-02-12 2001-02-27 Quark Systems Co., Ltd. Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus
DE19919169A1 (de) * 1999-04-28 2000-11-02 Philips Corp Intellectual Pty Vorrichtung zur Desinfektion von Wasser mit einer UV-C-Gasentladungslampe
JP2001110361A (ja) 1999-10-08 2001-04-20 Ushio Inc 誘電体バリア放電ランプ装置
JP3418581B2 (ja) * 2000-02-07 2003-06-23 株式会社オーク製作所 誘電体バリア放電ランプ
US6633109B2 (en) 2001-01-08 2003-10-14 Ushio America, Inc. Dielectric barrier discharge-driven (V)UV light source for fluid treatment
JP2002239484A (ja) 2001-02-16 2002-08-27 Ushio Inc 誘電体バリア放電ランプを使った基板処理装置
US7381976B2 (en) * 2001-03-13 2008-06-03 Triton Thalassic Technologies, Inc. Monochromatic fluid treatment systems
JP3518525B2 (ja) * 2001-06-14 2004-04-12 ウシオ電機株式会社 紫外線ランプ装置
JP2003165711A (ja) * 2001-11-26 2003-06-10 Wakomu Denso:Kk オゾン発生装置
CN1162215C (zh) * 2002-01-16 2004-08-18 中山大学 三相三维电极光电反应器
CN1263686C (zh) * 2004-04-07 2006-07-12 太原理工大学 光电催化氧化处理水中有机物的装置
US20070051902A1 (en) * 2004-07-21 2007-03-08 Thomas Justel Apparatus for reducing contaminants in fluid stream comprising a dielectric barrier excimer discharge lamp
US7199374B2 (en) * 2004-08-30 2007-04-03 Rutgers, The State University Corona discharge lamps

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